KR101169240B1 - 노광 장치용 광조사 장치, 노광 장치 및 노광 방법 - Google Patents

노광 장치용 광조사 장치, 노광 장치 및 노광 방법 Download PDF

Info

Publication number
KR101169240B1
KR101169240B1 KR1020110082872A KR20110082872A KR101169240B1 KR 101169240 B1 KR101169240 B1 KR 101169240B1 KR 1020110082872 A KR1020110082872 A KR 1020110082872A KR 20110082872 A KR20110082872 A KR 20110082872A KR 101169240 B1 KR101169240 B1 KR 101169240B1
Authority
KR
South Korea
Prior art keywords
light source
light
cassette
portions
exposure
Prior art date
Application number
KR1020110082872A
Other languages
English (en)
Korean (ko)
Other versions
KR20110110076A (ko
Inventor
도모노리 하라다
신이치로우 나가이
슈사쿠 가루이시
Original Assignee
엔에스케이 테쿠노로지 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엔에스케이 테쿠노로지 가부시키가이샤 filed Critical 엔에스케이 테쿠노로지 가부시키가이샤
Publication of KR20110110076A publication Critical patent/KR20110110076A/ko
Application granted granted Critical
Publication of KR101169240B1 publication Critical patent/KR101169240B1/ko

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • H01L21/0275—Photolithographic processes using lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Non-Portable Lighting Devices Or Systems Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020110082872A 2009-04-09 2011-08-19 노광 장치용 광조사 장치, 노광 장치 및 노광 방법 KR101169240B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JPJP-P-2009-094966 2009-04-09
JP2009094966 2009-04-09
JP2009157718 2009-07-02
JPJP-P-2009-157718 2009-07-02
JPJP-P-2009-180643 2009-08-03
JP2009180643A JP5598789B2 (ja) 2009-04-09 2009-08-03 露光装置用光照射装置及び露光装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020090103633A Division KR101138681B1 (ko) 2009-04-09 2009-10-29 노광 장치용 광조사 장치, 노광 장치 및 노광 방법

Publications (2)

Publication Number Publication Date
KR20110110076A KR20110110076A (ko) 2011-10-06
KR101169240B1 true KR101169240B1 (ko) 2012-08-02

Family

ID=43636964

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110082872A KR101169240B1 (ko) 2009-04-09 2011-08-19 노광 장치용 광조사 장치, 노광 장치 및 노광 방법

Country Status (3)

Country Link
JP (1) JP5598789B2 (ja)
KR (1) KR101169240B1 (ja)
TW (1) TWI529494B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102369484B (zh) * 2010-02-05 2015-05-20 恩斯克科技有限公司 曝光装置用照光装置及其亮灯控制方法、以及曝光装置、曝光方法及基板
JP5825546B2 (ja) * 2011-02-25 2015-12-02 株式会社ブイ・テクノロジー 露光装置用光照射装置
JP2019105672A (ja) * 2017-12-08 2019-06-27 株式会社ブイ・テクノロジー 光照射装置、光照射方法、露光装置及び露光方法
US10775694B1 (en) * 2019-04-30 2020-09-15 Taiwan Semiconductor Manufacturing Company Ltd. Apparatus for mounting a pellicle to a photomask and method for mounting a pellicle to a photomask
CN112526827A (zh) 2019-09-19 2021-03-19 株式会社斯库林集团 曝光装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006278907A (ja) * 2005-03-30 2006-10-12 Ushio Inc 光照射装置および光照射装置における光源ユニットの交換方法
JP2008191252A (ja) * 2007-02-01 2008-08-21 Phoenix Denki Kk 露光用光源ならびにこれを用いた露光装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11119149A (ja) * 1997-10-17 1999-04-30 Matsushita Electric Ind Co Ltd 液晶プロジェクション装置
JP4391136B2 (ja) * 2003-06-05 2009-12-24 株式会社目白ゲノッセン 露光用照明装置
JP2008159394A (ja) * 2006-12-22 2008-07-10 Koha Co Ltd 取付けユニットおよび面状発光装置
JP2009058924A (ja) * 2007-08-31 2009-03-19 Attomakkusu:Kk 照明装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006278907A (ja) * 2005-03-30 2006-10-12 Ushio Inc 光照射装置および光照射装置における光源ユニットの交換方法
JP2008191252A (ja) * 2007-02-01 2008-08-21 Phoenix Denki Kk 露光用光源ならびにこれを用いた露光装置

Also Published As

Publication number Publication date
JP2011028184A (ja) 2011-02-10
JP5598789B2 (ja) 2014-10-01
KR20110110076A (ko) 2011-10-06
TW201037464A (en) 2010-10-16
TWI529494B (zh) 2016-04-11

Similar Documents

Publication Publication Date Title
JP6206997B2 (ja) 露光装置用光照射装置及びその点灯制御方法
KR101437210B1 (ko) 노광 장치용 광조사 장치, 노광 장치, 노광 방법, 기판의 제조 방법, 마스크, 및 피노광 기판
KR101169240B1 (ko) 노광 장치용 광조사 장치, 노광 장치 및 노광 방법
CN107615170B (zh) 曝光用照明装置、曝光装置和曝光方法
JP5799306B2 (ja) 露光装置用光照射装置の制御方法、及び露光方法
JP5057382B2 (ja) 露光装置及び基板の製造方法
KR101443431B1 (ko) 노광 장치용 광조사 장치, 광조사 장치의 제어 방법, 노광 장치 및 노광 방법
KR101725542B1 (ko) 노광 장치용 광 조사 장치 및 그 점등 제어 방법, 그리고 노광 장치 및 기판
KR101138681B1 (ko) 노광 장치용 광조사 장치, 노광 장치 및 노광 방법
JP5935294B2 (ja) 近接露光装置及び近接露光方法
JP5825546B2 (ja) 露光装置用光照射装置
TW201107891A (en) Light irradiation apparatus for exposure apparatus, exposure apparatus, and exposure method
JP2012114390A (ja) 露光装置用光照射装置
WO2012011497A1 (ja) 露光装置用光照射装置、光照射装置の制御方法、露光装置及び露光方法
KR101578385B1 (ko) 근접 노광 장치, 근접 노광 방법 및 조명 광학계
JP2012113268A (ja) 露光装置用光照射装置及び露光装置

Legal Events

Date Code Title Description
A107 Divisional application of patent
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
N231 Notification of change of applicant
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20150618

Year of fee payment: 4

FPAY Annual fee payment

Payment date: 20160616

Year of fee payment: 5

FPAY Annual fee payment

Payment date: 20170616

Year of fee payment: 6

FPAY Annual fee payment

Payment date: 20180628

Year of fee payment: 7