KR101109095B1

KR101109095B1 - Mems microphone and manufacturing method of the same

Info

Publication number: KR101109095B1
Application number: KR1020090132682A
Authority: KR
Inventors: 김용국
Original assignee: 주식회사 비에스이
Priority date: 2009-12-29
Filing date: 2009-12-29
Publication date: 2012-01-31
Also published as: WO2011081288A3; CN201937821U; WO2011081288A2; CN102111705B; CN102111705A; KR20110076074A; TWI505723B; TW201127088A

Abstract

The present invention relates to a MEMS microphone capable of reducing residual stress at a contact portion of a silicon substrate with a membrane, and a method of manufacturing the same. According to the present invention, a silicon substrate is formed a back chamber; A back plate deposited on the silicon substrate and having a plurality of sound holes; A membrane deposited on the silicon substrate to be spaced apart from the back plate to form an air gap; And a stress buffer portion deposited on a contact portion of the membrane and the silicon substrate.

MEMS microphone, stress buffer

Description

MEMS microphone and its manufacturing method {MEMS MICROPHONE AND MANUFACTURING METHOD OF THE SAME}

The present invention relates to a MEMS microphone and a method of manufacturing the same.

In general, microphones are devices that convert voice into electrical signals. The microphone may be applied to various communication devices such as mobile communication devices such as mobile terminals, earphones or hearing aids. Such microphones should have good electronic / acoustic performance, reliability and operability.

The micron includes a condenser microphone, a MEMS microphone, and the like.

The condenser microphone is manufactured by fabricating the diaphragm, the back plate, and the signal processing printed circuit board, respectively, and then assembling the components into the case. The condenser microphone is separated from the process of manufacturing a printed circuit board and the process of manufacturing a condenser microphone, thereby increasing production cost and limiting miniaturization.

The MEMS microphone manufactures all the deflection sensing element parts such as the diaphragm and the back plate on a single silicon substrate using a semiconductor process.

A MEMS microphone disclosed in Korean Application No. 10-2002-0074492 (filed November 27, 2002) is disclosed. The MEMS microphone is heat-treated at a high temperature of approximately 1100 ° C. to inject electrons into the lower electrode. In this case, since the membrane (vibration plate) is substantially composed of heterogeneous materials such as a metallic lower electrode, a silicon nitride film, and a silicon oxide film, residual stress (compression stress or expansion stress) is generated due to a difference in thermal expansion coefficient during high temperature heat treatment. Deformation or cracking may occur as the membrane is subjected to residual stress. Furthermore, when the residual stress is applied to the membrane, the membrane may be difficult to accurately vibrate according to the sound, so it may be difficult to accurately convert the generated sound into an electrical signal.

In addition, since the microphone adjusts the thickness of the membrane by etching the lower side of the silicon substrate, the thickness of the membrane may be uneven. When the thickness of the membrane becomes nonuniform, the membrane may vibrate irregularly with respect to the sound, and thus it may be difficult to accurately convert the sound into an electrical signal.

International Publication No. WO 2007/112743 (published March 29, 2007) discloses a method for manufacturing a MEMS microphone in which a silicon substrate is oxidized to form a bag volume 15. In this case, the silicon substrate 9 is oxidized to form the back volume 15, and the conductive layer 2, the metal layer 3, the silicon oxide film 4, etc. are formed to form the porous silicon structure. Deposition and etching processes (steps 1a-1h) and the like are sequentially performed. Since a number of processes to form the porous silicon structure must be performed, the manufacturing time of the MEMS microphone can be significantly increased. In addition, the porous silicon structure 9 may be non-uniform oxidation rate of the silicon depending on the voltage conditions, the back volume 15 could be etched non-uniformly. When the surface of the bag volume is non-uniformly etched, the distance between the membrane and the bag volume becomes non-uniform, which makes it difficult to accurately convert sound into an electrical signal.

In addition, the diaphragm has a significant difference in thermal expansion coefficient between a silicon substrate and a silicon oxide film. However, since the diaphragm is in contact with the silicon substrate by the silicon oxide film, cracks may be generated due to the difference in the coefficient of thermal expansion at the portion where the diaphragm is in contact with the silicon substrate.

In addition, since the two cited references have a structure in which a membrane and a back plate are stacked on a silicon substrate, the height of the MEMS microphone is inevitably increased. Thus, there has been a limitation in the production of miniaturized microphones.

An object of the present invention for solving the above-mentioned problems is to provide a MEMS microphone and a method of manufacturing the same that can minimize the residual stress at the site where the membrane is in contact with the silicon substrate.

Another object of the present invention is to provide a MEMS microphone and a method of manufacturing the same, which do not need to be heated to a high temperature to adsorb ions to the membrane and the back plate.

Another object of the present invention is to facilitate the planarization of the sacrificial layer than the structure in which the membrane and the back plate are stacked on the upper side of the silicon substrate, and by controlling the thickness of the membrane and the back plate freely to adjust the acoustic characteristics of the microphone It is to provide a MEMS microphone and a method of manufacturing the same that can be improved.

It is still another object of the present invention to provide a MEMS microphone capable of reducing the height of the MEMS microphone beyond a gap between the membrane and the back plate, and a method of manufacturing the same.

According to an aspect of the present invention for achieving the above object, a silicon substrate is formed; A back plate deposited on the silicon substrate and having a plurality of sound holes; A membrane deposited on the silicon substrate to be spaced apart from the back plate to form an air gap; And a stress buffer deposited on a contact portion between the membrane and the silicon substrate.

According to another aspect of the invention, the step of depositing a stress buffer on the silicon substrate; Depositing a membrane on the stress buffer; Depositing a sacrificial layer on the membrane; Depositing a back plate such that a plurality of sound holes are formed in the sacrificial layer; Etching the lower side of the silicon substrate to form a back chamber; And removing the sacrificial layer to form an air gap between the membrane and the back plate.

According to another aspect of the invention, the step of depositing a back plate on a silicon substrate; Depositing a sacrificial layer on the back plate; Depositing a stress buffer around the back plate of the silicon substrate; Depositing a membrane on the stress buffer and the sacrificial layer; Etching the lower side of the silicon substrate to form a back chamber; And removing the sacrificial layer to form an air gap between the membrane and the back plate.

According to the present invention, there is an effect of minimizing the residual stress at the site where the membrane and the silicon substrate contact. Furthermore, there is an effect that can prevent the crack is generated in the contact portion of the membrane and the silicon substrate.

According to the present invention, the membrane is prevented from being deformed by residual stress, so that the negative pressure measurement can be normally performed.

According to the present invention, since the membrane and the back plate are deposited by electroless plating at a low temperature (a temperature of about 90 ° C.), there is an effect that one-chip of MEMS chip and ASIC chip can be formed. Furthermore, there is an effect that can be produced by the unified semiconductor process MEMS microphone.

According to the present invention, since the MEMS microphone is manufactured at a low temperature, there is an effect of minimizing the residual stress remaining in the membrane and the back plate itself. Furthermore, the membrane and the back plate may have an effect of preventing cracks from occurring in contact with the silicon substrate.

According to the present invention, since the membrane and the back plate are deposited using the electroless plating method, the membrane and the back plate can be easily adjusted to stabilize the acoustic properties and increase the acoustic sensitivity.

According to the present invention, since the silicon substrate is etched and the membrane and the back plate are deposited to form an air gap, the air gap can be accurately and simply formed. Furthermore, there is an effect of reducing the height of the MEMS microphone and allowing the membrane and the back plate to be more stably fixed to the substrate.

Specific embodiments of the MEMS microphone of the present invention for achieving the above object will be described.

A first embodiment of a MEMS microphone according to the present invention will be described.

1A to 1C are cross-sectional views illustrating a process of forming an air gap forming portion on a silicon substrate in a first embodiment of a MEMS microphone according to the present invention.

1A and 1B, the MEMS microphone includes a silicon substrate 10. Both sides of the silicon substrate 10 have silicon nitride (

) Or silicon oxide (

Insulation

protective layers

11 and 12, such as < RTI ID = 0.0 > In this case, the silicon nitride is deposited on the protective layer (11, 12) on the surface of the silicon substrate 10 by using a low pressure chemical vapor deposition (LPCVD).

The insulating protective layer 11 on the silicon substrate 10 is etched to form the air gap forming portion 15 (see FIG. 1B). In this case, the upper insulating protective layer 11 of the silicon substrate 10 may be etched by Reactive Ion Etching (RIE) equipment.

Referring to FIG. 1C, the air gap forming unit 15 is formed to a predetermined depth by etching the upper side of the silicon substrate 10 with a KOH solution or a TMAH solution. In this case, the mask material (not shown) of the air gap forming unit 15 may include silicon nitride (

) Or silicon oxide (

) May be applied.

By adjusting the depth of the air gap forming unit 15 to a predetermined depth (D), it is possible to adjust the distance between the membrane 25 and the back plate 37 to be described below. The depth D of the air gap forming unit 15 may be adjusted according to the concentration, etching time and temperature of the KOH solution or TMAH solution. The concentration, etching time and temperature of the KOH solution or TMAH solution should be appropriately adjusted according to the depth of the air gap forming portion.

In addition, the circumference of the air gap forming unit 15 may form an inclined surface 16 having an angle α of approximately 54.74 ° when etching with KOH solution or TMAH solution. At this time, the reaction with the KOH solution or TMAH solution is relatively slow in the inclination direction (111 plane direction) of the silicon crystal, and the reaction with the KOH solution or TMAH solution is relatively relatively in the vertical direction (100 plane direction) of the silicon crystal. fast. Therefore, the periphery of the air gap forming part 15 is etched to have the inclined surface 16.

2A to 2C are cross-sectional views illustrating a process of depositing a stress buffer in an air gap forming portion of the silicon substrate of FIG. 1C.

2A to 2C, a stress buffer 20 is deposited on the air gap forming portion 15 of the silicon substrate 10. The membrane 25 is deposited on the air gap forming portion 15 and the stress buffer 20.

The stress buffer 20 is made through the following process.

The photosensitive mask material 21 is coated on the surface of the air gap forming part 15 of the silicon substrate 10. The photosensitive mask material 21 is exposed and developed to pattern the region 22a in which the stress buffer 20 is to be formed (see FIG. 2A). The stress buffer 20 is deposited in the region 22a in which the stress buffer 20 is to be formed (see FIG. 2B). Then, the photosensitive mask material is removed (see FIG. 2C).

The stress buffer 20 may be formed of a plurality of material layers having different thermal expansion coefficients. For example, the stress buffer 20 may be formed by stacking chromium 20a (Cr), gold 20b (Au), and polyimide 20c (Polyimide).

In this case, the thermal expansion coefficients of the plurality of material layers 20a, 20b, and 20c may gradually increase from the silicon substrate 10 toward the membrane 25. This will be described in detail with reference to the table below. In the table below, E represents young's modulus and α represents thermal expansion coefficient.

matter E
(Gpa) α
(ppm / ℃) Δα
(ppm / ℃) ΔαE
(MPa / ℃) density
(g / cm3) Possion's
ratio Thermal conductivity
(W / mK) thickness
(um) Si 178 2.6 - - 2.33 0.28 141 395 Ni 200 13.4 -10.8 -2.16 8.89 0.31 90.9 0.3 PI 2.5 35 -32.4 -0.081 1.43 - 0.52 One Au 78 14.2 -11.6 -0.90 19.32 0.42 315 0.3 Cr 279 4.9 -2.3 -0.64 7.19 0.21 93.9 0.05 Si3N4 300 2.7 -0.1 -0.3 3.3 0.17 80 0.3

[table]

The silicon substrate 10 may be stacked in the order of chromium (coefficient of thermal expansion 4.9), gold (coefficient of thermal expansion 14.2), and polyimide (coefficient of thermal expansion 35) toward the membrane 25. Here, the thermal expansion coefficient of the silicon substrate is 2.6, the thermal expansion coefficient of silicon nitride, which is a protective layer of the silicon substrate, is 2.7, and the thermal expansion coefficient of the nickel membrane is 13.4.

The stress buffer 20 prevents cracks from occurring at the contact portion between the membrane 25 and the silicon substrate 10 by the buffering action of the stress buffer 20 when the membrane 25 is vibrated. .

3A and 3B are cross-sectional views illustrating a process of depositing a membrane over the membrane of the silicon substrate of FIG. 2C.

3A and 3B, a membrane 25 is deposited on the air gap forming portion 15 and the stress buffer 20 of the silicon substrate 10. In this case, an air passage hole 25a is formed in the membrane 25 to allow air to pass therethrough (see FIG. 3A). The membrane 25 is a diaphragm vibrating by negative pressure and is a lower electrode of a capacitor for measuring capacitance.

The membrane 25 may be deposited by electroless plating. Here, the electroless plating method is a method of depositing a metal on the surface of a silicon substrate by reducing metal ions by the force of a reducing agent without receiving electrical energy from the outside. Such an electroless plating method can make the thickness of the membrane 25 uniform as compared with the electroplating, and can easily form the membrane 25 on the curved surface.

The electroless plating method of the membrane 25 is performed through the following process. First, the photosensitive mask material 21 is coated on the surface of the silicon substrate 10 on which the air gap forming part 15 is formed. The photosensitive mask material 21 is exposed and developed to pattern the region where the membrane 25 is to be formed. The patterned silicon surface is surface activated for nickel electroless plating. The nickel membrane 25 is formed on the surface of the surface activated silicon substrate 10 by electroless plating (see FIG. 3A). After the nickel membrane 25 is formed, the photosensitive mask material 21 is removed (see FIG. 3B). Finally, the surface of the membrane 25 is cleaned.

In addition, since the conductive ions or the like are reduced-substituted at a low temperature of about 90 ° C. by electroless plating, the membrane 25 needs to be heated to a high temperature of about 1100 ° C. as conventionally in order to deposit the membrane 25. There is no.

In addition, since the membrane 25 is made of a metallic material, the membrane 25 may be electrically connected to an external circuit (eg, an ASIC chip) measuring capacitance. Therefore, since there is no need to inject conductive ions into the membrane layer of polysilicon as in the related art, there is no need to perform a separate high temperature heating process on the membrane layer, and the manufacturing process may be reduced.

In addition, the membrane 25 and the silicon substrate 10 are not heated to a high temperature even if there is a difference in the coefficient of thermal expansion, so that the residual stress during the electroless plating process at the contact portion between the membrane 25 and the silicon substrate 10 is increased. ) Compressive stress or tensile stress is hardly generated. As a result, since the membrane 25 is hardly deformed by residual stress, the membrane 25 may be vibrated normally to stabilize acoustic characteristics. In addition, since residual stress is hardly generated at the contact portion between the membrane and the silicon substrate, cracks may be prevented from occurring at the contact portion between the silicon substrate and the membrane.

In contrast, when the membrane 25 is formed by the electroplating method as in the related art, after the seed layer is deposited on the surface of the silicon substrate, electricity must be applied. In the seed layer, electricity is not distributed in uniform intensity, but electricity is distributed in partially non-uniform intensity. In this case, since the conductive ions are plated with a non-uniform thickness on the membrane 25, the thickness of the membrane 25 may be uneven as a whole. However, the electroless plating method of the present invention has no current density difference in the membrane, so that the thickness of the membrane becomes uniform throughout.

Meanwhile, the flexible conductive material including nickel may be applied to the membrane 25. Since the membrane 25 is a conductive material, electricity may be supplied to the membrane 25. Furthermore, since the membrane 25 is a soft material, the membrane 25 can be prevented from being damaged when the membrane 25 is vibrated by excessive current or when an external shock is applied.

In addition, the thickness of the membrane 25 may be formed to approximately 0.1 ~ 5㎛. The thickness of the membrane 25 may be adjusted to an appropriate thickness according to the sound pressure sensed by the MEMS microphone.

On the other hand, when the membrane 25 is electroless plated, the metal vapor for plating is substantially perpendicular from the upper side to the lower side of the air gap forming unit 15 by a sputter or an electron beam (E-beam). Or sprayed with a slight inclination. In this case, the membrane 25 and the electrode (not shown) may not be shorted to the inclined surface 16 of the air gap forming unit 15. However, when the membrane 25 is electroless plated, the membrane 25 is easily deposited on the curved surface, so that the membrane and its electrode (not shown) can be easily connected without being shorted.

4A and 4B are cross-sectional views illustrating a process of depositing a sacrificial layer and a back plate on the membrane of FIG. 3B.

Referring to FIG. 4A, a sacrificial layer 33 is deposited on the air gap forming unit 15. At this time, the sacrificial layer 33 is deposited on the air gap forming portion etched to a predetermined depth on the silicon substrate, it is not necessary to deposit or etch a separate layer to deposit the sacrificial layer. Thus, the sacrificial layer can be easily deposited and the manufacturing process can be reduced.

The top surface of the sacrificial layer 33 may be deposited to form the same plane as the top surface of the silicon substrate 10. In this case, when the sacrificial layer 33 is made of a material having a relatively high viscosity, the surface of the sacrificial layer 33 may be smoothed through chemical mechanical polishing (CMP). In addition, when the sacrificial layer 33 is made of a material having a relatively low viscosity, the surface of the sacrificial layer 33 may be smoothly formed so that the chemical mechanical polishing may not be performed separately.

The sacrificial layer 33 may be formed of a material such as silicon oxide, photoresist, plated copper, or the like.

Referring to FIG. 4B, the back plate 37 may be deposited on the sacrificial layer 33 by electroless plating. The back plate 37 may be deposited to a thickness of approximately 2 ~ 100㎛. The back plate 37 is an upper electrode of a capacitor installed to face the membrane 25 and measuring capacitance.

The electroless plating method of the back plate 37 is made through the following process. First, a photosensitive mask material (not shown) is applied to the surface of the sacrificial layer 33. The photosensitive mask material is exposed and developed to pattern an area where the back plate 37 is to be formed. At this time, the region in which the back plate 37 is to be formed has a shape in which a plurality of sound holes 38 can be formed. The patterned back plate 37 area is surface activated for nickel electroless plating. Nickel back plate 37 is deposited on the surface of the surface activated back plate 37 area by electroless plating. After the nickel back plate 37 is formed, the photosensitive mask material is removed to form the back plate 37. Finally, the surface of the back plate 37 is cleaned. The electroless plating method of the back plate 37 is substantially the same as the electroless plating method of the membrane 25 described above.

Since the back plate 37 is reduced-substituted at a low temperature of about 90 ° C. by electroless plating, it is necessary to heat the back plate 37 to a high temperature of about 1100 ° C. in order to deposit the back plate 37. There is no. In addition, since the back plate 37 is formed of a metallic material, the back plate 37 may be electrically connected to an external circuit (eg, an ASIC chip) measuring capacitance. Therefore, since there is no need to inject conductive ions into the polysilicon back plate layer as in the prior art, there is no need to perform a separate high temperature heating process to inject conductive ions into the polysilicon as in the prior art, and the manufacturing process is reduced. Can be.

In addition, since the back plate 37 and the silicon substrate 10 are not heated to a high temperature even if there is a difference in the coefficient of thermal expansion, the back plate 37 and the silicon substrate 10 are compressed at a residual stress at the contact portion between the back plate 37 and the silicon substrate 10. Almost no compressive or tensile stress is generated. As a result, since the back plate 37 is hardly deformed by the residual stress, acoustic characteristics can be stabilized. In addition, since residual stress hardly occurs between the back plate 37 and the silicon substrate 10, cracks may be prevented from occurring at a contact portion between the back plate 37 and the silicon substrate 10. Can be.

In contrast, when the back plate 37 is formed by the electroplating method as in the related art, after the seed layer is deposited on the surface of the silicon substrate, electricity must be applied. In the seed layer, electricity is distributed at partially uneven intensity. In this case, since the conductive ions are plated with a non-uniform thickness on the back plate 37, the thickness of the back plate 37 may be uneven as a whole.

On the other hand, the back plate 37 may be formed of a flexible conductive material containing nickel. Since the back plate 37 is a conductive material, electricity may be supplied to the back plate 37. Furthermore, since the back plate 37 is a soft material, it is possible to prevent the back plate 37 from being damaged when an external impact is applied to the back plate 37.

5A through 5C are cross-sectional views illustrating a process of forming a back chamber and an air gap in the silicon substrate of FIG. 4B.

5A and 5B, a photosensitive mask material (not shown) is coated on the lower insulating protective layer 12 of the silicon substrate 10. The photosensitive mask material is exposed and developed to pattern a region where the back chamber 41 is to be formed (see FIG. 5A).

The region where the bag chamber 41 is to be formed may be anisotropic wet etched by KOH solution or TMAH solution (see FIG. 5B). In this case, silicon nitride, silicon dioxide, a photosensitive material, gold or chromium may be used as the mask material.

In addition, the region in which the back chamber 41 is to be formed may be anisotropic dry etched by Deep Reactive Ion Etching (DRIE) (see FIG. 5B). In this case, silicon nitride, silicon dioxide, a photosensitive material, gold or chromium may be used as the mask material.

As the lower side of the silicon substrate 10 is etched as described above, a back chamber 41 is formed below the membrane 25.

Referring to FIG. 5C, the sacrificial layer 33 is etched and removed through the sound holes 38 of the back plate 37. At this time, as the sacrificial layer 33 is removed, an air gap 45 is formed between the membrane 25 and the back plate 37. The air gap 45 allows the membrane 25 to vibrate without contact with the back plate 37 when negative pressure is applied to the membrane 25.

The gap of the air gap 45 may be previously designed by the etching depth of the air gap forming part 15 and the thickness of the sacrificial layer 33. Accordingly, the membrane 25 and the back plate 37 may be positioned inside or on the surface of the silicon substrate 10 without depositing the upper portion of the silicon substrate 10. As a result, the present invention can lower the height of the MEMS microphone by the height of the back plate 37 and the membrane 25 as compared with the related art.

In addition, the air passage hole 25a of the membrane 25 allows air to pass through the air gap 45 and the back chamber 41 when a negative pressure acts on the membrane 25. In this case, a pressure almost equal to atmospheric pressure is formed. Thus, negative pressure acts on the membrane 25 normally.

The operation of the MEMS microphone configured as described above will be described.

6 is a schematic view for explaining the action of the membrane and the stress buffer.

Referring to FIG. 6, in the MEMS microphone, when the membrane 25 vibrates by a negative pressure, the gap of the air gap 45 between the membrane 25 and the back plate 37 is changed. At this time, the capacitance changes as the interval of the air gap 45 is changed, and the voice is converted into an electrical signal by the changed capacitance.

In this case, when there is a compressive stress remaining in the membrane 25, the stress buffer 20 may compress the compressive stress of the membrane 25 when the membrane 25 is vibrated or is not vibrated. Buffer.

In addition, when there is a tensile stress remaining in the membrane 25, the stress buffer 20 buffers the tensile stress of the membrane 25 when the membrane 25 is vibrated or not.

Accordingly, the stress buffer 20 may solve the buffer stress generated at the contact portion between the membrane 25 and the silicon substrate 10. In addition, the stress buffer 20 prevents the membrane 25 from being deformed due to residual stress, thereby enabling accurate acoustic sensing.

Meanwhile, the MEMS microphone may control the air gap 45 between the membrane 25 and the back plate 37 by adjusting the etching depth of the air gap forming unit 15.

In addition, since the membrane 25 and the back plate 37 are deposited with the same material including nickel, the process can be simplified and the manufacturing cost can be reduced.

In addition, since the back plate 37 and the membrane 25 are deposited on the silicon substrate 10 by the same process, the manufacturing process of the MEMS microphone can be simplified and the yield can be significantly increased.

In addition, since the membrane 25 and the back plate 37 are deposited at a low temperature by electroless plating, residual stress is generated at the contact portion between the silicon substrate 10 and the membrane 25 and the back plate 37. Can be minimized. Therefore, it is possible to prevent the membrane 25 from being deformed or cracking at the contact portion. In addition, the manufacturing process can be simplified and manufacturing costs can be reduced.

Next, a second embodiment of the MEMS microphone according to the present invention will be described.

7 is a cross-sectional view showing a process of forming an air gap forming portion on a silicon substrate in a second embodiment of a MEMS microphone according to the present invention.

Referring to FIG. 7, the MEMS microphone includes a silicon substrate 50. Both sides of the silicon substrate 50 have silicon nitride (

) Or silicon oxide (

Insulation

protective layers

51 and 52, such as < RTI ID = 0.0 > In this case, the insulating

protective layers

51 and 52 are deposited on the surface of the silicon substrate 50 using low pressure chemical vapor deposition (LPCVD).

The insulating protective layer 51 on the silicon substrate 50 is etched to form the air gap forming portion 55. In this case, the upper insulating protective layer 51 of the silicon substrate 50 may be etched by Reactive Ion Etching (RIE) equipment.

An upper side of the silicon substrate 50 is etched with a KOH solution or a TMAH solution to form the air gap forming part 55 to a predetermined depth D. At this time, as the mask material 61 of the air gap forming portion 55, silicon nitride (

) Or silicon oxide (

) May be applied.

By adjusting the depth D of the air gap forming part 55 to a predetermined depth, the distance between the membrane 77 and the back plate 65 to be described below can be adjusted. The depth of the air gap forming unit 55 may be determined according to the concentration, etching time and temperature of the KOH solution or TMAH solution.

In addition, the circumference of the air gap forming portion 55 may be formed with an inclined surface 56 having an inclination angle α of approximately 54.74 ° when etching with a KOH solution or TMAH solution. At this time, the reaction with the KOH solution or TMAH solution is relatively slow in the inclination direction (111 crystal direction) of the silicon crystal, and the reaction with the KOH solution or TMAH solution is relatively relatively in the vertical direction (100 crystal direction) of the silicon crystal. fast. Therefore, the inclined surface 56 is formed around the air gap forming part 55.

8A to 8C are cross-sectional views illustrating a process of depositing a back plate on an air gap forming portion of the silicon substrate of FIG. 7.

8A to 8C, a back plate 65 is deposited on the air gap forming portion 55 of the silicon substrate 50. The back plate 65 may be deposited by an electroless plating method. This back plate 65 is a lower electrode of the capacitor for measuring vibration by capacitance.

The electroless plating method of the back plate 65 is made through the following process. First, the photosensitive mask material 61 is coated on the surface of the silicon substrate 50 on which the air gap forming part 55 is formed. The photosensitive mask material 61 is exposed and developed to pattern the region where the back plate 65 and the sound hole 66 are to be formed (see FIG. 8A). The patterned silicon surface is surface activated for nickel electroless plating. The nickel back plate 65 is formed on the surface of the surface activated silicon substrate 50 by electroless plating (see FIG. 8B). After the nickel back plate 65 is formed, the photosensitive material is removed (see FIG. 8C). Finally, the surface of the back plate 65 is cleaned.

Since the back plate 65 is formed by reduction substitution of conductive ions at a low temperature of about 90 ° C. by electroless plating, it is necessary to heat the back plate 65 to a high temperature of about 1100 ° C. to deposit the back plate 65. none. Since the back plate 65 is made of a metallic material, the back plate 65 is electrically connected to an external circuit (eg, an ASIC chip) measuring capacitance. Therefore, there is no need to go through a separate high temperature heating process to inject and stabilize metallic ions into polysilicon as in the prior art, and the manufacturing process can be reduced.

In addition, since the back plate 65 and the silicon substrate 50 are not heated to a high temperature even if there is a difference in the coefficient of thermal expansion, the back plate 65 and the silicon substrate 50 are compressed at a residual stress at the contact portion between the back plate 65 and the silicon substrate 50. Almost no compressive or tensile stress is generated. As a result, since the back plate 65 is hardly deformed due to residual stress, cracks may be prevented from occurring at the contact portion between the back plate 65 and the silicon substrate 50.

On the contrary, when the back plate is formed by the electroplating method as in the related art, after the seed layer is deposited on the surface of the back plate, electricity must be supplied. In the seed layer, electricity is distributed at partially uneven intensity. At this time, since the back plate is plated with a non-uniform thickness of the conductive ions, the thickness of the back plate may be uneven overall. However, the electroless plating method of the present invention has no current density difference in the back plate, so that the thickness of the back plate becomes uniform throughout.

Meanwhile, a flexible conductive material including nickel may be applied to the back plate 65. Since the back plate 65 is a conductive material, electricity may be supplied to the back plate 65. In addition, since the back plate 65 is a soft material, the back plate 65 may be prevented from being damaged by an external impact.

In addition, the thickness of the back plate 65 may be formed to approximately 2 ~ 100㎛. The thickness of the back plate 65 may be adjusted to an appropriate thickness according to the sound pressure sensed by the MEMS microphone.

On the other hand, when the back plate 65 is electroplated, the metal vapor for plating is almost vertically vertically above and below the air gap forming part 55 by a sputter or an electron beam (E-beam). Or sprayed with a slight inclination. At this time, the back plate 65 and the electrode (not shown) may be short-circuited on the inclined surface 56 of the air gap forming part 55. However, when the back plate 65 is electroless plated, the back plate 65 is easily deposited on the curved surface, so that the back plate and its electrode (not shown) can be easily connected without being shorted.

9A and 9B are cross-sectional views illustrating a process of depositing a sacrificial layer and a stress buffer on the back plate of a silicon substrate.

Referring to FIG. 9A, a sacrificial layer 73 is deposited on the air gap forming part 55. In this case, since the sacrificial layer 73 is deposited on the air gap forming part 55 etched to the silicon substrate 60 to a predetermined depth D, a separate layer is deposited to deposit the sacrificial layer 73. There is no need to etch. Thus, the sacrificial layer can be easily deposited and the manufacturing process can be reduced.

The top surface of the sacrificial layer 73 may be deposited to form the same plane as the top surface of the silicon substrate 50. In this case, when the sacrificial layer 73 is a highly viscous solid material, the surface of the sacrificial layer 73 may be smoothed through chemical mechanical polishing (CMP). In addition, when the sacrificial layer 73 is a material having a low viscosity, the surface of the sacrificial layer 73 may be smoothly formed so that the chemical mechanical polishing may not be performed separately.

The sacrificial layer 73 may be formed of a material such as silicon oxide, photoresist, plated copper, or the like.

Referring to FIG. 9B, a stress buffer 70 is deposited around the upper side of the sacrificial layer 73.

The stress buffer 70 is made through the following process.

The photosensitive mask material 72 is applied to the surface of the sacrificial layer 73. The photosensitive mask material 72 is exposed and developed to pattern the region 72a in which the stress buffer 70 is to be formed. The stress buffer 70 is deposited in the region 72a in which the stress buffer 70 is to be formed. Then, the photosensitive mask material is removed.

The stress buffer 70 may be formed of a plurality of material layers 70a, 70b, and 70c having different thermal expansion coefficients. For example, the stress buffer 20 may be formed by stacking chromium 70a (Cr), gold 70b (Au), and polyimide 70c (Polyimide).

In this case, the thermal expansion coefficients of the plurality of material layers 70a, 70b, and 70c may gradually increase from the silicon substrate 50 toward the membrane 77. For example, the chromium (coefficient of thermal expansion 4.9), gold (coefficient of thermal expansion 14.2), and polyimide (coefficient of thermal expansion 35) may be stacked in the silicon substrate 50 toward the membrane 77. Here, the thermal expansion coefficient of the silicon substrate is 2.6, the thermal expansion coefficient of silicon nitride, which is a protective layer of the silicon substrate, is 2.7, and the thermal expansion coefficient of the nickel membrane is 13.4. Physical properties of the material layers are as shown in the above-mentioned [Table].

The stress buffer 20 is cracked at the contact portion between the membrane 77 and the silicon substrate 50 by the buffering action of the plurality of material layers 70a, 70b, 70c when the membrane 77 is vibrated. Prevent it from occurring. Since the operation of the stress buffer 20 is substantially the same as described above, a description thereof will be omitted.

10 is a cross-sectional view illustrating a process of depositing a membrane on a stress buffer and a sacrificial layer.

Referring to FIG. 10, the membrane 77 may be deposited on the sacrificial layer 73 by an electroless plating method. The membrane 77 may be deposited to a thickness of approximately 0.1 ~ 5㎛.

The electroless plating method of the membrane 77 is performed through the following process. First, a photosensitive mask material (not shown) is applied to the surface of the sacrificial layer 73. The photosensitive mask material is exposed and developed to pattern the area where the membrane 77 is to be formed. The patterned membrane 77 area is surface activated for nickel electroless plating. Nickel membrane 77 is formed on the surface of the surface-activated membrane 77 region by electroless plating. After the nickel membrane 77 is formed, the photosensitive material is removed. Finally, the surface of the membrane 77 is cleaned.

Since the membrane 77 is formed by reduction substitution of conductive ions at a low temperature of about 90 ° C. by electroless plating, it is necessary to heat the membrane 77 to a high temperature of about 1100 ° C. in the related art. There is no.

Since the membrane 77 is made of a metallic material, the membrane 77 may be electrically connected to an external circuit (eg, an ASIC chip) for measuring capacitance. Therefore, there is no need to perform a separate high temperature heating process for injecting metallic ions into the membrane 77.

Since the membrane 77 and the silicon substrate 50 are not heated to a high temperature even if there is a difference in the coefficient of thermal expansion, the compressive stress, which is a residual stress at the contact portion of the membrane 77 and the silicon substrate 50, is increased. ) Or tensile stress is hardly generated. As a result, since the membrane 77 is hardly deformed by residual stress, cracks may be prevented from occurring at the contact portion between the membrane 77 and the silicon substrate 50.

In addition, the membrane 77 may be formed of a flexible conductive material including nickel. Since the membrane 77 is a conductive material, electricity may be supplied. In addition, since the membrane 77 is a soft material, it can be prevented from being damaged by excessive current or external impulse.

11A and 11B are cross-sectional views illustrating a process of forming a back chamber and an air gap in a silicon substrate.

Referring to FIG. 11A, a photosensitive mask material is coated on the lower insulating protective layer 52 of the silicon substrate 50. The photosensitive mask material is exposed and developed to pattern an area where the back chamber 81 is to be formed.

The region where the bag chamber 81 is to be formed may be anisotropic wet etched by KOH solution or TMAH solution. In this case, silicon nitride, silicon dioxide, a photosensitive material, gold or chromium may be used as the mask material.

In addition, an area in which the back chamber 81 is to be formed may be anisotropic dry etched by deep reactive ion etching (DRIE). In this case, silicon nitride, silicon dioxide, a photosensitive material, gold or chromium may be used as the mask material.

As the lower side of the silicon substrate 50 is etched as described above, the back chamber 81 is formed below the back plate 65.

Referring to FIG. 11B, the sacrificial layer 73 is etched and removed through the sound holes 66 of the back plate 65. In this case, as the sacrificial layer 73 is removed, an air gap 85 is formed between the membrane 77 and the back plate 65. The air gap 85 allows the membrane 77 to vibrate without contact with the back plate 65 when a negative pressure is applied to the membrane 77.

The gap of the air gap 85 may be predesigned by the etching depth of the silicon substrate 50 and the deposition height of the air gap forming part 55. Accordingly, the membrane 77 and the back plate 65 may be positioned inside or on the surface of the silicon substrate 50 without depositing the upper portion of the silicon substrate 50. As a result, the present invention can lower the height of the MEMS microphone by the height of the back plate 65 and the membrane 77 as compared with the prior art.

In addition, the air passage hole 77a of the membrane 77 allows air to pass through the air gap 85 and the back chamber 81 when a negative pressure acts on the membrane 77, and thus the back chamber 81. The air gap 85 has a pressure almost equal to atmospheric pressure. Thus, negative pressure acts on the membrane 77 normally.

The MEMS microphone may adjust the air gap 85 between the membrane 77 and the back plate 65 by adjusting the etching depth of the air gap forming unit 55.

In addition, since the membrane 77 and the back plate 65 are deposited from the same material including nickel, the process can be simplified and manufacturing costs can be reduced.

In addition, since the back plate 65 and the membrane 77 are deposited on the silicon substrate 50 by the same process, the manufacturing process of the MEMS microphone can be simplified and the yield can be significantly increased.

In addition, since the membrane 77 and the back plate 65 are deposited at a low temperature by electroless plating, residual stress is generated at the contact portion between the silicon substrate 50 and the membrane 77 and the back plate 65. Can be minimized. Therefore, it is possible to prevent the membrane 77 from being deformed or cracking at the contact portion. In addition, the manufacturing process can be simplified and manufacturing costs can be reduced.

Since the present invention can prevent the occurrence of cracks by reducing the residual stress at the contact portion of the membrane and the silicon substrate, there is a significant industrial applicability.

3A and 3B are cross-sectional views illustrating a process of depositing a membrane in an air gap forming portion of the silicon substrate of FIG. 2C.

6 is a schematic view for explaining the operation of the membrane and the stress buffer of FIG.

9A and 9B are cross-sectional views illustrating a process of depositing a sacrificial layer and a stress buffer on the back plate of FIG. 8C.

FIG. 10 is a cross-sectional view illustrating a process of depositing a membrane on the stress buffer and the sacrificial layer of FIG. 9B.

Explanation of symbols on the main parts of the drawings

10,50: silicon substrate 15,55: air gap forming portion

16,56: slope 25,77: membrane

33,73: sacrificial layer 37,65: back plate

41,81: back chamber 45,85: air gap

20, 70: stress buffer 20a, 20b, 20c, 70a, 70b, 70c: material layer

Claims

A silicon substrate on which a back chamber is formed;

A back plate deposited on the silicon substrate and having a plurality of sound holes;

A membrane deposited on the silicon substrate to be spaced apart from the back plate to form an air gap; And

MEMS microphone comprising; a stress buffer deposited on the contact portion of the membrane and the silicon substrate.

The method of claim 1,

The stress buffer unit MEMS microphone, characterized in that made of a plurality of material layers having different coefficients of thermal expansion.

The method of claim 2,

Mess microphone, characterized in that the thermal expansion coefficient of the plurality of layers of material increases toward the membrane side from the silicon substrate.

The method of claim 2,

Wherein said stress buffer comprises a layer of chromium, gold and polyimide material.

The method of claim 1,

As the silicon substrate is etched to a predetermined depth is formed an air gap forming portion,

The membrane is deposited below the air gap or above the silicon substrate,

And the back plate is deposited below the air gap or above the silicon substrate to form an air gap spaced apart from the membrane.

The method of claim 5,

MEMS microphone, characterized in that the gap of the air gap between the membrane and the back plate is adjusted according to the depth of the air gap forming portion.

The method of claim 1,

MEMS microphone, characterized in that the membrane or the back plate is deposited by an electroless plating method.

Depositing a stress buffer on the silicon substrate;

Depositing a membrane on the stress buffer;

Depositing a sacrificial layer on the membrane;

Depositing a back plate such that a plurality of sound holes are formed in the sacrificial layer;

Etching the lower side of the silicon substrate to form a back chamber; And

Removing the sacrificial layer to form an air gap between the membrane and the back plate.

The method of claim 8,

In the step of depositing the stress buffer, a method of manufacturing a MEMS microphone, characterized in that a plurality of material layers are sequentially stacked.

The method of claim 9,

In the step of depositing the stress buffer, a method of manufacturing a MEMS microphone, characterized in that the material layer with a larger coefficient of thermal expansion is deposited from the silicon substrate to the membrane.

The method of claim 9,

The method of claim 8,

The step of depositing the stress buffer is:

Forming an air gap forming portion on the silicon substrate; And

Method of manufacturing a MEMS microphone, characterized in that it comprises the step of depositing a stress buffer on the bottom surface of the air gap forming portion.

13. The method of claim 12,

The gap of the air gap between the membrane and the back plate is adjusted according to the depth of the air gap forming portion.

The method of claim 8,

In the step of depositing the membrane or the back plate, the method of manufacturing a MEMS microphone, characterized in that deposited by the electroless plating method.

Depositing a back plate on the silicon substrate;

Depositing a sacrificial layer on the back plate;

Depositing a stress buffer around the back plate of the silicon substrate;

Depositing a membrane on the stress buffer and the sacrificial layer;

Etching the lower side of the silicon substrate to form a back chamber; And

The method of claim 15,

The method of claim 16,

The method of claim 15,

Depositing a back plate on the silicon substrate may include:

Forming an air gap forming portion on the silicon substrate; And

And depositing a back plate on the bottom surface of the air gap forming unit.

The method of claim 15,