KR100853087B1 - 나노결정, 그의 제조방법 및 그를 포함하는 전자소자 - Google Patents
나노결정, 그의 제조방법 및 그를 포함하는 전자소자 Download PDFInfo
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- KR100853087B1 KR100853087B1 KR1020070040803A KR20070040803A KR100853087B1 KR 100853087 B1 KR100853087 B1 KR 100853087B1 KR 1020070040803 A KR1020070040803 A KR 1020070040803A KR 20070040803 A KR20070040803 A KR 20070040803A KR 100853087 B1 KR100853087 B1 KR 100853087B1
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- C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
- C01B21/0632—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with gallium, indium or thallium
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- C01B25/00—Phosphorus; Compounds thereof
- C01B25/08—Other phosphides
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- C09K11/70—Luminescent, e.g. electroluminescent, chemiluminescent materials containing inorganic luminescent materials containing phosphorus
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
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Abstract
Description
Claims (24)
- 반도체 물질로 구성된 나노결정 코어; 및상기 나노결정 코어 둘레에 형성된 비반도체 물질로 구성된 버퍼층을 포함하는 것을 특징으로 하는 나노결정.
- 제 1항에 있어서, 상기 나노결정 코어는 III-V족 반도체 물질을 포함하는 것을 특징으로 하는 나노결정.
- 제 2항에 있어서, 상기 나노결정 코어는GaN, GaP, GaAs, InP, InAs, InSb 및 이들의 합금 및 조합으로 구성되는 군에서 선택되는 재료로 형성되는 것을 특징으로 하는 나노결정.
- 제 1항에 있어서, 상기 버퍼층은 칼코겐 버퍼층인 것을 특징으로 하는 나노결정.
- 제 4항에 있어서, 상기 칼코겐 버퍼층은 S, Se, Te및 이들의 혼합물을 포함하는 칼코겐 원소인 것을 특징으로 하는 나노결정.
- 삭제
- 제 1항에 있어서, 상기 나노결정의 표면이 유기물에 의해 배위되어 있는 것을 특징으로 하는 나노결정.
- 제 1항에 있어서, 상기 나노결정이 상기 버퍼층 위에 하나 이상의 쉘층을 포함하는 것을 특징으로 하는 나노결정.
- 제 8항에 있어서, 상기 쉘층은 Ⅱ-Ⅵ족 화합물, Ⅱ-Ⅴ족 화합물, Ⅲ-Ⅵ족 화합물, Ⅲ-Ⅴ족 화합물, Ⅳ-Ⅵ족 화합물, Ⅰ-Ⅲ-Ⅵ족 화합물, Ⅱ-Ⅳ-Ⅵ족 화합물, Ⅱ-Ⅳ-Ⅴ족 화합물 및 이들의 합금 및 조합으로 이루어진 군에서 선택되는 재료로 구성된 것임을 특징으로 하는 나노결정.
- 제 9항에 있어서, 상기 쉘층은 Ⅱ-Ⅵ족 화합물 또는 Ⅲ-Ⅴ족 화합물을 포함하는 것을 특징으로 하는 나노결정.
- 제 9항에 있어서, 상기 나노결정의 쉘층은 ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, GaSb, GaSe, InN, InP, InAs, InSb 및 이들의 합금 및 조합으로 이루어지는 군에서 선택되는 것을 특징으로 하는 나노결정.
- 반도체 물질의 전구체를 용매 및 분산제가 존재하는 반응계에서 반응시켜 반도체 물질로 구성된 나노결정 코어를 합성하는 단계; 및상기 나노결정 코어의 용액에 비반도체 물질의 전구체를 주입하여 상기 나 노결정의 표면에 비반도체 물질로 구성된 버퍼층을 형성하는 단계를 포함하는 것을 특징으로 하는 나노결정의 제조방법.
- 제 12항에 있어서, 상기 반도체 물질의 전구체는 III족 전구체 및 V족 전구체인 것을 특징으로 하는 나노결정의 제조방법.
- 제 13항에 있어서, 상기 III족 전구체는 알루미늄 포스페이트 (Aluminum phosphate), 알루미늄 아세틸아세토네이트 (Aluminum acetylacetonate), 알루미늄 클로라이드 (Aluminum chloride), 알루미늄 플루오라이드 (Aluminum fluoride), 알루미늄 옥사이드 (Aluminum oxide), 알루미늄 나이트레이트 (Aluminum nitrate), 알루미늄 설페이트 (Aluminum sulfate), 갈륨 아세틸아세토네이트 (Gallium acetylacetonate), 갈륨 클로라이드 (Gallium chloride), 갈륨 플루오라이드 (Gallium fluoride), 갈륨 옥사이드 (Gallium oxide), 갈륨 나이트레이트 (Gallium nitrate), 갈륨 설페이트 (Gallium sulfate), 인듐 클로라이드 (Indium chloride), 인듐 옥사이드 (Indium oxide), 인듐 나이트레이트 (Indium nitrate), 인듐 설페이트 (Indium sulfate), 탈륨 아세테이트 (thallium acetate), 탈륨 아세틸아세토네이트 (thallium acetylacetonate), 탈륨 클로라이드 (thallium chloride), 탈륨 옥사이드 (thallium oxide), 탈륨 에톡시드 (thallium ethoxide), 탈륨 나이트레이트 (thallium nitrate), 탈륨 설페이트 (thallium sulfate), 탈륨 카보네이트 (thallium carbonate)로 구성되는 군에서 선택되는 1종 이상인 것을 특징으로 하는 나노결정의 제조방법.
- 제 13항에 있어서, 상기 V족 전구체는 트리메틸실릴 포스핀(trimethylsilyl phosphine) 및 트리에틸포스핀, 트리부틸포스핀, 트리옥틸포스핀, 트리페닐포스핀, 트리시클로헥실포스핀을 포함하는 알킬 포스핀(alkyl phosphine), 아르세닉 옥사이드 (Arsenic oxide), 아르세닉 클로라이드(Arsenic chloride), 아르세닉 설페이트(Arsenic sulfate), 아르세닉 브로마이드(Arsenic bromide), 아르세닉 아이오다이드(Arsenic iodide), 나이트릭 옥사이드(Nitroud oxide), 나이트릭산(Nitric acid), 암모늄 나이트레이트(Ammonium nitrate)로 구성되는 군에서 선택되는 1종 이상인 것을 특징으로 하는 나노결정의 제조방법.
- 제 12항에 있어서, 상기 비반도체 물질의 전구체는 칼코겐 전구체임을 특징으로 하는 나노결정의 제조방법.
- 제 16항에 있어서, 상기 칼코겐 전구체는 S, Se, Te 및 이들의 혼합물, 헥 산 싸이올, 옥탄 싸이올, 데칸 싸이올, 도데칸 싸이올, 헥사데칸 싸이올, 머캡토 프로필 실란 등과 같은 알킬 싸이올 화합물, 설퍼-트리옥틸포스핀(S-TOP), 설퍼-트리부틸포스핀(S-TBP), 설퍼-트리페닐포스핀(S-TPP), 설퍼-트리옥틸아민(S-TOA), 트리메틸실릴 설퍼(trimethylsilyl sulfur), 황화 암모늄, 황화 나트륨, 셀렌-트리옥틸포스핀(Se-TOP), 셀렌-트리부틸포스핀(Se-TBP), 셀렌-트리페닐포스핀(Se-TPP), 텔루르-트리옥틸포스핀(Te-TOP), 텔루르-트리부틸포스핀(Te-TBP), 텔루르-트리페닐포스핀(Te-TPP) 및 이들의 혼합물로 구성되는 군에서 선택되는 것임을 특징으로 하는 나노결정의 제조방법.
- 삭제
- 제 12항에 있어서, 상기 방법이 상기 버퍼층 위에 하나 이상의 쉘층을 형성하는 단계를 더 포함하는 것을 특징으로 하는 나노결정의 제조방법.
- 제 19항에 있어서, 상기 쉘층은 Ⅱ-Ⅵ족 화합물, Ⅱ-Ⅴ족 화합물, Ⅲ-Ⅵ족 화합물, Ⅲ-Ⅴ족 화합물, Ⅳ-Ⅵ족 화합물, II-Ⅲ-Ⅵ족 화합물, Ⅱ-Ⅳ-Ⅵ족 화합물, Ⅱ-Ⅳ-Ⅴ족 화합물 및 이들의 합금 및 조합으로 이루어진 군에서 선택되는 재료로 구성된 것임을 특징으로 하는 나노결정의 제조방법.
- 제 20항에 있어서, 상기 쉘층은 Ⅱ-Ⅵ족 화합물 또는 Ⅲ-Ⅴ족 화합물인 것을 특징으로 하는 나노결정의 제조방법.
- 제 20항에 있어서, 상기 나노결정의 쉘층은 ZnS, ZnSe, ZnTe, CdS, CdSe, CdTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, GaSb, GaSe, InN, InP, InAs, InSb 및 이들의 합금 및 조합으로 이루어지는 군에서 선택되는 것을 특징으로 하는 나노결정의 제조방법.
- 제 1항 내지 제 5항 또는 제 7항 내지 제 11항 중 어느 하나의 항의 나노결정을 포함하는 전자소자.
- 제 23항에 있어서, 상기 전자소자는 디스플레이, 전기발광소자, 레이저, 선형 광학장치, 센서 및 광전변환소자로 구성되는 군에서 선택되는 것임을 특징으로 하는 전자소자.
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KR1020070040803A KR100853087B1 (ko) | 2007-04-26 | 2007-04-26 | 나노결정, 그의 제조방법 및 그를 포함하는 전자소자 |
US11/970,723 US8247073B2 (en) | 2007-04-26 | 2008-01-08 | Core-shell nanocrystal comprising a non-semiconductor buffer layer, method for preparing the same and electronic device comprising the same |
JP2008109535A JP5416359B2 (ja) | 2007-04-26 | 2008-04-18 | ナノ結晶とその製造方法およびそれを含む電子素子 |
DE602008002851T DE602008002851D1 (de) | 2007-04-26 | 2008-04-21 | Nanokristall, Verfahren zu seiner Herstellung und elektronische Vorrichtung damit |
EP08154889A EP1988142B1 (en) | 2007-04-26 | 2008-04-21 | Nanocrystal, method for preparing the same and electronic device comprising the same |
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