KR101109354B1 - 레이저 방사선의 코히어런스 감소 시스템 - Google Patents

레이저 방사선의 코히어런스 감소 시스템 Download PDF

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Publication number
KR101109354B1
KR101109354B1 KR1020067019720A KR20067019720A KR101109354B1 KR 101109354 B1 KR101109354 B1 KR 101109354B1 KR 1020067019720 A KR1020067019720 A KR 1020067019720A KR 20067019720 A KR20067019720 A KR 20067019720A KR 101109354 B1 KR101109354 B1 KR 101109354B1
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KR
South Korea
Prior art keywords
resonator body
partial beam
laser
partial
transmitted
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Expired - Fee Related
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KR1020067019720A
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English (en)
Korean (ko)
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KR20060129502A (ko
Inventor
닐스 딕크만
만프레드 마울
다미안 피올카
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20060129502A publication Critical patent/KR20060129502A/ko
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Publication of KR101109354B1 publication Critical patent/KR101109354B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lasers (AREA)
KR1020067019720A 2004-02-26 2005-02-22 레이저 방사선의 코히어런스 감소 시스템 Expired - Fee Related KR101109354B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004009239 2004-02-26
DE102004009239.7 2004-02-26
PCT/EP2005/001797 WO2005083511A2 (de) 2004-02-26 2005-02-22 System zur reduzierung der kohärenz einer laserstrahlung

Publications (2)

Publication Number Publication Date
KR20060129502A KR20060129502A (ko) 2006-12-15
KR101109354B1 true KR101109354B1 (ko) 2012-01-31

Family

ID=34894863

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067019720A Expired - Fee Related KR101109354B1 (ko) 2004-02-26 2005-02-22 레이저 방사선의 코히어런스 감소 시스템

Country Status (5)

Country Link
US (1) US7593095B2 (https=)
EP (1) EP1721217A2 (https=)
JP (1) JP4769788B2 (https=)
KR (1) KR101109354B1 (https=)
WO (1) WO2005083511A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
JP5622126B2 (ja) * 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US7948606B2 (en) * 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
NL2004483A (nl) * 2009-05-26 2010-11-30 Asml Holding Nv Pulse stretcher with reduced energy density on optical components.
JP7311586B2 (ja) * 2018-08-22 2023-07-19 エーエスエムエル ネザーランズ ビー．ブイ． パルスストレッチャーおよび方法
EP4504442A1 (en) * 2022-04-01 2025-02-12 Nikon SLM Solutions AG Method of operating an irradiation system, irradiation system and apparatus for producing a three-dimensional work piece

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2969718B2 (ja) * 1990-01-20 1999-11-02 キヤノン株式会社 照明装置及びそれを用いた回路の製造方法
DE19508754C2 (de) * 1995-03-10 1999-06-02 Ldt Gmbh & Co Verfahren und Vorrichtung zum Vermindern von Interferenzen eines kohärenten Lichtbündels
US6238063B1 (en) * 1998-04-27 2001-05-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JP2002522710A (ja) * 1998-08-06 2002-07-23 マネスマン レックスオート アクチェンゲゼルシャフト ハイドロ変圧器
DE19959742A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes
TW561254B (en) * 2001-09-26 2003-11-11 Nikon Corp Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method

Also Published As

Publication number Publication date
JP2007528595A (ja) 2007-10-11
US20070206381A1 (en) 2007-09-06
JP4769788B2 (ja) 2011-09-07
KR20060129502A (ko) 2006-12-15
WO2005083511A2 (de) 2005-09-09
EP1721217A2 (de) 2006-11-15
US7593095B2 (en) 2009-09-22
WO2005083511A3 (de) 2005-12-01

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