KR100990815B1 - 수소센서 및 그 제조방법 - Google Patents
수소센서 및 그 제조방법 Download PDFInfo
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- KR100990815B1 KR100990815B1 KR1020080065702A KR20080065702A KR100990815B1 KR 100990815 B1 KR100990815 B1 KR 100990815B1 KR 1020080065702 A KR1020080065702 A KR 1020080065702A KR 20080065702 A KR20080065702 A KR 20080065702A KR 100990815 B1 KR100990815 B1 KR 100990815B1
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- South Korea
- Prior art keywords
- hydrogen sensor
- electrodes
- manufacturing
- hydrogen
- forming
- Prior art date
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- 239000001257 hydrogen Substances 0.000 title claims abstract description 55
- 229910052739 hydrogen Inorganic materials 0.000 title claims abstract description 55
- 238000000034 method Methods 0.000 title claims abstract description 29
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 125000004435 hydrogen atom Chemical class [H]* 0.000 title claims 9
- 239000002070 nanowire Substances 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 238000006243 chemical reaction Methods 0.000 claims abstract description 6
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 59
- 229910052763 palladium Inorganic materials 0.000 claims description 28
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 7
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims description 6
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 claims description 6
- 238000009713 electroplating Methods 0.000 claims description 5
- 238000004544 sputter deposition Methods 0.000 claims description 4
- 238000002207 thermal evaporation Methods 0.000 claims description 4
- 239000011780 sodium chloride Substances 0.000 claims description 3
- 238000005566 electron beam evaporation Methods 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 abstract description 37
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 20
- 230000035945 sensitivity Effects 0.000 abstract description 9
- 239000010408 film Substances 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
- 239000002042 Silver nanowire Substances 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000007772 electrode material Substances 0.000 description 4
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 101150003085 Pdcl gene Proteins 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910007116 SnPb Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000007084 catalytic combustion reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000000313 electron-beam-induced deposition Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- -1 silver ions Chemical class 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/02—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
- G01N27/04—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
- G01N27/12—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
- G01N27/125—Composition of the body, e.g. the composition of its sensitive layer
- G01N27/127—Composition of the body, e.g. the composition of its sensitive layer comprising nanoparticles
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/403—Cells and electrode assemblies
- G01N27/414—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS
- G01N27/4146—Ion-sensitive or chemical field-effect transistors, i.e. ISFETS or CHEMFETS involving nanosized elements, e.g. nanotubes, nanowires
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
- G01N33/0036—General constructional details of gas analysers, e.g. portable test equipment concerning the detector specially adapted to detect a particular component
- G01N33/005—H2
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- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Immunology (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Nanotechnology (AREA)
- Molecular Biology (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Combustion & Propulsion (AREA)
- Food Science & Technology (AREA)
- Medicinal Chemistry (AREA)
- Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)
Abstract
Description
Claims (12)
- (a) 기판 상에 제1 및 제2 전극을 형성하는 단계;(b) 상기 제1 및 제2 전극간에 전압을 인가하여 나노선을 형성하는 단계; 및(c) 상기 나노선 상에 반응막을 형성하는 단계를 포함하며,상기 (b) 단계에서 전압 인가 전에 상기 제1 및 제2 전극 중 적어도 하나의 전극 상에 물을 적하하는 것을 특징으로 하는 수소센서의 제조방법.
- 제1항에 있어서,상기 제1 및 제2 전극은 은(Ag)을 포함하는 것을 특징으로 하는 수소센서의 제조방법.
- 제1항에 있어서,상기 제1 및 제2 전극간의 간격은 50㎛ 내지 500㎛의 범위인 것을 특징으로 하는 수소센서의 제조방법.
- 제1항에 있어서,상기 (b)에서 인가되는 전압은 0.5V 내지 5V의 범위인 것을 특징으로 하는 제조방법.
- 제1항에 있어서,상기 나노선은 은(Ag)을 포함하는 것을 특징으로 하는 수소센서의 제조방법.
- 삭제
- 제1항에 있어서,상기 제1 및 제2 전극 상에 절연성 캡을 설치하는 것을 특징으로 하는 수소센서의 제조방법.
- 제1항에 있어서,상기 물에는 NaCl, Na2SO4, NaBr, NaF 중 적어도 하나 이상의 나노선 성장 제어물질을 첨가하는 것을 특징으로 하는 수소센서의 제조방법.
- 제1항에 있어서,상기 반응막은 팔라듐(Pd)막인 것을 특징으로 하는 수소센서의 제조방법.
- 제9항에 있어서,상기 팔라듐막의 형성방법은 열증착법, 전자빔 증착법, 스퍼터링법 및 전기 도금법을 포함하는 것을 특징으로 하는 수소센서의 제조방법.
- 제10항에 있어서,상기 팔라듐막의 두께는 10㎛ 내지 500㎛의 범위인 것을 특징으로 하는 수소센서의 제조방법.
- 제1항 내지 제5항, 제7항 내지 제11항 중 어느 한 항의 방법에 의해 제조되는 것을 특징으로 하는 수소센서.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020080065702A KR100990815B1 (ko) | 2008-07-07 | 2008-07-07 | 수소센서 및 그 제조방법 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020080065702A KR100990815B1 (ko) | 2008-07-07 | 2008-07-07 | 수소센서 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20100005607A KR20100005607A (ko) | 2010-01-15 |
KR100990815B1 true KR100990815B1 (ko) | 2010-10-29 |
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KR1020080065702A KR100990815B1 (ko) | 2008-07-07 | 2008-07-07 | 수소센서 및 그 제조방법 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11946920B2 (en) | 2020-01-31 | 2024-04-02 | Korea Institute Of Science And Technology | Hydrogen sensor having vertical nanogap structure and method for manufacturing the same |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102208383B1 (ko) | 2018-07-05 | 2021-01-28 | 한국과학기술원 | 수소 센서 및 그 제조 방법 |
KR102246230B1 (ko) | 2019-03-26 | 2021-04-29 | 한국과학기술원 | 수소 센서 및 그 제조 방법 |
KR102545620B1 (ko) * | 2022-03-30 | 2023-06-21 | 한국화학연구원 | 클릭반응을 이용한 cnt 필름, 이를 이용한 cnt 기반 수소 가스 센서 및 이의 제조방법 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6713377B2 (en) | 1998-07-31 | 2004-03-30 | Industrial Technology Research Institute | Method of electroless plating copper on nitride barrier |
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- 2008-07-07 KR KR1020080065702A patent/KR100990815B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6713377B2 (en) | 1998-07-31 | 2004-03-30 | Industrial Technology Research Institute | Method of electroless plating copper on nitride barrier |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11946920B2 (en) | 2020-01-31 | 2024-04-02 | Korea Institute Of Science And Technology | Hydrogen sensor having vertical nanogap structure and method for manufacturing the same |
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