KR100784826B1 - Nano imprinting lithography apparatus using roll-stamp - Google Patents

Abstract

A nano imprinting lithography apparatus using a roll stamp is provided to form a nano pattern having a large area by irradiating ultra violet ray and simultaneously contacting the roll stamp with a wafer, and rotating it. A main plate(4) is installed at both frames on a base, so as to be slid bidirectionally. A sliding block(6) is installed penetrating the main plate, and is moved up and down by a hydraulic pressure device. A wafer assembly(7) is installed at the sliding block and moved up and down and horizontal, and includes a wafer plate for mounting a wafer. An actuator is installed at the slide block, and transports the wafer assembly horizontally and bidirectionally. A roll stamp(9) is made of a transparent material to transmit ultra violet ray, and rotated by a motor to project a wafer pattern to the wafer. An ultra violet ray generator irradiates ultra violet ray to the roll stamp, to be transmitted to the wafer on the wafer plate.

Description

Nano imprinting lithography apparatus using roll-stamp}

1 is an overall perspective view of a lithographic apparatus according to the present invention.

2 is a cross-sectional schematic side view of a lithographic apparatus according to the present invention.

3 is a perspective view of a part mounted on a table according to the present invention;

4 is a front view of FIG. 3

5 is a side view of FIG. 3

6 is a partial cross-sectional view of FIG.

7 is a plan view showing the top of the main plate according to the present invention;

Figure 8a is a perspective view showing an initial state of imprinting according to the present invention

Figure 8b is a perspective view showing a state in which the imprinting is performed in accordance with the present invention

Figure 8c is a perspective view showing the completion state of the imprinting according to the present invention

9 is a perspective view of the main plate according to the present invention

10 is a perspective view showing a sliding block according to the present invention

11 is an exploded perspective view of a wafer assembly according to the present invention.

12 is a perspective view of a buffer member for maintaining a parallel state of the roll stamp and the wafer top surface according to the present invention;

Figure 13 is a schematic side view showing the imprinting principle according to the present invention

14 is a schematic front view showing the imprinting principle according to the present invention;

Explanation of symbols on the main parts of the drawings

1: nanoimprinting lithography apparatus 2: base

3: frame 4: main plate

5: hydraulic means 6: sliding block

7: wafer assembly 8: actuator

9: roll stamp 10: UV generation means

13: wide adjustment bracket

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a nanoimprinting lithography apparatus for forming nanoscale patterns on imprinting objects such as wafers or substrates. In particular, the present invention relates to forming a pattern on a transparent roll-shaped stamp to rotate the rollstamp and to simultaneously generate ultraviolet light. The light transmitted through the rollstam is irradiated to the photocurable resin coated on the wafer to form a pattern so that a large area of the nanopattern can be formed, and by using ultraviolet light, the nanopattern can be formed even at room temperature and low pressure. The present invention relates to a nanoimprinting lithography apparatus using a roll stamp.

The imprinting process transfers the pattern formed on the stamp to the surface of a base layer, such as a wafer coated with a photocurable resin, which is hardened by shooting light using a stamp or mold formed with a pattern of a desired size. It is a process.

The conventional imprinting process is slightly different depending on the size of the wafer used, but imprinting a small stamp having a size of 1chch × 1chch or 1cm × 1cm by a scanning method, that is, a 1: 1 mapping method. And how to imprint large stamps in a single process. In such an imprinting process, imprinting is performed while the wafer on which the pattern of the stamp is transferred is placed on a flat chuck.

However, the stamp used in the conventional imprinting process is difficult to manufacture large-size because the portion on which the pattern is formed should be formed in a plane form parallel to the wafer, and is used for imprinting on a large part such as a display or an optical polarizing film. There was a limitation, and there was a problem that high load was required because the stamp was pressurized in the vertical direction to perform imprinting.

In order to solve this problem, there has been a conventional imprinting method using a roll stamp, but since it uses a forging method using heat or a high load, there is a limit in producing a pattern on a roll surface, and thus a nano size pattern is used. It was impossible to produce.

Accordingly, the present invention is to solve all the problems of the conventional nano-imprinted lithography apparatus as described above, the object of the present invention is to attach a roll stamp or a thin polymer stamp that is transparent and bendable to form a pattern on a transparent roll-shaped stamp The roll stamp of the form is brought into contact with the wafer coated with the photocurable resin (a material cured by light), rotated, and irradiated with ultraviolet light, and the light transmitted through the rollstamp is irradiated onto the photocurable resin applied to the wafer. The present invention provides a nanoimprinting lithography apparatus using a roll stamp that enables forming a large-area nanopattern, and forming the nanopattern even at room temperature and low pressure by using ultraviolet light.

Such nanoimprinting lithographic apparatus,

Base;

A main plate mounted on both sides of the base to enable reciprocating slides;

A sliding block which is installed to penetrate the main plate and is moved up and down by hydraulic means installed at a lower portion thereof;

A wafer assembly mounted on the sliding block and having a wafer plate for lifting and lowering horizontally and mounting a wafer thereon;

An actuator installed on the slide block and configured to linearly reciprocate the wafer assembly horizontally;

A roll-stamp made of a transparent material such that a roll-shaped body having a pattern formed on a surface thereof may transmit ultraviolet rays, and rotated by driving of a motor so that the pattern may be transferred onto a wafer mounted on a wafer assembly; And

And ultraviolet generating means for irradiating the roll stamp with ultraviolet rays to transmit the ultraviolet rays to the wafer mounted on the wafer plate.

Here, the motor rotates the roll stamp while the hydraulic means lifts the sliding block so that the wafer mounted on the wafer plate is in contact with the roll stamp, and the actuator moves the wafer assembly in a straight line to form a pattern of the roll stamp. When transferred to the photocurable resin coated on the wafer, the light irradiated from the ultraviolet generating means is transmitted to the photocurable resin through the roll stamp, characterized in that the pattern is imprinted on the wafer.

Hereinafter, a configuration of a nanoimprinting lithography apparatus using a roll stamp according to the present invention will be described in detail with reference to the accompanying drawings.

1 is an overall perspective view of a lithographic apparatus according to the present invention, and FIG. 2 is an overall side sectional schematic view of the lithographic apparatus according to the present invention. 3 is a perspective view illustrating a portion mounted on a table, FIG. 4 is a front view of FIG. 3, FIG. 5 is a side view of FIG. 3, and FIG. 6 is a partial cross-sectional view of FIG. 5. 7 is a plan view showing an upper portion of the main plate according to the present invention, Figures 8a to 8c is a flow chart showing an imprinting process according to the invention, Figure 10 is a perspective view showing a sliding block according to the present invention. 11 is an exploded perspective view of a wafer assembly according to the present invention, FIG. 13 is a side schematic view showing an imprinting principle according to the present invention, and FIG. 14 is a front schematic view showing an imprinting principle according to the present invention.

As shown in the drawings, the nanoimprinting lithographic apparatus 1 using the roll stamp 9 according to the present invention is installed on the base 2 and on both side frames 3 provided on the base 2 so as to be capable of reciprocating slides. Wafer assembly having a main plate (4), a sliding block (6) to be moved up and down by the hydraulic means (5), a wafer plate (71) for lifting up and down and horizontal reciprocating during the imprinting process and mounting the wafer on the top (7), the actuator 8 for linearly reciprocating the wafer assembly 7 horizontally, the roll stamp 9 having a pattern formed thereon, and the roll stamp 9 are irradiated with ultraviolet rays and mounted on the wafer plate 71. It includes; ultraviolet generating means 10 to be transmitted to the wafer.

The nanoimprinting lithographic apparatus 1 is a roll in which the hydraulic means 5 lifts the sliding block 6 so that the wafer W mounted on the wafer plate 71 is in contact with the roll stamp 9. At the same time as the stamp 9 is rotated, the actuator 8 moves the wafer assembly 7 linearly to generate ultraviolet rays when the pattern of the roll stamp 9 is transferred to the photocurable resin 11 coated on the wafer W. The light irradiated from the means 10 passes through the roll stamp 9 and is transferred to the photocurable resin 11 so that a pattern is imprinted on the wafer W.

The base 2 is configured in the form of a plate so as to be fixed to the table 12, and various parts including both sides of the frame 3 are mounted thereon.

The main plate 4 is slidably installed in the frame 3 to be reciprocated by the driving force of the electromagnet M. Since the propulsion principle of the electromagnet is a known technology such as a magnetic levitation train, a detailed description thereof will be omitted. The main plate 4 has a hole 41 through which the sliding block 6 penetrates in a central portion thereof, and four guide posts for guiding the lifting and lowering movement of the sliding block 6 around the hole 41. 42 is fastened and protrudes.

The main plate 4 is slidably installed on both frame 3 as shown in FIG. 9, and as shown in the drawing, the main plate 4 reciprocates along the rail 31 installed on the upper side of the frame 3. Therefore, the rail block 31a is installed below the main plate 4 to correspond to the rail 31.

The sliding block 6 is raised and lowered by the hydraulic means 5 installed at the lower portion thereof, thereby raising and lowering the wafer assembly 7 mounted thereon. In addition, the sliding block 6 is to mount the actuator (8), the actuator (8) is to move the wafer assembly (7) in a straight reciprocating horizontally. Therefore, the wafer assembly 7 is able to achieve the present invention because it is raised and lowered and straight reciprocating horizontally.

The configuration of the sliding block 6 is shown in detail in FIG. 10. The lower part is provided with a body 61 accommodated in the hole 41 of the main plate 4, the lower part of the body 61 is connected to the hydraulic means (5), the upper part is to install the actuator (8) The horizontal surface 62 is prepared for this. Four guide members 63 formed with guide holes 63a for inserting guide posts 42 installed in the main plate 4 are formed at two upper sides of the body so as to protrude two by four.

Accordingly, the guide posts 42 are fixed to the main plate 4 to protrude, and guide holes 63a are formed in the sliding block 6 to receive the guide posts 42. As a result, the main plate 4 moves along the guide of the guide post 42 when the main plate 4 moves up and down.

The wafer assembly 7 is equipped with a wafer (W) on the upper portion, and during the imprinting process is moved up and down and horizontal reciprocating movement of the wafer (W) in contact with the roll stamp 9 to imprint the pattern To make it possible.

The wafer assembly 7 is fixed to the wafer plate 71 on which the wafer is mounted, the first flexure bracket 72 fastened to the lower portion of the wafer plate 71, and the actuator 8 as shown in FIG. 11. Between the member 73, the second flexure bracket 74 fastened to the fixing member 73, and the first and second flexure brackets 72 and 74, and the wafer W is roll-stamped. 9) a shock absorbing member (75) for absorbing shock when in contact with; And an adjusting block 76 having a tapered shape to be slidably assembled between the fixing member 73 and the second flexure bracket 74 to adjust the flatness of the second flexure bracket 74. Include.

The wafer plate 71 attaches the wafer W in an adsorptive manner, and since it is a known technique, further description thereof will be omitted.

The first flexure bracket 72 is formed with a receiving groove 72a on the bottom surface of the first flexure bracket 72 so as to accommodate one end of the shock absorbing member 75. have.

The fixing member 73 has a lower portion fastened to the actuator 8 to reciprocate in accordance with the driving of the actuator 8 to move the wafer assembly 7. The fixing member 73 is provided with assembly grooves (73a) for receiving the control block 76 at both ends.

The second flexure bracket 74 is fastened to an upper portion of the fixing member 73, and cooperates with the first flexure bracket 72 to install the shock absorbing member 75. The shock absorbing member 75 is disposed on the upper surface. An accommodation groove 74a for receiving is formed.

The buffer member 75 is inserted into each of the receiving grooves 72a and 74a of the first and second flexure brackets 72 and 74 so that the roll stamp 9 forms a pattern on the wafer W. When the shock is to absorb. The shock absorbing member 75 is a conventionally used element, and preferably a nonferrous metal is preferably an aluminum material so as to absorb a minute impact. The structure of one embodiment of the shock absorbing member 75 is configured in a four-stage shape, and the central portions of four sides of each stage are connected by a connecting member 75a. Therefore, the shock absorbing member 75 absorbs the pressing force of the roll stamp 9 during the imprinting process to absorb the outer portion of the connecting member 75a.

The adjustment block 76 is accommodated in the assembling groove 73a of the fixing member 73 and moved back and forth by an operator during initial setting of the wafer assembly 7 to incline the flatness of the wafer plate 71. To be able to adjust.

The control block 76 has an inclined surface formed on the bottom thereof, the height varies depending on the moving position, so that the flatness of the wafer plate 71 mounted thereon can be easily adjusted. Such a technique is widely used in the industrial field. Technology.

The actuator 8 linearly reciprocates the wafer assembly 7 horizontally and is a well-known element in which a ball screw (not shown) rotates by driving the motor 8a. Therefore, since the fixing member 73 is connected to the ball screw, the fixing member 73 reciprocates according to the forward and reverse rotation of the ball screw, thereby reciprocating the wafer assembly 7 horizontally.

The roll stamp 9 is formed in a cylindrical shape, that is, a roller shape and transfers the pattern formed on the surface to the wafer W while rotating, which is a key element of the present invention.

The roll stamp 9 is a roller 91 made of a transparent material; And a stamp 92 having a transparent film shape and having a pattern formed on the surface thereof, the stamp 92 being attached to an outer circumference of the roller 91.

The roller 91 should be made of a transparent material so that ultraviolet rays can be transmitted, and preferably, high strength glass or high transparency synthetic resin series is used.

The stamp 92 should be made of a thin and flexible material to be wound around the roller 91, the pattern is formed on the surface.

The roll stamp 9 configured as described above compresses the wafer W coated with the photocurable resin 11 in a rolling contact manner while being rotated by the driving of the motor 91. You can imprint the pattern.

The ultraviolet generating means 10 is a known one. The ultraviolet generating means 10 is irradiated with the ultraviolet light emitted from the lens 10a of the exit to the roll stamp (9). Therefore, the ultraviolet light transmitted through the roll stamp 9 is irradiated onto the wafer W mounted on the wafer plate 71. The roll stamp 9 rotates to the photocurable resin 11 coated on the wafer W. At the moment of transferring the pattern, the pattern is formed by reaching the transfer surface and curing the pattern.

The ultraviolet generating means (10) is a widening bracket having a slot (13a) is formed so that the light irradiated from the lens (10a) between the exit and the roll stamp 9 to the center of the roll stamp 9 ( 13) is installed further. Therefore, the light irradiated from the lens 10a passes through the slot 13a of the wide adjustment bracket 13 and then passes through the center of the roll stamp 9 to the photocurable resin 11, so that the photocurable resin 11 At the same time the pattern is molded by the roll stamp 9 is cured to form a pattern.

On the other hand, the nano-imprinted lithographic apparatus 1 using the roll stamp 9 of the present invention, as shown in FIG. 1, the base 2 and the ultraviolet generating means 10 are mounted on the table 12 to be integrally configured. It is good.

Next, a process of imprinting a pattern by the present invention will be described in more detail with reference to FIGS. 8A to 8C.

8C is a state before imprinting, in which the sliding block 6 is lifted and lifted by the hydraulic means 5, and the wafer assembly 7 is moved by the actuator 8, and the wafer W positioned thereon is moved. It is out of the roll stamp 9.

In this state, the motor 91 is rotated to rotate the roll stamp 9 while the actuator 8 moves the wafer assembly 7 to rotate the roll stamp 9 mounted on the wafer plate 71. The wafer W is brought into rolling contact. As such, since the roll stamp 9 rotates and the wafer assembly 7 moves linearly, the contact portion of the wafer W does not slip and thus the pattern is not damaged or deformed.

8B shows the roll stamp 9 in a cloud contact state at the center of the wafer W. As shown in FIG. As described above, the imprinting process is performed while the roll stamp 9 is rotated to compress the photocurable resin 11 coated on the wafer W, and the UV generating means 10 is roll stamped through the slot 13a. By irradiating the central portion of (9) with ultraviolet rays, ultraviolet rays transmitted through the roll stamp 9 are transferred to the photocurable resin 11 to cure the transferred pattern at the same time.

8C shows a state in which the roll stamp 9 leaves the wafer after the imprinting process is completed. Such a process can be seen in more detail through FIGS. 13 to 14.

Thereafter, when the hydraulic means 5 lowers the wafer assembly 7, the actuator 8 restores the wafer assembly 7 to its original position and prepares to perform imprinting again.

The present invention configured as described above is rotated by contacting a wafer with a photocurable resin coated roll stamp with a roll stamp for forming a pattern on a transparent roll-shaped stamp or a thin polymer stamp that is transparent and bendable. By irradiating the same iso-UV light, the light transmitted through the roll stamp is irradiated to the photocurable resin coated on the wafer so that the pattern can be formed, so that the large-area nano-pattern can be formed. Has the advantage of being able to manufacture nanopatterns.

In addition, the present invention rotates the roll stamp, so the contact between the wafer surface and the roll stamp is very small, so that the imprinting process can be performed under low pressure, and the buffer member acts on the wafer to reduce the defects by keeping the surface pressure constant. There is an advantage.

Claims (7)

Base; A main plate mounted on both sides of the base to enable reciprocating slides; A sliding block which is installed to penetrate the main plate and is moved up and down by hydraulic means installed at a lower portion thereof; A wafer assembly mounted on the sliding block and having a wafer plate for lifting and lowering horizontally and mounting a wafer thereon; An actuator installed on the slide block and configured to linearly reciprocate the wafer assembly horizontally; A roll-stamp made of a transparent material such that a roll-shaped body having a pattern formed on a surface thereof may transmit ultraviolet rays, and rotated by driving of a motor so that the pattern may be transferred onto a wafer mounted on a wafer assembly; And And ultraviolet generating means for irradiating the roll stamp with ultraviolet rays to transmit the ultraviolet rays to the wafer mounted on the wafer plate. Here, the motor rotates the roll stamp while the hydraulic means lifts the sliding block so that the wafer mounted on the wafer plate is in contact with the roll stamp, and the actuator moves the wafer assembly in a straight line to form a pattern of the roll stamp. When transferred to a photocurable resin coated on the wafer, the light irradiated from the ultraviolet generating means is transmitted to the photocurable resin through the rollstamp and the pattern is imprinted on the wafer. Lithographic apparatus. The rollstamp of claim 1, wherein a slot width adjusting bracket is further disposed between the outlet of the UV generating means and the roll stamp so that light emitted from the UV generating means is irradiated to the center of the roll stamp. Nanoimprinting lithography apparatus using. The method of claim 1, wherein the roll stamp is a roller made of a transparent material; And And a stamp having a transparent film shape and having a pattern formed on a surface thereof, the stamp being attached to the outer circumferential surface of the roller. The guide post is fixed to the main plate to protrude, and the guide hole for receiving the guide post in the sliding block is formed, according to the guide post when the main plate is moved up and down by hydraulic means Nanoimprinting lithographic apparatus using a roll stamp, characterized in that the movement. The nanoimprinting lithographic apparatus according to claim 1, wherein the main plate reciprocates along rails installed on both frames. The nanoimprinting lithographic apparatus according to claim 1, wherein the base and the ultraviolet generating means are mounted on a table. The method of claim 1, wherein the wafer assembly is A wafer plate on which the wafer is mounted; A first flexure bracket fastened to the lower portion of the wafer plate A fixing member fixed to the actuator; A second flexure bracket fastened to the fixing member; A buffer member which is assembled between the first and second flexure brackets and absorbs shock when the wafer contacts the roll stamp to form a pattern in a low pressure state; And The body having a tapered shape is slidably assembled between the fixing member and the second flexure bracket to adjust the flatness of the second flexure bracket; Nano-imprinting using a roll stamp Lithographic apparatus.

Images