KR100871887B1 - 유도결합 플라즈마 처리장치 - Google Patents

유도결합 플라즈마 처리장치 Download PDF

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Publication number
KR100871887B1
KR100871887B1 KR1020020027704A KR20020027704A KR100871887B1 KR 100871887 B1 KR100871887 B1 KR 100871887B1 KR 1020020027704 A KR1020020027704 A KR 1020020027704A KR 20020027704 A KR20020027704 A KR 20020027704A KR 100871887 B1 KR100871887 B1 KR 100871887B1
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KR
South Korea
Prior art keywords
plasma processing
coil electrode
inductively coupled
coupled plasma
processing chamber
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KR1020020027704A
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English (en)
Korean (ko)
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KR20020089172A (ko
Inventor
아츠시 마츠시타
카즈토 오부치
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도쿄 오카 고교 가부시키가이샤
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Publication of KR20020089172A publication Critical patent/KR20020089172A/ko
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Publication of KR100871887B1 publication Critical patent/KR100871887B1/ko

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    • A—HUMAN NECESSITIES
    • A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
    • A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
    • A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
    • A47L13/20—Mops
    • A47L13/24—Frames for mops; Mop heads

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  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020020027704A 2001-05-21 2002-05-20 유도결합 플라즈마 처리장치 KR100871887B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001150713A JP3907425B2 (ja) 2001-05-21 2001-05-21 誘導結合プラズマ処理装置
JPJP-P-2001-00150713 2001-05-21

Publications (2)

Publication Number Publication Date
KR20020089172A KR20020089172A (ko) 2002-11-29
KR100871887B1 true KR100871887B1 (ko) 2008-12-03

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ID=18995686

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020027704A KR100871887B1 (ko) 2001-05-21 2002-05-20 유도결합 플라즈마 처리장치

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JP (1) JP3907425B2 (ja)
KR (1) KR100871887B1 (ja)
TW (1) TW557643B (ja)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5636931B2 (ja) * 2010-12-13 2014-12-10 株式会社昭和真空 電子ビーム照射装置、これを用いる電子ビーム照射処理装置、及びこれらに用いるコレクター電極
US9279179B2 (en) * 2012-02-06 2016-03-08 Taiwan Semiconductor Manufacturing Co., Ltd. Multi coil target design
US9736920B2 (en) * 2015-02-06 2017-08-15 Mks Instruments, Inc. Apparatus and method for plasma ignition with a self-resonating device
JP6715129B2 (ja) 2016-08-31 2020-07-01 東京エレクトロン株式会社 プラズマ処理装置
JP6876326B2 (ja) * 2017-03-27 2021-05-26 株式会社昭和真空 電子ビーム発生装置およびコレクタ電極
CN111161993A (zh) * 2020-01-19 2020-05-15 无锡市邑勉微电子有限公司 一种法拉第屏蔽反应腔室
KR102540773B1 (ko) * 2021-01-19 2023-06-12 피에스케이 주식회사 패러데이 실드 및 기판 처리 장치
KR102553189B1 (ko) * 2021-12-29 2023-07-10 피에스케이 주식회사 기판 처리 장치
CN114446759B (zh) * 2022-01-26 2024-03-26 北京北方华创微电子装备有限公司 半导体工艺设备

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10275694A (ja) * 1997-03-31 1998-10-13 Hitachi Ltd プラズマ処理装置及び処理方法
JPH11185995A (ja) * 1997-12-25 1999-07-09 Tokyo Ohka Kogyo Co Ltd プラズマ処理装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10275694A (ja) * 1997-03-31 1998-10-13 Hitachi Ltd プラズマ処理装置及び処理方法
JPH11185995A (ja) * 1997-12-25 1999-07-09 Tokyo Ohka Kogyo Co Ltd プラズマ処理装置

Also Published As

Publication number Publication date
KR20020089172A (ko) 2002-11-29
JP2002343776A (ja) 2002-11-29
JP3907425B2 (ja) 2007-04-18
TW557643B (en) 2003-10-11

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