KR101234575B1 - Ｅｕｖ 콜렉터 파편 관리 - Google Patents

Ｅｕｖ 콜렉터 파편 관리 Download PDF

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Publication number
KR101234575B1
KR101234575B1 KR1020077009514A KR20077009514A KR101234575B1 KR 101234575 B1 KR101234575 B1 KR 101234575B1 KR 1020077009514 A KR1020077009514 A KR 1020077009514A KR 20077009514 A KR20077009514 A KR 20077009514A KR 101234575 B1 KR101234575 B1 KR 101234575B1
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South Korea
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delete delete
plasma
euv
etch
source material
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Expired - Fee Related
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KR1020077009514A
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Korean (ko)
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KR20070091603A (ko
Inventor
윌리엄 엔. 파틀로
이고르 브이. 포멘코프
알렉산더 아이. 에르쇼프
윌리엄 올드햄
오스카 햄버그
윌리엄 에프. 마르크스
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사이머 인코포레이티드
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Publication of KR20070091603A publication Critical patent/KR20070091603A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Optical Elements Other Than Lenses (AREA)
KR1020077009514A 2004-11-01 2005-10-20 Ｅｕｖ 콜렉터 파편 관리 Expired - Fee Related KR101234575B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/979,945 2004-11-01
US10/979,945 US8075732B2 (en) 2004-11-01 2004-11-01 EUV collector debris management
PCT/US2005/037725 WO2006049886A2 (en) 2004-11-01 2005-10-20 Euv collector debris management

Publications (2)

Publication Number Publication Date
KR20070091603A KR20070091603A (ko) 2007-09-11
KR101234575B1 true KR101234575B1 (ko) 2013-02-19

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KR1020077009514A Expired - Fee Related KR101234575B1 (ko) 2004-11-01 2005-10-20 Ｅｕｖ 콜렉터 파편 관리

Country Status (5)

Country Link
US (1) US8075732B2 (enExample)
EP (1) EP1807866B1 (enExample)
JP (1) JP2008518480A (enExample)
KR (1) KR101234575B1 (enExample)
WO (1) WO2006049886A2 (enExample)

Cited By (1)

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KR102444183B1 (ko) 2022-02-07 2022-09-16 주식회사 경신이엔지 연속식 멸균 시스템

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JP5124452B2 (ja) * 2005-06-21 2013-01-23 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 照射ユニット光学面の二段階クリーニング方法
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JP5098019B2 (ja) * 2007-04-27 2012-12-12 ギガフォトン株式会社 極端紫外光源装置
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JP4973425B2 (ja) * 2007-10-03 2012-07-11 ウシオ電機株式会社 極端紫外光光源装置における集光光学手段のクリーニング方法及び極端紫外光光源装置
JP5133740B2 (ja) * 2008-03-10 2013-01-30 ギガフォトン株式会社 極端紫外光源装置
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NL2003181A1 (nl) * 2008-07-14 2010-01-18 Asml Netherlands Bv A source module of an EUV lithographic apparatus, a lithographic apparatus, and a method for manufacturing a device.
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JP5559562B2 (ja) 2009-02-12 2014-07-23 ギガフォトン株式会社 極端紫外光光源装置
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KR102864171B1 (ko) * 2023-06-16 2025-09-24 한국표준과학연구원 Euv 광원에 의한 광학부품 오염 방지 장치 및 그 방법

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Also Published As

Publication number Publication date
WO2006049886A3 (en) 2009-03-05
WO2006049886A2 (en) 2006-05-11
EP1807866A2 (en) 2007-07-18
EP1807866A4 (en) 2011-08-24
KR20070091603A (ko) 2007-09-11
JP2008518480A (ja) 2008-05-29
EP1807866B1 (en) 2013-03-06
US20060091109A1 (en) 2006-05-04
US8075732B2 (en) 2011-12-13

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