CN112213917A - Uniform electric field assisted nanoimprint forming device and method - Google Patents
Uniform electric field assisted nanoimprint forming device and method Download PDFInfo
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- CN112213917A CN112213917A CN201910617394.8A CN201910617394A CN112213917A CN 112213917 A CN112213917 A CN 112213917A CN 201910617394 A CN201910617394 A CN 201910617394A CN 112213917 A CN112213917 A CN 112213917A
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- 230000005684 electric field Effects 0.000 title claims abstract description 57
- 238000000034 method Methods 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 59
- 238000006073 displacement reaction Methods 0.000 claims description 40
- 239000011521 glass Substances 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 25
- 238000001127 nanoimprint lithography Methods 0.000 claims description 20
- 239000000919 ceramic Substances 0.000 claims description 16
- 238000001816 cooling Methods 0.000 claims description 14
- 238000010168 coupling process Methods 0.000 claims description 13
- 238000005859 coupling reaction Methods 0.000 claims description 13
- 239000002861 polymer material Substances 0.000 claims description 12
- 230000008878 coupling Effects 0.000 claims description 11
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000000007 visual effect Effects 0.000 claims description 8
- 238000009413 insulation Methods 0.000 claims description 6
- 238000000465 moulding Methods 0.000 claims description 6
- 238000003466 welding Methods 0.000 claims description 5
- 229920002120 photoresistant polymer Polymers 0.000 claims description 3
- 239000000725 suspension Substances 0.000 claims 6
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 8
- 238000005516 engineering process Methods 0.000 description 6
- 238000004049 embossing Methods 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 238000007711 solidification Methods 0.000 description 5
- 230000008023 solidification Effects 0.000 description 4
- 239000002131 composite material Substances 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 125000006850 spacer group Chemical group 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
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Abstract
A uniform electric field assistant nano-imprinting forming device and method controls the uniform electric field force generated between the pole plates by adjusting the voltage between the upper and lower pole plates of the imprinting device, and the uniform electric field force is used as the imprinting force to imprint, when demolding, the equal-large adjustable voltage in the positive and negative directions is repeatedly applied between the two pole plates to form the uniform electric field force in the positive and negative directions, and the uniform electric field force is used as the demolding force to separate the imprinting mold from the substrate. The invention adopts uniform electric field force as imprinting force, so that the microstructure on the imprinting mold can be better transferred to the substrate by uniform force, and simultaneously uses repeated uniform electric field force in the positive and negative directions as demolding force to ensure the completeness of the pattern in the demolding process.
Description
Technical Field
The invention relates to the field of nanoimprint lithography, in particular to a uniform electric field assisted nanoimprint lithography device and method.
Background
In 1995, professor Stephen y.chou (depression) of princeton university proposed nanoimprint lithography technology, which is not limited by the optical lithography wavelength and can realize cheap and fast manufacturing of micro-nano patterns, compared to conventional lithography technology and etching technology. Since the application of nanoimprint technology has a great development prospect, it has been paid great attention from the academic world and the practical world since it was proposed, and the nanoimprint technology has been rapidly developed over a decade and is now one of the current popular research fields.
Currently, nanoimprint technology has developed two main types of hot imprint, ultraviolet imprint, and the like. Compared with the traditional nano processing method, the hot stamping method has the characteristics of flexible method, low cost and biocompatibility, and can obtain a structure with high resolution and high aspect ratio. Compared with the traditional processing method, the ultraviolet nano-imprinting method has the advantages of being capable of working in the environment of room temperature and low pressure and the like.
However, both of the above techniques still have some problems, for example, when an imprinting force is applied during imprinting, it is difficult to ensure that the imprinting mold is subjected to a uniform imprinting force, so that the microstructure on the mold cannot be transferred onto the substrate better. In demolding, when the demolding force is too large, the imprint-molded pattern is damaged, and when the demolding force is too small, the imprint material remains, so that the nano-microstructure pattern has insufficient precision, that is, the demolding force cannot be applied more accurately, and the invention patent of publication No. 10100986 a discloses a method for separating a nano-imprint template from a substrate: moving the mold and the substrate relative to each other to generate a tension applied to the mold and the substrate, and determining an amount of pressure applied to the mold and the substrate by measuring the tension applied to the mold and the substrate so as to determine an amount of tension that should be applied; reducing the tension applied to the mold or the substrate by applying the determined amount of pressure to the mold and the substrate; the above steps are then repeated until the mold is completely separated from the cured pattern layer, which reduces separation defects. However, this method still has a certain defect, and one cannot ensure that uniform tension and pressure are applied between the mold and the substrate during demolding, so that the integrity of the pattern cannot be ensured, and the two can be demolded at a fixed demolding angle all the time during demolding, so that the influence of demolding force and demolding angle on demolding effect cannot be effectively reduced, which will result in the damage of micro-nano pattern or the damage of substrate material boundary, thereby reducing the pattern forming rate.
In summary, the following problems mainly exist in the current nanoimprinting:
during imprinting, the microstructures on the mold cannot be better transferred to the substrate due to uneven imprinting force;
when demoulding, the demoulding force can not be controlled, thereby affecting the integrity of the pattern;
during demolding, the demolding angle influences the precision and resolution of the nano microstructure pattern obtained after demolding.
Disclosure of Invention
The invention aims to solve the problems that the precision and the resolution of an imprinted pattern are influenced due to the fact that the imprinting force is not uniform in the imprinting process and the demolding force cannot be accurately controlled in the demolding process, and the demolding angle is not comfortable. A uniform electric field assisted nanoimprint forming device and method are provided.
According to the purpose of the invention, the uniform electric field assisted nanoimprint forming device is characterized in that: the device comprises a frame, an X-direction working platform, a Z-direction working platform, a solidifying device, a horizontal adjusting device, an imprinting device, a cooling plate, a heat-insulating ceramic gasket, a substrate chuck, a mold chuck and a base frame, wherein the frame is horizontally placed on a horizontal plane, the X-direction working platform is fixed on an upper supporting plate in the frame through screws, the Z-direction working platform is fixed on an X-direction displacement sliding table in the X-direction working platform through screws, the solidifying device is fixedly connected between visible glass in the horizontal device and a Z-direction displacement sliding block in the Z-direction working platform through screws, the imprinting device is connected with an angle adjusting ball in the horizontal adjusting device through a welding mode, the cooling plate is fixedly connected on the heat-insulating ceramic gasket, the heat-insulating ceramic gasket is fixedly connected on a base frame outer frame in the base frame, the mold chuck is fixedly connected on a transparent glass plate in the imprinting device, the substrate chuck is fixedly connected on a heating plate in the imprinting device, the base frame is fixedly connected to the lower supporting plate in the machine frame through screws.
The invention aims to provide a uniform electric field assisted nanoimprint lithography device which is characterized in that a rack comprises an upper supporting plate, a lower supporting plate, a first supporting column, a second supporting column, a third supporting column and a fourth supporting column, wherein the lower supporting plate is horizontally placed on a horizontal plane, one end of the first supporting column is connected with the lower supporting plate through a screw, the other end of the first supporting column is connected with the upper supporting plate through a screw, one end of the second supporting column is connected with the lower supporting plate through a screw, the other end of the second supporting column is connected with the upper supporting plate through a screw, one end of the third supporting column is connected with the lower supporting plate through a screw, the other end of the third supporting column is connected with the upper supporting plate through a screw, one end of the fourth supporting column is connected with the lower supporting plate through a screw.
The invention aims to provide a uniform electric field assisted nanoimprint forming device which is characterized in that an X-direction working platform comprises a first servo motor, a first ball screw, a first motor encoder, a first X-direction displacement sliding table and a first coupling, wherein the first servo motor is fixed on an upper supporting plate through a screw, the first motor encoder is fixedly connected to the first servo motor, the first ball screw is connected with the first servo motor through the first coupling, and the first X-direction displacement sliding table is clamped on the first ball screw. The X-direction working platform is mainly used for adjusting the displacement of the Z-direction working platform in the X direction.
According to the purpose of the invention, the uniform electric field assisted nanoimprint lithography device is characterized in that the Z-direction working platform comprises: the servo motor II is fixed at one end of the X-direction displacement sliding table through a screw, the motor encoder II is fixedly connected to the servo motor II, the ball screw II is connected with the servo motor II through the coupling II, and the Z-direction displacement sliding block is installed on the ball screw II. The Z-direction working platform is mainly used for adjusting the displacement of the imprinting device and the curing device in the Z direction and enabling the imprinting device curing device to move to a working position.
According to the object of the invention, a uniform electric field assisted nanoimprint forming device is provided, which is characterized in that the solidifying device comprises: the device comprises an ultraviolet lamp and an ultraviolet lamp supporting frame, wherein the ultraviolet lamp is fixed on the ultraviolet lamp supporting frame through a screw, one end of the ultraviolet lamp supporting frame is connected with a Z-direction displacement sliding block in the Z-direction working platform through a screw, and the other end of the ultraviolet lamp supporting frame is fixed on the visible glass through a screw. The curing device is mainly used for curing and exposing the imprinting material on the substrate in the ultraviolet nano-imprinting process.
According to the object of the invention, the uniform electric field assisted nanoimprint lithography device is characterized in that the horizontal adjusting device comprises: the visual glass and the angle adjusting ball are connected in a spherical pair structure mode, and the other end of the visual glass is connected with the Z-direction displacement sliding block in the Z-direction working platform. The level adjusting device is mainly used for ensuring the levelness of the stamping device.
According to the purpose of the invention, the uniform electric field assisted nanoimprint lithography device is characterized by comprising the following components: the angle adjusting device comprises an upper electrode plate, a lower electrode plate, a transparent glass plate, a heating plate and a lifting plate, wherein the upper electrode plate is fixed on an angle adjusting ball through welding, the transparent glass plate is clamped at one end of the upper electrode plate through a clamping mode, the lower electrode plate is fixedly connected onto the lifting plate, the heating plate is fixedly connected onto the lower electrode plate, and the lifting plate is arranged on a first sliding block and a second sliding block, wherein the first sliding block and the second sliding block are driven by a ball screw and a screw rod respectively, and the second sliding block slides on a guide. The impressing device is used for realizing impressing between an impressing mold and a polymer material, when the impressing is carried out by hot impressing, the hot plate preheats the impressing polymer material, the temperature of the impressed polymer material is impressed when reaching the impressing temperature, and after the impressing is finished, positive and negative equal-direction voltage is applied to the upper electrode plate and the lower electrode plate, so that positive and negative uniform electric field force is formed for demoulding.
According to the object of the invention, a uniform electric field assisted nanoimprint forming device is provided, which is characterized in that a base frame comprises: the base frame, servo motor three, motor encoder three, the servo motor mount, guide wire lever mount, ball three, the guide wire lever, shaft coupling three, slider one, slider two, wherein, the base frame passes through screw connection in the lower support plate of frame, servo motor three mount passes through screw connection in the lower support plate of frame, guide wire lever mount passes through screw connection in the lower support plate of frame, servo motor tee bend passes through motor mount fixed connection in the lower support plate, the guide wire lever passes through guide wire lever mount and connects in the lower support plate, motor encoder three and servo motor three fixed connection, be connected through shaft coupling three between ball three and the servo motor, slider one and two dress cards respectively on ball three and guide wire lever with the slider. The base frame is mainly used for supporting the cooling device and the impressing device, and the lifting plate is driven to move through the ball screw III and the guide screw lever during demolding, so that demolding is smooth.
The invention provides a uniform electric field assisted nanoimprint method, which is characterized by comprising the following steps: the method comprises the following steps:
(1) horizontally placing the whole device on a horizontal plane, adjusting the X-direction working platform and the Z-direction working platform to enable the mold chuck to be adjusted to be right above the substrate chuck, then clamping a required imprinting mold on the mold chuck, and clamping a substrate coated with imprinting photoresist or imprinting polymer material on the substrate chuck;
(2) the horizontal adjusting device is adjusted to enable the imprinting device to reach a horizontal state so as to ensure that complete contact between the imprinting mold and the substrate can be achieved after imprinting force is applied. The specific way of adjusting the imprinting device to a horizontal state is as follows: after the stamping die is clamped on the die chuck, the angle adjusting ball in the horizontal device is adjusted, and the angle adjusting ball and the visual glass are connected with each other in a spherical pair mode, so that the stamping device welded below the angle adjusting ball can reach a horizontal state under the dead weight, namely, the horizontal state under the dead weight is realized;
(3) the imprint polymer material is subjected to a pre-heat or curing exposure process. The specific processing method is divided into processing under hot embossing and processing under ultraviolet embossing. The method specifically comprises the following steps: when the required material of the imprinting mold and the polymer material to be imprinted are used for hot imprinting, the heating device is started to preheat the polymer material on the substrate, and then the Z-direction displacement platform is adjusted to enable the imprinting device to move downwards to a required working position close to the position right above the substrate. When the required material of the imprinting mold and the polymer material to be imprinted are used for ultraviolet imprinting, firstly adjusting the Z-direction displacement platform to enable the curing device and the imprinting device to move downwards to the required working position, then opening an ultraviolet lamp in the curing device, and exposing and curing the polymer material when the imprinting is carried out;
(4) and starting the imprinting device to enable the transparent glass plate to drive the imprinting mold to move downwards to imprint the polymer on the substrate, and completing imprinting when the mold is completely contacted with the polymer on the substrate and the microstructure is imprinted on the polymer. The specific working mode of the stamping device is as follows: the uniform electric field is formed between the upper electrode plate and the lower electrode plate by applying power supply voltage to the upper electrode plate and the lower electrode plate in the imprinting device, so that the uniform electric field force is formed between the upper electrode plate and the lower electrode plate and is used as imprinting force to imprint materials on the substrate. When the area and the distance between the upper electrode plate and the lower electrode plate are fixed, the imprinting force required by specific imprinting is obtained by adjusting the magnitude of the applied power voltage. Under the action of uniform electric field force, the transparent glass plate clamped on the upper electrode plate moves downwards, so that the imprinting mold and the imprinting photoresist or the imprinting polymer material on the substrate are completely contacted under the action of uniform force, and when a required microstructure is imprinted on the polymer, imprinting with uniform force is realized;
(5) after the imprinting is finished, the equal-size adjustable voltage in the positive direction and the negative direction is continuously applied to the upper electrode plate and the lower electrode plate in the imprinting device, uniform electric field force in the positive direction and the negative direction is repeatedly formed between the electrode plates to serve as demolding force, the demolding force can be changed by adjusting the voltage, the substrate and a mold chuck are separated by the demolding force required in the specific demolding process, the lifting plate is driven to have small displacement through the third ball screw and the guide screw lever in the demolding process, and the demolding process is smooth.
The invention has the following obvious advantages:
1. in the imprinting process, the uniform electric field force is used as the imprinting force, so that the microstructure on the mold can be better transferred to the substrate by the uniform force applied to the imprinting mold, and the forming rate of an imprinted pattern is improved;
2. in the demolding process, the force of repeatedly applying a uniform electric field force which can be accurately adjusted in the positive direction and the negative direction is used as the demolding force, so that the completeness of the pattern in the demolding process is ensured;
3. in the demolding process, the horizontal adjusting device is adjusted, the proper demolding angle is obtained through self-adaptive adjustment, and the precision and the resolution of the imprinted pattern are improved.
Drawings
FIG. 1: a structural schematic diagram of a uniform electric field assisted nanoimprint forming device;
FIG. 2: a structural schematic diagram of a uniform electric field assisted nanoimprint forming device;
FIG. 3: a structural schematic diagram of a rack of a uniform electric field assisted nanoimprint molding device;
FIG. 4: a structural schematic diagram of an X-direction working platform of a uniform electric field assisted nanoimprint molding device;
FIG. 5: a structural schematic diagram of a Z-direction working platform of a uniform electric field assisted nanoimprint molding device;
FIG. 6: a structural schematic diagram of a curing device of a uniform electric field assisted nanoimprint molding device;
FIG. 7: a structure schematic diagram of connection among a level adjusting device of a uniform electric field assisted nanoimprint lithography device, an imprint device and a mold chuck;
FIG. 8: a level adjusting device of a uniform electric field assisted nanoimprint lithography device, and an A-A surface cross-sectional view of a connection structure between the nanoimprint lithography device and a mold chuck;
FIG. 9: an isometric view of the connection mode among an imprinting device, a cooling plate, a heat-insulating ceramic gasket, a substrate chuck and a base frame of a uniform electric field assisted nanoimprint molding device;
FIG. 10: the front view of the connection mode among the imprinting device, the cooling plate, the heat-insulating ceramic gasket, the substrate chuck and the base frame of the uniform electric field assisted nano imprinting forming device;
FIG. 11: an internal structure schematic diagram of a base frame of a uniform electric field assisted nanoimprint forming device.
Description of the reference numerals
1-machine frame, 2-X direction working platform, 3-Z direction working platform, 4-solidification device, 5-horizontal adjustment device, 6-impression device, 7-cooling plate, 8-heat insulation ceramic gasket, 9-mould chuck, 10-substrate chuck, 11-base frame, 101-upper supporting plate, 102-lower supporting plate, 103-supporting column I, 104-supporting column II, 105-supporting column III, 106-supporting column IV, 201-servo motor I, 202-ball screw I, 203-motor encoder I, 204-X direction displacement platform, 205-coupling I, 301-servo motor II, 302-motor encoder II, 303-ball screw II, 304-Z direction displacement slide block, 305-coupling II, and, 401-ultraviolet lamp, 402-ultraviolet lamp support frame, 501-visible glass, 502-angle adjusting ball, 601-upper electrode plate, 602-lower electrode plate, 603-transparent glass plate, 604-heating plate, 605-lifting plate, 1101-base frame outer frame, 1102-servo motor III, 1103-motor encoder III, 1104-motor fixing frame, 1105-guide wire lever fixing frame, 1106-ball screw III, 1107-guide wire lever, 1108-shaft coupler III, 1109-sliding block I and 1110-sliding block II.
Detailed Description
The use of a uniform electric field assisted nanoimprint lithography apparatus is described with reference to the drawings.
As shown in fig. 1 and 2, the uniform electric field assisted nanoimprint lithography apparatus includes a frame 1, an X-direction working platform 2, a Z-direction working platform 3, a curing device 4, a level adjusting device 5, a imprinting device 6, a cooling plate 7, a heat-insulating ceramic spacer 8, a mold chuck 9, a substrate chuck 10, and a base frame 11. Wherein the machine frame 1 is horizontally placed on a horizontal plane, the X-direction working platform 2 is fixed on an upper supporting plate 101 in the machine frame 1 through screws, the Z-direction working platform 3 is fixed on an X-direction displacement platform 204 in the X-direction working platform 2 through screws, the curing device 4 is fixed between visual glass 501 in a horizontal adjusting device 5 and a Z-direction displacement slider 304 in the Z-direction working platform 3 through screws, the imprinting device 6 is connected with a fine adjusting device angle adjusting ball 502 in the horizontal adjusting device 5 through a welding mode, the cooling plate 7 is fixedly connected on a heat insulation ceramic gasket 8, the heat insulation ceramic gasket 8 is fixedly connected on a base frame outer frame 1101 in a base frame 11, a mold chuck 9 and a substrate chuck 10 are respectively and fixedly connected on a transparent glass plate 603 and a heating plate 604 in the imprinting device 6, wherein the mold chuck 9 and the substrate chuck 10 are transparent chucks, the base frame 11 is fixedly attached to a lower support plate 102 in the frame 1 by screws.
As shown in fig. 3, the rack 1 includes an upper support plate 101, a lower support plate 102, a first support column 103, a second support column 104, a third support column 105, and a fourth support column 106 for connecting the upper support plate 101 and the lower support plate 102, wherein the lower support plate 102 is horizontally disposed on a horizontal plane, one end of the first support column 103, the second support column 104, the third support column 105, and the fourth support column 106 is connected to the lower support plate 102 through screws, the other end of the first support column 103, the second support column 104, the third support column 105, and the fourth support column 106 is connected to the upper support plate 101 through screws, wherein the upper support plate 101 is used for supporting an X-direction displacement adjusting device 204, and the first support column 103, the second support column 104, the third support column 105.
As shown in fig. 4, the X-direction working platform 2 includes: the X-direction displacement platform 204 is arranged on the ball screw I202 and is driven by the ball screw I202 to displace to a working position or a rest position by the ball screw I202, wherein the displacement is determined by the code in the motor encoder I203. The X-direction working platform 2 is mainly used for adjusting the displacement of the Z-direction working platform 3 in the X direction.
As shown in fig. 5, the Z-direction working platform 3 includes: the second servo motor 301, the second motor encoder 302, the second ball screw 303, the Z-direction displacement slider 304 and the second coupling 305 are arranged, wherein the second motor encoder 302 is fixedly connected to the second servo motor 301, the second servo motor 301 is connected to one end of the X-direction displacement platform 204 through a screw, the second ball screw 303 and the second servo motor 301 are connected with each other through the third coupling 305, the second ball screw 303 is driven by the second servo motor 301, and the Z-direction displacement slider 304 is arranged on the second ball screw 302. And the second ball screw 302 drives the second ball screw to perform displacement in the Z direction, wherein the amount of the displacement is determined by the code in the second motor encoder 302. The Z-stage 3 is mainly used to adjust the displacement of the curing device 4, the leveling device 5, and the imprinting device 6 in the Z-direction.
As shown in fig. 6, the curing device 4 includes: the ultraviolet curing device 4 is mainly used for curing and exposing imprinting materials or imprinting polymers in the ultraviolet nano-imprinting process.
As shown in fig. 7 and 8, the horizontal adjusting device 5, the imprinting device 6, and the mold chuck 9 include: the device comprises a piece of visual glass 501, an angle adjusting ball 502, an upper electrode plate 601 and a transparent glass plate 603, wherein the center of one end of the visual glass 501 is connected with the angle adjusting ball 502 in a clamping mode, one end of the upper electrode plate 601 is fixedly connected with the angle adjusting ball 502, the transparent glass plate 603 is arranged and clamped inside the other end of the upper electrode plate 601 in a sleeving and clamping mode, the friction force between the transparent glass plate 603 and the upper electrode plate 601 just can support the weight of a mold chuck 9 connected to the transparent glass plate 603 and the weight of the transparent glass plate 603, the horizontal adjusting device 5 is mainly used for adjusting the levelness of an imprinting device 6 so as to ensure that the imprinting device 6 is uniformly stressed when imprinting and demolding are carried out, and the mold chuck 9 ensures that an imprinting mold required to be used can be stably clamped at a required imprinting position.
As shown in fig. 9 and 10, the imprinting device 6, the condensing plate 7, the ceramic heat insulating spacer 8, the substrate chuck 10, and the base frame 11 include: lower electrode plate 602, hot plate 604, lifter plate 605, base frame 1101, wherein substrate chuck 10 links firmly on hot plate 604, hot plate 604 links firmly on lower electrode plate 602, lower electrode plate fixed mounting is on lifter plate 605, condenser plate 7 links firmly on thermal-insulated ceramic gasket 8, thermal-insulated ceramic gasket 8 links on base frame 1101, the connection structure shown in this figure is mainly used for the hot embossing in-process to cool off the impression material after the impression is accomplished and solidify, substrate chuck 10 has guaranteed that the substrate can be stable fix in operating position department.
As shown in fig. 11, the internal device of the base frame 11 includes: the stamping device comprises a servo motor III 1102, a motor encoder III 1103, a motor fixing frame 1104, a guide wire lever fixing frame 1105, a ball screw III 1106, a guide wire lever 1107, a coupler III 1108, a sliding block I1109 and a sliding block II 1110, wherein the servo motor III 1103 is fixedly connected to a lower supporting plate 202 of the rack 1 through the motor fixing frame 1104, the guide wire lever 1107 is connected to the lower supporting plate 202 of the rack 1 through the guide wire lever fixing frame 1105, the motor encoder III 1103 is fixedly connected with the servo motor III 1102, the ball screw III 1106 is connected with the servo motor III 1102 through the coupler III 1108, the ball screw III 1106 is driven by the servo motor III 1102, the sliding block I1109 is installed on the ball screw III 1106, the sliding block II 1110 is installed on the guide screw 1107, the guide wire lever 1107 is connected with the ball screw III 1106 through a lifting plate 605 installed on the sliding block I1109 and the sliding block II 1110 Cooling plate 7, insulating ceramic spacer 8, die chuck 9, substrate chuck 10, and, secondly, for adjusting the displacement of lifter plate 505 at the time of demolding.
The following further describes the embodiments with reference to fig. 1 to 11.
Firstly, a power supply is switched on, the X-direction displacement platform 204 drives the Z-direction working platform 3 to a working position by adjusting the first servo motor 201 of the X-direction working platform 2, and then the Z-direction displacement slide block 304 arranged on the second ball screw 303 is driven to move by controlling the second servo motor 301 of the Z-direction working platform 3, so that the curing device 4, the horizontal adjusting device 5 and the imprinting device 6 at the lower end of the Z-direction working platform 3 are driven to move to the working position required by imprinting.
Then, a mold having a nano pattern required for imprinting is chucked in the mold chuck 9, and an imprinting material or a polymer material is uniformly spread on the substrate chucked on the substrate chuck 10 to wait for imprinting.
The stamp device 2 welded at its lower end is then brought to a level state under self-adjustment by the angle adjustment ball 502 of the level adjustment device 5.
The curing device 4, the horizontal adjusting device 5 and the imprinting device 6 are moved to an imprinting and curing working position through adjusting the Z-direction working platform 3, after the imprinting device 6 reaches the level under the adjustment of the horizontal adjusting device 5, a uniform electric field force is formed between the upper electrode plate 601 and the lower electrode plate 602 to serve as an imprinting force by applying adjustable voltage to the upper electrode plate 601 and the lower electrode plate 602, so that the transparent glass plate 603 pushes the mold chuck 9 to drive the composite mold to be imprinted to move downwards to the imprinting material clamped by the substrate chuck 10 under the action of the uniform electric field force, and the complete contact between the composite mold and the substrate is realized to realize imprinting.
The curing, cooling and curing time or the exposure and curing time is automatically adjusted as required, after the curing is finished, equal-large adjustable voltage in the positive and negative directions is repeatedly applied to the upper electrode plate 601 and the lower electrode plate 602, so that uniform electric field force in the positive and negative directions is continuously formed to serve as demolding force, meanwhile, the servo motor III 1103 of the lifting plate 605 provided with the heating plate 603 and the lower electrode plate 602 is controlled, the lifting plate 605 drives the lower electrode plate 602 and the heating plate 603 to have small displacement, and under the action of the uniform electric field force in the constantly changing direction, the composite mold and the imprinting substrate are repeatedly subjected to the upward and downward uniform force, so that the mold and the imprinting material are separated under the uniform force, and the demolding is finished.
Then the Z-direction working platform 3 is driven to drive the imprinting device 6 to return to the initial working position from the imprinting working position, the imprinted substrate is unloaded, a new substrate is put on, and the next working cycle is started.
The above imprinting can be performed according to different materials used for the imprinting material and the imprinting mold, so that the imprinting mode required by different molds and materials can be selected for imprinting. Wherein, when required mould and the required impression mode of impression material are hot embossing, the hot plate 603 switches on the outer power when the impression goes on to heat the impression material, treat impression, heat the completion back, through the power of switching on cooling plate 7, realize the cooling solidification to the impression material, thereby realize hot embossing, ultraviolet lamp 602 stop work this moment is in the closed condition.
When the required impression mode of mould and impression material that is required is ultraviolet nanoimprint, the work of hot plate 203 stop heating, solidification equipment 4 begins to work, wherein ultraviolet lamp 602 begins to work, and ultraviolet lamp 602 is opened, and when impression device 6 moved to impression position department, open ultraviolet lamp 401 among the solidification equipment 4, but pass through the ultraviolet ray through glass 501 and shine on the impression device, thereby when making the impression go on, ultraviolet lamp 602 carries out the ultraviolet exposure solidification to the material that is carrying out the impression, thereby realizes ultraviolet nanoimprint.
Claims (9)
1. A uniform electric field assisted nanoimprint lithography forming device is characterized by comprising a rack, an X-direction working platform, a Z-direction working platform, a solidifying device, a horizontal adjusting device, a stamping device, a cooling plate, a heat insulation ceramic gasket, a substrate chuck, a mold chuck and a base frame, wherein the rack is horizontally placed on a horizontal plane, the X-direction working platform is fixed on an upper supporting plate in the rack through screws, the Z-direction working platform is fixed on an X-direction displacement sliding table in the X-direction working platform through screws, the solidifying device is fixedly connected between visual glass in the horizontal device and a Z-direction displacement sliding block in the Z-direction working platform through screws, the stamping device is connected with an angle adjusting ball in the horizontal adjusting device in a welding mode, the cooling plate is fixedly connected on the heat insulation ceramic gasket, and the heat insulation ceramic gasket is fixedly connected on an outer frame of the base frame, the mold chuck is fixedly connected to a transparent glass plate in the imprinting device, the substrate chuck is fixedly connected to a heating plate in the imprinting device, and the base frame is fixedly connected to a lower supporting plate in the frame through screws.
2. The uniform electric field assisted nanoimprint lithography apparatus of claim 1, wherein the frame comprises: go up the backup pad, the bottom suspension fagging, support column one, support column two, support column three, support column four, wherein, the bottom suspension fagging level is placed on the horizontal plane, the one end of support column one passes through screwed connection with the bottom suspension fagging, the other end of support column one passes through screwed connection with last backup pad, the one end of support column two passes through screwed connection with the bottom suspension fagging, the one end of support column three passes through screwed connection with the bottom suspension fagging, the other end of support column three passes through screwed connection with last backup pad, the one end of support column four passes through screwed connection with the bottom suspension fagging, the other end of support column four passes through screwed connection with last backup pad.
3. The nanoimprint lithography apparatus assisted by a uniform electric field according to claim 1, wherein the X-direction stage comprises: the first servo motor is fixed on an upper supporting plate in the rack through screws, the first motor encoder is fixedly connected to the first servo motor, the first ball screw is connected with the first servo motor through the first coupler, and the X-direction displacement sliding table is clamped on the first ball screw.
4. The nanoimprint lithography apparatus assisted by a uniform electric field according to claim 1, wherein the Z-stage comprises: the servo motor II, the motor encoder II, the ball screw II, the Z-direction displacement sliding block and the coupling II are arranged on the base, wherein the servo motor II is fixedly connected to one end of the X-direction displacement sliding table through a screw, the motor encoder II is fixedly connected to the servo motor II, the ball screw II is connected with the servo motor II through the coupling II, and the Z-direction displacement sliding block is arranged on the ball screw II.
5. The uniform electric field assisted nanoimprint lithography apparatus of claim 1, wherein the curing device comprises: the device comprises an ultraviolet lamp and an ultraviolet lamp supporting frame, wherein the ultraviolet lamp is fixed on the ultraviolet lamp supporting frame through a screw, one end of the ultraviolet lamp supporting frame is connected with a Z-direction displacement sliding block in the Z-direction working platform through a screw, and the other end of the ultraviolet lamp supporting frame is fixed on visible glass in a horizontal adjusting device through a screw.
6. The uniform electric field assisted nanoimprint lithography apparatus of claim 1, wherein the level adjusting means comprises: the visual glass and the angle adjusting ball are connected in a spherical pair structure mode.
7. The nanoimprint lithography apparatus assisted by a uniform electric field according to claim 1, wherein the imprint apparatus comprises: go up electrode plate, lower electrode plate, transparent glass board, hot plate, lifter plate, wherein, go up and be connected through the welding on the angle adjustment ball among electrode plate and the level adjusting device, transparent glass board passes through the mode block of dress card and goes up electrode plate one end, and the hot plate links firmly on lower electrode plate, and lower electrode plate links firmly on the lifter plate, and the lifter plate dress card is on slider one and the slider two in the pedestal.
8. The uniform electric field assisted nanoimprint lithography apparatus of claim 1, wherein the base frame comprises: the base frame, servo motor three, motor encoder three, the servo motor mount, guide wire lever mount, ball three, the guide wire lever, shaft coupling three, slider one, slider two, wherein, the base frame passes through screw connection in the lower support plate of frame, servo motor three mount passes through screw connection in the lower support plate of frame, guide wire lever mount passes through screw connection in the lower support plate of frame, servo motor tee bend passes through motor mount fixed connection in the lower support plate, the guide wire lever passes through guide wire lever mount and connects in the lower support plate, motor encoder three and servo motor three fixed connection, be connected through shaft coupling three between ball three and the servo motor, slider one and two dress cards respectively on ball three and guide wire lever with the slider.
9. The seed uniform electric field assisted nanoimprint molding method of claims 1 to 8, characterized in that: the method comprises the following steps:
(1) horizontally placing the whole device on a horizontal plane, adjusting the X-direction working platform and the Z-direction working platform to enable the mold chuck to be adjusted to be right above the substrate chuck, then clamping a required imprinting mold on the mold chuck, and clamping a substrate coated with photoresist or imprinted polymer material on the substrate chuck;
(2) the imprinting device is enabled to reach a horizontal state by adjusting the horizontal adjusting device, when a needed imprinting mold and a needed substrate material are used for hot imprinting, the heating device is started to preheat the substrate, then the Z-direction displacement platform is adjusted to enable the imprinting device to move downwards to a needed working position right above the substrate, when the needed imprinting mold and the needed substrate material are used for ultraviolet imprinting, the Z-direction displacement platform is adjusted firstly to enable the curing device and the imprinting device to move downwards to the needed working position, an ultraviolet lamp in the curing device is turned on, and the substrate material is exposed and cured when the imprinting is carried out;
(3) the method comprises the steps of applying power supply voltage to an upper electrode plate and a lower electrode plate in an imprinting device to enable uniform electric field force to be formed between the upper electrode plate and the lower electrode plate to be used as imprinting force to imprint a substrate material, adjusting the size of the applied power supply voltage to obtain the imprinting force required during imprinting when the area and the distance between the upper electrode plate and the lower electrode plate are fixed, enabling a transparent glass plate clamped on the upper electrode plate to move downwards through a movable mold chuck under the action of the uniform electric field force to enable the imprinting mold and the substrate material to realize uniform force imprinting, repeatedly applying equal adjustable voltage in positive and negative directions between the two electrode plates, forming positive and negative uniform electric field force and taking the uniform electric field force as demolding force to demold the substrate material.
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| CN201910617394.8A CN112213917A (en) | 2019-07-10 | 2019-07-10 | Uniform electric field assisted nanoimprint forming device and method |
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| CN201910617394.8A CN112213917A (en) | 2019-07-10 | 2019-07-10 | Uniform electric field assisted nanoimprint forming device and method |
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Application publication date: 20210112 |