KR101255700B1 - Liquid Crystal Display Device And Method Of Fabricating The Same - Google Patents

Abstract

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a manufacturing method thereof capable of preventing the deterioration of display quality.

A liquid crystal display device according to the present invention comprises: a liquid crystal display panel comprising a color filter array substrate having a common electrode and a thin film transistor array substrate facing each other with a liquid crystal interposed therebetween; A plurality of gate integrated circuit units supplying a gate voltage to a gate line positioned on the thin film transistor array substrate; A plurality of data integrated circuit units supplying data voltages to data lines positioned on the thin film transistor array substrate; A common line located in at least one region between neighboring gate integrated circuit units and between neighboring data integrated circuit units simultaneously with the gate integrated circuit unit and the data integrated circuit unit; And a silver dot electrically connecting the common line and the common electrode in at least one region between the neighboring gate integrated circuit units and the neighboring data integrated circuit units, wherein the common line is the thin film transistor array substrate. The gate insulating film is formed of the same material as the data line.

Description

Liquid crystal display device and method for manufacturing the same {Liquid Crystal Display Device And Method Of Fabricating The Same}

1 is a plan view schematically showing a conventional liquid crystal display.

2 is an enlarged plan view of region A in FIG. 1;

FIG. 3 is a cross-sectional view of the liquid crystal display taken along the line II ′ of FIG. 2.

Figure 4 is a plan view showing a common line of another conventional form.

5 is a diagram showing that the backlight light is multi-reflective, refracted and diffracted in a common line of the liquid crystal display panel.

FIG. 6 is a diagram for explaining that light leakage is generated when an image is implemented by light reflection or the like in a common line; FIG.

7 is a plan view schematically showing a liquid crystal display according to the present invention.

8 is an enlarged plan view of region A of FIG. 7;

FIG. 9 is a cross-sectional view illustrating the liquid crystal display taken along the line II-II ′ of FIG. 8.

10A to 10E are cross-sectional views illustrating a method of manufacturing region A of FIG. 7 step by step.

FIG. 11 is a plan view showing still another embodiment of region A of FIG. 7; FIG.

      Description of the Related Art

70, 170: thin film transistor array substrate

80,180 color filter array substrate

21,121: Gate link 20,120: Gate line

31,131: data link 30, 130: data line

86,186: Silver dot 82,182: Common electrode

91,191: common line 1,101: lower substrate

11,111: upper substrate 92,192: transparent electrode pattern

50,150: gate insulating film 53,153: protective film

75,175 Liquid crystal display panel 95,195 Contact hole

210: fine pattern

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device and a method of manufacturing the same, which can prevent a decrease in display quality.

The liquid crystal display device displays an image by adjusting the light transmittance of the liquid crystal using an electric field.

The liquid crystal display device includes a liquid crystal display panel in which liquid crystal cells are arranged in a matrix, a data driver and gate driver for supplying a driving signal to the liquid crystal display panel, and a backlight unit for supplying light to the liquid crystal display panel.

FIG. 1 is a schematic view of a conventional liquid crystal display, and FIG. 2 is a plan view showing an enlarged area A between neighboring data integrated circuits 33 in FIG. 1, and FIG. It is sectional drawing which cut | disconnected the line -I '.

First, the liquid crystal display shown in FIG. 1 includes a liquid crystal display panel 75 in which liquid crystal cells are arranged in a matrix, and a data integrated circuit (IC) 33 for supplying driving signals to the liquid crystal display panel 75. ) And the gate integrated circuit 23.

The liquid crystal display panel 75 includes a thin film transistor array substrate 70 on which a thin film transistor array is formed, a color filter array substrate 80 on which a color filter array is formed, a thin film transistor array substrate 70, and a color filter array substrate 80. It has a structure in which the liquid crystal is bonded therebetween.

In the display area P1 of the thin film transistor array substrate 70, gate lines 20 and data lines 30 formed to cross each other to define pixel cells, thin film transistors formed at respective intersections thereof, and thin film transistors are connected to each other. And a lower alignment layer coated thereon for liquid crystal alignment.

In the non-display area P2 of the thin film transistor array substrate 70, a common line 91 to which a common voltage is supplied from the power supply unit 60 is formed. The common line 91 is a silver dot located between the gate integrated circuits 23 and the data integrated circuits 33 and between the gate integrated circuits 23 and the neighboring data integrated circuits 33. Electrically connected via 86.

The color filter array substrate 80 includes a black matrix for preventing light leakage, a color filter for realizing color, a common electrode 82 forming a vertical electric field with a pixel electrode, and an upper alignment layer coated thereon for liquid crystal alignment. The color filter array is formed. Here, the common electrode 82 formed on the curly filter array substrate 80 is electrically connected to the common line 91 formed on the thin film transistor array substrate 70 through the silver dots 86 as shown in FIGS. 2 and 3. Connected.

The common line 91 is formed of the same material as the gate line 20 of the thin film transistor array substrate 70 made of chromium, aluminum alloy, or the like, so that the common line 91 is formed on the gate insulating film 50 and the protective film 53. To be covered. Here, a contact hole 95 exposing the common line 91 is provided in the gate insulating film 50 and the passivation layer 53 so as to make electrical contact between the common line 91 and the silver dot 86. And a transparent electrode pattern 92 contacting the common line 91 and the silver dot 86 at the same time. Accordingly, the common line 91 may be electrically connected to the silver diagram 86 so that the common line 91 may be supplied to the common electrode 82 formed on the color filter array substrate 80.

The gate integrated circuit 23 is electrically connected to the gate line 20 through a gate link 21 extending from the gate line 20 to supply a gate signal to the gate line 20. The data integrated circuit 33 is electrically connected to the gate line 20 through a data link 31 extending from the data line 30 to supply a data signal to the data line 30.

On the other hand, in the conventional liquid crystal display device, the display quality may be degraded because unwanted backlight light is transmitted to the area between the neighboring gate integrated circuits 23 and the neighboring data integrated circuit 33. Accordingly, as shown in FIG. 4, the area of the common line 91 is widened to block transmission of backlight light. However, even when the area of the common line 91 is wide as shown in FIG. 4, the common line 91 is formed of a gate metal having good reflectivity, so that the light 65 emitted from the backlight unit 55 is shown in FIG. 5. It is reflected by the common line 91 and simultaneously refracted and diffracted. As a result, when the liquid crystal display device 100 is viewed from a viewing angle, light leakage occurs between neighboring data integrated circuits as shown in FIG. 6.

Accordingly, an object of the present invention is to provide a liquid crystal display device and a method of manufacturing the same, which can prevent light leakage and prevent degradation of display quality.

In order to achieve the above object, a liquid crystal display device according to an embodiment of the present invention comprises a liquid crystal display panel composed of a color filter array substrate having a common electrode and a thin film transistor array substrate facing the liquid crystal therebetween; A plurality of gate integrated circuit units supplying a gate voltage to a gate line positioned on the thin film transistor array substrate; A plurality of data integrated circuit units supplying data voltages to data lines positioned on the thin film transistor array substrate; A common line located in at least one region between neighboring gate integrated circuit units and between neighboring data integrated circuit units simultaneously with the gate integrated circuit unit and the data integrated circuit unit; And a silver dot electrically connecting the common line and the common electrode in at least one region between the neighboring gate integrated circuit units and the neighboring data integrated circuit units, wherein the common line is the thin film transistor array substrate. The gate insulating film is formed of the same material as the data line.

The thin film transistor array substrate may further include a plurality of fine patterns in a line shape positioned around the common line with the same material as the common line.

The fine patterns may be entirely distributed in at least one region between the neighboring gate integrated circuit units and between the neighboring data integrated circuit units.

The common lines and the fine patterns are made of at least one metal of molybdenum, titanium, tantalum, and molybdenum alloys.

A protective film having a contact hole exposing the common line; And a transparent electrode pattern contacting the common line through the contact hole and integrating contact with the silver dot.

The gate integrated circuit unit includes a gate integrated circuit electrically connected to the gate line, and a tape carrier package on which the gate integrated circuit is mounted; The data integrated circuit unit includes a data integrated circuit electrically connected to the data line, and a tape carrier package in which the data integrated circuit is mounted.

A method of manufacturing a liquid crystal display device according to the present invention includes forming a color filter array substrate on which a common electrode is formed; Forming a thin film transistor array substrate having a common line for supplying a common voltage to the common electrode; Bonding the thin film transistor array substrate and the color filter array substrate to electrically connect the common electrode and the common line through silver dots; Attaching a gate integrated circuit unit to the thin film transistor array substrate to supply a gate voltage to a gate line of the thin film transistor array substrate; Attaching a data integrated circuit unit to the thin film transistor array substrate, the data integrated circuit unit supplying a data voltage to the data line of the thin film transistor array substrate, wherein forming the thin film transistor array substrate comprises forming a gate line on a lower substrate; Wow; Forming a gate insulating film on the lower substrate; At least any one of the gate integrated circuit portions adjacent to the gate insulating layer and the data integrated circuit portions adjacent to each other on the gate insulating layer while simultaneously forming a data line crossing the gate line and passing through the gate integrated circuit portion and the data integrated circuit portion. Forming a common line located in one region.

Forming a protective film having a contact hole exposing the common line; The method may further include forming a transparent electrode pattern in contact with the common line through the contact hole and in contact with the silver dot.

Other objects and advantages of the present invention will become apparent from the following description of preferred embodiments of the present invention with reference to the accompanying drawings.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to FIGS. 7 to 11.

FIG. 7 is a schematic view of a liquid crystal display according to an exemplary embodiment of the present invention. FIG. 8 is an enlarged plan view of an area A between neighboring data integrated circuits 133 in FIG. 7, and FIG. It is sectional drawing which cut | disconnected the II-II 'line | wire in FIG.

7 includes a liquid crystal display panel 175 in which liquid crystal cells are arranged in a matrix, a data integrated circuit (IC) 133 for supplying a driving signal to the liquid crystal display panel 175, and a liquid crystal display panel 175. The gate integrated circuit 123 is illustrated.

The liquid crystal display panel 175 includes a thin film transistor array substrate 170 on which a thin film transistor array is formed, a color filter array substrate 180 on which a color filter array is formed, a thin film transistor array substrate 170, and a color filter array substrate 180. It has a structure in which the liquid crystal is bonded therebetween.

The thin film transistor array substrate 170 has a gate line 120 and a data line 130 formed to cross each other to define pixel cells, thin film transistors formed at each intersection thereof, pixel electrodes connected to the thin film transistors, And a lower alignment layer coated for liquid crystal alignment on the top. A common line 191 to which a common voltage is supplied from the power supply unit 160 is formed in the outer region of the thin film transistor array substrate 170. The common line 191 passes through the gate integrated circuit 123 and the data integrated circuit 133, and is a silver dot located between the gate integrated circuits 123 and between the neighboring data integrated circuits 133. Electrically connected via 86.

The color filter array substrate 180 includes a black matrix for preventing light leakage, a color filter for color implementation, a common electrode 182 forming a vertical electric field with the pixel electrode, and an upper alignment layer coated thereon for liquid crystal alignment. The color filter array is formed. Here, the common electrode 182 formed on the curly filter array substrate 180 is electrically connected to the common line 191 formed on the thin film transistor array substrate 170 through the silver dots 186 as shown in FIGS. 8 and 9. Connected.

In the present invention, the common line 191 is formed of the same material at the same time as the data line 130 and the data link 131 with molybdenum (Mo), titanium, tantalum, and molybdenum alloy (Mo alloy) sources / drain metals, not gate metals. do. Accordingly, unlike the related art, the common line 191 according to the present invention is not formed directly on the lower substrate 101, but is formed on the gate insulating layer 150 and covered by the protective layer 153. In addition, the common line 191 is in contact with the transparent electrode pattern 192 through the contact hole 195 penetrating the passivation layer 153, and the transparent electrode pattern 192 is in electrical contact with the silver dot 186.

The common line 191 is formed on the gate insulating layer 150, so that light emitted from the backlight passes through the lower substrate 101 of the thin film transistor array substrate 170, but is reflected, refracted, and diffracted by the gate insulating layer 150. The degree is weakened. At the same time, the common line 191 is formed of a source / drain metal such as molybdenum (Mo), titanium, tantalum, or molybdenum alloy (Mo alloy), which is a metal having a relatively smaller reflectance than the gate metal. Accordingly, even though backlight light enters a region between the gate integrated circuits 123 and the neighboring data integrated circuits 133, most of the light disappears in the gate insulating layer 150, and only a part of the light passes through the gate insulating layer 150. Even though transmitted through the common line 191, light leakage does not appear as the common line 191 is formed of a source / drain metal having a low reflectance. Therefore, the degradation of display quality can be prevented.

The gate integrated circuit 123 is electrically connected to the gate line 120 through a gate link 121 extended from the gate line 120 to supply a gate signal to the gate line 120. The data integrated circuit 133 is electrically connected to the gate line 120 through a data link 131 extended from the data line 130 to supply a data signal to the data line 130.

The gate integrated circuit 123 and the data integrated circuit 133 are mounted on a tape carrier package (TCP) or on a base film of TCP in a chip on film (COF) method, and a liquid crystal display in a tape automated bonding (TAB) method. The thin film transistor array substrate 70 of the panel 175 is attached and electrically connected to the liquid crystal display panel 175. In addition, the gate integrated circuit 123 and the data integrated circuit 133 may be directly mounted on the liquid crystal display panel 175 by a chip on glass (COG) method.

10A through 10E are cross-sectional views illustrating a manufacturing process in a contact area between a common line 191 and a silver dot 184 among non-display areas of a liquid crystal display.

First, a gate line or the like is formed in the display area P1 of the lower substrate 101, and then an insulating material is deposited by a deposition process such as PECVD. As shown in FIG. 10A, the common line 191 and the silver dot 186 are formed. Only the gate insulating layer 150 is formed in the contact region with the. Here, an inorganic insulating material such as silicon oxide (SiOx) or silicon nitride (SiNx) is used as the material of the gate insulating layer 150.

Thereafter, after forming the source / drain metal layer, a photolithography process and an etching process using a mask are performed to form a common line 191 as illustrated in FIG. 10B. Here, as the source / drain metal, molybdenum (Mo), titanium, tantalum, molybdenum alloy (Mo alloy) and the like are used.

Thereafter, after the protective film 50 is formed by a deposition method such as PECVD, the protective film 50 is patterned by a photolithography process and an etching process using a mask to expose the common line 191 as shown in FIG. 10C. The contact hole 195 is formed. As the material of the protective film 50, an inorganic insulating material such as the gate insulating film 94 or an organic insulating material such as an acryl-based organic compound having a low dielectric constant, BCB, or PFCB is used.

Subsequently, the transparent electrode material is entirely deposited on the protective film 50 by a deposition method such as sputtering, and then the transparent electrode material is etched through a photolithography process and an etching process using a mask, thereby contacting as shown in FIG. 10D. The transparent electrode pattern 192 is formed to contact the common line 191 through the hole 95. As the transparent electrode material, indium tin oxide (ITO), tin oxide (TO), or indium zinc oxide (IZO) is used.

Subsequently, as shown in FIG. 10E, the silver dot 186 is formed on the transparent electrode pattern 192 of the thin film transistor array substrate 170, and the color filter array substrate on which the common electrode 182 is formed by a separate process. The common electrode 182 and the common line 191 are electrically connected to each other by forming the 180 and bonding the thin film transistor array substrate 170 and the color filter array substrate 180 together. Accordingly, the common voltage from the common line 191 may be supplied to the common electrode 182.

FIG. 11 is a plan view illustrating another form of the region A between the neighboring gate integrated circuits 123 and the neighboring data integrated circuits 133.

In the region A shown in FIG. 11, the common line 91 is formed in a line shape on a plane, similar to that of FIG. 2, and a plurality of fine patterns 210 are formed around the common line 91. . Except for such differences, the same components as those in FIGS. 8 and 9 are assigned the same reference numerals, and detailed description thereof will be omitted.

In FIG. 11, the common line 191 is a molybdenum (Mo), titanium, tantalum, or molybdenum alloy (Mo alloy) source / drain metal, which is not a gate metal, but simultaneously with the data line 130 and the data link 131. The gate insulating layer 150 may be formed of the same material and beneath the common line 191. At the same time, fine patterns 210 having a line shape are distributed over the entire area between neighboring gate integrated circuits 123 and between neighboring data integrated circuits 133. As a result, even if the light emitted from the backlight passes through the lower substrate 101 of the thin film transistor array substrate 170, the degree of reflection, refraction and diffraction is weakened by the gate insulating layer 150. Even though the light is transmitted, light leakage does not appear as the fine patterns 210 are formed of a source / drain metal having a low reflectance around the common line 191 and the common line 191. Therefore, the degradation of display quality can be prevented.

In addition, since the fine pattern 210 is formed in a line shape around the common line 191 in FIG. 11, some light transmitted through the gate insulating layer 150 is reflected a plurality of times in the space between the fine patterns 210. , All become extinct by processes such as diffraction and refraction. Accordingly, the light leakage is more effectively prevented than the common line 191 illustrated in FIG. 8.

As described above, the liquid crystal display and the method of manufacturing the same according to the present invention, the common line in contact with the silver dot in the region between the neighboring gate integrated circuit and the neighboring data integrated circuit, the data line to the source / drain metal on the gate insulating film And at the same time. Accordingly, even if the light emitted from the backlight penetrates the lower substrate of the thin film transistor array substrate, the degree of reflection, refraction, and diffraction is weakened by the gate insulating film. Even though some light is transmitted through the gate insulating film, fine patterns are formed around the common line and the common line. Light leakage does not appear as it is formed of a low reflectance source / drain metal. Furthermore, since the fine pattern is formed around the common line in the form of a line, some light transmitted through the gate insulating film is all extinguished by the process of reflection, diffraction, refraction, etc. many times in the space between the fine patterns, thereby further strengthening the light leakage. It can be prevented. As a result, the degradation of display quality can be prevented.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or scope of the invention. Therefore, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be defined by the claims.

Claims (11)

A liquid crystal display panel including a color filter array substrate having a common electrode and a thin film transistor array substrate facing each other with a liquid crystal interposed therebetween; A plurality of gate integrated circuit units supplying a gate voltage to a gate line positioned on the thin film transistor array substrate; A plurality of data integrated circuit units supplying data voltages to data lines positioned on the thin film transistor array substrate; A common line located in at least one region between neighboring gate integrated circuit units and between neighboring data integrated circuit units simultaneously with the gate integrated circuit unit and the data integrated circuit unit; And a silver dot electrically connecting the common line and the common electrode in at least one region between the neighboring gate integrated circuit units and the neighboring data integrated circuit units. The common line The thin film transistor array substrate may be formed of the same material as the data line on the gate insulating layer of the thin film transistor array substrate, and the thin film transistor array substrate may further include a plurality of fine patterns in the form of lines positioned around the common line. Liquid crystal display device characterized in that. delete The method of claim 1, And the fine patterns are entirely distributed in at least one region between the neighboring gate integrated circuit units and between the neighboring data integrated circuit units. The method of claim 3, wherein And the common lines and the fine patterns are formed of at least one metal of molybdenum, titanium, tantalum, and molybdenum alloy. The method of claim 1, A protective film having a contact hole exposing the common line; And a transparent electrode pattern contacting the common line through the contact hole and integrating contact with the silver dot. The method of claim 1, The gate integrated circuit unit includes a gate integrated circuit electrically connected to the gate line, and a tape carrier package on which the gate integrated circuit is mounted. And the data integrated circuit unit comprises a data integrated circuit electrically connected to the data line, and a tape carrier package on which the data integrated circuit is mounted. Forming a color filter array substrate having a common electrode formed thereon; Forming a thin film transistor array substrate having a common line for supplying a common voltage to the common electrode; Bonding the thin film transistor array substrate and the color filter array substrate to electrically connect the common electrode and the common line through silver dots; Attaching a gate integrated circuit unit to the thin film transistor array substrate to supply a gate voltage to a gate line of the thin film transistor array substrate; Attaching a data integrated circuit unit to the thin film transistor array substrate to supply a data voltage to a data line of the thin film transistor array substrate, Forming the thin film transistor array substrate Forming a gate line on the lower substrate; Forming a gate insulating film on the lower substrate; At least any one of the gate integrated circuit portions adjacent to the gate insulating layer and the data integrated circuit portions adjacent to each other on the gate insulating layer while simultaneously forming a data line crossing the gate line and passing through the gate integrated circuit portion and the data integrated circuit portion. A method of manufacturing a liquid crystal display device comprising the step of forming a common line located in one region. The method of claim 7, wherein Forming the common line Forming a plurality of fine patterns in a line shape around a common line in at least one region among the gate integrated circuit units and between the neighboring data integrated circuit units. . 9. The method of claim 8, And the fine patterns are entirely distributed in at least one region between the neighboring gate integrated circuits and the neighboring data integrated circuits. The method of claim 9, And the common lines and the fine patterns are made of at least one metal of molybdenum, titanium, tantalum, and molybdenum alloy. The method of claim 7, wherein Forming a protective film having a contact hole exposing the common line; And forming a transparent electrode pattern in contact with the common line through the contact hole and integrating contact with the silver dot.

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