KR101278800B1 - Substrate processing apparatus and supporting frame to be used therein - Google Patents

Abstract

The present invention provides a substrate processing apparatus that can effectively use a space below the scaffold used in a maintenance operation or the like of a substrate processing apparatus. In addition, in the present invention, the support frame 140 disposed on the floor surface for supporting the substrate processing apparatus 100 including the plurality of processing chambers 110 is provided from the periphery of the processing chamber to a portion having a predetermined height from the floor surface. The footrest 160 was directly provided so that it might protrude to the outside. The footrest includes a plurality of support brackets 162 mounted on the outside of the support frame, and a footrest plate 164 supported horizontally to the support bracket.

Description

Substrate processing apparatus and support frame used for it {SUBSTRATE PROCESSING APPARATUS AND SUPPORTING FRAME TO BE USED THEREIN}

This invention relates to the substrate processing apparatus provided with the process chamber which performs a predetermined process with respect to a to-be-processed substrate, and a support frame used for supporting it.

In a semiconductor manufacturing process, predetermined processes, such as an etching process and a film-forming process, with respect to to-be-processed substrates, such as a glass substrate (for example, flat panel display substrates, such as a liquid crystal display), and a semiconductor wafer (henceforth only a "wafer"). The substrate processing apparatus for performing a process is used. Background Art In recent years, multichamber substrate processing apparatuses having a plurality of processing chambers (chambers) have been widely used for the purpose of high integration and high throughput. In this type of substrate processing apparatus, a plurality of processing chambers and a transfer chamber are connected via a gate valve, and the substrates to be processed are sequentially brought into each processing chamber sequentially by a transfer mechanism provided in the transfer chamber, and in each processing chamber. Individual process processing is performed on the substrate to be processed.

When the above substrate processing apparatus is installed in a clean room, a support frame having a size capable of mounting the processing chamber is disposed on the floor surface of the clean room, the processing chamber is mounted on the support frame, and the support frame is installed in the interior space of the support frame. Control devices, matching devices, vacuum pumps, various electric cables, gas pipes and the like are disposed. For example, Patent Documents 1 and 2 below describe a support frame for supporting a processing chamber.

By the way, when a process chamber is mounted to a support frame as mentioned above, a process chamber will be located above from the floor of a clean room. In addition, in recent years, the enlargement of the processing chamber has been progressed, so that the ceiling of the processing chamber is higher, and it has become difficult for the operator to perform the maintenance work of the processing chamber while standing directly on the floor surface. Therefore, in the past, the scaffold was installed along the support frame, and the operator stood on the scaffold to perform maintenance of the processing chamber.

Japanese Patent Laid-Open No. 1995-193115 Japanese Patent Laid-Open No. 1996-335540

However, in order to install the scaffold, since the support frame for scaffolding was provided adjacent to the support frame of a process chamber, and the scaffolding plate was laid on it, the support frame for scaffolding has become an obstacle, for example, for maintenance work, The space under the scaffold was not available effectively, such as no tools or measuring equipment could be placed.

In particular, in today's large-scale substrate processing apparatus due to the increase in size of the substrate to be processed, the area occupied by the support frame on the floor surface of the clean room tends to be wider, and the space under the scaffold can be used. If this is not possible, it will lead to the problem that the necessity of further expansion of the floor area of the clean room arises.

In addition, in the case of a large process chamber, since the apparatus accommodated in the space below the process chamber, ie, the support frame, such as a vacuum pump and a matching device, inevitably becomes large, the process chamber is supported at a higher position. Under such an environment, the worker can use the space below the scaffold for maintenance, such as entering and exiting the space below the processing chamber and performing maintenance work. By the way, conventionally, the frame for scaffolding adjacent to a support frame obstructs a worker's passage, and also there exists a problem that workability falls.

Therefore, the present invention has been made in view of the above problems, and an object thereof is to provide a substrate processing apparatus which can effectively use a space below the scaffold used in maintenance work, and a support frame used therefor.

In order to solve the said subject, according to some aspect of this invention, in the support frame arrange | positioned on a floor surface in order to support the substrate processing apparatus provided with the process chamber which performs a predetermined process with respect to a to-be-processed substrate, the said floor A support frame is provided in which a scaffold is directly provided at a portion of a predetermined height from a surface so as to protrude outward from the periphery of the processing chamber. The scaffold includes, for example, a plurality of support brackets mounted on the outside of the support frame, and a scaffold plate supported horizontally on the support bracket.

In order to solve the said subject, according to another viewpoint of this invention, the substrate processing apparatus provided with the processing chamber which performs a predetermined process with respect to a to-be-processed substrate, and the support frame arrange | positioned on a floor surface and supporting the said processing chamber. And a plurality of support brackets directly mounted to the outside of the support frame so as to protrude outward from the periphery of the processing chamber, at a portion of a predetermined height from the floor surface, and a foot plate supported horizontally to the support bracket. The substrate processing apparatus characterized by the above-mentioned.

According to this invention, since the scaffold is directly provided in the support frame which supports the substrate processing apparatus, it becomes unnecessary to provide the frame and the leg which support this scaffold plate in the space below the scaffold plate. As a result, the space below the scaffold plate can also be effectively used. Further, by providing the scaffold directly on the support frame, the scaffold can be formed at a position where the maintenance work can be easily performed.

In addition, each of the support brackets is preferably formed of a shape steel. As a result, the rigidity of the support bracket can be increased to increase the maximum load on the scaffold plate supported by the support bracket.

Each support bracket is preferably detachable with respect to the support frame. Thereby, a support bracket can be attached only to the location which requires a footplate. Moreover, since a support frame can be transported in the state which removed the support bracket, it becomes possible to hold down the transport cost of a support frame.

In addition, the processing chamber is composed of a gas unit and a cover part detachable from the gas part, and the cover part detached from the gas part is provided with a rail which can slide to an evacuation site on the side of the gas part, It is preferable to provide the scaffolding so that the scaffolding can be carried out between the scaffolds around the processing chamber. According to this, the operator can perform maintenance of the inside of the gaseous part while traveling between the scaffolding around the processing chamber and the footing around the rail, and can also perform the maintenance of the cover part evacuated from the gaseous part onto the rail.

Further, a door may be provided between the scaffold around the processing chamber and the scaffold around the rail to prevent traffic between these scaffolds. By restricting the movement to the scaffolding by the door, it is possible to prevent entry and exit of the scaffold around the rail except when necessary, thereby improving the safety of the maintenance work.

In this case, a sensor for detecting the open / closed state of the door and a control unit for controlling a detachment operation of the lid part in accordance with a detection result of the sensor, wherein the control unit is provided while the sensor detects the open state of the door. It is preferable to restrict so that attachment or detachment operation | movement of a cover part is impossible. Thereby, for example, an accident such as a cover part in contact with an operator on the scaffold plate during detachment operation can be prevented in advance, and the safety of the maintenance work can be further improved.

In addition, the door is composed of an outer door and a double door consisting of an inner door that is pivotable with respect to the outer door, the outer door having a width narrower than the width of the footrest, and rotatably supported on a support portion provided near the outer side of the footrest. The inner door may be pivotally supported on the tip side of the outer door. According to this, even if the outer door is closed, a gap in which the door does not exist is formed on the inner side (between the front end of the outer door and the support frame). For this reason, even when a part of the cover portion protrudes outward from the support frame or the rail (stool side), when the cover portion is slid along the rail, the outer door and the inner door are closed to prohibit entry to the footboard around the rail. At the same time, interference between the cover and the outer door can be prevented. In addition, when the cover part is closed, the gap inside the scaffold can be closed by closing the outer door in a state where the inner door is opened. As a result, the entry and exit of the worker to the scaffold around the rail can be regulated.

The lock mechanism may be provided in the door, and the control unit may lock the door so that the door does not open while the lid is detecting the closed state and while the lid is attached or detached. When the cover part is in the closed state, since there is no cover part on the rail, a large space may be generated in the vicinity of the rail and the worker may fall. When the worker may fall in this way, by locking the door, the operator can be forced out of the footrest around the rail.

According to the present invention, by providing the scaffold directly in the support frame for supporting the substrate processing apparatus, the space below the scaffold plate can be effectively used, and the scaffold can be formed at a position where the maintenance work such as the processing chamber can be easily performed. Can be.

1 is a perspective view showing an outline of an external configuration of a substrate processing apparatus according to a first embodiment of the present invention;
2 is a plan view when the substrate processing apparatus shown in FIG. 1 is viewed from above;
3 is a front view of the substrate processing apparatus shown in FIG. 1;
4 is a perspective view for explaining the structure of a support frame of the substrate processing apparatus shown in FIG. 1;
5 is a perspective view for explaining a mounting example of the support bracket shown in FIG. 4;
FIG. 6 is a view of the connecting portion of the support bracket and the beam member shown in FIG. 5 seen from the side;
7 is a view showing an outline of a configuration of a substrate processing apparatus according to a second embodiment of the present invention, and is a plan view when the substrate processing apparatus is viewed from above;
8 is a perspective view illustrating an outline of a structural example of a door illustrated in FIG. 7;
9 is a plan view of the door shown in FIG. 8 seen from above;
10 is a perspective view illustrating an outline of another configuration example of a door illustrated in FIG. 7.

EMBODIMENT OF THE INVENTION Preferred embodiment of this invention is described in detail, referring an accompanying drawing below. In the present specification and drawings, constituent elements having substantially the same functional configuration are denoted by the same reference numerals, and redundant description will be omitted.

(Configuration example of substrate processing apparatus according to the first embodiment)

First, an embodiment in the case where the present invention is applied to a multi-chamber substrate processing apparatus having a plurality of processing chambers will be described with reference to the drawings. 1 is a perspective view illustrating an outline of an external configuration of a substrate processing apparatus according to the present embodiment. FIG. 2 is a plan view (arrow A in FIG. 1) of the substrate processing apparatus shown in FIG. 1, and FIG. 3 is a front view (arrow B in FIG. 1). The substrate processing apparatus 100 shown in FIGS. 1-3 is equipped with three processing chambers 110 (110A-110C) for performing a plasma process with respect to the flat panel display substrate (FPD substrate) as a to-be-processed substrate. do.

Each of the processing chambers 110 includes, for example, a gas unit 112 (112A to 112C) provided with a mounting table for mounting a substrate for FPD having one side of about 3m, and detachably attached to the gas unit 112. ), Cover portions 114 (114A to 114C) provided with electrodes for supplying reaction energy and shower head portions for forming a processing gas atmosphere. When performing maintenance work inside the processing chamber 110, the lid part 114 is separated from the base part 112. As a result, the ceiling of the processing chamber 110 is opened, and the members inside the processing chamber 110 can be replaced or adjusted. In addition, each process chamber 110 may be comprised so that the same process (for example, an etching process etc.) may be performed, and may be comprised so that different processes (for example, an etching process, an ashing process, etc.) may be performed.

Each process chamber 110 is connected to the side surface of the conveyance chamber 120 of cross-sectional polygon shape (for example, cross-sectional rectangular shape) via gate valves 102 (102A-102C). In addition, the load lock chamber 130 is connected to the transfer chamber 120 via the gate valve 104. Thus, in the substrate processing apparatus 100 which concerns on this embodiment, the some processing chamber 110 and the load lock chamber 130 are arrange | positioned so that the conveyance chamber 120 may be enclosed. In addition, a substrate loading / unloading mechanism (not shown here) is connected to the load lock chamber 130 via the gate valve 106.

The plurality of processing chambers 110, the conveyance chamber 120, and the load lock chamber 130 are mounted on a support frame 140 having a box shape disposed on the floor surface of the clean room, and from the floor surface of the clean room. The height is adjusted to a predetermined height, for example, 1800 mm. Thereby, the board | substrate for FPD can be carried in to the substrate processing apparatus 100, maintaining the conveyance height (pass line).

In addition, by mounting each thread in the support frame 140, a space can be ensured below each thread, that is, in the support frame 140. In this space, for example, a control device for controlling the drive unit of each chamber, a high frequency power supply, a matching device, other electric devices, a measurement device, an exhaust device including a vacuum pump, various electric cables, a gas pipe, and the like are disposed.

The support frame 140 has sufficient strength in order to stably support each thread, and is comprised by the shape steel, such as a metal square pipe and H-shaped steel, for example. In the case where the plurality of processing chambers 110, the transfer chamber 120, and the load lock chamber 130 are large, for example, each chamber is placed on the upper surface of the support frame 140, over a beam member made of, for example, a steel beam. It may be mounted. Thereby, the bending of the housing of each chamber can be prevented.

In addition, the substrate processing apparatus 100 is provided with the scaffold 160 used for maintenance work, for example. Specifically, the scaffold 160 is provided so as to protrude horizontally out of the support frame 140 at a predetermined height (for example, 1800 mm) from the floor surface of the clean room. As mentioned above, in the substrate processing apparatus 100 which concerns on this embodiment, the some process chamber 110 and the load lock chamber 130 are arrange | positioned so that the conveyance chamber 120 may be enclosed, and these threads may be the support frame ( 140 is mounted on. Therefore, as shown in FIG. 1 and FIG. 2, the scaffold 160 is positioned around the processing chamber 110 and the load lock chamber 130. The operator can move on the scaffold 160 to the desired point, and can perform maintenance of each processing chamber 110, the conveyance chamber 120, and the load lock chamber 130.

The footrest 160 according to this embodiment is supported by being directly fixed to the support frame 140, and is characterized in that it does not include a frame or a leg supporting itself. A more specific structural example of the scaffold 160 is mentioned later.

When plasma processing is performed on the FPD substrate by the substrate processing apparatus 100 according to the present embodiment, first, the FPD substrate is loaded into the load lock chamber 130 by a substrate loading / unloading mechanism (not shown). At this time, if the processed FPD board | substrate exists in the load lock chamber 130, the processed FPD board | substrate is carried out from the load lock chamber 130, and is exchanged with the unprocessed FPD board | substrate. After the FPD substrate is loaded into the load lock chamber 130, the gate valve 106 is closed.

Next, after depressurizing the inside of the load lock chamber 130 to a predetermined degree of vacuum, the gate valve 104 between the transfer chamber 120 and the load lock chamber 130 is opened. After the FPD substrate in the load lock chamber 130 is loaded into the transfer chamber 120 by a transfer mechanism (not shown) in the transfer chamber 120, the gate valve 104 is closed.

Next, the gate valve 102 between the conveyance chamber 120 and the process chamber 110 is opened, and the unprocessed FPD board | substrate is carried in to the mounting table in the process chamber 110 by the said conveyance mechanism. At this time, if there is a processed FPD substrate, the processed FPD substrate is taken out and replaced with an unprocessed FPD substrate.

In the processing chamber 110, the high frequency power is supplied to either or both of the lower electrode and the upper electrode while supplying the processing gas from the shower head to the FPD substrate mounted on the mounting table, thereby supplying the lower electrode and the upper electrode. Plasma of the processing gas is generated in between. Thus, a predetermined plasma treatment is performed on the FPD substrate.

(Configuration example of scaffolding)

Here, the specific structural example of the scaffold 160 which concerns on this embodiment is demonstrated in detail, referring drawings. 4 is a perspective view for explaining a support frame of the substrate processing apparatus. 4, the process chamber 110, the conveyance chamber 120, and the load lock chamber 130 are mounted above the support frame 140. As shown in FIG.

As shown in FIG. 4, a plurality of support brackets 162 are directly attached to the support frame 140 so as to protrude outward from the periphery of the processing chamber 110 at a predetermined height from the floor surface of the clean room. . However, the support bracket 162 is not attached to the location which does not provide the footrest 160. FIG. For example, the footrest 160 is not provided below the gate valve 106 so that the load lock chamber 130 does not interfere with the loading / exiting of the FPD substrate. Therefore, the support bracket 162 is not attached to this location.

In addition, in this embodiment, the some support bracket 162 is attached to the beam member 142 which comprises the upper end part of the support frame 140. As shown in FIG. A plurality of scaffold plates 164 are laid on the plurality of support brackets 162, thereby forming the scaffold 160. The support bracket 162 has high rigidity and is comprised, for example with H-shaped steel. Further, the scaffold plate 164 preferably has a small amount of warpage and is lightweight, and is formed of aluminum or stainless steel having a mesh structure, for example. In addition, it is preferable that the surface of the scaffolding plate 164 is given the anti-slip process.

Here, the specific mounting example of the support bracket 162 is demonstrated, referring drawings. FIG. 5 is a perspective view for explaining an example of mounting of the support bracket 162. The connecting portion of the support bracket 162 and the beam member 142 is enlarged. FIG. 6 is a view of the connecting portion shown in FIG. 5 viewed from the side. FIG. As shown in FIGS. 5 and 6, the beam member 142 according to the present embodiment has high rigidity in order to stably support the processing chamber 110, the transfer chamber 120, and the load lock chamber 130. For example, it consists of H-beams. Moreover, it is preferable that the pillar member 144 which supports this beam member 142 is also comprised from H-shaped steel.

The base plate 170 is welded to the beam member 142 across both flanges. The end of the support bracket 162 is fastened to the base plate 170 by fastening members 172 such as bolts. In this way, the plurality of support brackets 162 are securely and firmly mounted to the support frame 140.

The scaffold plate 164 is horizontally supported by placing the plurality of scaffold plates 164 on the plurality of support brackets 162 mounted on the beam member 142 of the support frame 140, and the scaffold 160 is supported. Is formed. In addition, the scaffold 160 may be provided with a fence for preventing a worker from falling. Specifically, for example, as illustrated in FIG. 6, the fence 166 may be mounted along the outer side surface of the scaffold 160. Thereby, stability in the scaffold 160 can be improved.

By the way, in this embodiment, since the some support bracket 162 is attached to the beam member 142 of the upper end of the support frame 140, the height of the footrest 160 is substantially equal to the height of the support frame 140. FIG. Become the same. In contrast, in the case where the footrest 160 is provided at a lower position, a beam member such as, for example, the beam member 142 is mounted on the pillar member 144 so as to be horizontal between the beam member 142 and the floor surface. The support bracket 162 may be attached thereto.

In addition, according to the shapes of the processing chamber 110, the transfer chamber 120, and the load lock chamber 130, in particular, the height dimension, the mounting height of the scaffold 160 may be adjusted to configure the scaffold 160 in a stepped shape. .

As described above, in the present embodiment, since the scaffold 160 is directly provided on the support frame 140 supporting the substrate processing apparatus 100, a frame or a leg supporting the scaffold plate 164 is not required. Therefore, since a space free of obstacles is obtained under the scaffold 160, it is possible to effectively use the inside of the clean room, for example, by placing a tool or a measuring device for maintenance work there.

Moreover, by providing the footrest 160 directly in the support frame 140, the footrest can be formed in the position which is easy to perform maintenance work. For example, the scaffold can be provided so that a large gap does not occur between the processing chamber 110 and a more stable scaffold can be provided as compared with the case where the scaffold is independently installed next to the processing chamber as in the prior art.

In addition, since the footrest 160 is located at a height of about 1800 mm from the floor of the clean room, the operator can pass under the footrest 160 without being disturbed by the footrest 160. For this reason, it is possible to enter and exit the support frame 140 safely and quickly, so that the maintenance of the processing chamber 110, the transport chamber 120, and the load lock chamber 130 mounted on the support frame 140 can be performed. Of course, the maintenance of the base material accommodated in the support frame 140 can also be performed efficiently.

Moreover, according to this embodiment, it can respond easily to the maximum loading load of the scaffold 160 calculated | required by the substrate processing apparatus 100 by increasing or decreasing the number of the support brackets 162. FIG.

In addition, since the support bracket 162 is fastened to the support frame 140 by the fastening member 172, the support bracket 162 and the footrest plate 164 are installed until the support frame 140 is installed in the clean room. You can keep it separate. Therefore, the transportation cost of the support frame 140 can be suppressed.

In addition, although the footrest 160 which concerns on this embodiment is provided so that the process chamber 110 and the load lock chamber 130 may be enclosed, it is not limited to this, For example, according to the installation situation of the substrate processing apparatus 100, it is necessary only in the required location. The scaffold 160 may be provided.

(Second Embodiment)

Next, a second embodiment of the present invention will be described in detail with reference to the drawings. It is a top view which shows the outline of the structural example of the substrate processing apparatus which concerns on 2nd Embodiment. As shown in FIG. 7, the substrate processing apparatus 200 is similar to the substrate processing apparatus 100 according to the first embodiment, and includes a plurality of processing chambers 110 and a load lock chamber 130 around the transfer chamber 120. ) Is provided.

Each process chamber 110 (110A-110C) shown in FIG. 7 is comprised from the base part 112 (112A-112C), and the cover part 114 (114A-114C) which is removable from this base part 112. As shown in FIG. (See FIG. 1). In addition, these process chambers 110 (110A to 110C) are provided with a pair of rails 202 (202A to 202C) extending laterally, respectively. These pairs of rails 202 (202A to 202C) are provided with a cover portion 114 separated from the base portion 112, and a retracted portion (cover portion 114) on the side of the base portion 112 with the slide mechanism 113. Even if it rotates so that it may be turned upside down as an axis | shaft, it is for sliding to the site | part which does not interfere with the base part 112.

The cover part 114 (114A-114C) is provided with a pair of slide mechanism 113 (113A-113C) in the side part, respectively. The slide mechanism 113 (113A-113C) is equipped with the support member (not shown) which supports the cover part 114 (114A-114C) rotatably, for example about a horizontal axis. The support member also functions as a slider that can slide along the rails 202 (202A to 202C). In addition, the cover parts 114B and 114C shown in FIG. 7 are the closed state, and the cover part 114A is the state which slides along the rail 202A.

When the maintenance work of the processing chamber 110 is executed, the cover part 114 is detached from the body part 112 by an opening / closing mechanism (not shown), and then the slide mechanism 113 is used to lift the cover part 114 onto the rail 202. Move the slide. Subsequently, the cover part 114 is rotated 180 degrees between the parallel rails 202 with the support member (not shown) of the slide mechanism 113 as an axis, and is reversed. As a result, since the inside of the base 112 and the cover 114 are upward together, the worker is in various positions provided in the inside of the base 112 and the cover 114 in a state where the operator is on the footrests 260 and 262. Maintenance is possible.

In addition, the support frame 140 which supports the substrate processing apparatus 200 shown in FIG. 7 is provided with the footrest 260 used for maintenance work so that it may protrude from the periphery of each processing chamber 110, for example. This scaffold 260 is comprised similarly to the case of 1st Embodiment. That is, the plurality of support brackets 162 directly mounted to the support frame 140 and the plurality of the support brackets 162 mounted on the support frame 140 so as to protrude outward from the periphery of the processing chamber at a predetermined height from the floor surface of the clean room. It is comprised with the scaffold plate 164.

Moreover, in the substrate processing apparatus 200 shown in FIG. 7, the footrest 262 is further provided also around the rail 202 of each process chamber 110 side. The footrest 262 around these rails 202 is made to be able to come and go between the footrest 260 around the processing chamber 110, and these board | substrate 260, 262 combined and the substrate processing apparatus 200 We construct scaffolding around). Thus, by providing the footrest 262 not only in the footrest 260 around the process chamber 110 but also in the circumference | surroundings of the rail 202, an operator passes these footrests 260 and 262, and each process chamber 110 is carried out. The maintenance of the inside of the cover part 114 on the rail 202 as well as the inside of the gas part 112 of the inside can be performed.

The scaffold 262 around the rail 202 may also be configured similarly to the scaffold 260 around the process chamber 110. In addition, depending on the configuration of the processing chamber 110, the rail 202 may not be supported by the support frame 140. In this case, the support bracket of the footrest 262 may be mounted around the rail 202. Since the scaffold 262 is not supported, instead of supporting the scaffold plate on the support bracket, a support frame for supporting the scaffold plate may be separately provided.

By the way, when there is an operator in the footrest 262 around the rail 202, sliding the cover part 114 along the rail 202 may come in contact with the cover part 114 and an operator. Not desirable In addition, since the cover part 114 does not exist on the rail 202 when the cover part 114 of the base part 112 is closed, for example, in the vicinity of the rail 202, such as between a pair of rails 202, for example. Large space is created. At this time, if an operator is in the footrest 262 around the rail 202, there exists a possibility that it may fall between rails 202 etc. by walking, for example. In order to cope with this problem, it is also considered to provide a fence on the rail 202 side of the scaffold 262, but the fence may interfere with the maintenance work of the cover 114.

Therefore, in the present embodiment, for example, as shown in FIG. 7, the scaffold 260 between the scaffold 260 around the processing chamber 110 and the scaffold 262 around the rail 202 is provided. It is preferable to provide a plurality of doors 210 (210A1, 210A2, 210B1, 210B2, 210C1) that obstruct the traffic of 262. As a result, it is possible to prevent entry and exit of the footrest 262 around each rail 202 except as necessary.

Hereinafter, the specific structural example of such the door 210 is demonstrated, referring drawings. FIG. 8: is an external perspective view which shows the outline of the structural example of the door 210, and FIG. 9 is the top view which looked at the door 210 from upper direction. As illustrated in FIG. 8, for example, the door 210 is configured to pivotally support the door body 212 with the hinge portion 216 to an upright support 214. The support portion 214 may be provided on the footrest 260 around the processing chamber 110 or may be provided on the footrest 262 around the rail 202. When providing the support part 214 on the side of the footrest 260 around the processing chamber 110, you may make it mount, for example in the some support bracket 162 (not shown in FIG. 8).

In addition, as shown in FIG. 9, the door 210 is provided with a sensor 218 for detecting the open / closed state of the door body 212. As such a sensor 218, a proximity switch, a limit switch, etc. are mentioned, for example. In the case of using the proximity switch as the sensor 218, for example, when the door main body 212 is completely closed, the sensor 218 is moved to the door main body so that the metal part of the support 214 enters the detection range of the sensor 218. 212).

The sensor 218 is electrically connected to a control unit 290 that controls the entire substrate processing apparatus 200, and the control unit 290 controls the opening / closing state of the door 210 by a detection signal from the sensor 218. I can figure it out. Moreover, the control part 290 is also electrically connected with the opening / closing mechanism of the cover part 114 of each processing chamber 110. Accordingly, the controller 290 may control the slide operation on the rail 202 of the cover 114 according to the open / closed state of the door 210. Specific examples of such interlock control include the following.

The control unit 290 detects that the doors 210A1 and 210A2 are both closed based on signals from the sensors 210 of the doors 210A1 and 210A2, for example. ) Cover portion 114A is allowed to slide along rail 202A.

At this time, for example, when the opening / closing mechanism of the cover portion 114A is manual, for example, the brake of the opening / closing mechanism is released to enable the slide operation of the cover portion 114A by the operator. In addition, when the opening / closing mechanism of the cover part 114A is automatic, the control part 290 controls the opening / closing mechanism of the cover part 114A, and slides the cover part 114A along the rail 202A.

On the other hand, the control part 290 prohibits the slide operation of the cover part 114A while detecting that at least one of the doors 210A1 and 210A2 is open.

In this case, when the cover part 114 of the base part 112 is closed, all the doors 210 which can enter and exit the footrest 262 around the rail 202 which the cover part 114 slides will be closed. When the worker works on the footrest 262 around the rail 202, it is necessary to open the door 210 that can enter and exit the footrest 262.

For example, when there is an operator at the footrest 262 between the door 210A1 and the door 210A2, at least one of both doors 210A1 and 210A2 is opened. The doors 210A1 and 210A2 may be closed.

Thereby, when both doors 210A1 and 210A2 are closed, since an operator is not in the footrest 262 around the rail 202A, even if it slides the cover part 114 along the rail 202A, There is no fear that the part 114 and the worker come into contact. Moreover, even when the cover part 114 slides to the base part 112 along the rail 202, there is no danger of an operator falling from the footrest 262. FIG.

In addition, for example, a lock mechanism capable of being released and locked under the control of the control unit 290 may be provided in the door 210, and the lock mechanism of the door 210 may be controlled according to the opening / closing operation of the cover part 114. good. That is, when the cover part 114 of the base part 112 is closed, or when the cover part 114 slides along the rail 202, the rail 202 is automatically locked to the door 210. FIG. The surrounding scaffold 262 may not be forced to enter or leave the worker. In addition, an area sensor may be provided on the footrest 262 around the rail 202 to directly detect the presence or absence of an operator and control the slide operation of the lid 114 based on the detection result.

Thus, according to 2nd Embodiment, the effect similar to 1st Embodiment is acquired. In addition, the door 210 is provided on the footrest 260 around the processing chamber 110 and the footrest 262 around the rail 202, and the door 210 can be entered and exited only when necessary. By doing so, the stability of the maintenance work can be further improved.

In addition, the structure of the door provided in the footrest 260 around the processing chamber 110 and the footrest 262 around the rail 202 is not limited to what is shown in FIG. 8, and two pieces provided with another door inside the door. It may consist of so-called double doors. For example, as shown in FIG. 7, when the slide structure 113 (113A-113C) of the cover part 114 (114A-114C) does not protrude outside the support frame 140 or the rail 202, Even in the door 210 as shown in FIG. 8, when the lid 114 slides, the door 210 does not interfere with the door 210.

By the way, according to the shape of the cover part 114, the slide mechanism 113, etc., as shown, for example in FIG. 10, a part of the slide mechanism 113 of the cover part 114 is a support frame 140 or a rail. It may also stick outward from 202. When such a cover part 114 slides along the rail 202, there exists a possibility that the cover part 114 and a part of slide mechanism 113 may interfere with the closed door 210. FIG. Thus, in such a case, by using a two-door, for example, a double door as shown in FIG. 10, instead of a one-door 210, it is possible to prevent the cover 114 from interfering with the door when sliding. Can be.

The specific structural example of a double door is demonstrated below as a modification of such a door. 10 is an external perspective view of the double door in the present embodiment. The double door 220 shown in FIG. 10 consists of two doors, namely an outer door (order) 222, and an inner door (section) 224 provided on one side of the outer door 222. Like the door main body 212 of the door 210 shown in FIG. 8, the outer door 222 is rotatably supported by the hinge part 216 by the support | pillar 214 standing up, for example.

The inner door 224 is a door for closing the outside of the front end of the outer door 222, so that even when the inner door 224 overlaps the outer door 222, the outer door 222 is closed so that it cannot pass through (footrest 260). And the footrest 262 cannot be moved between. Specifically, the inner door 224 is pivotally supported by a hinge portion (not shown) mounted on the tip side of the outer door 222, and rotates in the direction of the arrow R or L around the tip side. I can do it.

According to the double door 220 configured as described above, by closing the outer door 222, the operator's coming and going of the scaffold (260, 262) can be regulated. In addition, the outer door 222 is configured such that its width becomes narrower than the widths of the footrests 260 and 262. As a result, even when the outer door 222 is completely closed, the outer door 222 is between the front end and the support frame 140, that is, the foothold 260, Inside the 262, a gap S may be formed to prevent interference with the outer door 222 when the lid 114 is slid.

Specifically, when the inner door 224 is rotated in the direction of the arrow R to overlap the outer door 222, the gap S in which the door does not exist can be formed inside the scaffolds 260 and 262. On the other hand, when the inner door 224 is rotated in the direction of the arrow L, the inner door 224 can be rotated to the outside of the front end of the outer door 222, and thus the inner door 224 of the footrests 260 and 262 is used. The inner gap S can be closed.

For example, when the cover portion 114 is closed, the gap S is closed by rotating the inner door 224 in the direction of the arrow L to close the outer door 222. Thereby, the entry and exit of the worker from the footrest 260 around the processing chamber 110 to the footrest 262 around the each rail 202 can be regulated.

In addition, when sliding the cover part 114, the outer door 222 is closed in the state which the inner door 224 overlapped with the outer door 222. As shown in FIG. As a result, a gap S is secured between the tip of the outer door 222 and the support frame 140 (between the processing chamber 110), so that the slide mechanism 113 and the like interfere with the outer door 222. It can prevent. That is, even when a part of the slide mechanism 113 protrudes outward, the protruding portion passes through the gap S when the lid portion 114 slides, thus interfering with the double door 220. There is nothing to do. In this case, the worker can be prevented from entering and exiting the footrest 262 around the rails 202.

In addition, when the cover part 114 is fully open, by opening the outer door 222 with the inner door 224 overlapping with the outer door 222, each rail (from the footrest 260 around the processing chamber 110) is opened. The worker can enter and exit the footrest 262 around the 202.

In addition, by providing a sensor such as a proximity switch or a limit switch in the outer door 222 and the inner door 224, the slide operation of the lid 114 may be controlled according to the opening and closing states of the outer door 222 and the inner door 224. good.

In addition, although the case where the door 210 and the double door 220 were comprised by the swinging door was demonstrated in 2nd Embodiment, it is not limited to this, The door 210 and the double door 220 are each sliding door or folding. You may comprise a door.

As mentioned above, although preferred embodiment of this invention was described referring an accompanying drawing, this invention is not limited to this example. If it is those skilled in the art, it is clear that various changes or modifications can be assumed within the range of a claim, and these also naturally belong to the technical scope of this invention.

For example, although the embodiment of the present invention has been described using a plasma processing apparatus as an example of the substrate processing apparatus, the present invention is not necessarily limited to this, but the sputtering apparatus, the coater developer, the cleaning apparatus, the CMP (chemical mechanical polishing) apparatus, the PVD (Physical Vapor Deposition) Applicable to an apparatus, an exposure apparatus, an ion implanter, and the like.

In addition, the present invention is applicable not only to a multi-chamber substrate processing apparatus but also to a substrate processing apparatus constituted by a single processing chamber. Moreover, it is applicable not only to the sheet processing apparatus which processes a board | substrate one by one, but also to the batch processing apparatus which processes several board | substrates collectively.

The substrate to be processed may be, for example, a semiconductor wafer CD substrate, a printed substrate, a ceramic substrate, a solar cell substrate, or the like, without being limited to the FPD substrate.

INDUSTRIAL APPLICABILITY The present invention is applicable to a substrate processing apparatus having a processing chamber that performs a predetermined process on a substrate to be processed and a support frame used to support the substrate.

100 substrate processing apparatus 102 (102A to 102C): gate valve
104, 106: gate valve 110 (110A to 110C): processing chamber
112 (112A to 112C): gas part 113 (113A to 113C): slide mechanism
114 (114A to 114C): lid portion 120: conveyance chamber
130: load lock chamber 140: support frame
142 beam member 144 pillar member
160: scaffold 162: support bracket
164: scaffold plate 166: fence
170: base plate 172: fastening member
200: substrate processing apparatus 202 (202A to 202C): rail
210 (210A1, 210A2, 210B1, 210B2, 210C1): Door
212: door body 214: holding part
216: hinge portion 218: sensor
220: double door 222: outer door
224: visit 260, 262: scaffold
290: control unit S: gap

Claims (5)

delete In the support frame which is arrange | positioned on the floor surface for supporting the substrate processing apparatus provided with the process chamber which performs a predetermined process with respect to a to-be-processed substrate,
A footrest is directly provided on the outer side of the support frame so as to protrude outward from the periphery of the processing chamber at a portion of a predetermined height from the floor surface,
The process chamber is composed of a gas part and a cover part detachable from the gas part, and the cover part detached from the gas part is provided with a rail which can slide to an evacuation site on the side of the gas part,
A scaffold is also provided around the rail, so as to be able to travel between the scaffold around the processing chamber,
Between the footrest around the said processing chamber and the footrest around the said rail, the door which interrupts the traffic between these footrests is provided,
The support frame includes:
A sensor for detecting an open / closed state of the door;
Further comprising a control unit for controlling the detachable operation of the cover portion in accordance with the detection result of the sensor,
The control unit controls the cover unit to be attached or detached while the sensor detects the open state of the door.
Support frame. 3. The method of claim 2,
The lock mechanism is provided in the door,
The control unit locks the door so that the door is not opened while the lid is detecting the closed state and while the lid is attached or detached.
Support frame. In the support frame which is arrange | positioned on the floor surface for supporting the substrate processing apparatus provided with the process chamber which performs a predetermined process with respect to a to-be-processed substrate,
A footrest is directly provided on the outer side of the support frame so as to protrude outward from the periphery of the processing chamber at a portion of a predetermined height from the floor surface,
The process chamber is composed of a gas part and a cover part detachable from the gas part, and the cover part detached from the gas part is provided with a rail which can slide to an evacuation site on the side of the gas part,
A scaffold is also provided around the rail, so as to be able to travel between the scaffold around the processing chamber,
Between the footrest around the said processing chamber and the footrest around the said rail, the door which interrupts the traffic between these footrests is provided,
The door is composed of a double door consisting of the outer door and the inner door rotatable with respect to the outer door,
The outer door is configured to have a width narrower than the width of the footrest, and is rotatably supported by a support portion provided near the outer side of the footrest,
The inner door is pivotally supported on the tip side of the outer door.
Support frame. In the substrate processing apparatus provided with the processing chamber which performs a predetermined process with respect to a to-be-processed substrate, and the support frame arrange | positioned on a floor surface and supporting the said processing chamber,
A footrest is directly provided on the outer side of the support frame so as to protrude outward from the periphery of the processing chamber at a portion of a predetermined height from the floor surface,
The process chamber is composed of a gas part and a cover part detachable from the gas part, and the cover part detached from the gas part is provided with a rail which can slide to an evacuation site on the side of the gas part,
A scaffold is also provided around the rail, so as to be able to travel between the scaffold around the processing chamber,
Between the footrest around the said processing chamber and the footrest around the said rail, the door which interrupts the traffic between these footrests is provided,
The support frame includes:
A sensor for detecting an open / closed state of the door;
Further comprising a control unit for controlling the detachable operation of the cover portion in accordance with the detection result of the sensor,
The control unit controls the cover unit to be attached or detached while the sensor detects the open state of the door.
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