KR101103155B1 - 노광 장치 - Google Patents

노광 장치 Download PDF

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Publication number
KR101103155B1
KR101103155B1 KR1020067022508A KR20067022508A KR101103155B1 KR 101103155 B1 KR101103155 B1 KR 101103155B1 KR 1020067022508 A KR1020067022508 A KR 1020067022508A KR 20067022508 A KR20067022508 A KR 20067022508A KR 101103155 B1 KR101103155 B1 KR 101103155B1
Authority
KR
South Korea
Prior art keywords
exposure
image
pattern
image data
optical system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020067022508A
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English (en)
Korean (ko)
Other versions
KR20070001252A (ko
Inventor
미요시 이또오
Original Assignee
브이 테크놀로지 씨오. 엘티디
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 브이 테크놀로지 씨오. 엘티디 filed Critical 브이 테크놀로지 씨오. 엘티디
Publication of KR20070001252A publication Critical patent/KR20070001252A/ko
Application granted granted Critical
Publication of KR101103155B1 publication Critical patent/KR101103155B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067022508A 2004-04-28 2005-04-28 노광 장치 Expired - Fee Related KR101103155B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00134443 2004-04-28
JP2004134443A JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置
PCT/JP2005/008117 WO2005106596A1 (ja) 2004-04-28 2005-04-28 露光装置

Publications (2)

Publication Number Publication Date
KR20070001252A KR20070001252A (ko) 2007-01-03
KR101103155B1 true KR101103155B1 (ko) 2012-01-04

Family

ID=35241832

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020067022508A Expired - Fee Related KR101103155B1 (ko) 2004-04-28 2005-04-28 노광 장치

Country Status (5)

Country Link
JP (1) JP4253708B2 (enExample)
KR (1) KR101103155B1 (enExample)
CN (2) CN101846889B (enExample)
TW (1) TWI347450B (enExample)
WO (1) WO2005106596A1 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법
KR102065012B1 (ko) * 2016-07-26 2020-01-10 에이피시스템 주식회사 레이저 처리장치 및 레이저 처리방법
JP6917727B2 (ja) * 2017-02-15 2021-08-11 株式会社ディスコ レーザー加工装置
JP7211627B2 (ja) * 2020-04-10 2023-01-24 Ａｌｉｔｅｃｓ株式会社 パターン測定装置、方法及びプログラム、並びに、パターン検査装置、方法及びプログラム

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01125823A (ja) * 1987-11-10 1989-05-18 Nikon Corp アライメント装置
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法
JP2797506B2 (ja) * 1989-08-31 1998-09-17 凸版印刷株式会社 露光装置
JPH03201454A (ja) * 1989-12-28 1991-09-03 Fujitsu Ltd 半導体装置の位置合わせ方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01125823A (ja) * 1987-11-10 1989-05-18 Nikon Corp アライメント装置
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
KR20070001252A (ko) 2007-01-03
TW200535453A (en) 2005-11-01
CN1947069B (zh) 2010-09-29
WO2005106596A1 (ja) 2005-11-10
CN1947069A (zh) 2007-04-11
TWI347450B (en) 2011-08-21
JP4253708B2 (ja) 2009-04-15
CN101846889A (zh) 2010-09-29
CN101846889B (zh) 2012-05-09
JP2005317800A (ja) 2005-11-10

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