KR101250777B1 - Solution for cleaning mask deposited with metal electrode material and cleaning method using the same - Google Patents

Abstract

PURPOSE: A cleaning solution for a mask deposited with a metal electrode material and a method thereof are provided to prevent the deformation of a mask and to be unaffected by kinds of metals. CONSTITUTION: A cleaning solution for a mask deposited with a metal electrode material comprises iodine contained in an organic solvent to chemically react to a metal electrode material according to a motion. The organic solvent is one selected among the groups consisting of dimethylformamide, dimethylacetamide, and methyl pyrrolidone. The organic solvent excludes an alcoholic solution. [Reference numerals] (AA) Steam;

Description

Mask cleaning liquid deposited with metal electrode material and cleaning method using the same {SOLUTION FOR CLEANING MASK DEPOSITED WITH METAL ELECTRODE MATERIAL AND CLEANING METHOD USING THE SAME}

The present invention relates to a mask cleaning liquid in which a metal electrode material is deposited and a cleaning method using the same. More particularly, the metal electrode material recovered after depositing a metal electrode material of an anode and a cathode on a substrate in an organic light emitting display device. Is cleaned with a cleaning solution containing iodine (I ₂ ) which chemically reacts with the metal electrode material to clean the deposited mask, thereby essentially eliminating the corrosion problem caused by the acid, and chemically reacting with the metal electrode material to remove it. Therefore, the present invention relates to a cleaning solution which can be applied to a wide range without being greatly influenced by the metal type and preventing the deformation of the mask and being greatly affected by the metal.

An organic light emitting diode of an organic light emitting diode display (OLED) is a self-luminous element and requires a backlight used in a liquid crystal display device (LCD) which is a non-light emitting element. Light weight and thinness are possible.

In addition, the organic light emitting diode display has excellent viewing angle and color, low power consumption, low direct current voltage driving, fast response, and solid internal components, which are resistant to external shocks and have a wide temperature range. It has the advantage of high quality.

The organic light emitting diode of the organic light emitting diode display may be largely divided into an electrode layer and an organic light emitting layer of an anode and a cathode. For natural light emission, holes and electrons have to be injected efficiently through the anode and cathode, and its effects greatly affect the type of organic material, the arrangement of the organic light emitting layer, the thickness of the thin film, and the amount of current required.

FIG. 1 is a diagram illustrating a conventional organic light emitting device, in which a first transflective electrode 10 is a hole injection electrode as an anode electrode from a glass substrate side. The second transflective electrode 20 is an electron injection electrode and is a cathode. The organic light emitting layer 30 includes a hole injection layer (HIL) 30-1, a hole transport layer (HTL) 30-2, and an electron transport layer (ETL) 30-3. ), A thin film is formed of an electron injection layer (EIL) 30-4 and an emissive layer (EML) 40. The main light emitting layer is composed of a red light emitting layer 40-1, a green light emitting layer 40-2, and a blue light emitting layer 40-3.

The first transflective electrode and the second transflective electrode comprise at least one of a transparent conductive material and a semipermeable metal. In this case, the transparent conductive material includes at least one of indium tin oxide (ITO), indium zinc oxide (IZO), zinc oxide, and indium oxide.

In addition, the semi-permeable metal is made of one or more metals or alloys of magnesium (Mg), silver (Ag), gold (Au), calcium (Ca), lithium (Li), chromium (Cr) and aluminum (Al). do. At this time, the semi-permeable metal is deposited to a thickness in the range of 5 to 50㎛.

The transmittance and reflectance of the light vary depending on the thickness of the semi-transmissive metal. The thicker the thickness, the lower the transmittance of the light, and the thinner the poor the electrical properties.

As shown in FIG. 1, the first transflective electrode includes a transflective layer 10-1 formed of a transflective metal and a transparent layer 10-2 formed of a transparent conductive material on the transflective layer.

This allows the first transflective electrode to facilitate hole injection by disposing a transparent layer having a relatively high work function between the transflective layer of the first transflective electrode and the organic light emitting layer.

FIG. 2 illustrates a mask used for vacuum deposition in a conventional organic light emitting display manufacturing process, in which metal electrode materials, which are anode and cathode materials, are deposited on a substrate through an opening formed in the mask. In this process, some metal electrode materials stick to the mask surface and the openings. Thus, as the deposition time elapses, the size of the opening is reduced, which causes a problem that smooth deposition does not occur.

Therefore, periodic cleaning of the mask is required to achieve smooth deposition. More preferably, after one deposition process is completed, the mask should be cleaned to remove the deposition material, which causes troublesome and long process steps.

As an example of the prior art related to mask cleaning, Korean Patent Laid-Open Publication No. 2005-53335 provides a cleaning method and a cleaning apparatus that can easily remove organic substances attached to a deposition mask of a low molecular organic EL device. -36435 provides a mask cleaning apparatus that optimizes a range of ultrasonic intensities and frequencies used for cleaning a mask, thereby providing a method of preventing mask deformation and providing reliable cleaning. The above inventions are a method of cleaning a mask on which an organic material of an organic light emitting layer is deposited using an organic solvent having high solubility in organic matter.

In addition, Korean Patent Laid-Open No. 2011-34544 discloses a method of removing organic materials by exfoliation between layers by irradiating laser light to have a difference in thermal expansion due to a temperature difference between an organic deposition material and a mask.

However, there are few reports on how to clean a mask coated with metal electrode material.

However, in the alloy of magnesium (90%, w / w) and silver (10%, w / w) reported as a metal material in Japanese Patent Application Laid-Open No. 2011-146387, that is, magnesium (Mg) in the semi-transmissive electrode In the case of a large amount of components, when heat is applied to a temperature of 60 to 80 ° C. in an aqueous alkali solution such as tetramethylammonium hydroxide (TMAH) or potassium hydroxide, swelling and contraction occurs, resulting in peeling between the mask and the metal film. Force is generated, thereby attempting to remove the metal film.

However, in the above invention, even in the case of cleaning by the peel force should be applied to strong ultrasonic vibration, it takes a long time more than 20 hours.

Moreover, the method by the peel force is not applied when the component content of magnesium is low. In particular, in order to improve the injection efficiency of holes and electrons, since a change in the composition of the metal component is necessarily accompanied, it is necessary to develop an appropriate cleaning solution accordingly.

In general, the frame portion of the mask is made of stainless steel with high hardness, and the opening is made of a metal plate having a thickness of 100 μm or less, so that deformation of the plate occurs even with a small impact, so that it is difficult to apply a physical force. In addition, invar, which is a material having a very low expansion ratio, is used to maintain the close contact with the substrate even when the temperature is raised to 500 ° C. or higher during vacuum deposition, and contains iron. Therefore, the frame and the opening constituting the mask are made of a material weak against acid, and acid cleaning is impossible due to corrosion problems caused by acid.

Accordingly, the present inventors have made efforts to establish a cleaning liquid capable of cleaning a mask in which metal electrode materials other than organic materials are deposited or a cleaning method thereof. As a result, the present inventors have developed a cleaning liquid which can be easily dissolved in various kinds of metal electrode materials and quickly cleaned. Thus, unlike the conventional method using the peeling force of the contraction and expansion, because the chemical reaction with the metal electrode material to remove the cleaning speed is fast, by providing a cleaning solution that can fundamentally solve the corrosion problem caused by conventional acids, Was completed.

It is an object of the present invention to provide a cleaning liquid for mask cleaning on which metal electrode materials are deposited.

Another object of the present invention is to provide a method for cleaning a mask on which a metal electrode material is deposited, using the cleaning liquid.

The present invention provides a cleaning solution for mask cleaning on which a metal electrode material is deposited, wherein iodine (I ₂ ) is chemically reacted with the metal electrode material according to the behavior of the following formulas (1) and (2). do.

(1) 2Ag + I₂ → 2AgI

(2) 2Al + 3I₂ → 2AlI₃

Cleaning solution of the present invention, it is preferred that the iodine (I ₂₎ containing 5 to 10% by weight.

The iodine (I ₂ ) is any one selected from the group consisting of dimethyl formamide (DMF), dimethyl acetamide (DMAC) and methyl pyrrolidone (NMP) It is preferable to be contained in the organic solvent. In this case, the mask cleaning liquid has an iodine solubility of 10 to 25 g / 100 ml of an organic solvent containing 3% by weight of water, and the thin film removal time is completed within 30 minutes.

In addition, the iodine (I ₂ ) is contained in an aqueous solution in which potassium iodide (KI) is dissolved, wherein the cleaning solution for mask cleaning has iodine solubility of 10 g / 100 ml or less, and a thin film removal time of 40 Is completed within minutes.

Accordingly, the present invention is immersed in the cleaning tank containing the cleaning solution for cleaning the mask on which the metal electrode material is deposited, by immersing the mask on which the metal electrode material recovered after vacuum deposition of the anode or cathode during deposition of the substrate of the organic light emitting display device is deposited. Dissolving the metal electrode material,

Removing the iodine by immersing the mask subjected to the above step in a softening tank in which a softening solution composed of an aqueous alkali solution is immersed, first washing with water through a water washing tank,

Provided is a mask cleaning method in which a metal electrode material is deposited, which comprises a second washing step through a solvent washing tank and a drying step using a hot air dryer.

In the cleaning method of the present invention, it is preferable that the cleaning tank is maintained at 30 to 60 ° C, and more preferably, ultrasonic vibration having a frequency of 60 to 90 KHz is added.

In the cleaning method of the present invention, the softening solution is an aqueous solution containing 2 to 5% by weight of an alkaline component selected from the group consisting of tetramethylammonium hydroxide, potassium hydroxide and sodium hydroxide in water.

At this time, the softening liquid of the present invention is effective to dissociate and remove iodine according to the behavior of the following formula (3).

^{_{(3) I 2 + 2OH -}} → I - + IO - + H 2 O

The present invention provides a cleaning liquid containing iodine (I ₂ ) that chemically reacts with the metal electrode material, unlike the conventional method using the peeling force of shrinkage and expansion, because the chemical reaction with the metal electrode material is removed to remove the cleaning speed It is fast and can fundamentally solve the corrosion problem caused by conventional acid, prevent deformation of mask and apply to a wide range without being greatly influenced by metal type.

In addition, the present invention is to provide a high-quality organic light emitting display device by depositing the metal electrode material of the anode and cathode on the substrate in the organic light emitting display device, and then effectively cleaning the mask on which the recovered metal electrode material is deposited with the cleaning liquid. Can be.

In addition, various metal electrode materials may be developed by easily and simply removing a mask on which a metal electrode material, which is efficiently and variously configured, is deposited in the organic light emitting display field by using a chemical reaction with iodine.

1 is a configuration diagram of a conventional organic light emitting display device.
2 illustrates an example of a mask used for vacuum deposition of a metal electrode material in a conventional organic light emitting display manufacturing process;
Figure 3 shows the process sequence according to the cleaning method of the mask on which the metal electrode material of the present invention is deposited,
4 is a photograph of mask changes before and after cleaning according to the mask cleaning method of the present invention.

Hereinafter, the present invention will be described in detail.

The present invention provides a cleaning solution for mask cleaning on which a metal electrode material is deposited, wherein iodine (I ₂ ) is chemically reacted with the metal electrode material according to the behavior of the following formulas (1) and (2). do.

(1) 2Ag + I₂ → 2AgI

(2) 2Al + 3I₂ → 2AlI ₃

The present invention is to clean the mask on which the recovered metal electrode material is deposited after depositing the metal electrode material of the anode and cathode on the substrate in the organic light emitting display device, the metal electrode materials and halogen elements used for the anode and cathode Considering its reactivity with, it excludes molecules that are toxic or gaseous at room temperature among the halogenated elements.

Accordingly, the present invention provides a mask cleaning liquid in which a metal electrode material containing iodine (I ₂ ), which is solid at room temperature, is deposited.

In the cleaning solution of the present invention, the preferred concentration of the iodine (I ₂₎ component will be included in an amount of 5 to 10% by weight. At this time, if the iodine concentration is less than 5% by weight, the dissolution time is long, while if it exceeds 10% by weight, there is a problem that iodine is precipitated during long-term storage under the influence of temperature and moisture.

Thus, in the embodiment of the present invention, but the solubility and thin film removal time at 5% by weight iodine concentration was presented, similar results can be confirmed in the case of containing 10% by weight iodine concentration.

Mask cleaning cleaning liquid deposited with a metal electrode material as a first embodiment for the preferred embodiment of the present invention is any one of the iodine (I ₂ ) selected from the group consisting of dimethyl formamide, dimethyl acetamide and methyl pyrrolidone It is contained in organic solvents. In the case of the organic solvent, solubility is high, but alcohol solvents such as isopropyl alcohol (IPA) and butyl alcohol have relatively low solubility. More preferably, when dimethyl formamide or dimethyl acetamide is used, the result of removing the metal electrode material thin film due to high solubility can be confirmed quickly.

More specifically, since the cleaning liquid of the first embodiment should be used as the cleaning liquid until the long term drug effect is reached, the organic solvent may contain moisture in the air and thus contain 3% (w / w) of water. Thus, the mask cleaning liquid in which the metal electrode material of the present invention is deposited has an iodine solubility of 10 to 25 g / 100 ml of an organic solvent containing 3 wt% of moisture, and the thin film removal time is completed within 30 minutes.

In the mask cleaning liquid in which the metal electrode material is deposited as a second embodiment for implementing the present invention, the iodine (I ₂ ) is dissolved in water.

At this time, since iodine (I ₂ ) is insoluble in water, it is contained in an aqueous solution in which potassium iodide is dissolved as a solvent. At this time, the solubility of iodine in the cleaning liquid of the second embodiment is proportional to the concentration of potassium iodide dissolved, preferably 5 to 10% by weight of the potassium iodide.

Thus, when potassium iodide is dissolved in water at 20 g / 100ml, iodine solubility can be up to 10 g / 100ml, and thin film removal is completed within 40 minutes.

Therefore, the mask cleaning liquid having the above-described metal electrode material deposited thereon is different from the conventional contracting and expanding peeling force, and thus the chemicals react with the metal electrode material thin film to be removed.

In addition, the mask cleaning liquid for removing the metal electrode material of the present invention is prevented from deformation of the mask can be applied to a wide range without being greatly affected by the type of metal.

Accordingly, the present invention provides a cleaning method using a cleaning solution for mask cleaning on which the metal electrode material is deposited.

3 shows a process sequence according to a cleaning method of a mask on which a metal electrode material of the present invention is deposited, and in detail, in a cleaning tank 110 containing a cleaning solution containing iodine (I ₂ ) of the present invention, A first step of dissolving the metal electrode material by immersing a mask 160 in which the metal electrode material recovered after vacuum deposition of an anode or a cathode is deposited in a substrate manufacturing process of an organic light emitting display device;

A second step of removing the iodine by immersing the mask subjected to the above step in a softening tank 120 in which a softening solution made of an aqueous alkali solution is dipped;

A third step of first washing with water through the water washing tank 130,

A fourth step of washing secondly through the solvent washing tank 140 and

Provided is a mask cleaning method in which a metal electrode material is deposited, which is dried through a hot air dryer (150).

Hereinafter, each step will be described.

In the cleaning method of the present invention, a step is the step of dissolving the metal electrode material by using a cleaning liquid containing iodine (I ₂₎ 1, halogen elements to respond the iodine (I ₂₎ is chemically and metal electrode material As the fluorine (F), chlorine (Cl) and bromine (Br) is also good reactivity, but toxic, present in a gaseous state at room temperature, when prepared in the cleaning solution, it is difficult to easily escape into the air to maintain the concentration.

Thus, the iodine (I ₂ ) adopted in the present invention is a molecular form of iodine (I) that is solid at room temperature.

In this case, in order for the iodine (I ₂ ) to easily react with the metal electrode material, iodine must be dissolved in a molecular state, and thus a soluble solvent is required. The solvent must be high in boiling point and low in viscosity so that it can be used repeatedly for a long time in a cleaning bath. do.

As a preferable example, the organic solvent used in the cleaning solution of the present invention is dimethyl formamide (DMF), dimethyl acetamide (DMAC) and methyl pyrrolidone (NMP). Any one selected from the group consisting of.

In addition, the washing solution of the present invention can be in the form of an aqueous solution, in which case iodine is contained in an aqueous solution in which potassium iodide (KI) is first dissolved as a solvent. When the cleaning solution is an aqueous solution, there is an advantage in health and safety compared to the organic solvent.

In the first step of the cleaning method of the present invention, when the metal electrode material is reacted and melted using the above cleaning solution, the higher the temperature, the faster the melting, but the temperature is maintained at 30 to 60 ° C. At this time, if the temperature of the washing tank 110 is less than 30 ℃, the solvent is low, the time is long, if the temperature exceeds 60 ℃ evaporation of the organic solvent occurs is not preferable.

In addition, in order to increase the dissolving power, the ultrasonic vibrator 111 is simultaneously applied in the first step so that the attached solid can be more easily dissolved.

In the cleaning method of the present invention, if the first step is to dissolve and remove the metal electronic material, the second step is because the unreacted iodine buried in the mask is difficult to dissolve in water, it is ionized to remove it to remove the surface of the mask This step is to remove stains and to clean the surface.

Thus, the softening tank 120 of the second step is filled with a softening solution of an aqueous solution containing 2 to 5% by weight of an alkaline component selected from the group consisting of tetramethylammonium hydroxide, potassium hydroxide and sodium hydroxide in water.

The softening liquid is not particularly limited as long as it is an aqueous alkali solution, but a method of softening iodine by putting a mask in an aqueous solution containing 2% by weight of tetramethylammonium hydroxide can confirm the best cleaning effect. This result can be confirmed when the softening liquid is used repeatedly, and the softening liquid is preferable when the concentration is 2 to 5% by weight, and when the concentration exceeds 5% by weight, it causes turbidity when repeated use, which is not transparent and is washed. It is hard to confirm degree.

At this time, the softening liquid consisting of aqueous alkali solution can be removed by dissociating iodine according to the behavior of the following formula (3).

^{_{(3) I 2 + 2OH -}} → I - + IO - + H 2 O

The reaction completion point of the second step of the present cleaning method is easy to identify because the color disappears as purple iodine is removed.

Thereafter, the washing method of the present invention is cleanly washed through the third step of the water washing tank 130 and the fourth step of the solvent washing tank 140 in succession.

At this time, the solvent washing tank 140 is preferably used isopropyl alcohol or ethyl alcohol in order to remove even less contaminants and to facilitate drying.

The fifth step in the cleaning method of the present invention after the cleaning through the above steps, dried in the hot air dryer 150 is provided as a clean mask.

Fig. 4 is a photograph of observing mask changes before and after cleaning according to the mask cleaning method of the present invention, and it can be seen that the mask surface cleaned according to the cleaning method of the present invention was cleanly cleaned.

Hereinafter, the present invention will be described in more detail with reference to Examples.

This is for further illustrating the present invention, and the scope of the present invention is not limited to these examples.

1. Mask cleaning liquid using organic solvent

≪ Example 1 >

After preparing a cleaning solution by dissolving 10 kg of iodine (I 2) in 200 L of dimethyl formamide, the mask 160 having 5 to 10 μm of metal electrode material deposited therein was placed in the cleaning bath 110 as shown in FIG . 3 . The mask was soaked in the wash bath for 60 minutes. At this time, the temperature of the cleaning tank was maintained at 30 to 60 ℃, and the ultrasonic vibrator 111 of 60kHz was operated at the same time.

When it was confirmed that the metal electrode material on the mask surface was completely removed from the cleaning tank 110, the mask was transferred from the cleaning tank to the softening tank 120. That is, the mask 160 subjected to the cleaning bath step is placed in a softening bath 120 containing a softening solution prepared with an aqueous alkali solution containing 2% (w / v) tetramethylammonium hydroxide for 30 minutes at room temperature. Was processed. At this time, it was easy to confirm that the violet color of the iodine changed to colorless.

Since the iodine softened mask was washed clean in a water washing tank 130 and a solvent washing tank 140 containing isopropyl alcohol.

The mask subjected to the above step was dried at 70 to 80 ° C. for 2 hours in a hot air dryer 150 to complete the washing process.

<Example 2>

The same procedure as in Example 1 was carried out except that a cleaning solution in which 5% by weight of iodine was dissolved in a dimethyl acetamide (DMAC) solvent containing 3% (w / w) of water was used.

<Example 3>

The same procedure as in Example 1 was carried out except that a washing solution in which 5% by weight of iodine was dissolved in a methyl pyrrolidone (NMP) solvent containing 3% (w / w) of water was used.

&Lt; Comparative Example 1 &

The same procedure as in Example 1 was performed except that a cleaning solution in which 5% by weight of iodine was dissolved in an isopropyl alcohol (IPA) solvent containing 3% (w / w) of water was used.

Experimental Example 1 Measurement of Solubility and Cleaning Rate According to Organic Solvents

The mask on which the metal electrode material is deposited is discharged for cleaning after the deposition on the substrate is completed. When the mask was cleaned in a cleaning tank containing a cleaning solution prepared by dissolving 5% (w / v) of iodine in a solvent containing 3% (w / w) of water, the cleaning efficiency according to the cleaning solution used was observed. .

At this time, since the cleaning solution should be used until the long-term drug effect, solubility of iodine at 30 ° C. in a solvent containing water of 3% (w / w) was measured.

In addition, the time when the mask thin film deposited with the metal electrode material was dissolved and removed in the cleaning solution prepared by dissolving 5% (w / v) of iodine in each solvent containing 3% (w / w) of moisture was measured. Is shown in Table 1 below.

As confirmed in Table 1, in the case of dimethyl formamide (DMF) and dimethyl acetamide (DMAC), iodine solubility is high, and the thin film removal time in 5% iodine liquid is fast, desirable.

Methyl pyrrolidone (NMP), on the other hand, has a lower iodine solubility and a thinner film removal time than the iodine solution than the DMF or DMAC solvent.

However, isopropyl alcohol is not preferable as a mask cleaning solvent because the compound after the reaction does not continue to dissolve and adheres to the mask surface.

2. Mask cleaning solution using aqueous solution

<Example 4>

The same procedure as in Example 1 was performed except that 10 kg of iodine (I ₂ ) was used in an aqueous solution in which 20 kg of potassium iodide (KI) was dissolved in 200 L of water.

Experimental Example 2 Measurement of Solubility and Cleaning Rate in Potassium Iodide Aqueous Solution

When the mask thin film on which the metal electrode material was deposited was washed in the cleaning tank containing the cleaning solution in the aqueous solution prepared in Example 4, the cleaning efficiency according to the cleaning solution used was observed. The results are shown in Table 2 below.

As shown in Table 2 above, in the aqueous solution in which 10% (w / v) potassium iodide (KI) is dissolved, iodine shows 5.0 g / 100 ml, that is, 5% (w / v) solubility. Removal time was 35 minutes. The aqueous solution cleaning solution has a lower solubility and removal time efficiency than the case of using an organic solvent, but can be applied to a working environment because it has an advantage in health and safety compared to the use of an organic solvent.

Experimental Example 3 Mask Surface Observation Before and After Cleaning

In order to observe the removal efficiency of the metal electrode material from the surface of the mask according to the cleaning method of the present invention, the half of the mask on which the metal electrode material is deposited, the cleaning tank containing the cleaning liquid according to Example 1, and then the softening tank, water washing tank and A clean mask was prepared through a hot air dryer, and the other half of the mask that was not cleaned was contrasted with the photograph shown in FIG . 4 .

As a result, the mask surface cleaned according to the cleaning method of the present invention was clearly distinguished.

As described above, according to the present invention, after depositing a metal electrode material of the positive electrode and the negative electrode on the substrate in the organic light emitting display, a cleaning liquid which can efficiently clean and remove the mask on which the recovered metal electrode material is deposited It was.

That is, the cleaning solution of the present invention contains iodine (I ₂ ) that chemically reacts with the metal electrode material, and unlike the conventional method using the peeling force of contraction and expansion, the cleaning solution is chemically reacted with and removed from the metal electrode material. It is fast, fundamentally solves the corrosion problems caused by conventional acids, prevents deformation of the mask, and can be applied to a wide range without being greatly influenced by the type of metal.

In addition, the present invention can provide a high-quality organic light emitting display device by providing an optimal cleaning method using the cleaning solution, by easily and simply removing the mask on which the metal electrode material is deposited, it is useful for the development of various metal electrode materials Do.

Although the present invention has been described in detail only with respect to the described embodiments, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical scope of the present invention, and such modifications and modifications belong to the appended claims.

110: washing tank 111: ultrasonic vibrator
120: softening tank 130: water washing tank
140: solvent washing tank 150: hot air dryer
160: a mask on which a metal electrode material is deposited

Claims (11)

Iodine (I ₂ ) is contained in the organic solvent and reacts chemically with the metal electrode material according to the behavior of the following formulas (1) and (2),
The organic solvent is any one selected from the group consisting of dimethyl formamide, dimethyl acetamide and methyl pyrrolidone, the cleaning solution for mask cleaning deposited metal electrode material, characterized in that the alcohol solvent is excluded.
(1) 2Ag + I₂ → 2AgI
(2) 2Al + 3I₂ → 2AlI ₃ The method of claim 1, wherein the mask cleaning liquid, characterized in that said iodine (I ₂₎ containing 5 to 10% by weight. delete The mask cleaning liquid according to claim 1, wherein the mask cleaning liquid has an iodine solubility of 10 to 25 g / 100 ml in an organic solvent containing 3% by weight of water, and a thin film removal time is within 30 minutes. Iodine (I ₂ ) is contained in an aqueous solution in which potassium iodide (KI) is dissolved and chemically reacts with the metal electrode material according to the behavior of the following formulas (1) and (2),
When the aqueous solution is dissolved in 10% (w / v) potassium iodide (KI), the iodine solubility is less than 10 g / 100ml, the thin film removal time is less than 40 minutes, the mask on which the metal electrode material is deposited Cleaning liquid for cleaning.
(1) 2Ag + I₂ → 2AgI
(2) 2Al + 3I₂ → 2AlI ₃ delete The metal electrode material recovered after depositing the positive electrode and the negative electrode metal on the substrate in the cleaning tank containing the cleaning liquid according to any one of claims 1, 2, 4 and 5. Immersing the deposited mask to dissolve the metal electrode material;
Immersing the mask subjected to the above step in a softening tank containing a softening solution made of an aqueous alkali solution to dissociate and remove iodine according to the behavior of the following formula (3),
The first washing step through the water washing tank,
Second washing with a solvent washing tank and
A mask cleaning method comprising depositing a metal electrode material consisting of drying through a hot air dryer.
^{_{(3) I 2 + 2OH -}} → I - + IO - + H 2 O 8. The mask cleaning method according to claim 7, wherein the cleaning bath is maintained at 30 to 60 캜. 8. The mask cleaning method according to claim 7, wherein ultrasonic vibrations having a frequency of 60 to 90 KHz are added to the cleaning tank. 8. The mask cleaning method according to claim 7, wherein the softening solution is an aqueous solution containing an alkali component selected from the group consisting of tetramethylammonium hydroxide, potassium hydroxide and sodium hydroxide in water. Way. 8. The mask cleaning method according to claim 7, wherein an alkali component is contained in an aqueous alkali solution of 2 to 5 wt%.

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