KR101196324B1 - 광 조사 장치 - Google Patents

광 조사 장치 Download PDF

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Publication number
KR101196324B1
KR101196324B1 KR1020107029579A KR20107029579A KR101196324B1 KR 101196324 B1 KR101196324 B1 KR 101196324B1 KR 1020107029579 A KR1020107029579 A KR 1020107029579A KR 20107029579 A KR20107029579 A KR 20107029579A KR 101196324 B1 KR101196324 B1 KR 101196324B1
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KR
South Korea
Prior art keywords
ultraviolet
light
stage
light irradiation
linear
Prior art date
Application number
KR1020107029579A
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English (en)
Korean (ko)
Other versions
KR20120024348A (ko
Inventor
시게루 엔도우
노리히코 하타노
데츠지 가도와키
Original Assignee
가부시키가이샤 아루박
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Publication date
Application filed by 가부시키가이샤 아루박 filed Critical 가부시키가이샤 아루박
Publication of KR20120024348A publication Critical patent/KR20120024348A/ko
Application granted granted Critical
Publication of KR101196324B1 publication Critical patent/KR101196324B1/ko

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1306—Details
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7042—Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0277—Electrolithographic processes

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)
KR1020107029579A 2010-07-20 2010-07-20 광 조사 장치 KR101196324B1 (ko)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2010/062192 WO2012011166A1 (ja) 2010-07-20 2010-07-20 光照射装置

Publications (2)

Publication Number Publication Date
KR20120024348A KR20120024348A (ko) 2012-03-14
KR101196324B1 true KR101196324B1 (ko) 2012-11-01

Family

ID=45496607

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020107029579A KR101196324B1 (ko) 2010-07-20 2010-07-20 광 조사 장치

Country Status (3)

Country Link
KR (1) KR101196324B1 (zh)
CN (1) CN102388336A (zh)
WO (1) WO2012011166A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5538467B2 (ja) * 2012-03-30 2014-07-02 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 レンズユニット、光照射ユニット及び光照射装置
EP3012079A4 (en) * 2013-06-17 2017-02-22 Biomedical 3D Printing Co., Ltd Curing apparatus for 3d printer, using ultraviolet light emitting diode
JP6139450B2 (ja) * 2014-03-27 2017-05-31 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 光照射ユニット及び光照射装置
JP6125456B2 (ja) 2014-03-31 2017-05-10 Ｈｏｙａ Ｃａｎｄｅｏ Ｏｐｔｒｏｎｉｃｓ株式会社 光照射ユニット
CN106125512B (zh) * 2016-06-23 2018-01-19 京东方科技集团股份有限公司 一种曝光基台及其制备方法、曝光机
KR102090933B1 (ko) * 2019-08-13 2020-03-19 엘지디스플레이 주식회사 발광다이오드 광원부를 포함하는 자외선 조사장치
WO2024011199A1 (en) * 2022-07-08 2024-01-11 Samtec, Inc. Method and appartus for additively fabricating electrical components

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005017341A (ja) * 2003-06-23 2005-01-20 Dainippon Screen Mfg Co Ltd 光照射装置
JP2005109091A (ja) * 2003-09-30 2005-04-21 Toshiba Ceramics Co Ltd 基板保持用真空チャック

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3161296B2 (ja) * 1995-09-05 2001-04-25 松下電器産業株式会社 液晶表示素子の製造方法
JP4694803B2 (ja) * 2003-08-28 2011-06-08 芝浦メカトロニクス株式会社 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法
JP4852907B2 (ja) * 2005-06-29 2012-01-11 ウシオ電機株式会社 ディスプレイパネルの貼り合せ装置
JP2008107702A (ja) * 2006-10-27 2008-05-08 Nakan Corp 光配向膜形成装置
JP2009169386A (ja) * 2007-12-18 2009-07-30 Ulvac Japan Ltd 光照射装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005017341A (ja) * 2003-06-23 2005-01-20 Dainippon Screen Mfg Co Ltd 光照射装置
JP2005109091A (ja) * 2003-09-30 2005-04-21 Toshiba Ceramics Co Ltd 基板保持用真空チャック

Also Published As

Publication number Publication date
WO2012011166A1 (ja) 2012-01-26
CN102388336A (zh) 2012-03-21
KR20120024348A (ko) 2012-03-14

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