KR101237919B1 - recycling device of waste contaminated with hydrogen peroxide to sulfuric acid - Google Patents

recycling device of waste contaminated with hydrogen peroxide to sulfuric acid Download PDF

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KR101237919B1
KR101237919B1 KR1020120036808A KR20120036808A KR101237919B1 KR 101237919 B1 KR101237919 B1 KR 101237919B1 KR 1020120036808 A KR1020120036808 A KR 1020120036808A KR 20120036808 A KR20120036808 A KR 20120036808A KR 101237919 B1 KR101237919 B1 KR 101237919B1
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hydrogen peroxide
sulfuric acid
tank
decomposition
tower
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KR20130014014A (en
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소광민
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소광민
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B17/00—Sulfur; Compounds thereof
    • C01B17/69—Sulfur trioxide; Sulfuric acid
    • C01B17/90—Separation; Purification
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/06—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds in tube reactors; the solid particles being arranged in tubes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B17/00—Sulfur; Compounds thereof
    • C01B17/69—Sulfur trioxide; Sulfuric acid
    • C01B17/74—Preparation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/00548—Flow
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2208/00—Processes carried out in the presence of solid particles; Reactors therefor
    • B01J2208/00008—Controlling the process
    • B01J2208/0061—Controlling the level

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Removal Of Specific Substances (AREA)
  • Treating Waste Gases (AREA)

Abstract

본 발명은 과산화수소에 오염된 폐황산의 재활용 장치에 관한 것으로서, 종래에는 폐황산을 다시 과산화수소와 황산으로 분해시키는 장치가 없었기 때문에 폐황산을 폐기시킴으로써 자원을 낭비하게 되며, 환경을 오염시키는 문제점이 있었다.
따라서 본 발명은 과산화수소에 오염된 폐황산을 재사용할 수 있도록 과산화수소와 분리시키는 장치에 있어서, 상부 일측에 폐황산 공급관(170)과 제2순환관(110)이 설치되는 상부 분해조(120)가 구비되고, 상부 분해조(120) 하부에는 바닥의 제1다공망판(130) 위에 놓인 과산화수소 분해제(140)가 상부 분해조(120)까지 상승될 수 있도록 내부가 서로 통하는 하부 분해조(150)가 구비되며, 하부 분해조(150) 아래쪽에는 제1순환관(160)이 설치되고 측벽에는 과산화수소 분해제(140)보다 높은 위치에 제1펌프(180)가 설치된 배출관(190)이 구비되며, 상부 분해조(120)의 직경이 하부 분해조(150)의 직경보다 크게 형성되는 과산화수소 분해탑(100);과 가스입자를 분산시켜 물과의 접촉면적을 넓혀주는 충진재(230)가 제2다공망판(240) 위에 일정 높이 채워지고, 충진재(230) 위로 물을 분사시키는 살수봉(250)이 설치된 가스 흡수조(260)(270)를 복층으로 구비하되, 하측 가스 흡수조(270) 아래에는 물이 채워지는 하단부 수조(280)와의 사이에 과산화수소 분해탑(100)의 가스배출관(220)을 연결하고, 하단부 수조(280) 일측에는 살수봉(250)으로 물을 공급하도록 제2펌프(210)가 구비된 급수관(215)을 설치하며, 상측 가스흡수조(260) 상부에 환기관(290)이 형성된 가스 흡수탑(200);과 일측에 과산화수소 분해조(100)의 제1순환관(160)이 연결되고, 하부에는 제3펌프(350)가 설치된 제2순환관(110)이 과산화수소 분해탑(100)의 상부 분해조(120) 상단과 연결되어 폐황산을 순환시키는 보조탱크(300);와 제1펌프(180)가 설치된 황산 배출관(190)이 일측에 연결되어 과산화수소 분해탑(100)으로부터 생산된 황산을 저장하는 황산 저장조(400);로 이루어진 것을 특징으로 하는 것이다.The present invention relates to an apparatus for recycling waste sulfuric acid contaminated with hydrogen peroxide. In the past, since there is no device for decomposing waste sulfuric acid back into hydrogen peroxide and sulfuric acid, waste of sulfuric acid is wasted to waste resources and contaminate the environment. .
Therefore, the present invention, in the device for separating the hydrogen peroxide to reuse the waste sulfuric acid contaminated with hydrogen peroxide, the upper decomposition tank 120, the waste sulfuric acid supply pipe 170 and the second circulation pipe 110 is installed on one side It is provided, the lower decomposition tank 150 through which the inside communicates with each other so that the hydrogen peroxide decomposition agent 140 placed on the first porous mesh plate 130 of the bottom can be raised to the upper decomposition tank 120 under the upper decomposition tank 120 Is provided, the lower circulation tank 150, the first circulation pipe 160 is installed and the side wall is provided with a discharge pipe 190, the first pump 180 is installed at a position higher than the hydrogen peroxide decomposition agent 140, Hydrogen peroxide decomposition tower 100, the diameter of the upper digester 120 is formed larger than the diameter of the lower digester 150; and the filler 230 to expand the contact area with water by dispersing the gas particles and the second porous Filled to a certain height on the panel 240, water over the filler (230) Hydrogen peroxide decomposition tower 100 is provided with a gas absorbing tank 260, 270 is installed in a double layer, spraying water spraying rod 250 is sprayed between the lower water tank 280 is filled with water below the lower gas absorbing tank 270 ) Is connected to the gas discharge pipe 220, the lower end of the water tank 280 is installed on one side of the water supply pipe 215 with a second pump 210 to supply water to the sprinkling rod 250, the upper gas absorption tank ( 260, a gas absorption tower 200 having a ventilation pipe 290 formed thereon; and a first circulation pipe 160 of a hydrogen peroxide decomposition tank 100 connected to one side thereof, and a third pump 350 installed below. A circulation tank 110 is connected to the top of the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100, the auxiliary tank 300 for circulating waste sulfuric acid; and the sulfuric acid discharge pipe 190 is installed with the first pump 180 one side Characterized in that consisting of; sulfuric acid storage tank 400 for storing sulfuric acid produced from the hydrogen peroxide decomposition tower 100 is connected to will be.

Description

과산화수소에 오염된 폐황산의 재활용 장치{recycling device of waste contaminated with hydrogen peroxide to sulfuric acid}Recycling device of waste contaminated with hydrogen peroxide to sulfuric acid}

본 발명은 과산화수소에 오염된 폐황산의 재활용 장치에 관한 것으로서, 더욱 상세히는 반도체의 생산과정 중 세정과정에서 발생하는 과산화수소에 오염된 폐황산(이하 "폐황산"이라 칭함)을 과산화수소 분해제를 이용하여 과산화수소를 분해시키되, 분해제를 통해 과산화수소를 연속 분해시키는 공정을 반복하여 수행하며, 특히 과산화수소를 과산화수소 분해제에 의해 연속분해시키는 과산화수소 분해탑의 상부 분해조 직경을 하부 분해조의 직경보다 크게 형성함으로써, 과산화수소 잔류량을 제거하고 순도 높은 황산을 재활용할 수 있도록 한 과산화수소에 오염된 폐황산의 재활용 장치에 관한 것이다.
The present invention relates to a recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, and more particularly, waste sulfuric acid (hereinafter referred to as "waste sulfuric acid") contaminated with hydrogen peroxide generated during a cleaning process during semiconductor production using a hydrogen peroxide decomposition agent. By decomposing hydrogen peroxide, and continuously decomposing hydrogen peroxide through a decomposing agent, and in particular, by forming the diameter of the upper decomposition tank of the hydrogen peroxide decomposition tower that continuously decomposes hydrogen peroxide by the hydrogen peroxide decomposition agent larger than the diameter of the lower decomposition tank. The present invention relates to a recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, which removes residual hydrogen peroxide and enables high purity sulfuric acid to be recycled.

일반적으로 반도체의 생산과정은 크게 세정공정과 열처리공정, 불순물 도입공정 및 박막 형성공정, 리소그래피 공정과 평탄화 공정으로 나뉘는 것이다.In general, the semiconductor production process is divided into cleaning process, heat treatment process, impurity introduction process, thin film formation process, lithography process and planarization process.

이러한 생산공정 중 세정공정은 리소그래피(lithography)를 처음으로 하는 각 공정 사이에 반드시 행해야 하는 공정인 것이다.Among these production processes, the cleaning step is a step that must be performed between the first steps of lithography.

여기서 리소그래피는 집적 회로 제작 시 실리콘칩 표면에 만들고자 하는 패턴을 빛으로 촬영한 수지를 칩 표면에 고정한 후 화학 처리나 확산 처리하는 기술로, 이 기술의 핵심은 짧은 파장의 빛을 사용하여 정밀도를 높이는 것으로, 처음에는 가시광선, 자외선을 사용했으나 최근에는 전자 빔을 사용해 더 미세한 패턴을 만드는 것이다.Here, lithography is a technology that uses a short wavelength of light to improve precision by fixing a resin that photographs a pattern to be made on the surface of a silicon chip on the surface of the silicon chip, and then chemically treating or diffusing the lithography. At first, visible light and ultraviolet light were used, but recently, electron beams are used to make finer patterns.

즉, 이러한 세정공정은 표면 청정화를 위한 공정이며, 또한 열처리, 산화 등의 공정 전에 행하여지는 것으로, "후처리" 또는 "전처리" 라 불리기도 하는 것이다.That is, such a cleaning process is a process for surface cleaning and is performed before a process such as heat treatment or oxidation, and is also referred to as "post-treatment" or "pretreatment".

세정공정은 기술로서는 상당히 표준화하기 어려운 공정 중 하나로, 지금까지도 약액을 사용하는 WET처리가 중심으로, 미국의 RCA사에서 개발한 실리콘 세정법. 화학적방법인 RCA세정의 경우 유기물과 금속 불순물을 제거하게 되는 것이다. The cleaning process is one of the technologies that is difficult to standardize considerably, and the silicon cleaning method developed by RCA of the United States is mainly focused on WET treatment using chemical liquids. RCA cleaning, a chemical method, removes organic and metal impurities.

세정은 리소그래피를 처음으로 하는 각 공정 사이에서 반드시 행해야 하는 것으로, 표면 청정화를 위한 공정이다. 또한, 열처리, 산화 등의 공정 전에 행하여지는 것으로, “후처리" “전처리”라 불리기도 한다.The cleaning must be performed between the steps of performing lithography for the first time and is a step for surface cleaning. In addition, it is carried out before a process such as heat treatment, oxidation, etc., and is also called "post-treatment" or "pre-treatment".

이 공정은 지금까지도 약액을 사용하는 기술로서는 상당히 표준화 하기 어려운 공정 중 하나로, WET처리가 중심으로 RCA세정의 경우는 H₂SO⁴(황산), HCI, NH⁴OH, HF, H₂O₂(과산화수소)등의 약액 조합에 의해 처리되는 것이다.This process is still one of the most difficult processes to standardize with the technology using chemical liquids. In the case of WCA treatment, RCA cleaning is performed by combination of chemicals such as H₂SO⁴ (sulfuric acid), HCI, NH⁴OH, HF, and H₂O₂ (hydrogen peroxide). To be processed.

그리고, 세정 공정이 의한 제거 대상물은 유기물 잔사, 산화물 잔사, 금속오염, 파티클(먼지) 등이 되는 것이다.The object to be removed by the washing step is an organic residue, an oxide residue, metal contamination, particles (dust), or the like.

또한, 초음파 브러시(Blush) 등의 물리적 방법도 필요에 따라 추가될 수 있으며,“보이지 않는 오염”, 결정결함, 데미지(손상) 등의 제거도 세정의 구분에 포함하기도 한다.In addition, a physical method such as an ultrasonic brush may be added as needed, and the removal of “invisible contamination”, crystal defects, damage (damage), etc. may also be included in the cleaning.

하지만, 이와 같은 반도체 세정공정은 다음과 같은 문제점이 있었다.However, such a semiconductor cleaning process has the following problems.

즉, 세정공정 중 과산화수소에 오염된 폐황산이 발생하게 되는 문제점이 있었다.That is, there was a problem that waste sulfuric acid contaminated with hydrogen peroxide occurs during the cleaning process.

특히, 이렇게 발생한 폐황산은 폐기되어야 하는데, 폐황산을 폐기시키기 위해서는 많은 비용이 소요되며, 폐황산으로 인해 자연이 환경이 오염되는 문제점도 있었다.
In particular, the waste sulfuric acid thus generated has to be disposed of, and it takes a lot of money to dispose of the waste sulfuric acid.

따라서 본 발명의 목적은 높은 순도의 황산에 오염된 과산화수소를 분해시키고, 또한 이러한 순도 높은 황산을 재활용할 수 있도록 함으로써, 세정공정 중 폐황산이 발생하게 되는 문제점과, 이렇게 발생한 폐황산은 폐기되어야 하는데, 폐황산을 폐기시키기 위해서는 많은 비용이 소요되며, 폐황산으로 인해 자연이 환경이 오염되는 문제점을 효과적으로 해결할 수 있도록 한 과산화수소에 오염된 폐황산의 재활용 장치를 제공하는 데 있다.
Therefore, an object of the present invention is to decompose hydrogen peroxide contaminated with high-purity sulfuric acid, and also to recycle such high-purity sulfuric acid, and thus, waste sulfuric acid is generated during the cleaning process, and the waste sulfuric acid thus generated should be discarded. In order to effectively dispose of waste sulfuric acid, it is necessary to provide a recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, which can effectively solve the problem of environmental pollution caused by waste sulfuric acid.

이와 같은 본 발명은 과산화수소에 오염된 폐황산을 재사용할 수 있도록 과산화수소와 분리시키는 장치에 있어서, 상부 일측에 폐황산 공급관과 제2순환관이 설치되는 상부 분해조가 구비되고, 상부 분해조 하부에는 바닥의 제1다공망판 위에 놓인 과산화수소 분해제가 상부 분해조까지 상승될 수 있도록 내부가 서로 통하는 하부 분해조가 구비되며, 하부 분해조 아래쪽에는 제1순환관이 설치되고 측벽에는 과산화수소 분해제보다 높은 위치에 제1펌프가 설치된 배출관이 구비되며, 상부 분해조의 직경이 하부 분해조의 직경보다 크게 형성되는 과산화수소 분해탑;과 가스입자를 분산시켜 물과의 접촉면적을 넓혀주는 충진재가 제2다공망판 위에 일정 높이 채워지고, 충진재 위로 물을 분사시키는 살수봉이 설치된 가스 흡수조를 복층으로 구비하되, 하측 가스 흡수조 아래에는 물이 채워지는 하단부 수조와의 사이에 과산화수소 분해탑의 가스배출관을 연결하고, 하단부 수조 일측에는 살수봉으로 물을 공급하도록 제2펌프가 구비된 급수관을 설치하며, 상측 가스흡수조 상부에 환기관이 형성된 가스 흡수탑;과 일측에 과산화수소 분해탑의 제1순환관이 연결되고, 하부에는 제3펌프가 설치된 제2순환관이 과산화수소 분해탑의 상부 분해조 상단과 연결되어 폐황산을 순환시키는 보조탱크;와 제1펌프가 설치된 황산 배출관이 일측에 연결되어 과산화수소 분해탑으로부터 생산된 황산을 저장하는 황산 저장조;로 이루어진 것을 특징으로 한다.The present invention is a device for separating from the hydrogen peroxide to reuse the waste sulfuric acid contaminated with hydrogen peroxide, the upper digestion tank is provided with a waste sulfuric acid supply pipe and a second circulation pipe on one side, the bottom of the upper decomposition tank bottom The lower decomposition tank is provided with the inside of each other so that the hydrogen peroxide decomposer placed on the first perforated mesh of the upper surface to the upper decomposition tank, the first circulation pipe is installed below the lower decomposition tank, the side wall is located higher than the hydrogen peroxide decomposition agent One pump is provided with a discharge pipe is installed, the diameter of the upper decomposition tank is formed larger than the diameter of the lower decomposition tank hydrogen peroxide decomposition tower; and the filler to disperse the gas particles to expand the contact area with water is filled a certain height on the second porous network And a gas absorbing tank having a water spray rod for spraying water onto the filling material in double layers, Under the gas absorption tank, the gas discharge pipe of the hydrogen peroxide decomposition tower is connected between the lower tank filled with water, and one side of the lower tank is provided with a water supply pipe equipped with a second pump to supply water to the sprinkling rod. A gas absorption tower having a ventilation tube formed at an upper portion of the absorption tank; and a first circulation tube of a hydrogen peroxide decomposition tower connected to one side thereof, and a second circulation tube having a third pump installed at a lower portion thereof connected to an upper portion of the upper decomposition tank of the hydrogen peroxide decomposition tower closed. An auxiliary tank for circulating sulfuric acid; and a sulfuric acid storage tank connected to one side of the sulfuric acid discharge pipe in which the first pump is installed to store sulfuric acid produced from a hydrogen peroxide decomposition tower;

그리고, 과산화수소 분해탑과 황산 저장조 사이에 설치되는 황산 배출관의 제1펌프와 황산 저장조 사이에 필터가 구비되는 정화탱크를 설치하여, 과산화수소 분해제 가루 및 색조를 걸러주도록 형성하며, 과산화수소 분해탑의 상부 분해조와 하부 분해조에 제1펌프를 작동시키거나 정지시키는 제1레벨센서를 설치하고, 보조탱크에 제3펌프를 작동시키거나 정지시키는 제2레벨센서를 설치하여 과산화수소 분해탑과 보조탱크의 폐황산을 자동으로 순환시킬 수 있도록 형성하며, 과산화수소 분해탑과 가스 흡수탑을 연결하는 가스 배출관의 직경은 폐황산 공급관의 직경보다 크게 형성함으로써 본 발명의 목적을 달성할 수 있는 것이다.
In addition, a purification tank having a filter is installed between the first pump of the sulfuric acid discharge pipe installed between the hydrogen peroxide decomposition tower and the sulfuric acid storage tank and the sulfuric acid storage tank, so as to filter out hydrogen peroxide decomposer powder and color tone, and to form an upper portion of the hydrogen peroxide decomposition tower. Discharge tanks and lower tanks are equipped with a first level sensor that starts or stops the first pump, and a second level sensor that starts or stops the third pump in the auxiliary tank. It is formed to automatically circulate, and the diameter of the gas discharge pipe connecting the hydrogen peroxide decomposition tower and the gas absorption tower is larger than the diameter of the waste sulfuric acid supply pipe can achieve the object of the present invention.

이와 같은 본 발명은 반도체의 생산과정 중 세정과정에서 발생하는 과산화수소에 오염된 폐황산을 과산화수소 분해제를 이용하여 과산화수소와 황산으로 분리 분해시킴으로써, 황산을 재활용할 수 있는 효과가 있는 것이다.As such, the present invention separates and decomposes waste sulfuric acid contaminated with hydrogen peroxide generated during the cleaning process of the semiconductor into hydrogen peroxide and sulfuric acid using a hydrogen peroxide decomposing agent, thereby recycling sulfuric acid.

그리고, 과산화수소 분해제를 이용하여 폐황산의 과산화수소와 황산을 분리 분해시키는 공정을 반복하여 수행함으로써, 순수한 황산을 얻을 수 있는 효과가 있는 것이다.In addition, by repeatedly performing a process of separating and decomposing hydrogen peroxide and sulfuric acid of spent sulfuric acid using a hydrogen peroxide decomposition agent, there is an effect of obtaining pure sulfuric acid.

또한, 폐황산을 매립하거나 폐기하지 않고 재활용함으로써, 환경을 오염시키지 않는 효과도 있는 것이다.
In addition, by recycling waste sulfuric acid without embedding or discarding, there is an effect that does not pollute the environment.

도 1 은 본 발명에 따른 폐황산의 재활용 장치를 보여주는 전개도.
도 2 는 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑을 보여주는 요부확대도.
도 3 은 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑에서 과산화수소와 황산을 분해하는 과정을 보여주는 작동도.
도 4 는 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑에서 과산화수소와 황산을 분해 후 배출되는 과정을 보여주는 작동도.
도 5 는 본 발명에 따른 폐황산의 재활용 장치의 폴링을 보여주는 사시도.1 is an exploded view showing a recycling apparatus of waste sulfuric acid according to the present invention.
Figure 2 is an enlarged view of the main part showing a hydrogen peroxide decomposition tower of the waste sulfuric acid recycling apparatus according to the present invention.
Figure 3 is an operation showing the process of decomposing hydrogen peroxide and sulfuric acid in the hydrogen peroxide decomposition tower of the waste sulfuric acid recycling apparatus according to the present invention.
Figure 4 is an operation showing the process of discharging after decomposing hydrogen peroxide and sulfuric acid in the hydrogen peroxide decomposition tower of the waste sulfuric acid recycling apparatus according to the present invention.
5 is a perspective view showing polling of a recycling apparatus of waste sulfuric acid according to the present invention.

이하 본 발명의 특징을 효과적으로 달성할 수 있는 바람직한 실시 예로서 그 기술구성 및 작용효과를 첨부된 도면에 의하여 상세히 설명하면 다음과 같다.DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

즉, 도 1 은 본 발명에 따른 폐황산의 재활용 장치를 보여주는 전개도이고, 도 2 는 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑을 보여주는 요부확대도이며, 도 3 은 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑에서 과산화수소와 황산을 분해하는 과정을 보여주는 작동도, 도 4 는 본 발명에 따른 폐황산의 재활용 장치의 과산화수소 분해탑에서 과산화수소와 황산을 분해 후 배출되는 과정을 보여주는 작동도이고, 도 5 는 본 발명에 따른 폐황산의 재활용 장치의 폴링을 보여주는 사시도이다.That is, Figure 1 is an exploded view showing a waste sulfuric acid recycling apparatus according to the present invention, Figure 2 is an enlarged view of the main portion showing a hydrogen peroxide decomposition tower of the waste sulfuric acid recycling apparatus according to the present invention, Figure 3 is a waste according to the present invention 4 is an operation diagram illustrating a process of decomposing hydrogen peroxide and sulfuric acid in a hydrogen peroxide decomposition tower of a sulfuric acid recycling apparatus, Figure 4 is an operation showing a process of decomposing hydrogen peroxide and sulfuric acid in a hydrogen peroxide decomposition tower of a waste sulfuric acid recycling apparatus according to the present invention 5 is a perspective view showing polling of a recycling apparatus for waste sulfuric acid according to the present invention.

이와 같은 본 발명은 과산화수소에 오염된 폐황산을 재사용할 수 있도록 과산화수소와 분리시키는 장치에 있어서, 상부 일측에 폐황산 공급관(170)과 제2순환관(110)이 설치되는 상부 분해조(120)가 구비되고, 상부 분해조(120) 하부에는 바닥의 제1다공망판(130) 위에 놓인 과산화수소 분해제(140)가 상부 분해조(120)까지 상승될 수 있도록 내부가 서로 통하는 하부 분해조(150)가 구비되며, 하부 분해조(150) 아래쪽에는 제1순환관(160)이 설치되고 측벽에는 과산화수소 분해제(140)보다 높은 위치에 제1펌프(180)가 설치된 배출관(190)이 구비되며, 상부 분해조(120)의 직경이 하부 분해조(150)의 직경보다 크게 형성되는 과산화수소 분해탑(100);으로 이루어지는 것을 특징으로 하는 것이다. The present invention as described above in the device for separating the hydrogen peroxide so that the waste sulfuric acid contaminated with hydrogen peroxide, the waste sulfuric acid supply pipe 170 and the second circulation pipe 110 is installed on the upper side of the upper decomposition tank 120 Is provided, and the lower decomposition tank 150 through which the inside communicates with each other so that the hydrogen peroxide decomposition agent 140 placed on the first porous mesh plate 130 of the bottom can be raised to the upper decomposition tank 120 in the lower portion of the upper decomposition tank 120 ) Is provided, the first circulation pipe 160 is installed below the lower digester 150, and the discharge pipe 190 is provided on the side wall of the first pump 180 at a position higher than the hydrogen peroxide decomposition agent 140. It is characterized in that consisting of; hydrogen peroxide decomposition tower 100, the diameter of the upper decomposition tank 120 is formed larger than the diameter of the lower decomposition tank 150.

그리고, 가스입자를 분산시켜 물과의 접촉면적을 넓혀주는 충진재(230)가 제2다공망판(240) 위에 일정 높이 채워지고, 충진재(230) 위로 물을 분사시키는 살수봉(250)이 설치된 가스 흡수조(260)(270)를 복층으로 구비하되, 하측 가스 흡수조(270) 아래에는 물이 채워지는 하단부 수조(280)와의 사이에 과산화수소 분해탑(100)의 가스배출관(220)을 연결하고, 하단부 수조(280) 일측에는 살수봉(250)으로 물을 공급하도록 제2펌프(210)가 구비된 급수관(215)을 설치하며, 상측 가스흡하단부 수조(260) 상부에 환기관(290)이 형성된 가스 흡수탑(200);과 일측에 과산화수소 분해탑(100)의 제1순환관(160)이 연결되고, 하부에는 제3펌프(350)가 설치된 제2순환관(110)이 과산화수소 분해탑(100)의 상부 분해조(120) 상단과 연결되어 폐황산을 순환시키는 보조탱크(300);와 제1펌프(180)가 설치된 황산 배출관(190)이 일측에 연결되어 과산화수소 분해탑(100)으로부터 생산된 황산을 저장하는 황산 저장조(400);로 이루어진 것을 특징으로 하는 것이다.In addition, the filler 230 which expands the contact area with water by dispersing the gas particles is filled to a certain height on the second porous mesh plate 240, and the gas provided with a spraying rod 250 for spraying water onto the filler 230. The absorption tank 260, 270 is provided in a double layer, and the lower gas absorption tank 270 is connected to the gas discharge pipe 220 of the hydrogen peroxide decomposition tower 100 between the water tank 280 and the lower portion is filled with water and On one side of the lower water tank 280, a water supply pipe 215 having a second pump 210 is installed to supply water to the sprinkling rod 250, and a ventilation pipe 290 is provided on the upper gas absorption end water tank 260. The gas absorption tower 200 is formed; and the first circulation pipe 160 of the hydrogen peroxide decomposition tower 100 is connected to one side, and the second circulation pipe 110 in which the third pump 350 is installed at the lower portion is the hydrogen peroxide decomposition tower. Auxiliary tank 300 is connected to the top of the upper decomposition tank 120 of the (100) to circulate the waste sulfuric acid; and the first pump 180 is installed The sulfuric acid discharge pipe 190 is connected to one side sulfuric acid storage tank 400 for storing the sulfuric acid produced from the hydrogen peroxide decomposition tower 100; characterized in that consisting of.

특히, 과산화수소 분해탑(100)과 황산 저장조(400) 사이에 설치되는 황산 배출관(190)의 제1펌프(180)와 황산 저장조(400) 사이에 필터(550)가 구비되는 정화탱크(500)를 설치하여, 과산화수소 분해제(140) 가루 및 색조를 걸러주도록 형성하며, 과산화수소 분해탑(100)의 상부 분해조(120)와 하부 분해조(150)에 제1펌프(180)를 작동시키거나 정지시키는 제1레벨센서(185)를 설치하고, 보조탱크(300)에 제3펌프(350)를 작동시키거나 정지시키는 제2레벨센서(355)를 설치하여 과산화수소 분해탑(100)과 보조탱크(300)의 폐황산을 자동으로 순환시킬 수 있도록 한 것을 특징으로 하는 것이다.In particular, the purification tank 500 provided with a filter 550 between the first pump 180 and the sulfuric acid storage tank 400 of the sulfuric acid discharge pipe 190 installed between the hydrogen peroxide decomposition tower 100 and the sulfuric acid storage tank 400. By installing the, to form the peroxide decomposition agent 140 to filter the powder and color tone, to operate the first pump 180 to the upper decomposition tank 120 and the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100 or The hydrogen peroxide decomposition tower 100 and the auxiliary tank are installed by installing the first level sensor 185 to stop and installing the second level sensor 355 to operate or stop the third pump 350 in the auxiliary tank 300. It is characterized in that the waste sulfuric acid of (300) can be automatically circulated.

또한, 과산화수소 분해탑(100)과 가스 흡수탑(200)을 연결하는 가스 배출관(220)의 직경은 폐황산 공급관(170)의 직경보다 크게 형성된 것임을 특징으로 하는 것이다. In addition, the diameter of the gas discharge pipe 220 connecting the hydrogen peroxide decomposition tower 100 and the gas absorption tower 200 is characterized in that formed larger than the diameter of the waste sulfuric acid supply pipe (170).

그리고, 미설명 부호 (125), (155)는 각각 작업자가 과산화수소 분해탑 내부를 볼 수 있는 상부 투시창과 하부 투시창이다.In addition, reference numerals 125 and 155 are upper and lower viewing windows, respectively, through which the operator can see the hydrogen peroxide decomposition tower.

이와 같은 본 발명은 과산화수소에 오염된 폐황산의 재활용 장치에 관한 것이다.This invention relates to a recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide.

즉, 폐황산을 과산화수소와 황산으로 분리 분해하여 황산을 재활용하게 되는 것이다.In other words, waste sulfuric acid is separated and decomposed into hydrogen peroxide and sulfuric acid to recycle sulfuric acid.

우선 폐황산을 폐황산 공급관(170)을 통해 과산화수소 분해탑(100) 상부의 상부 분해조(120)로 공급하게 되는 것이다.First, the waste sulfuric acid is to be supplied to the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100 through the waste sulfuric acid supply pipe 170.

이렇게, 과산화수소 분해탑(100)의 상부 분해조(120)로 유입되는 폐황산은 상부 분해조(120)를 통해 과산화수소 분해탑(100) 하부의 하부 분해조(150)로 유입되면서 하부 분해조(150) 내부의 과산화수소 분해제(140)와 섞이게 되는 것이다.Thus, waste sulfuric acid introduced into the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100 is introduced into the lower decomposition tank 150 under the hydrogen peroxide decomposition tower 100 through the upper decomposition tank 120 while 150) will be mixed with the hydrogen peroxide decomposition agent 140 inside.

이때, 폐황산은 폐황산 공급관(170)을 통해 과산화수소 분해탑(100)의 하부 분해조(150)에서 과산화수소 분해제(140)와 섞인 후 과산화수소 분해탑(100)의 상부 분해조(120)에 일정높이만큼 채워질 때까지 공급되는 것이다.At this time, the waste sulfuric acid is mixed with the hydrogen peroxide decomposition agent 140 in the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100 through the waste sulfuric acid supply pipe 170 to the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100. It is supplied until it is filled up to a certain height.

폐황산과 과산화수소 분해제(140)가 섞여 과산화수소 분해탑(100) 내부에 일정높이만큼 채워지면, 과산화수소 분해탑(100)의 하부 분해조(150) 하부와 보조탱크(300) 사이에 연결되는 제1순환관(160)에 의해 폐황산이 보조탱크(300)로 유입되는 데, 이때 하부 분해조(150)와 제1순환관(160) 사이에는 제1다공망판(130)이 구비되어 있어서 과산화수소 분해제(140)가 제1순환관(160)으로 유입되는 것을 방지하게 되는 것이다.When the waste sulfuric acid and the hydrogen peroxide decomposition agent 140 are mixed and filled in the hydrogen peroxide decomposition tower 100 by a predetermined height, the agent is connected between the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100 and the auxiliary tank 300. Waste sulfuric acid is introduced into the auxiliary tank 300 by the first circulation pipe 160. At this time, the first perforated plate 130 is provided between the lower decomposition tank 150 and the first circulation pipe 160 to form hydrogen peroxide. The decomposition agent 140 will be prevented from flowing into the first circulation pipe 160.

즉, 과산화수소 분해탑(100)의 하부 분해조(150)에 구비되는 제1다공망판(130)은 과산화수소 분해제(140)인 활성탄이 통과되지 않는 크기의 구멍이 형성된 상하 다공판과, 상하 다공판 사이에 설치되는 100~150 메쉬의 미세한 필터망으로 형성되어 있어서, 과산화수소 분해제(140)가 제1순환관(160)으로 유입되지 않는 것이다.That is, the first porous network plate 130 provided in the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100 is a top and bottom porous plate formed with a hole of a size that does not pass the activated carbon, the hydrogen peroxide decomposition agent 140, and up and down Since it is formed of a fine filter network of 100 ~ 150 mesh installed between the stencil, the hydrogen peroxide decomposition agent 140 is not introduced into the first circulation pipe (160).

그리고, 과산화수소 분해탑(100)을 거쳐 보조탱크(300)로 유입되는 폐황산은 다시 제2순환관(110)을 통해 과산화수소 분해탑(100)의 상부 분해조(120)로 재유입되는 것이다.Then, the waste sulfuric acid introduced into the auxiliary tank 300 through the hydrogen peroxide decomposition tower 100 is re-introduced into the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100 through the second circulation pipe 110.

즉, 폐황산 공급관(170)을 통해 과산화수소 분해탑(100)으로 유입된 폐황산은 과산화수소 분해탑(100) 내부에서 과산화수소 분해제(140)과 섞인 후 보조탱크(300)로 보내지고, 보조탱크(300)에서 다시 과산화수소 분해탑(100)으로 유입되어 과산화수소 분해제(140)와 섞이는 과정을 반복하면서 과산화수소와 황산으로 분리되는 것이다.That is, the waste sulfuric acid introduced into the hydrogen peroxide decomposition tower 100 through the waste sulfuric acid supply pipe 170 is mixed with the hydrogen peroxide decomposition agent 140 in the hydrogen peroxide decomposition tower 100 and then sent to the auxiliary tank 300 and the auxiliary tank. Hydrogen peroxide is decomposed into the hydrogen peroxide decomposition tower 100 again at 300 and is separated into hydrogen peroxide and sulfuric acid while repeating the process of mixing with the hydrogen peroxide decomposition agent 140.

특히, 보조탱크(300)에는 보조탱크(300)와 제2순환관(110) 사이에 설치되는 제3펌프(350)를 작동시키거나 정지시키는 제2레벨센서(355)가 설치되어 있어서, 과산화수소 분해탑(100)으로부터 유입되는 폐황산이 보조탱크(300) 내부에서 일정높이만큼 채워지게 되면 자동으로 제2레벨센서(355)가 제3펌프(350)를 작동시켜 폐황산을 다시 과산화수소 분해탑(100)의 상부 분해조(120)로 유입시키게 되는 것이다.In particular, the auxiliary tank 300 is provided with a second level sensor 355 for operating or stopping the third pump 350 installed between the auxiliary tank 300 and the second circulation pipe 110, hydrogen peroxide When the waste sulfuric acid introduced from the decomposition tower 100 is filled to a certain height in the auxiliary tank 300, the second level sensor 355 automatically operates the third pump 350 to regenerate the waste sulfuric acid again. It will be introduced into the upper decomposition tank 120 of (100).

그리고, 보조탱크(300) 내부의 폐황산이 과산화수소 분해탑(100)으로 유입되어 보조탱크(300)의 내부의 수위가 설정된 수위까지 낮아지면 제2레벨센서(355)가 제3펌프(350)를 정지시켜 다시 보조탱크(300)를 폐황산으로 채우게 되는 것이다.Then, when the waste sulfuric acid in the auxiliary tank 300 flows into the hydrogen peroxide decomposition tower 100 and the water level inside the auxiliary tank 300 is lowered to the set level, the second level sensor 355 is connected to the third pump 350. By stopping the secondary tank 300 is to be filled with waste sulfuric acid again.

이러한 반복과정을 통해 작업자가 원하는 정도의 황산을 폐황산으로부터 얻게 되면, 과산화수소 분해탑(100)의 하부 분해조(150)에 설치되는 황산 배출관(190)을 통해 황산을 제품 저장조(400)로 보내게 되는 데, 이때 황산 배출관(190)은 하부 분해조(150)의 과산화수소 분해제(140)보다 높은 곳에 설치되어 있어서 황산 만을 배출시킬 수 있게 되는 것이다.When the worker obtains sulfuric acid from waste sulfuric acid through the iterative process, sulfuric acid is sent to the product storage tank 400 through the sulfuric acid discharge pipe 190 installed in the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100. At this time, the sulfuric acid discharge pipe 190 is installed at a position higher than the hydrogen peroxide decomposition agent 140 of the lower decomposition tank 150 to be able to discharge only sulfuric acid.

또한, 과산화수소 분해탑(100)의 하부 분해조(150)에는 하부 투시창(155)이 형성되어 있어서, 과산화수소 분해제(140)가 하부 분해조(150) 하부로 모두 가라앉은 후 황산을 황산 배출관(190)을 통해 배출시킬 수 있게 되며, 과산화수소 분해탑(100)의 상부에는 개폐 가능하도록 설치되는 상부 투시창(125)을 통해 작업자는 과산화수소 분해탑(100) 내부를 관찰할 수 있기 때문에, 과산화수소 분해탑(100) 내부를 작업자가 수시로 관찰함으로써 과산화수소 분해탑(100)의 오작동이나 과산화수소 분해 상태 등을 용이하게 확인할 수 있게 되는 것이다.In addition, the lower see-through window 155 is formed in the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100, so that the hydrogen peroxide decomposing agent 140 sinks to the lower portion of the lower decomposition tank 150, and then sulfuric acid discharge pipe ( 190, and the operator can observe the inside of the hydrogen peroxide decomposition tower 100 through the upper viewing window 125 is installed to open and close the upper portion of the hydrogen peroxide decomposition tower 100, the hydrogen peroxide decomposition tower When the operator observes the inside of the 100 at any time, the malfunction of the hydrogen peroxide decomposition tower 100 and the hydrogen peroxide decomposition state can be easily confirmed.

특히, 과산화수소 분해탑(100)의 상부 분해조(120)는 하부 분해조(150)보다 직경이 크게 형성되어 있어서, 평상시 하부 분해조(150)에 쌓여있던 과산화수소 분해제(140)가 폐황산이 과산화수소 분해탑(100)으로 유입됨에 따라 폐황산과 함께 상부 분해조(120)에서 과산화수소와 황산의 분해작용을 활발하게 수행하다가 황산과 과산화수소 분해과정이 끝나게 되면 폐황산과 관산화수소 분해제(140)가 섞여진 상태에서 빠른 시간 안에 용이하게 과산화수소 분해제(140)가 하부 분해조(150)로 가라앉아 황산을 황산 배출관(190)으로 배출시킬 수 있게 되는 것이다.In particular, the upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100 has a larger diameter than the lower decomposition tank 150, so that the hydrogen peroxide decomposition agent 140 accumulated in the lower decomposition tank 150 is waste sulfuric acid As the peroxide decomposition tower 100 is introduced into the spent sulfuric acid, the active decomposition of hydrogen peroxide and sulfuric acid in the upper digestion tank 120 together with the waste sulfuric acid is active, and when the sulfuric acid and hydrogen peroxide decomposition process is completed, the waste sulfuric acid and hydrogen peroxide decomposing agent (140). In the mixed state, the hydrogen peroxide decomposing agent 140 quickly sinks into the lower digestion tank 150 to quickly discharge sulfuric acid to the sulfuric acid discharge pipe 190.

그리고, 과산화수소 분해탑(100)의 상부 분해조(120)와 하부 분해조(150) 사이에는 제1레벨센서(185)가 구비되어 있어서, 제1펌프(180)를 작동시켜 황산을 제품 저장조(400)로 배출시키면 황산이 배출되어 설정된 수위로 수면이 낮아지면 이를 감지한 제1레벨센서(185)가 제1펌프(180)를 정지시키게 되는 것이다.In addition, a first level sensor 185 is provided between the upper digester 120 and the lower digester 150 of the hydrogen peroxide decomposition tower 100 to operate the first pump 180 to produce sulfuric acid. When discharged to 400, sulfuric acid is discharged, and when the water level is lowered to the set water level, the first level sensor 185 that detects this stops the first pump 180.

특히, 황산 배출관(190)과 제품 저장조(400) 사이에 필터(550)가 내부에 설치되는 정화탱크(500)를 구비하여, 황산에 섞여있는 미량의 과산화수소 분해제(140) 가루 및 색조를 걸러주게 되는 것이다.In particular, the filter tank 550 is provided between the sulfuric acid discharge pipe 190 and the product storage tank 400, the filter tank 500 is installed therein, to filter out a small amount of hydrogen peroxide decomposition agent 140 powder and color tone mixed with sulfuric acid Will be given.

그리고, 과산화수소 분해탑(100)에서 황산과 분해된 과산화수소는 가스 배출관(220)을 통해 가스 흡수탑(200)으로 유입되는 것이다.Hydrogen peroxide decomposed with sulfuric acid in the hydrogen peroxide decomposition tower 100 is introduced into the gas absorption tower 200 through the gas discharge pipe 220.

이렇게, 가스 흡수탑(200)의 하부로 유입되는 분해된 가스는 복수층으로 형성되는 제2다공판(240)을 차례로 거쳐 가스 흡수탑(200) 상부의 환기관(290)을 통해 외부로 배출되는 것이다.Thus, the decomposed gas flowing into the lower portion of the gas absorption tower 200 is discharged to the outside through the ventilation pipe 290 of the upper portion of the gas absorption tower 200 through the second porous plate 240 formed in a plurality of layers in sequence. will be.

이때, 분해된 가스가 제2다공판(240) 상부에는 외벽에 다수개의 구멍이 형성되고 내부에는 방사형의 격벽이 구비되는 폴링이 충진재(230)로 채워지며, 충진재(230) 상부에는 충진재(230) 위로 물을 분사시키는 살수봉(250)이 설치된 가스 흡수조(260)(270)를 순차적으로 통과하게 되는 것이다.At this time, the decomposed gas is filled with a filling material 230 in the upper portion of the second porous plate 240 is formed with a plurality of holes formed in the outer wall and a radial partition wall inside the filling material 230, the filling material 230 In order to sequentially pass through the gas absorbing tank 260, 270 is installed spraying water 250 to spray water.

그리고, 가스 흡수탑(200)의 하측 가스 흡수조(270) 하부에는 일정량의 물이 채워지는 하단부 수조(280)가 구비되고, 하단부 수조(280)의 일측에는 살수봉(250)으로 물을 공급하는 제2펌프(210)가 구비된 급수관(215)이 설치되어 있어서, 살수봉(250)을 통해 물을 분사시키면 분해된 가스가 가스 흡수조(260)(270)의 충진재(230)인 폴링을 지나면서 물과의 접촉면적이 확대되므로 물에 원활하게 용해되어 하단부 수조(280)로 물과 함께 저장되는 것이다.The lower gas absorption tank 270 of the gas absorption tower 200 is provided with a lower end tank 280 filled with a predetermined amount of water, and one side of the lower end tank 280 supplies water to the sprinkling rod 250. The water supply pipe 215 is provided with a second pump 210 to the water, spraying the water through the sprinkling rod 250 when the decomposed gas polling the filling material 230 of the gas absorption tank 260, 270 Since the contact area with the water is expanded as it passes through is smoothly dissolved in the water is to be stored with the water in the lower tank (280).

이렇게 분해된 가스가 물에 용해되어 하단부 수조(280)에 저장됨으로써, 가스 흡수탑(200) 상단의 환기관(290)을 통해서는 맑은 공기가 배출되는 것이다.The decomposed gas is dissolved in water and stored in the lower end water tank 280, so that clean air is discharged through the ventilation pipe 290 of the upper end of the gas absorption tower 200.

특히, 과산화수소 분해탑(100)과 가스 흡수탑(200)을 연결하는 가스 배출관(220)의 직경을 폐황산 공급관(170)의 직경보다 크게 형성하여, 폐황산 공급관(170)으로부터 폐황산을 과산화수소 분해탑(100)으로 공급시키는 속도보다 과산화수소 분해탑(100)에서 가스 흡수탑(200)으로 유입되는 가스 배출관(220)의 유입속도를 높게 조절함으로써, 과산화수소와 황산을 분해시키는 공정이 균형있게 이루어질 수 있게 되는 것이다.
In particular, the diameter of the gas discharge pipe 220 connecting the hydrogen peroxide decomposition tower 100 and the gas absorption tower 200 is formed larger than the diameter of the waste sulfuric acid supply pipe 170, so that the waste sulfuric acid from the waste sulfuric acid supply pipe 170 By adjusting the inflow rate of the gas discharge pipe 220 flowing from the hydrogen peroxide decomposition tower 100 to the gas absorption tower 200 higher than the rate to supply to the decomposition tower 100, a process for decomposing hydrogen peroxide and sulfuric acid is balanced. It will be possible.

100 : 과산화수소 분해탑 110 : 제2순환관
120 : 상부 분해조 130 : 제1다공망판
140 : 과산화수소 분해제 150 : 하부 분해조
160 : 제2순환관 170 : 폐황산 공급관
180 : 제1펌프 185 : 제1레벨센서
190 : 황산 배출관 200 : 가스 흡수탑
210 : 제2펌프 220 : 급수관
230 : 충진재 240 : 제2다공망판
250 : 살수봉 260, 270 : 가스 흡수조
280 : 하단부 수조 290 : 환기관
300 : 보조탱크 350 : 제3펌프
355 : 제2레벨센서 400 : 황산 저장조
500 : 정화탱크 550 : 필터100: hydrogen peroxide decomposition tower 110: the second circulation tube
120: upper decomposition tank 130: first porous network plate
140: hydrogen peroxide decomposition agent 150: lower decomposition tank
160: second circulation pipe 170: waste sulfuric acid supply pipe
180: first pump 185: first level sensor
190: sulfuric acid discharge pipe 200: gas absorption tower
210: second pump 220: water supply pipe
230: filling material 240: second porous plate
250: spraying rods 260, 270: gas absorption tank
280: bottom tank 290: ventilation pipe
300: auxiliary tank 350: third pump
355: second level sensor 400: sulfuric acid storage tank
500: purification tank 550: filter

Claims (4)

과산화수소에 오염된 폐황산을 재사용할 수 있도록 과산화수소와 분리시키는 장치에 있어서,
상부 일측에 폐황산 공급관(170)과 제2순환관(110)이 설치되는 상부 분해조(120)가 구비되고, 상부 분해조(120) 하부에는 바닥의 제1다공망판(130) 위에 놓인 과산화수소 분해제(140)가 상부 분해조(120)까지 상승될 수 있도록 내부가 서로 통하는 하부 분해조(150)가 구비되며, 하부 분해조(150) 아래쪽에는 제1순환관(160)이 설치되고 측벽에는 과산화수소 분해제(140)보다 높은 위치에 제1펌프(180)가 설치된 배출관(190)이 구비되며, 상부 분해조(120)의 직경이 하부 분해조(150)의 직경보다 크게 형성되는 과산화수소 분해탑(100);과
가스입자를 분산시켜 물과의 접촉면적을 넓혀주는 충진재(230)가 제2다공망판(240) 위에 일정 높이 채워지고, 충진재(230) 위로 물을 분사시키는 살수봉(250)이 설치된 가스 흡수조(260)(270)를 복층으로 구비하되, 하측 가스 흡수조(270) 아래에는 물이 채워지는 하단부 수조(280)와의 사이에 과산화수소 분해탑(100)의 가스배출관(220)을 연결하고, 하단부 수조(280) 일측에는 살수봉(250)으로 물을 공급하도록 제2펌프(210)가 구비된 급수관(215)을 설치하며, 상측 가스흡수조(260) 상부에 환기관(290)이 형성된 가스 흡수탑(200);과
일측에 과산화수소 분해탑(100)의 제1순환관(160)이 연결되고, 하부에는 제3펌프(350)가 설치된 제2순환관(110)이 과산화수소 분해탑(100)의 상부 분해조(120) 상단과 연결되어 폐황산을 순환시키는 보조탱크(300);와
제1펌프(180)가 설치된 황산 배출관(190)이 일측에 연결되어 과산화수소 분해탑(100)으로부터 생산된 황산을 저장하는 황산 저장조(400);
로 이루어진 것을 특징으로 하는 과산화수소에 오염된 폐황산의 재활용 장치.
In a device for separating waste sulfuric acid contaminated with hydrogen peroxide with hydrogen peroxide to reuse,
The upper digestion tank 120 is provided with a waste sulfuric acid supply pipe 170 and the second circulation pipe 110 is installed on one side of the upper side, the lower portion of the upper digestion tank 120 is hydrogen peroxide placed on the first porous mesh plate 130 of the bottom The lower digester 150 is provided to communicate with each other so that the disintegrator 140 may be raised to the upper digester 120, and a first circulation pipe 160 is installed below the lower digester 150 and the sidewalls are provided. The exhaust pipe 190 is provided with a first pump 180 is installed at a position higher than the hydrogen peroxide decomposition agent 140, the diameter of the upper decomposition tank 120 is larger than the diameter of the lower decomposition tank 150 decomposition decomposition Tower 100; and
A gas absorbing tank in which a filler 230 for dispersing gas particles to expand a contact area with water is filled to a certain height on the second porous mesh plate 240, and a spraying rod 250 for spraying water onto the filler 230 is installed. 260, 270 is provided in multiple layers, and the lower gas absorbing tank 270 is connected to the gas discharge pipe 220 of the hydrogen peroxide decomposition tower 100 between the lower end tank 280 is filled with water, the lower end One side of the water tank 280 is provided with a water supply pipe 215 provided with a second pump 210 to supply water to the spraying rod 250, the gas absorption formed with the ventilation pipe 290 on the upper gas absorption tank 260 Tower 200; and
The first circulation pipe 160 of the hydrogen peroxide decomposition tower 100 is connected to one side, and the second circulation pipe 110 having the third pump 350 installed therein is an upper decomposition tank 120 of the hydrogen peroxide decomposition tower 100. Auxiliary tank 300 is connected to the top and circulating waste sulfuric acid; and
Sulfuric acid storage tank 400 for storing the sulfuric acid produced from the hydrogen peroxide decomposition tower 100 is connected to one side of the sulfuric acid discharge pipe 190, the first pump 180 is installed;
Recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, characterized in that consisting of.
제 1 항에 있어서,
과산화수소 분해탑(100)과 황산 저장조(400) 사이에 설치되는 황산 배출관(190)의 제1펌프(180)와 황산 저장조(400) 사이에 필터(550)가 구비되는 정화탱크(500)를 설치하여,
과산화수소 분해제(140) 가루 및 색조를 걸러주도록 한 것을 특징으로 하는 과산화수소에 오염된 폐황산의 재활용 장치.
The method of claim 1,
A purification tank 500 having a filter 550 is installed between the first pump 180 and the sulfuric acid storage tank 400 of the sulfuric acid discharge pipe 190 installed between the hydrogen peroxide decomposition tower 100 and the sulfuric acid storage tank 400. So,
Hydrogen peroxide decomposition agent (140) Recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, characterized in that to filter the powder and color tone.
제 1 항 또는 제 2 항에 있어서,
과산화수소 분해탑(100)의 상부 분해조(120)와 하부 분해조(150)에 제1펌프(180)를 작동시키거나 정지시키는 수위감지용 제1레벨센서(185)를 설치하고,
보조탱크(300)에 제3펌프(350)를 작동시키거나 정지시키는 수위감지용 제2레벨센서(355)를 설치하여
과산화수소 분해탑(100)과 보조탱크(300)의 폐황산을 자동으로 순환시킬 수 있도록 한 것을 특징으로 하는 과산화수소에 오염된 폐황산의 재활용 장치.
3. The method according to claim 1 or 2,
The first level sensor 185 for level detection for operating or stopping the first pump 180 is installed in the upper decomposition tank 120 and the lower decomposition tank 150 of the hydrogen peroxide decomposition tower 100,
By installing a second level sensor 355 for detecting the water level to operate or stop the third pump 350 in the auxiliary tank (300)
A device for recycling waste sulfuric acid contaminated with hydrogen peroxide, characterized in that to automatically circulate the waste sulfuric acid of the hydrogen peroxide decomposition tower 100 and the auxiliary tank (300).
제 1 항 또는 제 2 항에 있어서,
과산화수소 분해탑(100)과 가스 흡수탑(200)을 연결하는 가스 배출관(220)의 직경은 폐황산 공급관(170)의 직경보다 크게 형성된 것임을 특징으로 하는 과산화수소에 오염된 폐황산의 재활용 장치.3. The method according to claim 1 or 2,
Recycling apparatus for waste sulfuric acid contaminated with hydrogen peroxide, characterized in that the diameter of the gas discharge pipe 220 connecting the hydrogen peroxide decomposition tower 100 and the gas absorption tower 200 is larger than the diameter of the waste sulfuric acid supply pipe (170).
KR1020120036808A 2012-04-09 2012-04-09 recycling device of waste contaminated with hydrogen peroxide to sulfuric acid KR101237919B1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102047212B1 (en) 2019-07-03 2019-11-20 정영남 Active carbon catalyst decomposition method for elimination of hydrogen peroxide in waste sulfuric acid

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CN108706557A (en) * 2018-07-09 2018-10-26 陕西高科环保科技有限公司 A kind of sulfur waste acid-restoring plant and its recovery method
KR102091728B1 (en) * 2019-08-27 2020-05-29 정영남 Retention type continuous digestion apparatus that removes hydrogen peroxide from spent sulfuric acid using activated carbon
KR102406565B1 (en) * 2021-07-08 2022-06-08 소광민 The hydrogen peroxide decomposition equipment for wastewater

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920002464A (en) * 1990-07-17 1992-02-28 제임스 제이.플라인, 이. 에이. 브라우닝 Method of Purifying Hydrogen Peroxide
JPH0839079A (en) * 1994-07-28 1996-02-13 Kurita Water Ind Ltd Treatment of hydrogen peroxide-containing acidic water
JPH08175810A (en) * 1994-12-22 1996-07-09 Nippon Sanso Kk Purification apparatus for waste sulfuric acid
KR20120024514A (en) * 2011-10-26 2012-03-14 소광민 Recycling device of waste contaminated with hydrogen peroxide to sulfuric acid

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR920002464A (en) * 1990-07-17 1992-02-28 제임스 제이.플라인, 이. 에이. 브라우닝 Method of Purifying Hydrogen Peroxide
JPH0839079A (en) * 1994-07-28 1996-02-13 Kurita Water Ind Ltd Treatment of hydrogen peroxide-containing acidic water
JPH08175810A (en) * 1994-12-22 1996-07-09 Nippon Sanso Kk Purification apparatus for waste sulfuric acid
KR20120024514A (en) * 2011-10-26 2012-03-14 소광민 Recycling device of waste contaminated with hydrogen peroxide to sulfuric acid

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102047212B1 (en) 2019-07-03 2019-11-20 정영남 Active carbon catalyst decomposition method for elimination of hydrogen peroxide in waste sulfuric acid

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