KR100857995B1 - Photo Resist Filtering Apparatus and Its Filtering Method - Google Patents

Photo Resist Filtering Apparatus and Its Filtering Method Download PDF

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KR100857995B1
KR100857995B1 KR1020030077312A KR20030077312A KR100857995B1 KR 100857995 B1 KR100857995 B1 KR 100857995B1 KR 1020030077312 A KR1020030077312 A KR 1020030077312A KR 20030077312 A KR20030077312 A KR 20030077312A KR 100857995 B1 KR100857995 B1 KR 100857995B1
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photosensitive liquid
housing
filter
filtration device
filtering
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KR20050042385A (en
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이철웅
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동부일렉트로닉스 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment

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  • Filtration Of Liquid (AREA)

Abstract

본 발명은 감광액 저장탱크에서 웨이퍼의 상면으로 연장된 감광액 공급라인 상에 설치되어 감광액 공급라인을 따라 유동하는 감광액을 여과하는 여과장치에 관한 것이며, 여과장치의 하우징 둘레에 진동자를 설치하여 진동시킴으로써, 하우징의 내벽과 필터에 부착된 미세한 기포 및 불순물을 내벽과 필터에서 탈락하여 기포 및 불순물을 용이하게 제거하는 감광액 여과장치 및 그 여과장치의 불순물 제거방법에 관한 것이다.The present invention relates to a filtration device for filtering the photosensitive liquid flowing along the photosensitive liquid supply line installed on the photosensitive liquid supply line extending from the photosensitive liquid storage tank to the upper surface of the wafer, and by vibrating by installing a vibrator around the housing of the filtration apparatus, The present invention relates to a photoresist filtration device for removing bubbles and impurities easily by dropping fine bubbles and impurities attached to the inner wall and the filter of the housing from the inner wall and the filter, and a method for removing impurities in the filtration device.

감광액, 여과장치, 필터, 진동자, 웨이퍼, 기포, 불순물Photoresist, Filtration Device, Filter, Oscillator, Wafer, Bubble, Impurity

Description

감광액 여과장치 및 그 불순물 제거방법{Photo Resist Filtering Apparatus and Its Filtering Method}Photoresist filtration apparatus and its impurity removal method {Photo Resist Filtering Apparatus and Its Filtering Method}

도 1은 종래의 기술에 따른 감광액 공급장치를 나타낸 개략도이고,1 is a schematic view showing a photosensitive liquid supply apparatus according to the prior art,

도 2는 도 1에 도시된 감광액 공급장치 중에 감광액을 여과하는 여과장치를 나타낸 사시도이고,2 is a perspective view showing a filtration device for filtering the photosensitive liquid in the photosensitive liquid supply device shown in FIG.

도 3은 본 발명의 한 실시예에 따른 감광액 공급장치의 여과장치의 개략도이며,3 is a schematic view of a filtration device of a photosensitive liquid supply device according to an embodiment of the present invention,

도 4는 도 3에 도시된 여과장치 내에 위치한 불순물의 제거방법을 나타낸 블록도이다.FIG. 4 is a block diagram illustrating a method of removing impurities located in the filtration apparatus shown in FIG. 3.

* 도면의 주요부분에 대한 부호의 설명 *   Explanation of symbols on the main parts of the drawings

1 : 감광액 공급장치 3 : 감광액1: photosensitive liquid supply device 3: photosensitive liquid

10 : 저장탱크 20 : 여과탱크10: storage tank 20: filtration tank

30, 130 : 여과장치 31 : 필터30, 130: filter 31: filter

32 : 하우징 33 : 덮개 32 housing 33 cover

34 : 클램퍼 41 : 감광액 공급라인34: clamper 41: photosensitive liquid supply line

42 : 감광액 분배라인 43 : 감광액 배출라인42: photosensitive liquid distribution line 43: photosensitive liquid discharge line

135 : 고무패드 136 : 진동자 135: rubber pad 136: vibrator                 

137 : 밴드 138 : 지지대
137: band 138: support

본 발명은 감광액에 포함된 불순물을 여과하는 여과장치에 관한 것으로, 특히, 여과장치의 내부에 존재하는 미세 크기의 불순물을 신속하게 제거할 수 있도록 여과를 도와주는 진동자를 구비한 감광액 여과장치 및 그 여과장치의 불순물 제거방법을 제공하는 데 있다.The present invention relates to a filtration device for filtering impurities contained in the photosensitive liquid, and in particular, a photosensitive liquid filtering device having a vibrator for filtration to quickly remove impurities of a fine size present in the inside of the filtering device and The present invention provides a method for removing impurities in a filtration device.

반도체 제조공정 중 포토 리소그래피(Photo lithography) 공정은 웨이퍼 상에 원하는 마스크 패턴을 형성시키기 위한 공정으로서, 먼저 세척 및 건조를 마친 웨이퍼의 표면에 포토 레지스트(photo resist)와 같은 감광막을 균일하게 도포하고, 그 위에 소정의 레이아웃(layout)으로 형성된 포토 마스크 상의 특정 패턴을 따라 노광공정을 수행하며, 이렇게 노광된 감광막의 불필요한 부위를 현상액으로 제거함으로써, 요구되는 마스크 패턴으로 형성하는 공정을 말한다. 상기 포토 리소그래피 공정에서 사용되는 감광막은 감광액 공급장치에서 웨이퍼 표면으로 분사된 감광액이 건조과정을 통해 굳어져 형성된다.Photolithography is a process for forming a desired mask pattern on a wafer during a semiconductor manufacturing process. First, a photoresist such as a photoresist is uniformly applied to the surface of the wafer after cleaning and drying. An exposure process is performed along a specific pattern on the photomask formed in a predetermined layout thereon, and an unnecessary portion of the exposed photoresist film is removed with a developer, thereby forming a desired mask pattern. The photoresist film used in the photolithography process is formed by the photoresist injected from the photoresist supply device to the wafer surface through a drying process.

아래에서는 상기 감광액 공급장치에 대해 도면을 참조하여 설명한다.Hereinafter, the photosensitive liquid supply apparatus will be described with reference to the drawings.

도면에서, 도 1은 종래의 기술에 따른 감광액 공급장치를 나타낸 개략도이며, 도 2는 도 1에 도시된 감광액 공급장치 중에 감광액을 여과하는 여과장치를 나 타낸 사시도이다.1 is a schematic view showing a photosensitive liquid supply apparatus according to the prior art, Figure 2 is a perspective view showing a filtration device for filtering the photosensitive liquid in the photosensitive liquid supply apparatus shown in FIG.

도 1에 도시한 바와 같이, 감광액 공급장치(1)는 크게 감광액(3)을 저장하는 저장탱크(10)와, 상기 저장탱크(10)와 연결되어 상기 저장탱크(10)에 저장되어 있는 감광액(3)을 1차적으로 여과하는 여과탱크(20)와, 여과탱크(20)로부터 공급된 감광액(3) 내의 불순물을 최종적으로 여과하는 여과장치(30)를 포함하며, 최종 여과된 감광액(3)은 여과장치(30)에서 연장된 감광액 분배라인(42)을 통해 웨이퍼(W)에 분사된다.As shown in FIG. 1, the photosensitive liquid supply device 1 is largely a storage tank 10 for storing the photosensitive liquid 3, and a photosensitive liquid stored in the storage tank 10 connected to the storage tank 10. A filtration tank 20 for primarily filtering (3), and a filtration device 30 for finally filtering impurities in the photosensitive liquid 3 supplied from the filtration tank 20, the final filtered photosensitive liquid 3 ) Is injected onto the wafer W through the photosensitive liquid distribution line 42 extending from the filtering device 30.

한편, 여과장치(30)는 필터(31)를 수용하는 하우징(32)과, 하우징(32)의 개방부를 덮는 덮개(33) 및, 하우징(32)과 덮개(33)를 밀봉하는 클램퍼(34)를 포함하며, 덮개(33)에는 감광액 배출라인(43)과 감광액 분배라인(42)이 연장되고, 하우징(32)의 저면에는 여과탱크(20)에서 연장된 감광액 공급라인(41)이 연결된다. 여기에서 여과장치(20)에서 여과된 불순물은 감광액(3)과 함께 감광액 배출라인(43)을 통해 배출된다.On the other hand, the filtration device 30 includes a housing 32 for housing the filter 31, a lid 33 covering the opening of the housing 32, and a clamper 34 for sealing the housing 32 and the lid 33. The photosensitive liquid discharge line 43 and the photosensitive liquid distribution line 42 are extended to the cover 33, and the photosensitive liquid supply line 41 extending from the filtration tank 20 is connected to the bottom of the housing 32. do. The impurities filtered by the filtration device 20 are discharged through the photosensitive liquid discharge line 43 together with the photosensitive liquid 3.

이러한 여과장치(30)에 있어서, 필터(31)는 주기적으로 교체되어야 한다. 필터(31)를 교체하기 위해서는 클램퍼(34)를 해체하여 하우징(32)과 덮개(33)를 분리하고 교체할 필터(31)를 제거한 후, 밀봉 포장된 포장지에서 새로운 필터를 꺼내 하우징(32)의 내부에 넣고 덮개(33)를 덮어 밀봉한다. 그리고 더미 디스펜스 과정을 거치는데, 더미 디스펜스 과정은 여과장치(30)로 희석제(thinner) 또는 감광액을 공급하여 필터 교체시에 필터와 함께 하우징 내부로 유입된 불순물과 기포를 제거한다. In this filtration device 30, the filter 31 must be replaced periodically. In order to replace the filter 31, the clamper 34 is dismantled to separate the housing 32 and the cover 33, and the filter 31 to be replaced is removed. Then, a new filter is taken out of the sealed package and the housing 32 is removed. Put the inside of the cover 33 to cover and seal. The dummy dispensing process is performed by supplying a thinner or a photosensitive liquid to the filtration device 30 to remove impurities and bubbles introduced into the housing together with the filter when the filter is replaced.                         

이와 같은 기포 및 불순물은 감광액 배출라인(43)을 통해 감광액(3)과 함께 배출되고, 여과된 감광액(3)은 감광액 분배라인(42)을 통해 웨이퍼(W)에 공급된다.Such bubbles and impurities are discharged together with the photosensitive liquid 3 through the photosensitive liquid discharge line 43, and the filtered photosensitive liquid 3 is supplied to the wafer W through the photosensitive liquid distribution line 42.

하지만, 종래의 더미 디스펜스 방식에 따르면 필터에 포함된 기포 및 불순물 입자를 제거하기 위해서는 희석제를 장시간 동안 순환하여야 하기 때문에 더미 디스펜스 작업 시간이 길어지게 되어 작업성이 떨어지며, 희석제 및 감광액의 소모량도 증가하게 되는 단점이 있다. 또한 미세한 마이크로 단위의 기포는 그 체적이 작아 부력이 약하므로, 미세한 마이크로 단위의 기포까지 제거하기 위해서는 더욱 긴 시간 동안 더미 디스펜스 작업을 수행하여야 한다. However, according to the conventional dummy dispensing method, since the diluent must be circulated for a long time in order to remove bubbles and impurity particles contained in the filter, the dummy dispensing operation time becomes long, resulting in poor workability, and increased consumption of the diluent and photoresist. There is a disadvantage. In addition, since microbubbles are small in volume and have low buoyancy, a dummy dispensing operation must be performed for a longer time to remove even microbubbles.

이러한 더미 디스펜스 작업이 충분히 이루어지지 않은 상태에서 감광액을 순환하여 감광액 분배라인으로 감광액을 공급하게 되면, 감광막을 형성하는 작업과정 중에 기포가 감광액과 함께 웨이퍼로 이동하여 분사되면서 균일한 두께의 감광막을 형성할 수 없게 되는 단점이 있다.When the photoresist is circulated by supplying the photoresist to the photoresist distribution line in a state where the dummy dispensing operation is not sufficiently performed, bubbles are moved to the wafer together with the photoresist to be sprayed to form a photoresist film having a uniform thickness during the process of forming the photoresist film. There is a disadvantage of not being able to.

본 발명은 앞서 설명한 바와 같은 종래 기술의 문제점을 해결하기 위하여 제안된 것으로서, 여과장치에 충격을 주어 더미 디스펜스 작업 중에 필터 및 하우징의 내벽에 부착된 미세한 크기의 기포까지 용이하게 제거할 수 있는 감광액 여과장치 및 그 여과장치의 불순물 제거방법을 제공하는 데 그 목적이 있다.The present invention has been proposed to solve the problems of the prior art as described above, the photosensitive liquid filtration that can easily remove even the fine size bubbles attached to the inner wall of the filter and the housing during the dummy dispensing operation by impacting the filtration device It is an object of the present invention to provide an apparatus and a method for removing impurities in the filtration apparatus.

상기와 같은 목적을 달성하기 위한 본 발명은 필터를 수용하는 하우징을 포함하며, 감광액 저장탱크에서 웨이퍼의 상면으로 연장된 감광액 공급라인 상에 설 치되어 상기 감광액 공급라인을 따라 유동하는 감광액을 여과하는 여과장치에 있어서, 상기 하우징의 둘레에 설치되어 진동하는 한 개 이상의 진동자를 포함하여 구성된 것을 기술적 특징으로 한다.The present invention for achieving the above object includes a housing for receiving a filter, installed on the photosensitive liquid supply line extending from the photosensitive liquid storage tank to the upper surface of the wafer to filter the photosensitive liquid flowing along the photosensitive liquid supply line The filtering device is characterized in that it comprises one or more vibrators installed around the housing and vibrating.

또한, 본 발명의 상기 하우징과 상기 진동자의 사이에는 고무패드가 위치하고, 상기 진동자는 상기 하우징을 감싸는 밴드에 의해 고정된다.In addition, a rubber pad is positioned between the housing and the vibrator of the present invention, the vibrator is fixed by a band surrounding the housing.

또한, 본 발명에 따르면, 감광액 저장탱크에서 웨이퍼의 상면으로 연장된 감광액 공급라인 상에 설치되어 상기 감광액 공급라인을 따라 유동하는 감광액을 여과하며, 하우징의 둘레에 설치되어 진동하는 한 개 이상의 진동자를 포함하는 감광액 여과장치를 이용한 불순물 제거방법에 있어서, 상기 진동자를 진동하는 단계와, 상기 진동자의 진동에 의해 상기 하우징의 내벽과 상기 필터에 부착된 기포 및 불순물이 탈락하는 단계와, 상기 탈락된 기포 및 불순물을 필터링 하는 단계를 포함하여 구성된 것을 기술적 특징으로 한다.In addition, according to the present invention, in the photosensitive liquid storage tank is installed on the photosensitive liquid supply line extending to the upper surface of the wafer to filter the photosensitive liquid flowing along the photosensitive liquid supply line, one or more vibrators installed around the housing vibrating In the impurity removal method using a photosensitive liquid filtering device comprising: vibrating the vibrator, and the bubbles and impurities attached to the inner wall of the housing and the filter by the vibration of the vibrator dropping, and the dropped bubbles And a step of filtering impurities.

아래에서, 본 발명에 따른 진동자를 구비한 감광액 여과장치 및 그 여과장치의 불순물 제거방법의 양호한 실시예를 첨부한 도면을 참조로 하여 상세히 설명하겠다.Hereinafter, with reference to the accompanying drawings, a preferred embodiment of a photosensitive liquid filtration device having a vibrator according to the present invention and a method for removing impurities in the filtration device will be described in detail.

도면에서, 도 3은 본 발명의 한 실시예에 따른 감광액 공급장치의 여과장치의 개략도이며, 도 4는 도 3에 도시된 여과장치 내에 위치한 불순물의 제거방법을 나타낸 블록도이다.3 is a schematic diagram of a filtration device of the photosensitive liquid supply device according to an embodiment of the present invention, Figure 4 is a block diagram showing a method for removing impurities located in the filtration device shown in FIG.

도 3에 도시된 바와 같이, 여과장치(130)는 필터(31)를 수용하는 하우징(32)과, 하우징(32)의 개방부를 덮는 덮개(33) 및, 하우징(32)과 덮개(33)를 밀봉하는 클램퍼(34)를 포함하며, 덮개(33)에는 감광액 배출라인(43)과 감광액 분배라인(42)이 연장되고, 하우징(32)의 저면에는 여과탱크(20)에서 연장된 감광액 공급라인(41)이 연결된다.As shown in FIG. 3, the filtration device 130 includes a housing 32 for housing the filter 31, a lid 33 covering the opening of the housing 32, and a housing 32 and a lid 33. It includes a clamper (34) for sealing the cover 33, the photosensitive liquid discharge line 43 and the photosensitive liquid distribution line 42 is extended, the bottom surface of the housing 32, the photosensitive liquid supply extending from the filtration tank 20 Line 41 is connected.

그리고, 하우징(32)의 외측면에는 그 길이방향 중간부를 고무패드(135)가 감싸고, 고무패드(135)의 상하부에는 각각 밴드(137)가 하우징(32)의 외측면에 체결된다. 그리고 상하부 밴드(137) 각각에는 진동자(136)를 지지하는 지지대(138)가 체결되고, 진동자(136)의 진동헤드(136H)는 고무패드(135)에 접한 상태로 상기 지지대(138)에 의해 고정된다.The rubber pad 135 surrounds the longitudinal middle portion of the housing 32 in the longitudinal direction, and the band 137 is fastened to the outer surface of the housing 32 on the upper and lower portions of the rubber pad 135. And a support 138 for supporting the vibrator 136 is fastened to each of the upper and lower bands 137, the vibration head 136H of the vibrator 136 is in contact with the rubber pad 135 by the support 138 It is fixed.

따라서, 진동자(136)는 지지대(138)에 의해 하우징(32)의 외측면에 고정되며, 진동자(136)가 진동하면서 발생한 충격은 고무패드(135)를 통해 하우징(32)에 전달된다. 이런 진동자(136)는 하우징(32)의 외측면을 따라 등간격으로 2개 이상 설치되는 것이 바람직하다.Therefore, the vibrator 136 is fixed to the outer surface of the housing 32 by the support 138, the shock generated while the vibrator 136 vibrates is transmitted to the housing 32 through the rubber pad 135. Two or more such vibrators 136 may be installed along the outer surface of the housing 32 at equal intervals.

이와 같이 하우징(32)의 외측면에 설치된 진동자(136)가 진동하게 되면, 진동에 의한 충격은 하우징(32)의 내부로 전달되며, 하우징(32)의 내벽에 부착된 기포 및 불순물은 내벽에서 탈락하여 부양하게 되고, 부양한 기포 및 불순물은 필터(31)에 필터링 되어 감광액 배출라인(43)을 통해 배출된다. 또한, 필터(31) 내에 부착된 기포 및 불순물 또한 하우징(32)의 내부에 채워진 용액(희석제 또는 감광액)에 의해 진동이 전달되어 필터(31)에 부착된 기포 및 불순물 또한 부양하게 되며, 진동을 크게 함으로써 미세한 마이크로단위의 기포 및 불순물도 필터(31) 및 하우징(32)의 내벽에서 분리된다. When the vibrator 136 installed on the outer surface of the housing 32 vibrates as described above, the shock caused by the vibration is transmitted to the inside of the housing 32, and bubbles and impurities attached to the inner wall of the housing 32 are removed from the inner wall. Dropped and buoyant, the buoyant bubbles and impurities are filtered by the filter 31 is discharged through the photosensitive liquid discharge line 43. In addition, the vibration and the impurities attached to the filter 31 is also transmitted by the solution (diluent or photosensitive liquid) filled in the interior of the housing 32 to also support the bubbles and impurities attached to the filter 31, and the vibration By making it larger, fine micro bubbles and impurities are also separated from the inner wall of the filter 31 and the housing 32.                     

여기에서 더미 디스펜스 과정에서는 용액이 희석제이고, 정상적인 작업이 진행될 경우에는 감광액이 된다.Here, in the dummy dispensing process, the solution is a diluent, and in the case of normal operation, the solution is a photoresist.

아래에서는 이와 같이 구성된 진동자를 구비한 감광액 여과장치를 이용한 여과장치의 불순물 제거방법에 대해 설명한다.Hereinafter, a method of removing impurities in the filtration apparatus using the photosensitive liquid filtration apparatus having the vibrator configured as described above will be described.

도 4에 도시된 바와 같이, 여과장치(130)의 클램퍼(34)를 해체하여 하우징(32)과 덮개(33)를 분리하여 하우징(32)을 개방한다(S10). 그리고 하우징(32)의 내부에 있는 필터를 새로운 필터로 교체한 후에(S20), 덮개(33)를 덮고 클램퍼(34)를 체결하여 여과장치(130)를 밀봉한다(S30).As shown in FIG. 4, the clamper 34 of the filtration device 130 is disassembled to separate the housing 32 and the cover 33 to open the housing 32 (S10). After replacing the filter in the housing 32 with a new filter (S20), the cover 33 is closed and the clamper 34 is fastened to seal the filtration device 130 (S30).

그리고 감광액 공급라인(41)을 통해 용액(감광액 또는 희석제)을 공급하여 하우징(32)의 내부에 용액을 채운다(S40).Then, the solution (photosensitive liquid or diluent) is supplied through the photosensitive liquid supply line 41 to fill the solution inside the housing 32 (S40).

이런 상태에서 진동자(136)에 전원을 공급하면 진동자(136)는 진동하게 되고, 진동자(136)의 진동은 고무패드(135) 및 하우징(32)을 통해 용액으로 전달되며, 용액은 하우징(32)의 내부에 위치한 필터(31)를 진동시킨다(S50).When power is supplied to the vibrator 136 in this state, the vibrator 136 vibrates, the vibration of the vibrator 136 is transmitted to the solution through the rubber pad 135 and the housing 32, the solution is the housing 32 Vibrate the filter 31 located inside the (S50).

이와 같이 진동자(136)의 진동이 하우징(32) 내부의 필터(31)까지 전달되는 과정에서 하우징(32)의 내벽과 필터(31)에 부착된 기포 및 불순물은 진동에 의해 탈락되면서(S60) 용액의 수면으로 상승하고, 이와 같이 기포 및 불순물이 상승하는 과정 중에 필터(31)에 의해 필터링되어 용액과 함께 감광액 배출라인(43)으로 배출된다(S70). 이때 진동자(136)의 진동세기를 증가시켜 제거되는 기포의 입자크기를 조절한다. 진동세기가 클수록 제거 가능한 입자의 크기는 미세해진다.As the vibration of the vibrator 136 is transmitted to the filter 31 in the housing 32, bubbles and impurities attached to the inner wall of the housing 32 and the filter 31 are dropped by the vibration (S60). Ascends to the surface of the solution, and is filtered by the filter 31 in the process of rising bubbles and impurities in this way is discharged to the photosensitive liquid discharge line 43 together with the solution (S70). At this time, by increasing the vibration intensity of the vibrator 136 to adjust the particle size of the bubbles are removed. The greater the vibration intensity, the finer the size of the removable particles.

앞서 상세히 설명한 바와 같이, 본 발명의 감광액 여과장치 및 그 여과장치의 불순물 제거방법은 진동자를 이용하여 하우징과 필터를 진동시킴으로써, 하우징의 내벽과 필터에 부착된 미세한 기포 및 불순물을 내벽과 필터에서 탈락하여 기포 및 불순물을 용이하게 제거할 수 있다는 장점이 있다. As described in detail above, the photosensitive liquid filtration device and the impurity removal method of the filtration device of the present invention by vibrating the housing and the filter using a vibrator, to remove the fine bubbles and impurities attached to the inner wall of the housing and the filter from the inner wall and the filter. Thus, there is an advantage that bubbles and impurities can be easily removed.

또한, 본 발명의 감광액 여과장치 및 그 여과장치의 불순물 제거방법은 하우징의 내벽과 필터에 부착된 기포 및 불순물을 효과적으로 제거함으로써, 기포 및 불순물을 제거하기 위해 더미 디스펜스 과정 중에서 소모되는 희석제 또는 감광액을 절감할 수 있다는 장점이 있다.In addition, the photosensitive liquid filtration device and the impurity removal method of the filter device of the present invention effectively removes bubbles and impurities attached to the inner wall of the housing and the filter, thereby eliminating the diluent or photosensitive liquid consumed during the dummy dispensing process to remove the bubbles and impurities. The advantage is that it can be saved.

또한, 본 발명의 감광액 여과장치 및 여과장치의 불순물 제거방법에 따르면, 여과장치 내에 존재하는 미세기포 및 불순물을 제거한 상태로 감광액을 웨이퍼에 도포하기 때문에 균일한 감광막을 형성할 수 있다는 장점이 있다.In addition, according to the method for removing impurities in the photosensitive liquid filtration apparatus and the filtration apparatus of the present invention, since the photosensitive liquid is applied to the wafer in a state in which microbubbles and impurities existing in the filtration apparatus are removed, there is an advantage that a uniform photosensitive film can be formed.

이상에서 본 발명의 진동자를 구비한 감광액 여과장치 및 그 여과장치의 불순물 제거방법에 대한 기술사상을 첨부도면과 함께 서술하였지만, 이는 본 발명의 가장 양호한 실시예를 예시적으로 설명한 것이지 본 발명을 한정하는 것은 아니다.Although the technical idea of the photosensitive liquid filtration device provided with the vibrator of the present invention and the impurity removal method of the filtration device has been described together with the accompanying drawings, this is illustrative of the best embodiments of the present invention, and the present invention is limited. It is not.

Claims (3)

필터를 수용하는 하우징을 포함하며, 감광액 저장탱크에서 웨이퍼의 상면으로 연장된 감광액 공급라인 상에 설치되어 상기 감광액 공급라인을 따라 유동하는 감광액을 여과하는 여과장치에 있어서,A filtration apparatus including a housing for accommodating a filter and installed on a photosensitive liquid supply line extending from a photosensitive liquid storage tank to an upper surface of a wafer, the filtering apparatus for filtering the photosensitive liquid flowing along the photosensitive liquid supply line, 상기 하우징의 둘레에 설치되어 진동하는 한 개 이상의 진동자;One or more vibrators installed around the housing and vibrating; 상기 하우징과 상기 진동자 사이에 형성된 고무패드; 및A rubber pad formed between the housing and the vibrator; And 상기 하우징을 감싸고 상기 진동자를 고정시키는 밴드를 포함하는 감광액 여과장치.And a band surrounding the housing and fixing the vibrator. 삭제delete 삭제delete
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US10688437B2 (en) 2018-01-26 2020-06-23 Samsung Electronics Co., Ltd. Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solution

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US5878918A (en) 1997-05-02 1999-03-09 Taiwan Semiconductor Manufacturing Co., Ltd. Photoresist supplying system for used in a semiconductor fabrication
US6042635A (en) 1998-06-04 2000-03-28 Taiwan Semiconductor Manufacturing Co., Ltd. Method for wetting a filter element
KR20010049010A (en) * 1999-11-30 2001-06-15 인재식 Apparatus for supplying photo resist
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JPH02281727A (en) * 1989-04-24 1990-11-19 Matsushita Electric Ind Co Ltd Applying apparatus of resist
JPH05228304A (en) * 1992-02-24 1993-09-07 Matsushita Electron Corp Filter device
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KR20010049010A (en) * 1999-11-30 2001-06-15 인재식 Apparatus for supplying photo resist
KR20010058319A (en) * 1999-12-27 2001-07-05 박종섭 Apparatus for removing bubble in photoresist container

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10688437B2 (en) 2018-01-26 2020-06-23 Samsung Electronics Co., Ltd. Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solution

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