KR101264676B1 - Patterning Method and Method of manufacturing Liquid Crystal Display Device using the same - Google Patents

Abstract

Applying a pattern material on a substrate having a flat top surface, partially curing the pattern material, and rotating a roll on the pattern material to remove an uncured portion of the pattern material, thereby Since the cured portion remaining on the form a pattern by a process constituting the pattern, unlike the conventional printing method, a printing plate is not required because the printing plate is not required, and the manufacturing process is also shortened because the printing plate cleaning process is not required.

pattern

Description

Pattern Forming Method and Method of Manufacturing Liquid Crystal Display Device Using the Same {Patterning Method and Method of manufacturing Liquid Crystal Display Device using the same}

1A to 1C are cross-sectional views illustrating a process of forming a pattern by a photolithography process according to the prior art.

2A to 2C are cross-sectional views illustrating a process of patterning a pattern material layer on a substrate using a printing roll according to the prior art.

3A to 3C are schematic cross-sectional views of a method of forming a pattern according to the present invention.

4A to 4C are perspective views or cross-sectional views schematically showing a method for forming a pattern material layer according to the present invention.

5A is a cross-sectional view illustrating a process of irradiating light to a portion of a pattern material layer constituting a predetermined pattern using a mask according to the present invention.

5B is a cross-sectional view of a step of irradiating light only to a portion of the pattern material layer constituting a predetermined pattern without using a mask according to the present invention.

6 is a process sectional view showing the manufacturing process of the liquid crystal display device according to the present invention.

DESCRIPTION OF THE REFERENCE NUMERALS OF THE DRAWINGS FIG.

100: transparent substrate 200: pattern material layer

200a: portion constituting a predetermined pattern 320: light shielding layer

340: color filter 800: roll

The present invention relates to a liquid crystal display device, and more particularly, to a pattern forming method of a liquid crystal display device.

Ultra-thin flat panel displays with a thickness of only a few centimeters (cm). Among them, liquid crystal displays have low operating voltages, which consume less power and can be used as portable devices. Applications range from ships to spacecraft to aircraft.

The liquid crystal display device includes a lower substrate, an upper substrate, and a liquid crystal layer formed between the two substrates, and a gate wiring and a data wiring are formed on the lower substrate so as to cross each other longitudinally and define a pixel region. In addition, a thin film transistor is formed as a switching element in an intersection region of the gate line and the data line. The thin film transistor is formed by sequentially stacking a gate electrode extending from the gate line, a gate insulating layer, a semiconductor layer, a source electrode extending from the data line, and a drain electrode formed to face the source electrode. A passivation layer is formed on the entire surface of the substrate, and a pixel electrode is formed on the passivation layer to be connected to the drain electrode of the thin film transistor.

In addition, a light blocking layer is formed on the upper substrate to block light leakage from the gate wiring, data wiring, and thin film transistor regions, and a color filter layer is formed on the light blocking layer, and a common electrode is formed on the color filter layer. Is formed.

As such, the liquid crystal display includes various components, and numerous processes are repeatedly performed to form the components. In particular, photolithography processes are used to pattern various components in various forms.

Hereinafter, a pattern forming method through a conventional photolithography process will be described with reference to the drawings.

First, as shown in FIG. 1A, the pattern material layer 20 is formed on the transparent substrate 10.

Thereafter, as shown in FIG. 1B, a mask 23 having a predetermined pattern is positioned on the pattern material layer 20 and then irradiated with light through a light irradiation apparatus.

Thereafter, as shown in FIG. 1C, the pattern 20a is completed through a developing process.

However, since the photolithography process requires the use of a mask having a predetermined pattern, the manufacturing cost increases accordingly, and the process is complicated and the process takes a long time because the photolithography process requires a development process.

Therefore, a new pattern forming method has been required to solve the shortcomings of the photolithography process, and a method of forming a pattern using a printing roll has been devised in accordance with such a request.

2A to 2C are cross-sectional views illustrating a process of patterning a pattern material layer 20 on a substrate using a printing roll 27.

First, as shown in FIG. 2A, the pattern material 20 is applied to the printing roll 27 using the printing nozzle 25.

Thereafter, as shown in FIG. 2B, the printing roll 27 is rotated on the printing plate 60 on which the protrusion 65 of a predetermined shape is formed, thereby partially patterning the material 20b on the protrusion 65 of the printing plate 60. ) Is transferred, and a pattern 20a of a predetermined shape is formed on the printing roll 27 by the remaining pattern material 20a.

Thereafter, as shown in FIG. 2C, the printing roll 27 is rotated on the transparent substrate 10 to transfer the pattern 20a onto the substrate 10.

However, the method of forming a pattern using the printing roll requires a printing plate on which the protrusion of the predetermined shape is additionally required, which increases manufacturing costs and requires a cleaning process of the printing plate.

The present invention has been made to solve the above problems, the first object of the present invention is to form a pattern by a new method in order to be able to manufacture a liquid crystal display device in a shorter process time at a lower cost A second object of the present invention is to provide a method of manufacturing a liquid crystal display device using the pattern forming method.

In order to achieve the first object as described above, the present invention is a step of applying a pattern material on a substrate (first step), a step of curing a portion constituting a predetermined pattern of the pattern material (second step) and Provided is a pattern forming method comprising a step (third step) of removing an uncured portion.

That is, when only the portion constituting the predetermined pattern of the pattern material layer is cured, the adhesive strength with the substrate is stronger than the portion where the cured portion is not cured, and thus the portion that is not cured can be easily removed from the substrate. According to the present invention, a pattern is formed on a substrate by a simple method using such characteristics, and unlike a conventional photolithography process, a developing process is not required, and unlike a conventional printing method, a printing plate is not required.

At this time, the step of applying the pattern material on the substrate (first step) may be made of a step of dropping the pattern material on the substrate and a step of rotating the substrate.

In addition, the process of applying the pattern material on the substrate (first process) may be made of a process of discharging the pattern material from the printing nozzle and a process of moving the substrate.

In addition, the process of applying the pattern material on the substrate (first process) may be made of a process of applying the pattern material to the printing roll and a process of transferring the pattern material on the substrate by rotating the printing roll.

The step of curing the portion constituting the predetermined pattern of the pattern material (second step) may be a step of irradiating light to the portion constituting the predetermined pattern of the pattern material.

At this time, the step of irradiating light to the portion constituting the predetermined pattern of the pattern material may be made of a process of irradiating light on the entire surface of the substrate with a mask other than the portion constituting the pattern.

In addition, the step of irradiating light to a portion constituting a predetermined pattern of the pattern material may be a step of irradiating light only to the portion constituting the pattern.

At this time, the step of irradiating light only to a portion of the pattern material constituting a predetermined pattern may be made of a process using a laser as a light source.

The process of removing the uncured portion (third process) may be performed by rotating the roll to remove the uncured portion.

The present invention also provides a method of forming a light shielding layer on a first substrate, a process of forming a color filter layer on a first substrate including the light shielding layer, and a second substrate in order to achieve the second object. And forming a liquid crystal layer between the first substrate and the second substrate, wherein forming at least one light blocking layer on the first substrate and forming the color filter layer include: It may be made by a process according to the pattern formation method described above.

The process of preparing the second substrate may include a gate wiring and a data wiring that cross each other on the second substrate vertically and horizontally to define a pixel region using a process according to the pattern forming method described above. And forming a thin film transistor at a crossing region of the wiring, a passivation layer on the first substrate including the thin film transistor, and a pixel electrode connected to the drain electrode of the thin film transistor on the passivation layer.

At this time, the step of forming a liquid crystal layer between the first substrate and the second substrate, forming a sealing material without the injection hole on any one of the first substrate or the second substrate, the liquid crystal on the substrate formed with the seal material After the addition of the two substrates may be bonded to each other.

In addition, the process of forming a liquid crystal layer between the first substrate and the second substrate, after forming a seal material so that the injection hole is formed in any one of the first substrate or the second substrate and then bonded both substrates, Thereafter, the liquid crystal may be injected and formed through the injection hole.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1. Pattern formation method

First, as shown in FIG. 3A, the pattern material layer 200 is formed on the transparent substrate 100.

A preferred method of forming the pattern material layer 200 will be described in detail with reference to FIGS. 4A to 4C.

First, as shown in FIG. 4A, the pattern material layer 200 may be formed by dropping the pattern material 200 on the transparent substrate 100 and then rotating the transparent substrate 100.

Second, as shown in FIG. 4B, the pattern material 200 may be discharged from the printing nozzle 250, and the pattern material layer 200 may be formed while moving the transparent substrate 100.

Third, as can be seen in FIG. 4C, the pattern material layer 200 may be formed by rotating the printing roll 270 coated with the pattern material 200 on the transparent substrate 100.

As described above, the pattern material layer 200 may be formed on the transparent substrate 100 in the same manner as in FIGS. 4A to 4C, but is not limited thereto.

 Thereafter, as shown in FIG. 3B, the portion 200a constituting a predetermined pattern of the pattern material layer is cured.

A preferred method of curing the portion 200a constituting a predetermined pattern of the pattern material layer will be described in detail with reference to FIGS. 5A to 5B.

First, as shown in FIG. 5A, a portion of the pattern material layer 200b other than the portion 200a constituting a predetermined pattern is covered with a mask 230 and the entire surface of the substrate 100 is irradiated with light to expose the pattern material. The portion 200a constituting the predetermined pattern of the layer 200 may be cured.

Second, as can be seen in Figure 5b, by irradiating light only to the portion of the pattern material layer 200 constituting a predetermined pattern 200a portion 200a constituting a predetermined pattern of the pattern material layer 200 Can be cured.

In this case, when light is irradiated only to the portion 200a of the pattern material layer 200 constituting a predetermined pattern, a laser may be used as the light source 700.

When only the portion 200a of the pattern material layer 200 constituting a predetermined pattern is cured using a laser, a relatively expensive mask is not required, thereby reducing manufacturing costs.

As described above, the portion 200a constituting the predetermined pattern of the pattern material layer 200 may be cured in the same manner as in FIGS. 5A to 5B, but is not limited thereto.

 Thereafter, as shown in FIG. 3C, the uncured portion 200b is removed from the transparent substrate 100 to form a pattern 200a having a predetermined shape.

In this case, the process of removing the uncured portion 200b from the transparent substrate 100 may be simply performed using the roll 800.

This is because when the portion 200a constituting a predetermined pattern of the pattern material layer is cured, the adhesive strength with the substrate is stronger than the portion 200b where the cured portion 200a is not cured and is cured by using the roll 800. This is because the part that is not used can be easily removed from the substrate.

2. Manufacturing method of liquid crystal display device

6A through 6D are cross-sectional views schematically illustrating a method of manufacturing a substrate for a liquid crystal display device according to an exemplary embodiment of the present invention.

First, as shown in FIG. 6A, the light blocking layer 320 is formed on the first substrate 300.

Thereafter, as shown in FIG. 6B, the color filter layer 340 is formed on the first substrate 300 including the light blocking layer 320.

Here, at least one of the process of forming the light shielding layer (see FIG. 6A) and the process of forming the color filter layer (see FIG. 6B) is formed by the process according to the embodiment of the pattern forming method described above.

Thereafter, as shown in FIG. 6C, the second substrate 400 is prepared.

Although not illustrated, the process of preparing the second substrate may be performed by using a process according to the embodiment of the pattern forming method described above, and the gate wiring and the data defining the pixel region by crossing vertically and horizontally on the second substrate. Forming a passivation layer on a wiring, a thin film transistor at an intersection region of the gate line and the data line, a protective film on a first substrate including the thin film transistor, and a pixel electrode connected to the drain electrode of the thin film transistor on the passivation layer. It may be made, including.

Thereafter, as shown in FIG. 6D, the liquid crystal layer 500 is formed between the first substrate 300 and the second substrate 400.

At this time, the process of forming the liquid crystal layer 500 forms a sealing material without an injection hole on any one of the first substrate 300 and the second substrate 400, and dropping the liquid crystal onto the substrate on which the sealing material is formed. After that, both substrates may be bonded to each other.

In addition, in the process of forming the liquid crystal layer 500, after forming a seal material to form an injection hole in any one of the first substrate 300 and the second substrate 400, and then bonded both substrates, The liquid crystal may be formed by using a capillary phenomenon and a pressure difference through the injection hole.

According to the present invention by the above configuration, because the part constituting a predetermined pattern of the pattern material layer is cured, and the part that is not cured is formed to form a pattern, unlike the conventional printing method does not require a printing plate to reduce the manufacturing cost In addition, the printing plate cleaning process is not necessary, and the manufacturing process is also shortened.

In addition, when the part constituting the predetermined pattern of the pattern material layer is cured, the cured part has stronger adhesive force with the substrate than the uncured part, and the part which is not cured using a roll can be easily removed from the substrate. Unlike the photolithography process, a developing process is not necessary, which simplifies the process.

 In addition, the laser can be used to cure a portion of the pattern material layer constituting a predetermined pattern, which eliminates the need for a mask, thereby reducing manufacturing costs.

Claims (13)

Applying a pattern material on a substrate having a flat top surface; Partially curing the pattern material; And Rotating the roll on the pattern material to remove an uncured portion of the pattern material, wherein the cured portion remaining on the substrate constitutes a pattern. The method of claim 1, The process of applying the pattern material on the substrate Dropping a pattern material on the substrate; And Pattern forming method comprising the step of rotating the substrate. The method of claim 1, The process of applying the pattern material on the substrate Discharging the pattern material from the printing nozzle; And The pattern formation method characterized by the process of moving a board | substrate. The method of claim 1, The process of applying the pattern material on the substrate Applying a pattern material to a printing roll; And The pattern forming method comprising the step of transferring the pattern material on the substrate by rotating the printing roll. The method of claim 1, The process of partially curing the pattern material And a step of irradiating light to a portion constituting a predetermined pattern of the pattern material. The method of claim 5, The step of irradiating light to the portion constituting a predetermined pattern of the pattern material A pattern forming method comprising the step of covering a portion other than a portion constituting the pattern with a mask and irradiating light on the entire surface of the substrate. The method of claim 5, The step of irradiating light to the portion constituting a predetermined pattern of the pattern material The pattern formation method characterized by the process of irradiating light only to the part which comprises a pattern. The method of claim 7, wherein The step of irradiating light only to a portion of the pattern material constituting a predetermined pattern The pattern forming method characterized by using a laser as the light. delete Forming a light shielding layer on the first substrate; Forming a color filter layer on the first substrate including the light blocking layer; Preparing a second substrate; And And forming a liquid crystal layer between the first substrate and the second substrate, At least one of the steps of forming the light blocking layer on the first substrate and the step of forming the color filter layer comprises a step of forming a pattern according to any one of claims 1 to 8. Liquid crystal display device manufacturing method. The method of claim 10, The process of preparing the second substrate, A gate wiring and a data wiring crossing each other vertically and horizontally on the second substrate using a process of forming a pattern according to any one of claims 1 to 8 to define a pixel region; and the gate wiring and data Forming a thin film transistor at a cross region of the wiring, a protective film on the first substrate including the thin film transistor, and a pixel electrode connected to the drain electrode of the thin film transistor on the protective film. Liquid crystal display device manufacturing method. The method of claim 10, The process of forming a liquid crystal layer between the first substrate and the second substrate is Forming a sealing material without an injection hole on any one of the first substrate and the second substrate, And dropping the liquid crystal onto the substrate on which the seal material is formed, and then bonding both substrates together. The method of claim 10, The process of forming a liquid crystal layer between the first substrate and the second substrate is Sealing is formed to form an injection hole in any one of the first substrate or the second substrate, After bonding both substrates, the liquid crystal display device manufacturing method comprising the step of injecting a liquid crystal into the liquid crystal injection port.

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