KR101109354B1 - 레이저 방사선의 코히어런스 감소 시스템 - Google Patents

레이저 방사선의 코히어런스 감소 시스템 Download PDF

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Publication number
KR101109354B1
KR101109354B1 KR1020067019720A KR20067019720A KR101109354B1 KR 101109354 B1 KR101109354 B1 KR 101109354B1 KR 1020067019720 A KR1020067019720 A KR 1020067019720A KR 20067019720 A KR20067019720 A KR 20067019720A KR 101109354 B1 KR101109354 B1 KR 101109354B1
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KR
South Korea
Prior art keywords
resonator body
partial beam
laser
partial
transmitted
Prior art date
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KR1020067019720A
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English (en)
Korean (ko)
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KR20060129502A (ko
Inventor
닐스 딕크만
만프레드 마울
다미안 피올카
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20060129502A publication Critical patent/KR20060129502A/ko
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Publication of KR101109354B1 publication Critical patent/KR101109354B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lasers (AREA)
KR1020067019720A 2004-02-26 2005-02-22 레이저 방사선의 코히어런스 감소 시스템 KR101109354B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004009239 2004-02-26
DE102004009239.7 2004-02-26
PCT/EP2005/001797 WO2005083511A2 (fr) 2004-02-26 2005-02-22 Systeme permettant de reduire la coherence d'un rayonnement laser

Publications (2)

Publication Number Publication Date
KR20060129502A KR20060129502A (ko) 2006-12-15
KR101109354B1 true KR101109354B1 (ko) 2012-01-31

Family

ID=34894863

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067019720A KR101109354B1 (ko) 2004-02-26 2005-02-22 레이저 방사선의 코히어런스 감소 시스템

Country Status (5)

Country Link
US (1) US7593095B2 (fr)
EP (1) EP1721217A2 (fr)
JP (1) JP4769788B2 (fr)
KR (1) KR101109354B1 (fr)
WO (1) WO2005083511A2 (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5622068B2 (ja) 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
JP5622126B2 (ja) * 2005-11-15 2014-11-12 株式会社ニコン 面位置検出装置、露光装置、およびデバイスの製造方法
US7948606B2 (en) * 2006-04-13 2011-05-24 Asml Netherlands B.V. Moving beam with respect to diffractive optics in order to reduce interference patterns
US7649676B2 (en) * 2006-06-14 2010-01-19 Asml Netherlands B.V. System and method to form unpolarized light
NL2004483A (nl) * 2009-05-26 2010-11-30 Asml Holding Nv Pulse stretcher with reduced energy density on optical components.
WO2020038707A1 (fr) * 2018-08-22 2020-02-27 Asml Netherlands B.V. Extenseur d'impulsions et procédé
WO2023186325A1 (fr) * 2022-04-01 2023-10-05 SLM Solutions Group AG Procédé de fonctionnement de système de rayonnement, système de rayonnement et appareil pour la fabrication de pièce tridimensionnelle

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2969718B2 (ja) * 1990-01-20 1999-11-02 キヤノン株式会社 照明装置及びそれを用いた回路の製造方法
DE19508754C2 (de) 1995-03-10 1999-06-02 Ldt Gmbh & Co Verfahren und Vorrichtung zum Vermindern von Interferenzen eines kohärenten Lichtbündels
US6238063B1 (en) * 1998-04-27 2001-05-29 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
JP2002522710A (ja) * 1998-08-06 2002-07-23 マネスマン レックスオート アクチェンゲゼルシャフト ハイドロ変圧器
DE19959742A1 (de) * 1999-12-10 2001-06-13 Zeiss Carl System zur Kompensation von Richtungs- und Positionsschwankungen eines von einem Laser erzeugten Lichtes
TW561254B (en) * 2001-09-26 2003-11-11 Nikon Corp Aberration measuring device, aberration measuring method, regulation method for optical system, and exposure system provided with optical system regulated by the regulation method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01198759A (ja) * 1988-02-03 1989-08-10 Nikon Corp 照明装置
JPH0311614A (ja) * 1989-06-08 1991-01-18 Canon Inc 照明装置，投影露光装置及び素子製造方法
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method

Also Published As

Publication number Publication date
JP4769788B2 (ja) 2011-09-07
US20070206381A1 (en) 2007-09-06
EP1721217A2 (fr) 2006-11-15
KR20060129502A (ko) 2006-12-15
WO2005083511A2 (fr) 2005-09-09
US7593095B2 (en) 2009-09-22
WO2005083511A3 (fr) 2005-12-01
JP2007528595A (ja) 2007-10-11

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