KR100863317B1 - Plasma Cleaning System - Google Patents

Abstract

The present invention relates to a plasma cleaning apparatus, and more particularly, after the semiconductor package molding process, by limiting the use of a tablet such as wax or melamine to remove foreign substances in plasma cleaning of the mold chase. Control costs and additional material costs can be suppressed and production efficiency can be increased.

In the technical configuration, the linear-way structure with the dual block can move forward and backward in the horizontal direction by the rack and the pinion, and the rotation block coupled with the plasma headset by the angular bearing and the rotation axis is upper. Up and down in the downward direction, the plasma cleaning device can clean the upper and lower mold chase smoothly in a narrow space by the plasma headset.

Plasma, Semiconductor Package, Auto Mold, Mold Chase, Rotation

Description

Plasma Cleaning System {Plasma Cleaning System}

1 is a cross-sectional view schematically showing a plasma cleaning apparatus according to an embodiment of the present invention;

2 is a rear view schematically showing a plasma cleaning apparatus according to an embodiment of the present invention;

3 is a cross-sectional view schematically showing an operation process of the plasma cleaning apparatus according to an embodiment of the present invention;

4 is a perspective view schematically showing a plasma headset assembly according to an embodiment of the present invention;

5 is a rear view and a front view schematically showing a plasma headset assembly according to an embodiment of the present invention;

6 is a plan view schematically showing a plasma headset assembly according to an embodiment of the present invention;

7 is a rear view schematically showing a linear way structure according to an embodiment of the present invention;

8 is a front view schematically showing a linear way structure according to an embodiment of the present invention;

9 is a perspective view schematically showing a linear way structure according to an embodiment of the present invention;

10 is a bottom view schematically showing a ball carrier structure according to an embodiment of the present invention;

11 is a front view schematically showing a ball carrier structure according to an embodiment of the present invention;

12 is a perspective view schematically showing a ball carrier structure according to an embodiment of the present invention;

Figure 13 is a perspective view schematically showing a linear way structure and a plasma headset assembly coupled state according to an embodiment of the present invention,

14 is a perspective view schematically showing a ball screw structure according to another embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

1: plasma cleaning device 10: outer housing

11: handler 13: alignment block

20: plasma headset assembly 30: linear way structure

40: ball carrier structure 50: auto mold work table

51: press main shaft 60: worker

70: plasma headset 71: seating detection sensor

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plasma cleaning apparatus, wherein after a semiconductor package molding process, a linear way structure having a dual structure block is moved forward and backward in a horizontal direction by a rack and a pinion in plasma cleaning of a mold chase. The rotation block coupled with the plasma headset can be up and down by the angular bearing and the rotation axis, and the up and down directions can be up and down, thereby smoothly cleaning the upper and lower mold chases in a narrow space by the plasma headset. In addition, the present invention relates to a plasma cleaning apparatus capable of limiting the use of tablets such as wax or melamine to remove foreign substances, thereby suppressing material management costs and additional material costs and bringing efficiency in production.

In general, semiconductors, which allow the control and amplification and storage of electrical signals by using properties that are intermediate between conductors and insulators, protect surfaces from external moisture and impurities, and effectively dissipate heat generated at junctions. In order to be built into a container made of metal, ceramic or plastic, etc., this is commonly called a semiconductor package (package).

The semiconductor package is largely manufactured by a manufacturing process consisting of a bonding process, a molding process, an MBT process, and a test process, and the molding process is performed by an auto molding operation.

However, since a tablet such as wax or melamine has been conventionally used to remove foreign substances in a mold chase during automolding, the cost and process processing time incurred during the tablet work are large. This can lead to production problems.

Accordingly, an object of the present invention is to solve the above problems, the object of the present invention is to use the linear way structure and the plasma headset assembly in the preferred horizontal and centering state of the plasma cleaning apparatus using the handler and ball carrier structure. The present invention provides a plasma cleaning apparatus for removing foreign matter from upper and lower mold chases by a downwardly directed plasma headset.

The present invention for achieving the above object,

A handler attached to one side of the outer housing;

An alignment block attached to the lower portion of the outer housing;

A ball carrier provided at four corners in a quadrangular shape at a lower side of the outer housing, and having a rolling rolling ball embedded in each ball housing;

A linear rail is provided to be movable in a horizontal direction between blocks forming a dual structure, and a block on one side is provided on a moving plate, and a lower end of the moving plate A rack having a spline shape is inserted into a surface thereof, and a pinion corresponding to the spline shape of the rack has a pinion formed in a circumferential direction to be engaged with the rack. A dual linear-way structure coupled to the side; And

A rotation block provided at the upper center of the plasma head-set and having a housing socket having a circular groove formed therein and a ball stud having a lower end formed in a circular shape at the groove of the housing socket; A plasma headset assembly comprising a rotation shaft having a circular cross section fixed to a housing from one side of the rotation block so that the rotation block can up and down the plasma headset in an up and down direction;

Characterized in that comprises a.

When the rotation block coupled to the plasma headset moves in the horizontal direction and moves up and down in the horizontal direction, an angular bearing is provided on the outer circumferential surface of the rotary shaft at a predetermined position for clearance prevention and smooth centering. It is done.

And a bearing cover outside the angular bearing and the rotating shaft.

In order to limit the rotation range of the rotation block to 0 ° to 180 °, it is characterized in that a rotation stopper is formed stepwise on one side lower portion of the bearing cover.

A spring pin is provided through the rotation block and the bearing cover to prevent separation of the rotation block associated with the plasma headset.

A clamp is provided on one side of the bearing cover and one side of the housing to fix the plasma headset when the rotation block moves in the horizontal direction.

A pin housing for protecting the spring pin is further provided.

An auxiliary shaft is further provided between the bearing cover and the housing to assist the rotating shaft.

Characterized in that it further comprises a seating detection sensor on one side and the other side of the lower surface of the plasma headset.

A linear rail is provided to be movable in a horizontal direction between the blocks forming a dual structure, and a block on one side is provided on a moving plate, and the moving plate is a screw housing. and a ball screw connected to the screw housing from the support unit to the screw housing so as to be movable in the horizontal direction by rotating by a rotating motor. .

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

1 is a cross-sectional view schematically showing a plasma cleaning apparatus according to an embodiment of the present invention, Figure 2 is a rear view schematically showing a plasma cleaning apparatus according to an embodiment of the present invention, Figure 3 is a view of the present invention 4 is a cross-sectional view schematically illustrating an operation process of a plasma cleaning apparatus according to an embodiment, FIG. 4 is a perspective view schematically showing a plasma headset assembly according to an embodiment of the present invention, and FIG. 5 is a plasma according to an embodiment of the present invention. FIG. 6 is a rear view and a front view schematically illustrating the headset assembly, and FIG. 6 is a plan view schematically illustrating the plasma headset assembly according to an embodiment of the present invention, and FIG. 7 is a schematic view of the linear way structure according to the embodiment of the present invention. 8 is a rear view schematically illustrating a linear way structure according to an embodiment of the present invention. 9 is a perspective view schematically illustrating a linear way structure according to an embodiment of the present invention, FIG. 10 is a bottom view schematically showing a ball carrier structure according to an embodiment of the present invention, and FIG. 12 is a front view schematically showing a ball carrier structure according to an embodiment of the present invention, Figure 12 is a perspective view schematically showing a ball carrier structure according to an embodiment of the present invention, Figure 13 is according to an embodiment of the present invention FIG. 14 is a perspective view schematically illustrating a linear way structure and a plasma headset assembly coupled state, and FIG. 14 is a perspective view schematically illustrating a ball screw structure according to another exemplary embodiment of the present invention.

1 to 3, the plasma cleaning apparatus 1 according to the exemplary embodiment of the present invention has a handler 11 attached to one side of the outer housing 10, and the other side of the outer housing 10. An alignment block 13 is attached to the bottom.

A ball housing 43 is provided at each of four corners of the lower side of the outer housing 10 and has a circular rolling ball 41 embedded in each of the ball housings 43. A carrier 40 is preferably provided (see FIGS. 10 to 11).

Thus, the operator 60 can preferably move the plasma cleaning apparatus 1 to the desired position using the handler 11, which is possible by rotating the rolling ball 41 of the ball carrier 40, This allows the alignment block 13 to abut on the press main shaft 51 of the auto mold work table 50 so that the plasma cleaning apparatus 1 can be positioned at a precise position without play (FIG. 2).

In addition, a linear rail 31 is provided between the blocks 35 forming a dual structure so as to be movable in a horizontal direction, and the block 35 on one side is a moving plate 33. It is provided in, the lower side of the movable plate 33 is a rack (rack, 33a) having a spline shape is inserted into the bottom surface, the spline shape corresponding to the spline shape of the rack 33a is formed in the circumferential direction ( A linear-way structure 30 having a pinion 37 engaged with the rack 33a is preferably coupled to the upper one side and the other side of the outer housing 10. FIGS. 9)

Finally, a housing socket 24b provided in the upper center of the plasma head-set 70 and having a circular groove therein and a ball stud having a lower end in a circular shape in the groove of the housing socket 24b ( A rotation block 24 to which the rotation block 24a is coupled, and the rotation block 24 of the rotation block 24 to up and down the plasma headset 70 up and down. It comprises a plasma headset assembly 20 consisting of a rotation shaft 25 of a circular cross section fixed to the housing 21 from one side (see Fig. 4).

And, referring to Figure 4, the plasma headset assembly 20 according to an embodiment of the present invention further has a shaft fixing portion 26a for fixing the rotating shaft 23 on the upper side of the rotation block 24 It is provided.

5 and 6, the mold chase surface is formed due to the floating joint type coupling structure of the ball stud 24a and the housing socket 24b that are the coupling structure of the plasma headset 70 and the rotation block 24. It is possible to maintain a horizontal level with the plasma headset 70 for cleaning (not shown).

Further, preferred centering of the rotation block 24 rotated by the angular bearing 26 when the plasma headset 70 is moved up and down is performed, and the angular bearing 26 and the rotation are made. By providing the bearing cover 29 on the outside of the shaft 25 it can have a smoothness and stability when rotating.

In addition, even when the rotation block 24 coupled to the plasma headset 70 moves in the horizontal direction, the clearance prevention and smooth centering are maintained by the angular bearing 26.

By forming a rotation stopper 28 at one lower portion of the bearing cover 29, the rotation range of the rotation block 24 may be limited to 0 ° to 180 °.

This is because it may be difficult to maintain the horizontality of the plasma headset 70 when the rotation range of the rotation block 24 is 0 ° to 360 °.

In addition, the spring block 27 may be penetrated through the rotation block 24 and the bearing cover 29 to prevent the separation of the rotation block 24 coupled to the plasma headset 70. .

Clamps 29a and 29b are provided on one side of the bearing cover 29 and one side of the housing 21, respectively, to fix the plasma headset 70 when the rotation block 24 is moved in the horizontal direction.

A pin housing 27a is further provided to protect the spring pin 27.

An auxiliary shaft 23 is further provided between the bearing cover 29 and the housing 21 to assist the rotating shaft 25.

At this time, the auxiliary shafts 23 are connected by the connecting portion 22 is limited in the movement range, when the rotation block 24 is moved in the horizontal direction with respect to the housing 21 to be fixed at the desired position In addition to the smooth cleaning of the mold chase surface by the plasma headset 70, the necessity of preventing the detachment of the plasma headset 70 due to movement is required, which is the clamp 29b of the housing 21. Can be solved by engaging the center projection of the bearing cover 29 with the center slot of the clamp 29a.

Further, by further provided with a seating detection sensor 71 on one side and the other side of the lower surface of the plasma headset 70, the operator 60 can easily detect whether the seat on the mold chase surface of the plasma headset 70. Can be.

Therefore, in the plasma cleaning apparatus 1 according to the embodiment of the present invention configured as described above, after the operator 60 moves the plasma cleaning apparatus 1 using a moving frame, the plasma cleaning apparatus 1 is moved into the auto mold work table 50. After the smooth separation, the plasma headset assembly is disposed between the upper and lower mold chase surfaces for cleaning by converting rotational motion into horizontal motion according to the spline shape of the rack 33a and the pinion 37 of the linear way structure 30. Position 20 to achieve the desired horizontality and centering.

Then, by rotating the rotation block 24, the plasma headset 70 first cleans the lower mold chase surface, and then rotates 180 ° in the circumferential direction to clean the upper mold chase surface.

This can not only improve the workability and quality in the cleaning process by cleaning the upper and lower mold chase surfaces by rotation without removing the plasma headset 70, but also limit the use of tablets for conventional cleaning. This can reduce material management costs and reduce the cost of additional materials, thus reducing the cleaning process time, resulting in increased productivity.

Meanwhile, according to another embodiment of the present invention, as shown in FIG. 14, the linear rail 31 is movable in the horizontal direction between the blocks 35 forming a dual structure. The block 35 on one side is provided in a moving plate 33 ', and the moving plate 33' is connected to a screw housing 34 ', and a support unit, A ball screw 36 ', which is connected to the screw housing 34' from 36'a, is rotated by the rotary motor 37'to move the movable plate 33 'in a horizontal direction. .

This is fixed to the support unit 36'a while the ball screw 36 'is rotated by the rotation of the rotary motor 37' to move the moving plate 33 'through the screw housing 34'. It can move back and forth smoothly in the horizontal direction.

Although the preferred embodiments of the present invention have been described above by way of example, the scope of the present invention is not limited to such specific embodiments, and those skilled in the art are appropriate within the scope described in the claims of the present invention. It will be possible to change.

Accordingly, in the present invention, in the plasma cleaning of the mold chase after the molding process of the semiconductor package, the linear way structure provided with the dual structure block can be moved forward and backward in the horizontal direction by the rack and the pinion. The rotation block coupled with the plasma headset can be up and down by the angular bearing and the rotation axis, so that the upper and lower mold chases can be smoothly cleaned in the narrow space by the plasma headset. By limiting the use of tablets, such as wax or melamine to remove the cost reduction of material management, suppression of the cost of additional materials and process time is saved, there is an effect that can increase the productivity efficiency.

Claims (10)

A handler 11 attached to one side of the outer housing 10; An alignment block 13 attached to the lower side of the other side of the outer housing 10; Ball housings 43 are respectively provided at four corners at the bottom of the outer housing 10 in a quadrangular shape, and each ball housing 43 has a ball carrier having a circular rolling ball 41 embedded therein ( ball carrier, 40); A linear rail 31 is provided to be movable in a horizontal direction between blocks 35 forming a dual structure, and a block 35 on one side is provided on a moving plate 33. The lower side of the movable plate 33 is inserted into a rack (rack, 33a) having a spline shape on the bottom surface, the pinion (spion) formed in the circumferential direction of the spline shape corresponding to the spline shape of the rack (33a) A linear-way structure (30) provided to be engaged with the rack (33a) and coupled to one upper side and the other side of the outer housing (10); And A housing socket 24b provided in the upper center of the plasma head set 70 and having a circular groove therein and a ball stud 24a having a circular lower end in the groove of the housing socket 24b are provided. A rotation block 24 coupled with the housing from one side of the rotation block 24 so that the rotation block 24 can up and down the plasma headset 70 up and down; A plasma headset assembly (20) consisting of a rotation shaft (25) having a circular cross section fixed to (21); Plasma cleaning apparatus comprising a. The angular assembly of claim 1, wherein the rotation block 24 coupled with the plasma headset 70 prevents play during movement in the horizontal direction and up and down in the vertical direction and provides smooth centering. Plasma cleaning device, characterized in that the bearing (angular bearing, 26) is provided on the outer peripheral surface of the rotary shaft (25). 3. The plasma cleaning apparatus according to claim 2, wherein a bearing cover (29) is provided outside the angular bearing (26) and the rotating shaft (25). 4. A rotation stopper (28) according to claim 3, characterized by a stepped stopper (28) formed at one lower side of the bearing cover (29) to limit the rotation range of the rotation block (24) to 0 ° to 180 °. Plasma cleaning device. The spring pin of claim 4, wherein the spring pin is provided through the rotation block 24 and the bearing cover 29 to prevent the rotation block 24 from being coupled with the plasma headset 70. 27) a plasma cleaning apparatus. The method of claim 5, wherein the clamp (29a, 29b) on one side of the bearing cover 29 and one side of the housing 21 to fix the plasma headset 70 in the horizontal movement of the rotation block 24, respectively. Plasma cleaning apparatus comprising a. 6. The plasma cleaning apparatus according to claim 5, further comprising a pin housing (27a) for protecting the spring pin (27). 7. The plasma cleaning apparatus according to claim 6, further comprising an auxiliary shaft (23) for assisting the rotating shaft (25) between the bearing cover (29) and the housing (21). The plasma cleaning apparatus according to claim 7 or 8, further comprising a seating detection sensor (71) on one side and the other side of the bottom surface of the plasma headset (70). According to claim 1, Between the blocks (35, 35) forming a dual structure (linear rail) 31 is provided to be movable in a horizontal direction, the block 35 of one side is a moving plate ( moving plate 33 ', the moving plate 33' is connected to a screw housing 34 ', and is supported by the screw housing 34' from a support unit 36'a. A plasma cleaning apparatus, characterized in that a ball screw (36 ') connected is rotated by a rotary motor (37') to move the moving plate (33 ') in a horizontal direction.

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