KR100818548B1 - 자동 블로커 - Google Patents
자동 블로커 Download PDFInfo
- Publication number
- KR100818548B1 KR100818548B1 KR1020060127282A KR20060127282A KR100818548B1 KR 100818548 B1 KR100818548 B1 KR 100818548B1 KR 1020060127282 A KR1020060127282 A KR 1020060127282A KR 20060127282 A KR20060127282 A KR 20060127282A KR 100818548 B1 KR100818548 B1 KR 100818548B1
- Authority
- KR
- South Korea
- Prior art keywords
- lens
- optical system
- plate
- test lens
- measurement light
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 claims abstract description 91
- 238000003384 imaging method Methods 0.000 claims abstract description 55
- 238000012360 testing method Methods 0.000 claims abstract description 49
- 238000005259 measurement Methods 0.000 claims description 34
- 238000001514 detection method Methods 0.000 claims description 33
- 239000000700 radioactive tracer Substances 0.000 description 6
- 238000005286 illumination Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 238000003491 array Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 210000001747 pupil Anatomy 0.000 description 2
- 208000010415 Low Vision Diseases 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 238000002493 microarray Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/04—Optical benches therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
- G03F7/706—Aberration measurement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Eyeglasses (AREA)
Abstract
Description
Claims (5)
- 테스트 렌즈를 검사하기 위한 측정광을 출사하는 광원;상기 측정광의 경로에 테스트 렌즈를 고정시키기 위한 고정 플레이트;상기 측정광에 의하여 형성된 테스트 렌즈의 그림자 영상 이미지를 결상시키기 위한 결상 플레이트;상기 결상 플레이트가 상기 테스트 렌즈를 통과한 측정광의 경로에 위치할 때, 상기 결상 플레이트에 형성된 테스트 렌즈의 그림자 영상 이미지를 검출하는 영상 광학계; 및상기 테스트 렌즈를 통과한 측정광의 경로에 위치하여, 상기 테스트 렌즈를 통과한 측정광으로부터 렌즈의 광학 특성을 검출하는 검출 광학계를 포함하며,상기 검출 광학계와 상기 결상 플레이트는, 상기 테스트 렌즈를 통과한 측정광이 진행하는 경로 상에 교대로 위치하도록, 이동 가능하게 설치되는 것을 특징으로 하는 자동 블로커.
- 제1항에 있어서, 상기 결상 플레이트는 2장의 투명 플레이트 사이에 낀 투사지로 제조되는 것인 자동 블로커.
- 제1항에 있어서, 상기 검출 광학계는 적어도 4개의 구멍이 형성되어 있는 홀 플레이트; 상기 홀 플레이트와 소정 거리 이격되어 설치되며, 상기 홀 플레이트에 형성된 구멍에 대응하는 미소 렌즈가 형성된 미소 렌즈 어레이; 및 상기 미소 렌즈 어레이를 통과한 측정광을 검출하는 디텍터를 포함하는 것인 자동 블로커.
- 제3항에 있어서, 상기 미소 렌즈 어레이는 홀 플레이트 구멍에 대응되는 위 부분의 4개의 렌즈 곡률에 아래 부분의 한 개의 렌즈 곡률을 가지는 형상인 것인 자동 블로커.
- 제1항에 있어서, 상기 검출 광학계와 상기 결상 플레이트의 이동 거리는 상기 테스트 렌즈의 최대 크기의 1/2인 것인 자동 블로커.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060127282A KR100818548B1 (ko) | 2006-12-13 | 2006-12-13 | 자동 블로커 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060127282A KR100818548B1 (ko) | 2006-12-13 | 2006-12-13 | 자동 블로커 |
Publications (1)
Publication Number | Publication Date |
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KR100818548B1 true KR100818548B1 (ko) | 2008-04-01 |
Family
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Family Applications (1)
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KR1020060127282A KR100818548B1 (ko) | 2006-12-13 | 2006-12-13 | 자동 블로커 |
Country Status (1)
Country | Link |
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KR (1) | KR100818548B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102589850A (zh) * | 2012-01-13 | 2012-07-18 | 中国科学院国家天文台 | 一种波片相位延迟的精密测量系统及其实现方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0161439B1 (ko) * | 1995-09-19 | 1999-01-15 | 이해규 | 노광장치의 렌즈 왜곡 측정장치 |
KR200372906Y1 (ko) | 2004-10-21 | 2005-01-21 | 부원광학주식회사 | 렌즈 초점거리 및 편심 측정장치 |
KR20060051376A (ko) * | 2004-09-17 | 2006-05-19 | 가부시키가이샤 토프콘 야마가타 | 렌즈미터 |
-
2006
- 2006-12-13 KR KR1020060127282A patent/KR100818548B1/ko active IP Right Grant
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0161439B1 (ko) * | 1995-09-19 | 1999-01-15 | 이해규 | 노광장치의 렌즈 왜곡 측정장치 |
KR20060051376A (ko) * | 2004-09-17 | 2006-05-19 | 가부시키가이샤 토프콘 야마가타 | 렌즈미터 |
KR200372906Y1 (ko) | 2004-10-21 | 2005-01-21 | 부원광학주식회사 | 렌즈 초점거리 및 편심 측정장치 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102589850A (zh) * | 2012-01-13 | 2012-07-18 | 中国科学院国家天文台 | 一种波片相位延迟的精密测量系统及其实现方法 |
CN102589850B (zh) * | 2012-01-13 | 2014-02-19 | 中国科学院国家天文台 | 一种波片相位延迟的精密测量系统及其实现方法 |
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