JP3877758B2 - Cleaning liquid composition and cleaning method for mask used in vacuum deposition process of low molecular organic EL device production - Google Patents
Cleaning liquid composition and cleaning method for mask used in vacuum deposition process of low molecular organic EL device production Download PDFInfo
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- 238000004140 cleaning Methods 0.000 title claims description 68
- 239000007788 liquid Substances 0.000 title claims description 34
- 239000000203 mixture Substances 0.000 title claims description 28
- 238000000034 method Methods 0.000 title claims description 23
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000001771 vacuum deposition Methods 0.000 title claims description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 12
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 claims description 10
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 9
- 238000007654 immersion Methods 0.000 claims description 7
- 239000002798 polar solvent Substances 0.000 claims description 7
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 claims description 6
- TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 3
- IBHBKWKFFTZAHE-UHFFFAOYSA-N n-[4-[4-(n-naphthalen-1-ylanilino)phenyl]phenyl]-n-phenylnaphthalen-1-amine Chemical compound C1=CC=CC=C1N(C=1C2=CC=CC=C2C=CC=1)C1=CC=C(C=2C=CC(=CC=2)N(C=2C=CC=CC=2)C=2C3=CC=CC=C3C=CC=2)C=C1 IBHBKWKFFTZAHE-UHFFFAOYSA-N 0.000 claims description 3
- 238000004506 ultrasonic cleaning Methods 0.000 claims description 3
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 claims description 2
- VVOLVFOSOPJKED-UHFFFAOYSA-N copper phthalocyanine Chemical compound [Cu].N=1C2=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC(C3=CC=CC=C33)=NC3=NC=1C1=CC=CC=C12 VVOLVFOSOPJKED-UHFFFAOYSA-N 0.000 claims 1
- 239000010410 layer Substances 0.000 description 32
- 239000000463 material Substances 0.000 description 15
- 239000002904 solvent Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 230000005525 hole transport Effects 0.000 description 7
- 238000007740 vapor deposition Methods 0.000 description 7
- 239000003960 organic solvent Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000011368 organic material Substances 0.000 description 4
- -1 polycyclic aromatic compound Chemical class 0.000 description 4
- OBAJPWYDYFEBTF-UHFFFAOYSA-N 2-tert-butyl-9,10-dinaphthalen-2-ylanthracene Chemical compound C1=CC=CC2=CC(C3=C4C=CC=CC4=C(C=4C=C5C=CC=CC5=CC=4)C4=CC=C(C=C43)C(C)(C)C)=CC=C21 OBAJPWYDYFEBTF-UHFFFAOYSA-N 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 239000003086 colorant Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000002356 single layer Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000005019 vapor deposition process Methods 0.000 description 3
- MBPCKEZNJVJYTC-UHFFFAOYSA-N 4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC(N)=CC=C1C1=CC=C(N(C=2C=CC=CC=2)C=2C=CC=CC=2)C=C1 MBPCKEZNJVJYTC-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000990 Ni alloy Inorganic materials 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 150000004696 coordination complex Chemical class 0.000 description 2
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000003495 polar organic solvent Substances 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- VDFVNEFVBPFDSB-UHFFFAOYSA-N 1,3-dioxane Chemical compound C1COCOC1 VDFVNEFVBPFDSB-UHFFFAOYSA-N 0.000 description 1
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- 229910000846 In alloy Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- GQVWHWAWLPCBHB-UHFFFAOYSA-L beryllium;benzo[h]quinolin-10-olate Chemical compound [Be+2].C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21.C1=CC=NC2=C3C([O-])=CC=CC3=CC=C21 GQVWHWAWLPCBHB-UHFFFAOYSA-L 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- VBVAVBCYMYWNOU-UHFFFAOYSA-N coumarin 6 Chemical compound C1=CC=C2SC(C3=CC4=CC=C(C=C4OC3=O)N(CC)CC)=NC2=C1 VBVAVBCYMYWNOU-UHFFFAOYSA-N 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000012487 rinsing solution Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Description
本発明は洗浄液組成物に関するものであって、特に低分子型有機ＥＬ素子製造の真空蒸着工程において発生する、マスクに付着する有機ＥＬ物質を除去するための洗浄液組成物および洗浄方法に関する。 The present invention relates to a cleaning liquid composition, and more particularly to a cleaning liquid composition and a cleaning method for removing an organic EL substance adhering to a mask, which is generated in a vacuum vapor deposition process of manufacturing a low molecular organic EL element.
フラットパネルディスプレーは、これからの表示装置として注目されているが、その中でも液晶表示装置や有機ＥＬ素子を備えた表示装置が優れている。液晶表示装置は低消費電力の反面、明るい画面を得るためには外部照明（バックライト）を必要とするのに対して、有機ＥＬ素子を備えた表示装置は、有機ＥＬ素子が自己発光型の素子であることから、液晶表示装置のようなバックライトを必要としないため省電力であるという特徴を有しているとともに、さらに高輝度、広視野角という特徴も併せて有している。
有機ＥＬ素子はその有機材料の種類により低分子型有機ＥＬ素子と高分子型有機ＥＬ素子の二つのタイプがあり、素子製造プロセスが異なる。前者は蒸着法により成膜され、後者は溶剤に溶解し回転塗布法やインクジェット法により成膜される。
低分子型有機ＥＬ素子は、ガラス基板上に、例えば（１）陽極、（２）正孔注入層、（３）正孔輸送層、（４）発光層、（５）電子輸送層、（６）陰極の順に層状の構造物をマスクを使用して真空蒸着により形成する。
マスクは、０．１ｍｍ程度の厚さの、ＳＵＳ等の金属をエッチング等により加工して製造したメタルマスクが一般に用いられているが、より精度が高い加工が可能なマスクとして、面方位が（１００）や（１１０）である単結晶シリコンを異方性エッチングにより加工して製造したマスクが提案されている（特許文献１〜３）。
Flat panel displays are attracting attention as future display devices. Among them, liquid crystal display devices and display devices including organic EL elements are excellent. While a liquid crystal display device has low power consumption, it requires external illumination (backlight) to obtain a bright screen, whereas a display device having an organic EL element has a self-luminous type. Since it is an element, it does not require a backlight like a liquid crystal display device, and thus has a feature of power saving, and also has features of high brightness and a wide viewing angle.
There are two types of organic EL elements, low molecular organic EL elements and polymer organic EL elements, depending on the type of organic material, and the element manufacturing process is different. The former is formed by vapor deposition, and the latter is dissolved in a solvent and formed by spin coating or ink jet.
The low molecular weight organic EL device has, for example, (1) an anode, (2) a hole injection layer, (3) a hole transport layer, (4) a light emitting layer, (5) an electron transport layer, (6 ) A layered structure in the order of the cathode is formed by vacuum deposition using a mask.
As a mask, a metal mask manufactured by processing a metal such as SUS by etching or the like with a thickness of about 0.1 mm is generally used. However, as a mask capable of processing with higher accuracy, a plane orientation is ( Masks manufactured by processing single crystal silicon (100) and (110) by anisotropic etching have been proposed (Patent Documents 1 to 3).
低分子型有機ＥＬ素子の構造の１例としては、（１）陽極は、例えば酸化インジウム錫（ＩＴＯ）、（２）正孔注入層は、銅（ＩＩ）フタロシアニン（ＣｕＰｃ）の単一層、（３）正孔輸送層は、Ｎ，Ｎ′−ジ（ナフタレン−１−イル）−Ｎ，Ｎ′−ジフェニル−ベンジジン（ＮＰＢ）の単一層、（４）発光層は、トリス（８−キノリノラト）アルミニウム（Ａｌｑ３）にクマリン−６を２％添加した層、（４）電子輸送層は、Ａｌｑ３の単一層、（５）陰極は、Ｍｇ／Ｉｎ合金の層からなる多層構造が開示されている（特許文献４）。
上記の例では正孔注入層としてＣｕＰｃが使用されているが、正孔注入層を特に設けない場合もある。正孔輸送層には通常ＮＰＢが用いられている。
発光層はキレート金属錯体や縮合多環芳香族化合物をホストとして、各種のドーパントをドープして得ている。青色の発光には縮合多環芳香族化合物である２−ｔｅｒｔ−ブチル−９、１０−ジ（ナフタレン−２−イル）アントラセン（ＴＢＡＤＮ）等が用いられ、赤色、緑色の発光には、キレート金属錯体である、Ａｌｑ３やビス（ベンゾキノリナト）ベリリウム錯体（ＢｅＢｑ２）等が用いられる。
発光層にＴＢＡＤＮが用いられる場合は、一般に電子輸送層（例えばＡｌｑ３）が用いられるが、発光層がＡｌｑ３等のキレート金属錯体である場合には電子輸送層は省略されることがある（特許文献５）。
As an example of the structure of the low molecular organic EL element, (1) the anode is, for example, indium tin oxide (ITO), (2) the hole injection layer is a single layer of copper (II) phthalocyanine (CuPc), ( 3) The hole transport layer is a single layer of N, N′-di (naphthalen-1-yl) -N, N′-diphenyl-benzidine (NPB), and (4) the light-emitting layer is tris (8-quinolinolato). A layer in which 2% of coumarin-6 is added to aluminum (Alq3), (4) the electron transport layer is a single layer of Alq3, and (5) the cathode is a multilayer structure composed of a layer of Mg / In alloy ( Patent Document 4).
In the above example, CuPc is used as the hole injection layer, but the hole injection layer is not particularly provided. NPB is usually used for the hole transport layer.
The light emitting layer is obtained by doping various dopants using a chelate metal complex or a condensed polycyclic aromatic compound as a host. 2-tert-butyl-9, 10-di (naphthalen-2-yl) anthracene (TBADN), which is a condensed polycyclic aromatic compound, is used for blue light emission, and chelate metal for red and green light emission. Complexes such as Alq3 and bis (benzoquinolinato) beryllium complex (BeBq2) are used.
When TBADN is used for the light emitting layer, an electron transport layer (for example, Alq3) is generally used. However, when the light emitting layer is a chelate metal complex such as Alq3, the electron transport layer may be omitted (patent document). 5).
これらの層のパターン形成は、基板にマスクを近づけ、マスクを介して、陰極、正孔注入層、正孔輸送層、発光層、電子輸送層、陽極を真空蒸着により形成することが必要であるが、特にＲＧＢ層の微細なパターニングのための蒸着用マスクは高精細であるため製造するのが困難で、さらに非常に高価である。しかし、低分子型有機ＥＬ素子における有機層のパターン形成においては、同じマスクを数回用いて蒸着すると、マスク上に有機材料が堆積して付着するので、高精細なマスクのパターンを基板に正確に転写できなくなってしまう。したがって、高精細なマスクパターンを実現するためには、数回用いた高価なマスクを廃棄せざるを得ず、生産コストの面から量産を難しくしている一因となっている。なお開発段階にある有機ＥＬ分野において、マスクを反復使用することによりコストを下げようとする試みや検討は現段階においてなされていない。 For pattern formation of these layers, it is necessary to form a cathode, a hole injection layer, a hole transport layer, a light-emitting layer, an electron transport layer, and an anode by vacuum deposition through a mask close to a substrate. However, an evaporation mask for fine patterning of the RGB layer in particular is difficult to manufacture because of its high definition, and is very expensive. However, in the pattern formation of the organic layer in the low molecular organic EL element, if the same mask is used for vapor deposition several times, the organic material is deposited and adhered on the mask. It becomes impossible to transfer to. Therefore, in order to realize a high-definition mask pattern, an expensive mask that has been used several times must be discarded, which is one of the reasons that makes mass production difficult in terms of production cost. In the organic EL field in the development stage, no attempt or examination for reducing the cost by repeatedly using the mask has been made at this stage.
前記の現状を踏まえて、本発明者らは、低分子型有機ＥＬ素子製造に際し用いられるマスクを、できるだけ回数多く反復使用するという新しい発想のもと、効率のよいマスク用洗浄液を開発することに着目した。即ち、本発明が解決しようとする課題は、低分子型有機ＥＬ素子製造の真空蒸着工程においてマスクに付着する種々の有機材料を、効率よく除去することができる洗浄液組成物および洗浄方法を提供するという全く新しい発想に基づくものである。 Based on the above-mentioned present situation, the present inventors have developed an efficient mask cleaning solution based on a new idea of repeatedly using a mask used in manufacturing a low-molecular-type organic EL element as many times as possible. Pay attention. That is, the problem to be solved by the present invention is to provide a cleaning liquid composition and a cleaning method capable of efficiently removing various organic materials adhering to a mask in a vacuum vapor deposition step of manufacturing a low molecular weight organic EL element. This is based on a completely new idea.
本発明者らは、上記課題を解決すべく鋭意研究を重ねる中で、１種類または２種類以上の非プロトン性極性溶剤を含む洗浄液組成物が、低分子型有機ＥＬ素子製造の真空蒸着工程においてマスクに付着する種々の有機材料に対して、優れた洗浄力を有することを見い出し、さらに研究を進めた結果、本発明を完成するに至った。 In the vacuum deposition process of manufacturing a low molecular organic EL device, the inventors of the present invention have made extensive studies to solve the above-described problems. As a result of finding further excellent detergency for various organic materials adhering to the mask and further researching, the present invention has been completed.
すなわち、本発明は、低分子型有機ＥＬ素子製造の真空蒸着工程において使用するマスクの洗浄液組成物であって、非プロトン性極性溶剤を１種類または２種類以上含む洗浄液組成物に関する。
また、本発明は、低分子型有機ＥＬ素子構造が、Ｎ，Ｎ′−ジ（ナフタレン−１−イル）−Ｎ，Ｎ′−ジフェニル−ベンジジンおよび銅（ＩＩ）フタロシアニンおよびトリス（８−キノリノラト）アルミニウムを含む、前記洗浄液組成物に関する。
さらに、本発明は、非プロトン性極性溶剤が、Ｎ，Ｎ−ジメチルホルムアミド、Ｎ−メチル−２−ピロリジノン、エチレングリコールジメチルエーテル、ジエチレングリコールジメチルエーテル、１、４−ジオキサンまたはシクロヘキサノンである、前記洗浄液組成物に関する。
また、本発明は、非プロトン性極性溶剤が、Ｎ−メチル−２−ピロリジノンまたはシクロヘキサノンである、前記洗浄液組成物に関する。
さらに、本発明は、洗浄液組成物に含まれる非プロトン性極性溶剤が１種類である、前記洗浄液組成物に関する。
また、本発明は、低分子型有機ＥＬ素子製造の真空蒸着工程において使用するマスクの洗浄方法であって、前記洗浄液組成物を用いて、浸漬またはジェット水流により洗浄する、前記洗浄方法に関する。
さらに、本発明は、超音波洗浄を併用する、前記洗浄方法に関する。
また、本発明は、室温で洗浄する、前記洗浄方法に関する。
さらに、本発明は、マスクを洗浄後、ハイドロフルオロエーテルによってリンスする、前記洗浄方法に関する。
That is, the present invention relates to a cleaning liquid composition for a mask used in a vacuum vapor deposition process for producing a low molecular weight organic EL element, and relates to a cleaning liquid composition containing one or more aprotic polar solvents.
Further, according to the present invention, the low molecular organic EL device structure has N, N′-di (naphthalen-1-yl) -N, N′-diphenyl-benzidine, copper (II) phthalocyanine and tris (8-quinolinolato). The present invention relates to the cleaning liquid composition containing aluminum.
Furthermore, the present invention relates to the cleaning liquid composition, wherein the aprotic polar solvent is N, N-dimethylformamide, N-methyl-2-pyrrolidinone, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, 1,4-dioxane or cyclohexanone. .
The present invention also relates to the cleaning liquid composition, wherein the aprotic polar solvent is N-methyl-2-pyrrolidinone or cyclohexanone.
Furthermore, this invention relates to the said cleaning liquid composition whose aprotic polar solvent contained in a cleaning liquid composition is 1 type.
The present invention also relates to a method for cleaning a mask used in a vacuum vapor deposition step for manufacturing a low molecular weight organic EL device, wherein the cleaning method is performed by immersion or jet water flow.
Furthermore, the present invention relates to the cleaning method using ultrasonic cleaning together.
The present invention also relates to the cleaning method, wherein the cleaning is performed at room temperature.
Furthermore, the present invention relates to the cleaning method, wherein the mask is rinsed with hydrofluoroether after being cleaned.
本発明の洗浄液組成物は、各種のマスク表面に付着した１種類または２種類以上の低分子型有機ＥＬ材料を、１種類の洗浄液で除去することができるために、マスクの再使用が可能となる。このことは、高精細なマスクパターンが求められる当該分野においては、マスクの作成やマスクを廃棄する際の費用が大幅に削減されるという、全く予測できない実用上の効果をもたらすものである。しかも、本発明の洗浄液組成物は、１種類の洗浄液で１種類または２種類以上の低分子型有機ＥＬ材料を洗浄できるので、洗浄液の種類の異なった洗浄槽を必要としない結果、洗浄プロセスが非常に簡便になる効果をもたらす。そして洗浄液組成物に含まれる非プロトン性有機溶剤が１種類である場合には、蒸留して得られた溶剤の組成を調整することなく、そのまま本発明の洗浄液組成物として再使用することができる。
また、本発明の洗浄液組成物は、室温で洗浄することができるために、マスクの材料が特に金属材料、例えばＳＵＳ、ニッケル（Ｎｉ）単体、鉄（Ｆｅ）などとＮｉの合金（例えば、Ｆｅ−Ｎｉ合金）などである場合であっても、マスクパターンの伸縮や歪みが生じず、反復使用の際においても基板にパターンを正確に転写することができる。
さらに、本発明の洗浄液組成物を用いてマスクを洗浄した後、乾燥速度が速いハイドロフルオロエーテルを用いてリンスを行うが、本発明の洗浄液組成物は、ハイドロフルオロエーテルに対して良好な溶解性を有するため、容易にリンスされる。
Since the cleaning liquid composition of the present invention can remove one or more kinds of low molecular organic EL materials adhering to various mask surfaces with one type of cleaning liquid, the mask can be reused. Become. In the field where a high-definition mask pattern is required, this brings about an unpredictable practical effect that the cost for creating and discarding the mask is greatly reduced. Moreover, since the cleaning liquid composition of the present invention can clean one type or two or more types of low-molecular-weight organic EL materials with one type of cleaning liquid, the cleaning process does not require different types of cleaning liquids. The effect is very simple. And when there is one kind of aprotic organic solvent contained in the cleaning liquid composition, it can be reused as it is as the cleaning liquid composition of the present invention without adjusting the composition of the solvent obtained by distillation. .
In addition, since the cleaning liquid composition of the present invention can be cleaned at room temperature, the mask material is particularly a metal material such as SUS, nickel (Ni) alone, iron (Fe), and an alloy of Ni (for example, Fe -Ni alloy) or the like, the mask pattern does not expand or contract, and the pattern can be accurately transferred to the substrate even during repeated use.
Further, after cleaning the mask using the cleaning liquid composition of the present invention, rinsing is performed using hydrofluoroether having a high drying rate. The cleaning liquid composition of the present invention has good solubility in hydrofluoroether. It is easily rinsed.
本発明の洗浄液組成物に用いられる、非プロトン性極性有機溶剤は、例えば、Ｎ−メチル−２−ピロリジノン、Ｎ，Ｎ-ジメチルホルムアミドなどのアミド系溶剤や、シクロヘキサノン、シクロペンタノンのような環状ケトン、1，３−ジオキサン、ジエチレングリコールジメチルエーテル、エチレングリコールジメチルエーテルのようなエーテル系溶剤が挙げられ、これらのうち、Ｎ−メチル−２−ピロリジノンまたはシクロヘキサノンが特に好ましい。
さらに、当該非プロトン性極性有機溶剤はこれらの１種類を用いることができるだけではなく、これらの有機溶剤の２種類以上を組み合わせた洗浄液組成物も、洗浄能力に優れるので好ましい。
また、使用済みの洗浄液組成物を蒸留して再使用する場合、複数の有機溶剤からなる洗浄液組成物であっても、蒸留して回収した液の組成を調整することにより再使用することが可能である。
Examples of the aprotic polar organic solvent used in the cleaning liquid composition of the present invention include amide solvents such as N-methyl-2-pyrrolidinone and N, N-dimethylformamide, and cyclic solvents such as cyclohexanone and cyclopentanone. Examples include ether solvents such as ketone, 1,3-dioxane, diethylene glycol dimethyl ether, and ethylene glycol dimethyl ether, and among these, N-methyl-2-pyrrolidinone or cyclohexanone is particularly preferable.
Furthermore, not only one of these aprotic polar organic solvents can be used, but also a cleaning liquid composition combining two or more of these organic solvents is preferable because of its excellent cleaning ability.
In addition, when a used cleaning liquid composition is distilled and reused, even a cleaning liquid composition composed of a plurality of organic solvents can be reused by adjusting the composition of the liquid recovered by distillation. It is.
さらに、本発明の洗浄液組成物は、低分子型有機ＥＬ素子製造の真空蒸着工程に使用するマスクを浸漬またはジェット水流による洗浄方法により室温で洗浄することができる。このため、洗浄時に高温度にする必要がないので、マスクが洗浄の際に歪むことを防ぐことができる。ここで、室温とは１０〜４０℃であり、好ましくは２０〜３０℃であり、さらに好ましくは約２５℃である。
また、本発明の洗浄液組成物は、マスク洗浄の際に超音波洗浄を併用することにより、溶解能が向上し、洗浄時間を短縮することができる。
さらに、本発明の洗浄液組成物は、乾燥速度が速い各種のリンス液を使用してリンスを行うことができ、例えば、乾燥速度の速いリンス液として知られているハイドロフルオロエーテルは、リンス液として特に好ましい。
Furthermore, the cleaning liquid composition of the present invention can be cleaned at room temperature by a cleaning method using immersion or jet water flow for a mask used in a vacuum vapor deposition process for producing a low molecular weight organic EL device. For this reason, since it is not necessary to make high temperature at the time of washing | cleaning, it can prevent that a mask is distorted at the time of washing | cleaning. Here, room temperature is 10 to 40 ° C, preferably 20 to 30 ° C, and more preferably about 25 ° C.
Moreover, the cleaning liquid composition of the present invention can improve the dissolving ability and shorten the cleaning time by using ultrasonic cleaning in combination with the mask cleaning.
Furthermore, the cleaning liquid composition of the present invention can be rinsed using various rinsing liquids having a high drying rate. For example, a hydrofluoroether known as a rinsing liquid having a high drying rate can be used as a rinsing liquid. Particularly preferred.
以下に、ＥＬ表示装置の製造方法について説明する。ガラス基板上にＴＦＴおよび透明電極を形成し、さらに、ホール輸送層を形成したガラス基板を鉛直下方にして、真空チャンバ内へ挿入する。同チャンバ内には、図１に示す態様にて、予め発光層の形状に合わせて開口されたマスク２０が配置されている。詳しくは、このマスク２０は、保持台２４上に配置されたマスクフレーム２１によって固定されている。
この工程は、カラー表示装置としての各原色Ｒ、Ｇ、Ｂに対応して各別に行われる。すなわち、ホール輸送層の形成されたガラス基板１は、上記各原色Ｒ、Ｇ、Ｂに対応する発光層を形成するための各別の真空チャンバへと順々に挿入される。そして、これら各真空チャンバには、上記マスク２０として、上記透明電極（陽極）のうち、所定の原色の発光に用いられる透明電極（陽極）に対応した部分のみが開口されたマスクが備えられている。すなわち、各真空チャンバ内には、Ｒ、Ｇ、Ｂのいずれかの色に対応したマスクが備えられている。これにより、各チャンバにおいて、各原色に対応した発光層をそれぞれ所定の位置に形成することができる。
Hereinafter, a method for manufacturing the EL display device will be described. The TFT and the transparent electrode are formed on the glass substrate, and the glass substrate on which the hole transport layer is formed is vertically lowered and inserted into the vacuum chamber. In the chamber, a
This step is performed separately for each of the primary colors R, G, and B as a color display device. That is, the glass substrate 1 on which the hole transport layer is formed is sequentially inserted into separate vacuum chambers for forming the light emitting layers corresponding to the primary colors R, G, and B. Each of these vacuum chambers is provided with a mask in which only a portion corresponding to the transparent electrode (anode) used for light emission of a predetermined primary color is opened as the
先の図１において、保持台２４の下方に配置された蒸着源（ソース）３０から、発光層の材料を加熱して蒸発させることで、上記マスクの開口部を介してガラス基板１表面に同材料を蒸着させる。
このマスク２０を介した発光層の形成態様を、図２に模式的に示す。図２に示すように、各透明電極（陽極）のうち、各チャンバ内で該当する原色に対応した透明電極の形成領域以外がマスク２０で覆われる。そして、該当する原色に対応したＥＬ材料（有機ＥＬ材料）は、ソース３０内で加熱され、気化されてマスク２０の開口部２０ｈを介してガラス基板１（正確にはそのホール輸送層）上に蒸着形成される。
なお、マスクの材質としては、ＳＵＳ、Ｎｉ単体、ＦｅなどとＮｉの合金（例えばＦｅ−Ｎｉ合金）、またはシリコン等の半導体などが挙げられる。
In FIG. 1 above, the material of the light emitting layer is heated and evaporated from a vapor deposition source (source) 30 disposed below the holding table 24, so that the same material as the surface of the glass substrate 1 is formed through the opening of the mask. Deposit material.
The formation mode of the light emitting layer through the
Examples of the material for the mask include SUS, Ni alone, Fe alloy and Ni alloy (for example, Fe-Ni alloy), and semiconductor such as silicon.
以下に本発明の実施例と比較例とを共に示し、本発明を詳細に説明するが、本発明はこれら実施例に限定されるものではない。なお、当該技術分野における洗浄液として公知のものは従来存在していないところ、参考例で用いられる有機溶媒も、有機ＥＬ材料の洗浄用としては新規な溶媒であるが、これらは、他分野の有機化合物を除去するために用いられる一般的な溶媒であり、参考のために実験したものである。 Examples of the present invention and comparative examples are shown below, and the present invention will be described in detail. However, the present invention is not limited to these examples. Although there are no known cleaning liquids in the technical field, the organic solvents used in the reference examples are also novel solvents for cleaning organic EL materials, but these are organic solvents in other fields. It is a common solvent used to remove compounds and is experimental for reference.
低分子型有機ＥＬ材料洗浄試験１：洗浄性、リンス性
表１に示す、５種類の低分子型有機ＥＬ材料について、洗浄性（除去時間）及びリンス性を調べた。洗浄性については各材料を蒸着した金属片を室温（２５℃）で洗浄液に浸漬することにより、また、リンス性については、洗浄後のリンス液として住友スリーエムのノべックＨＦＥ７１００（ハイドロフルオロエーテル）を用い、室温（２５℃）で、リンス液を満たした二つの槽に1分間ずつ浸漬する「２槽処理」により調べた。その結果を表２に示す。
さらに、洗浄性については、浸漬法による洗浄に超音波を併用した場合についても調べた。それらの結果を比較例とともに、表３に示す。
Low molecular organic EL material cleaning test 1: Detergency and rinsing properties The five low molecular organic EL materials shown in Table 1 were examined for cleaning properties (removal time) and rinsing properties. For cleaning properties, the metal pieces deposited with each material were immersed in a cleaning solution at room temperature (25 ° C.). For rinsing properties, Sumitomo 3M Novec HFE7100 (hydrofluoroether) was used as the rinsing solution after cleaning. ) And at room temperature (25 ° C.), it was examined by “two-tank treatment” in which each bath was immersed in two baths filled with the rinse solution for 1 minute. The results are shown in Table 2.
Furthermore, the cleaning property was also examined when ultrasonic waves were used in combination with the cleaning by the dipping method. The results are shown in Table 3 together with comparative examples.
表２、表３に示すように、比較例に挙げた溶剤は、浸漬による洗浄方法によっても、超音波を併用する洗浄方法においても、１種類の溶剤で、室温（２５℃）で、Ａ〜Ｅの、全ての種類の低分子型有機ＥＬ材料を除去することは出来なかった。
これに対して実施例の溶剤は、１種類の有機溶剤により、浸漬による洗浄方法を用いて、室温（２５℃）で、Ａ〜Ｅの、全ての種類の低分子型有機ＥＬ材料を除去することができた。
また、浸漬による洗浄方法に超音波を併用することにより、室温（２５℃）における洗浄性はさらに高まった。
As shown in Tables 2 and 3, the solvents listed in the comparative examples are one kind of solvent at room temperature (25 ° C.), both in the cleaning method by immersion and in the cleaning method using ultrasonic waves. It was not possible to remove all kinds of low molecular organic EL materials of E.
On the other hand, the solvent of an Example removes all kinds of low molecular-type organic EL materials of AE at room temperature (25 degreeC) using the washing | cleaning method by immersion with one type of organic solvent. I was able to.
Moreover, the cleaning performance at room temperature (25 ° C.) was further enhanced by using ultrasonic waves in combination with the cleaning method by immersion.
１・・ガラス基板
１ａ・・アラインメントマーク
１１・・透明電極
２０・・マスク
２０ａ・・アラインメントマーク
２０ｈ・・開口部
２１・・マスクフレーム
２２・・ＣＣＤカメラ
２４・・保持台
３０・・ソース
1.
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