CN218938765U - Nanometer impression equipment - Google Patents

Abstract

The application discloses a nanoimprint apparatus, comprising: the device comprises a rolling station, an imprinting station, a first workpiece moving platform and a die clamping carrier; the first workpiece moving platform is used for bearing the substrate after dispensing at the dispensing station; the first end of the die clamping carrier is hinged with the first end of the first workpiece moving platform; the rolling station comprises a rolling mechanism which spans over the first workpiece moving platform; the embossing station includes an embossing platen and a UV light source. Thus, through the cooperation of the mold clamping carrier and the rolling mechanism, the soft mold on the mold clamping carrier and the adhesive layer on the substrate are gradually attached from one end to the other end and are pre-pressed to a certain depth, and then the imprinting platform is utilized to press the soft mold. Therefore, not only can no bubble be ensured between the soft mold and the adhesive layer, but also the stamping evenness can be ensured, and the problem of difficult demolding can be solved.

Description

Nanometer impression equipment

Technical Field

The application belongs to the technical field of imprinting, and particularly relates to nano imprinting equipment.

Background

With the development of semiconductor manufacturing technology, the size requirements of integrated circuits are smaller and smaller, and the requirements of photolithography technology are higher and higher, resulting in higher and higher cost of photolithography manufacturing. To solve this technical problem, the field proposes nanoimprint technology.

Nanoimprint technology refers to imprinting micro/nanostructure patterns onto a corresponding substrate by pressure with the aid of a stamp. At present, the nanoimprint technology has the characteristics of high resolution, high yield and low cost, and is widely applied to micro-nano structure manufacturing.

Nanoimprint technology is generally divided into two modes, namely hot imprint and Ultraviolet (UV) imprint, and is widely applied due to the characteristics of high structural fidelity, high micro-structure transfer depth-to-width ratio and the like of ultraviolet imprint. The ultraviolet embossing mainly comprises three modes of roller-to-roller UV nanoembossing, roller-to-flat UV nanoembossing and flat nanoembossing.

At present, for the application scene of matching a soft mold with a hard substrate, a flat-to-flat nanoimprint mode is mainly adopted. However, when the pattern on the flexible mold is transferred to the hard substrate by the flat-to-flat nanoimprint method, there are problems in that bubbles are easily formed in the adhesive layer and the imprint flatness is poor.

Disclosure of Invention

The application provides a nanometer impression equipment, can solve among the prior art adopt flat to flat nanometer impression mode, when the pattern on the flexible mold was rendition to the stereoplasm substrate, had easy bubble formation in the glue film to the relatively poor problem of impression planarization.

The application provides a nanoimprint apparatus, comprising: the device comprises a rolling station, an imprinting station, a first workpiece moving platform and a die clamping carrier; the first workpiece moving platform is used for bearing the substrate after dispensing at the dispensing station; the first end of the die clamping carrier is hinged with the first end of the first workpiece moving platform; the rolling station comprises a rolling mechanism which spans over the first workpiece moving platform; the embossing station includes an embossing platen and a UV light source.

In one implementation, the device further comprises an embossing operation platform and a first transmission guide rail; the first transmission guide rail is positioned on the imprinting operation platform and is used for transmitting the first workpiece moving platform between a rolling station and an imprinting station; the rolling station and the embossing station are sequentially arranged along the length direction of the first transmission guide rail; the rolling mechanism spans over the first conveying guide rail.

In one implementation manner, when the first workpiece moving platform moves towards the first end direction of the die clamping carrier, an included angle between the die clamping carrier and the first workpiece moving platform is gradually reduced, and the rolling mechanism gradually presses a soft die on the die clamping carrier through the first end of the die clamping carrier so that the soft die is attached to the adhesive layer on the surface of the substrate;

when the first workpiece moving platform moves back to the first end direction of the die clamping carrier, an included angle between the die clamping carrier and the first workpiece moving platform is gradually increased, so that the soft die is gradually separated from the adhesive layer on the surface of the base material.

In one implementation, the mold clamping carrier comprises a main body frame, a rotating mechanism, a fixing device and a tightening device; the fixing device and the tightening device are respectively arranged at two opposite ends of the main body frame; the rotating mechanism is arranged on the outer side of the fixing device and is used for driving the main body frame to rotate around the rotating shaft of the rotating mechanism.

In one implementation, the rolling mechanism comprises a pressing roller and height adjusting mechanisms respectively arranged at two ends of the pressing roller; the height adjusting mechanism comprises a first wedge-shaped sliding block, a first grating displacement sensor and a first driving device; two ends of the press roll are respectively erected on the wedge-shaped surface of the first wedge-shaped sliding block, wherein the press roll is abutted with a local area of the wedge-shaped surface; the first wedge-shaped sliding block is respectively connected with the first grating displacement sensor and the first driving device.

In one implementation, the embossing station further comprises leveling means and lifting means; when the first workpiece moving platform is positioned at the stamping station, the stamping platform is positioned between the first workpiece moving platform and the leveling device; the leveling device is used for adjusting the parallelism of the imprinting platform relative to the base material on the first workpiece moving platform; the lifting device is connected with the imprinting platform and is used for driving the imprinting platform to generate displacement in the direction perpendicular to the imprinting operation platform.

In one implementation, the leveling device includes a plurality of servo motors and a plurality of position sensors distributed at the top end of the imprinting platform.

In one implementation, the first workpiece moving platform includes a light-transmitting region, the UV light source is disposed at the bottom of the imprinting operation platform, the UV light source is configured to cure a glue layer on a substrate above the light-transmitting region through the light-transmitting region, and the substrate is a transparent substrate.

In one implementation, the imprinting platform is a light-transmissive platform, and the UV light source is disposed above the imprinting platform, and the UV light source is configured to cure a glue layer on a substrate below the imprinting platform through the imprinting platform.

In one implementation, the dispensing station includes: the device comprises a dispensing operation platform, a second workpiece moving platform, a second transmission guide rail, a dispensing mechanism and a knife coating mechanism; the second transmission guide rail is positioned on the dispensing operation platform and is used for the second workpiece moving platform to transmit between a dispensing area and a doctor-blading area, wherein the dispensing area and the doctor-blading area are sequentially arranged along the length direction of the second transmission guide rail;

the dispensing area comprises a dispensing head and a third transmission guide rail, and the third transmission guide rail is positioned above the second transmission guide rail and is vertically arranged with the second transmission guide rail; one end of the dispensing head is suspended above the second transmission guide rail, and the other end of the dispensing head is connected with the third transmission guide rail; the third transmission guide rail is used for enabling the dispensing head to move in the length direction of the third transmission guide rail;

the scraping and coating area comprises a scraping and coating mechanism, and the scraping and coating mechanism comprises a scraping and coating roller, a second wedge-shaped sliding block, a second grating displacement sensor and a second driving device;

the two ends of the knife coating roller are respectively erected on the wedge-shaped surface of the second wedge-shaped sliding block, wherein the knife coating roller is abutted with a local area of the wedge-shaped surface of the second wedge-shaped sliding block;

the second wedge-shaped sliding block is respectively connected with the second grating displacement sensor and the second driving device.

In one implementation manner, the second workpiece moving platform is provided with a transfer printing bearing platform, and the transfer printing bearing platform is used for bearing a substrate to be transferred; the bottom of the transfer printing bearing platform is connected with a jacking device and a rotating device.

In summary, the nanoimprint apparatus provided by the present application has the following beneficial effects: and the soft mold on the mold clamping carrier and the adhesive layer on the substrate are gradually attached from one end to the other end and prepressed to a certain depth through the matching of the mold clamping carrier and the rolling mechanism, and then the soft mold is pressed by the imprinting platform. Therefore, not only can no bubble be ensured between the soft mold and the adhesive layer, but also the stamping evenness can be ensured, and the problem of difficult demolding can be solved.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, a brief description will be given below of the drawings that are needed in the embodiments or the prior art descriptions, and it is obvious that the drawings in the following description are some embodiments of the present application, and that other drawings can be obtained according to these drawings without inventive effort for a person skilled in the art.

FIG. 1 is a flow chart of a nanoimprint apparatus operation provided using an embodiment of the present application;

fig. 2A is a schematic perspective view of a nanoimprint apparatus according to an embodiment of the present application;

FIG. 2B is a view in the direction A of FIG. 2A;

FIG. 3A is a schematic diagram illustrating deformation changes of a flexible mold when a first workpiece moving platform provided in an embodiment of the present application moves in a direction approaching an imprinting station;

FIG. 3B is a schematic diagram illustrating deformation changes of a flexible mold when the first workpiece moving platform provided in the embodiment of the present application moves away from the imprinting station;

fig. 4A is a schematic perspective view of a mold clamping carrier 204 according to an embodiment of the present disclosure;

FIG. 4B is an A-direction view of FIG. 4A;

fig. 5A is a schematic perspective view of a nanoimprint apparatus when the first workpiece moving platform provided in the embodiment of the present application is moved to the imprint station 300;

FIG. 5B is a view from direction A of FIG. 5A;

FIG. 5C is a view in direction C of FIG. 5A with the lifting device removed;

FIG. 5D is a D-view of FIG. 5A;

fig. 6A is a schematic perspective view of a dispensing station 100 according to an embodiment of the present disclosure;

FIG. 6B is an A-direction view of FIG. 6A;

fig. 6C is a view from direction C of fig. 6A.

Description of the reference numerals

100-of a dispensing station, 200-of a rolling station and 300-of an embossing station;

the device comprises a 101-dispensing operation platform, a 102-second workpiece moving platform, a 103-second transmission guide rail, a 104-dispensing mechanism, a 105-blade coating mechanism, a 106-dispensing area, a 107-blade coating area and a 108-residual glue scraping blade;

1021-a transfer printing bearing platform, 1041-a dispensing head, 1042-a third transmission guide rail, 1051-a knife coating roller, 1052-a second wedge-shaped sliding block and 1053-a second grating displacement sensor;

201-an imprinting operation platform, 202-a first workpiece moving platform, 203-a first transmission guide rail, 204-a mold clamping carrier, 205-a rolling mechanism and 206-a flexible mold;

2041-a main body frame, 2042-a rotating mechanism, 2043-a fixing device, 2044-a tightening device, 2045-a fixing connection piece, 2044A-a rotating reel, 2044B-a die support piece;

2051-a press roller, 2052-a first wedge-shaped slide block, 2053-a first grating displacement sensor, 2054-a first driving device;

301-an embossing platform, 302-a UV light source, 303-a lifting device and 304-a leveling device;

3031-telescopic rod, 3032-cylinder, 3041-servo motor, 3042-position sensor.

Detailed Description

The following description of the embodiments of the present application will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all, of the embodiments of the present application. All other embodiments, which can be made by those skilled in the art based on the embodiments herein without making any inventive effort, are intended to be within the scope of the present application.

The present application may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.

In this document, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Moreover, the terms "comprise," "include," or any other variation thereof, are intended to cover a non-exclusive inclusion.

In the embodiments of the present application, words such as "exemplary" or "such as" are used to mean serving as examples, illustrations, or descriptions. Any embodiment or design described herein as "exemplary" or "for example" should not be construed as preferred or advantageous over other embodiments or designs. Rather, the use of words such as "exemplary" or "such as" is intended to present related concepts in a concrete fashion.

In the embodiments of the present application, "at least one" means one or more, and "a plurality" means two or more. "and/or", describes an association relationship of an association object, and indicates that there may be three relationships, for example, a and/or B, and may indicate: a alone, a and B together, and B alone, wherein a, B may be singular or plural. The character "/" generally indicates that the context-dependent object is an "or" relationship. "at least one of" or the like means any combination of these items, including any combination of single item(s) or plural items(s). For example, at least one (one) of a, b, or c may represent: a, b, c, a-b, a-c, b-c, or a-b-c, wherein a, b, c may be single or plural.

Fig. 1 is a flowchart of a nanoimprint apparatus according to an embodiment of the present application. As shown in fig. 1, the nano-imprinting apparatus provided in the embodiment of the present application includes a dispensing station 100, a rolling station 200, and an imprinting station 300. The process flow of nanoimprinting the substrate by using the nanoimprinting equipment is as follows: first, the substrate is subjected to a dispensing process by a dispensing station 100, so as to form a glue layer with a certain thickness on the surface of the substrate. Then, the substrate after the dispensing treatment is transferred to a rolling station 200, and the substrate with the adhesive layer coated on the surface is stamped once by clamping the carrier and the pressing roller by using a die of the rolling station 200 so as to attach the die to the adhesive layer. Then, the substrate attached to the mold is transferred to the imprinting station 300, and the imprinting platform of the imprinting station 300 is utilized to perform secondary imprinting on the substrate so as to transfer the pattern on the mold onto the adhesive layer of the substrate and solidify the pattern. Finally, the substrate after the secondary imprinting is transferred back to the rolling station 200 again, and a demolding treatment is performed, so that the substrate with the pattern transferred is obtained.

It should be noted that the positions of the dispensing station 100, the rolling station 200, and the embossing station 300 are not limited in this embodiment, and for example, the dispensing station 100, the rolling station 200, and the embossing station 300 may be sequentially disposed along a straight line. For another example, the dispensing station 100 may be disposed side-by-side with the roll station 200 and the embossing station 300, wherein the roll station 200 and the embossing station 300 are sequentially disposed on the same row.

Fig. 2A is a schematic perspective view of a nanoimprint apparatus according to an embodiment of the present application, and fig. 2B is an a-direction view of fig. 2A.

As shown in fig. 2A and fig. 2B, the nanoimprint apparatus provided in the embodiment of the present application may include: an imprint operation platform 201, a first workpiece moving platform 202, a first conveying rail 203, a mold clamping carrier 204, and a roll pressing mechanism 205.

Wherein the first conveying rail 203 is located on the imprint operation platform 201, and is used for conveying the first workpiece moving platform 202 between the rolling station 200 and the imprint station 300; wherein the rolling station 200 and the embossing station 300 are sequentially arranged along the length direction of the first conveying rail 203; the first workpiece moving platform 202 is configured to carry a substrate after dispensing at the dispensing station 100, and the substrate has a glue layer with a preset thickness thereon. A first end of the mold clamping carrier 204 is hinged to a first end of the first workpiece moving platform 202; the rolling mechanism 205 is located at the rolling station 200, and the rolling mechanism 205 spans over the first conveying rail 203; the embossing station 300 includes an embossing stage 301 and a UV light source 302.

The working principle of the nanoimprint apparatus provided by the embodiment of the application is as follows: the first transfer rail 203 extends through the roll station 200 and the imprint station 300 such that the first workpiece moving stage 202 can reciprocate between the roll station 200 and the imprint station 300 using the first transfer rail 203. The mold clamping carrier 204 is mounted on the first workpiece moving platform 202, the mold clamping carrier 204 is used for fixedly mounting the flexible mold 206, and a first end of the mold clamping carrier 204 is hinged to a first end of the first workpiece moving platform 202, so that the mold clamping carrier 204 can be opened or closed around the hinged end. For example, when the first workpiece moving stage 202 moves toward the imprinting station 300 (i.e., toward the first end of the die holder carrier 204), the die holder carrier 204 may rotate counterclockwise about the hinge end such that the angle between the die holder carrier 204 and the first workpiece moving stage 202 is gradually reduced until the die holder carrier 204 and the first workpiece moving stage 202 are completely closed. When the first workpiece moving platform 202 moves away from the imprinting station 300 (i.e., moves away from the first end of the die clamping carrier 204), the die clamping carrier 204 may rotate clockwise about the hinge end, so that an included angle between the die clamping carrier 204 and the first workpiece moving platform 202 gradually increases. The roller press 205 spans over the first conveyor rail 203, and the roller press 205 may be height-adjustable as desired.

Thus, when the first workpiece moving platform 202 carries the mold clamping carrier 204 with the soft mold and moves towards the direction approaching the imprinting station 300, the first workpiece moving platform 202 passes under the rolling mechanism 205, at this time, the rolling mechanism 205 may move downward to a first preset height, and the rolling mechanism 205 may deform downward to the passing soft mold 206 by adjusting the first preset height. Thus, as shown in fig. 3A, along with the movement of the first workpiece moving platform 202 in the direction approaching the imprinting station 300, the included angle between the mold clamping carrier 204 and the first workpiece moving platform 202 gradually decreases, and meanwhile, the rolling mechanism 205 gradually presses the flexible mold 206 on the mold clamping carrier from the first end of the mold clamping carrier 204 to generate downward deformation, so that the flexible mold is gradually attached to the adhesive layer on the surface of the substrate, and in this way, bubbles can be avoided from being generated between the flexible mold and the adhesive layer on the surface of the substrate in a manner that the flexible mold is gradually attached to the adhesive layer on the surface of the substrate from one end to the other end.

When the first workpiece moving platform 202 carries the mold clamping carrier 204 with the soft mold, and moves away from the imprinting station 300, the first workpiece moving platform 202 needs to pass under the rolling mechanism 205, at this time, the rolling mechanism 205 may move upward to a second preset height, and the second preset height is adjusted, so that the rolling mechanism 205 does not contact with the passing soft mold. Thus, as shown in fig. 3B, along with the movement of the first workpiece moving platform 202 in the direction away from the imprinting station 300, the included angle between the mold clamping carrier 204 and the first workpiece moving platform 202 gradually increases, and the soft mold 206 gradually recovers to deform, so that the soft mold 206 is gradually separated from the adhesive layer on the surface of the substrate, thereby solving the technical problem of difficult demolding in the prior art.

It should be noted that fig. 3A and 3B are only used for exemplary illustration, and the change process of the flexible mold 206 when the mold clamping carrier 204 cooperates with the rolling mechanism 205 is not indicative of the deformation of the flexible mold 206. In practical applications, the deformation of the flexible mold 206 is small, and the micro-nano structure on the flexible mold 206 is not affected, so that the printed pattern can be ensured to be clear and complete.

If the flexible mold 206 is pressed once directly by the rolling mechanism 205, the pattern on the flexible mold 206 is transferred onto the adhesive layer, and it is difficult to ensure the flatness of the transferred pattern. Therefore, in the embodiment of the present application, first, the primary imprinting is completed by the cooperation of the mold clamping carrier 204 and the rolling mechanism 205, and then the imprinting platform is used to perform the secondary imprinting on the soft mold 206 after the primary imprinting, so as to transfer the pattern on the soft mold 206 onto the adhesive layer of the substrate. Therefore, not only can no bubble be ensured between the soft mold and the adhesive layer, but also the stamping evenness can be ensured, and the problem of difficult demolding can be solved.

To sum up, in the embodiment of the present application, the mold clamping carrier 204 and the rolling mechanism 205 may be matched, the flexible mold 206 on the mold clamping carrier 204 and the adhesive layer on the substrate are gradually attached from one end to the other end and pre-pressed to a certain depth, and then the imprinting platform 301 is used to press the flexible mold 206. Thus, not only can no bubble be ensured between the soft mold 206 and the adhesive layer, but also the stamping evenness can be ensured, and the problem of difficult demolding can be solved.

The mold clamping carrier 204 provided in the embodiments of the present application is described below as an example.

Fig. 4A is a schematic perspective view of a mold clamping carrier 204 according to an embodiment of the present application, and fig. 4B is a view in a direction a of fig. 4A.

As shown in fig. 4A and 4B, the mold clamping carrier 204 provided in the embodiment of the present application includes a main body frame 2041, a rotation mechanism 2042, a fixing device 2043, and a tightening device 2044.

Wherein, the fixing device 2043 and the tightening device 2044 are respectively arranged at two opposite ends of the main body frame 2041, and the fixing device 2043 and the tightening device 2044 are used for fixing and tightening the flexible mold 206. The rotating mechanism 2042 is disposed outside the fixing device 2043, and the rotating mechanism 2042 is used for driving the main body frame 2041 to rotate around the rotating shaft Z of the rotating mechanism 2042.

The specific structure of the rotation mechanism 2042 is not limited in the embodiment of the present application, and for example, the rotation mechanism 2042 may include a rotation shaft and a motor for driving the rotation shaft to rotate. Wherein, the motor for driving the axis of rotation pivoted can be connected with the controller, like this, can control the direction of rotation and the rotation angle of axis of rotation through the controller.

Illustratively, when the first workpiece moving platform 202 is detected to move towards the direction approaching the imprinting station 300, the controller may control the rotation shaft to reversely rotate, so that the included angle between the mold clamping carrier 204 and the first workpiece moving platform 202 is gradually reduced; when the first workpiece moving platform 202 is detected to move away from the imprinting station 300, the controller can control the rotating shaft to rotate forward, so that the included angle between the die clamping carrier 204 and the first workpiece moving platform 202 is gradually increased.

A position sensor may be provided on the imprint operation platform 201, so that the movement direction of the first workpiece movement platform 202 may be determined using the position sensor. The controller may then control the rotational direction of the rotational shaft based on the determination result of the position sensor.

When the flexible mold 206 is installed, one end of the flexible mold 206 may be fixed by the fixing device 2043, and then the other end of the flexible mold 206 is pulled toward the tightening device 2044, the flexible mold 206 is tightened by the tightening device 2044, and the other end of the flexible mold 206 is fixed to the tightening device 2044. In this way, the surface of the soft mold 206 after being mounted is flat, so that the patterns printed on the adhesive layer later are clear and complete.

It should be noted that the specific structure of the tightening device 2044 is not limited in the embodiment of the present application, as long as the flexible mold 206 can be fixed and tightened.

By way of example, the tightening device 2044 may include a rotating reel 2044A and a die support 2044B. The mold support 2044B is located between the fixture 2043 and the rotating reel 2044A. In this way, when the flexible mold 206 is mounted, one end of the flexible mold 206 may be fixed by the fixing device 2043, and then the other end of the flexible mold 206 may be pulled toward the rotating reel 2044A, and the other end of the flexible mold 206 may be fixed by the rotating reel 2044A. With the rotation of the rotating reel 2044A, the surface of the flexible mold 206 can be pulled taut, wherein the mold support 2044B is used to support one end of the flexible mold 206 near the rotating reel 2044A so that the surface of the flexible mold 206 is on the same horizontal plane everywhere.

As shown in fig. 4A, the mold clamp carrier 204 may also include a fixed connector 2045. The fixing connectors 2045 are located at both sides of the rotation mechanism 2042 and fixed to the outer side of the main body frame 2041. Thus, one end of the mold clamping carrier 204 may be coupled to the first work piece moving platform 202 via the stationary coupling 2045.

It should be noted that, in the embodiment of the present application, the flexible mold 206 made of transparent material may be used, so that a UV light source may be disposed above the flexible mold 206 to cure the adhesive layer.

The following is an exemplary description of the platen roller mechanism 205 provided in the embodiment of the present application.

As shown in fig. 2A and 2B, the rolling mechanism 205 may include a press roller 2051 and a height adjusting mechanism provided separately at both ends of the press roller 2051, wherein the height adjusting mechanism may adjust the distance between the press roller 2051 and the platen 201.

The embodiment of the application does not limit the specific implementation manner of the height adjusting mechanism.

In one implementation, the height adjustment mechanism may include a first wedge slider 2052, a first grating displacement sensor 2053, and a first drive device 2054. Wherein, two ends of the press roller 2051 are respectively erected on the wedge-shaped surface of the first wedge-shaped sliding block 2052, and the press roller 2051 is abutted with a local area of the wedge-shaped surface; the first wedge sled 2052 is connected to the first grating displacement sensor 2053 and the first driving device 2054, respectively.

As shown in fig. 2A, a height adjusting mechanism is provided at each end of the pressure roller 2051. Each height adjustment mechanism includes a first wedge slide 2052, a first grating displacement sensor 2053, and a first drive device 2054. Wherein the first wedge sled 2052 comprises a wedge surface and a flat surface. With the wedge face facing the pressure roller 2051 and the flat face facing the platen 201.

In this way, the abutting position of the press roller 2051 and the local area of the wedge surface can be precisely controlled by using the first grating displacement sensor 2053, so that precise control of the distance between the press roller 2051 and the imprinting platform 201 is realized.

The imprinting station 300 provided in embodiments of the present application is described below as an example.

Fig. 5A is a schematic perspective view of a nanoimprint apparatus when the first workpiece moving platform provided in the embodiment of the present application is moved to the imprint station 300, fig. 5B is an a-direction view of fig. 5A, fig. 5C is a C-direction view of fig. 5A with a lifting device removed, and fig. 5D is a D-direction view of fig. 5A.

As shown in fig. 5A to 5D, the imprinting station 300 includes a lifting device 303, a leveling device 304, and an imprinting platform 301 from top to bottom.

When the first workpiece moving stage 202 moves to the imprint station 300, the imprint stage 301 is located between the first workpiece moving stage 202 and the leveling device 304. The leveling device 304 is used to adjust the parallelism of the imprint platform 301 with respect to the substrate on the first workpiece motion platform 202. The lifting device 303 is connected to the imprinting platform 301, and is used for driving the imprinting platform 301 to generate displacement in a direction perpendicular to the imprinting operation platform 201.

In order to ensure the flatness of the embossing, the embossing stage 301 may be made of transparent mirror glass.

In one implementation, as shown in fig. 5A, the lifting device 303 may include a telescoping rod 3031 and a cylinder 3032. One end of the telescopic rod 3031 is connected with the cylinder 3032, and the other end is connected with the imprinting platform 301. Here, the platen 301 is displaced in the longitudinal direction of the telescopic rod 3031 as the telescopic rod 3031 expands and contracts. The cylinder 3032 is connected to the telescopic rod 3031, and is used for controlling the telescopic rod 3031 to stretch and retract. In this way, the extension and retraction of the extension and retraction lever 3031 can be adjusted by the air cylinder 3032, thereby adjusting the distance between the imprint platform 301 and the first workpiece movement platform 202.

In one implementation, as shown in FIG. 5C, the leveling device 304 includes a plurality of servo motors 3041 and a plurality of position sensors 3042 distributed on top of the imprint platform 301. In this way, by the cooperation of the plurality of servo motors 3041 and the plurality of position sensors 3042, the parallelism of the imprinting platform 301 relative to the substrate on the first workpiece moving platform 202 can be accurately adjusted, so as to improve the transfer uniformity of nanoimprinting. The gap between the imprinting platform 301 and the substrate on the first workpiece moving platform 202 can be accurately adjusted through the cooperative work of the plurality of servo motors 3041 and the plurality of position sensors 3042, so that the nano imprinting requirements of glue layers with different thicknesses can be compatible.

The embossing station 300 is further provided with a UV light source 302, and the UV light source 302 is used for exposing the embossed glue layer to ultraviolet light, so as to promote the polymers in the embossed area to be polymerized and cured and formed.

The present application does not limit the installation position of the UV light source 302. For example, as shown in fig. 5C, in the case where the imprinting stage 301 is a light-transmitting stage, the UV light source 302 may be disposed above the imprinting stage 301, so that the UV light source 302 may cure the adhesive layer on the substrate under the imprinting stage 301 through the imprinting stage 301. The arrangement mode of the UV light source can realize the solidification of the adhesive layer on the substrate made of the non-transparent material.

For another example, as shown in fig. 5D, in the case where the first workpiece moving stage includes a light-transmitting region, the UV light source 302 may be disposed at the bottom of the imprinting operation stage 201, so that the UV light source 302 may cure the adhesive layer on the substrate above the light-transmitting region through the light-transmitting region. The arrangement mode of the UV light source can realize the solidification of the adhesive layer on the transparent material substrate.

It will be appreciated that the UV light source 302 may also be disposed above the imprint platform 301 and at the bottom of the imprint operation platform 201, respectively, and may be adapted to cure any substrate resist layer.

It should be noted that, in the embodiment of the present application, only the embossing station 300 and the rolling station 200 are disposed on the same operation platform for illustration, and the layout positions of the embossing station 300 and the rolling station 200 are not limited. For example, the embossing station 300 and the rolling station 200 may be separately provided on two operating stages.

The dispensing station 100 provided in the embodiments of the present application is described below as an example.

Fig. 6A is a schematic perspective view of a dispensing station 100 according to an embodiment of the present application, fig. 6B is a view from direction a of fig. 6A, and fig. 6C is a view from direction C of fig. 6A.

As shown in fig. 6A to 6C, the dispensing station 100 includes: a dispensing operation platform 101, a second workpiece moving platform 102, a second transmission guide rail 103, a dispensing mechanism 104 and a blade coating mechanism 105.

The second conveying rail 103 is located on the dispensing operation platform 101, and the dispensing station 100 is divided into a dispensing area 106 and a doctor-blade area 107 along the length direction of the second conveying rail 103. In this way, the second transfer rail 103 may be used for transferring the second workpiece moving platform 102 between the dispensing area 106 and the doctor blade area 107. The dispensing area 106 is used for dispensing the surface of the substrate, and the doctor-blading area 107 is used for doctor-blading the dispensing on the substrate, so as to form a glue layer with uniform thickness on the surface of the substrate.

The dispensing mechanism 104 includes a dispensing head 1041 and a third conveying rail 1042, where the third conveying rail 1042 is located above the second conveying rail 103 and is perpendicular to the second conveying rail 103. One end of the dispensing head 1041 is suspended above the second transmission guide rail 103, and the other end is connected with the third transmission guide rail 1042; the third conveying rail 1042 is used for moving the dispensing head 1041 along the length direction of the third conveying rail 1042.

A transfer printing bearing platform 1021 is arranged on the second workpiece moving platform 102, and the transfer printing bearing platform 1021 is used for bearing a substrate to be transferred; the bottom of the transfer printing bearing platform 1021 is connected with a jacking device and a rotating device, the jacking device can drive the transfer printing bearing platform 1021 to lift, and the rotating device can enable the transfer printing bearing platform 1021 to rotate by taking the central shaft of the transfer printing substrate adsorption platform 1021 as a rotating center. In this way, when the second workpiece moving platform 102 moves to the dispensing area 106 through the second conveying rail 103, the dispensing head 1041 can move along the length direction of the third conveying rail 142, and the dispensing in different areas on the surface of the substrate is realized by matching with the rotation of the transfer printing bearing platform 1021.

In this embodiment of the application, the dispensing head 1041 may include components such as pneumatic dispensing valve, dispensing syringe, precise screw rubberizing pump, so that precise dispensing may be realized by components such as pneumatic dispensing valve, dispensing syringe, precise screw rubberizing pump.

As shown in fig. 6C, the transfer supporting platform 1021 may be provided with adsorption holes, and the adsorption holes may be arranged in an array. Thus, the substrate can be better fixed on the transfer printing bearing platform 1021.

As shown in fig. 6C, the dispensing area 106 may further include a residual glue scraping blade 108, where when the second workpiece moving platform 102 is located in the dispensing area 106, the residual glue scraping blade 108 is located at the edge of the transfer printing carrier platform 1021, so that residual glue on the edge of the substrate can be collected by rotating the transfer printing carrier platform 1021 and the residual glue scraping blade 108.

In one implementation, the residual glue scraper 108 includes a fixed end and a free end, the fixed end is connected with the dispensing operation platform, and the free end is rotatable around the fixed end. Thus, when the substrate edge needs to be scraped, the free end of the residual glue scraper 108 can be rotated to a proper position to scrape the substrate edge. When the scraping process is not required for the edge of the substrate, the free end of the residual glue scraper 108 can be rotated, so that the free end of the residual glue scraper 108 is far away from the second workpiece moving platform 102.

The blade coating area 107 comprises a blade coating mechanism 105, said blade coating mechanism 105 comprising a blade coating roller 1051, a second wedge sled 1052, a second grating displacement sensor 1053 and a second drive means. Wherein, two ends of the knife coating roller 1051 are respectively erected on the wedge surface of the second wedge-shaped sliding block 1052, and the knife coating roller 1051 is abutted with a partial area of the wedge surface of the second wedge-shaped sliding block 1052; the second wedge sled 1052 is connected to a second grating displacement sensor 1053 and a second drive mechanism, respectively.

The method for adjusting the height of the doctor roll 1051 by using the second wedge-shaped slider 105, the second grating displacement sensor 1053 and the second driving device can be specifically referred to the description of the height adjusting mechanism of the press roll 2051 in the above embodiment, and the working principle thereof is the same and will not be repeated herein.

In summary, the dispensing station 100 provided in the embodiments of the present application applies UV glue to a substrate in a manner that mates with a dispensing mechanism and a doctor blade mechanism. Thus, the problem of UV glue overflow can be solved.

The foregoing detailed description has been provided for the purposes of illustration in connection with specific embodiments and exemplary examples, but such description is not to be construed as limiting the application. Those skilled in the art will appreciate that various equivalent substitutions, modifications and improvements may be made to the technical solution of the present application and its embodiments without departing from the spirit and scope of the present application, and these all fall within the scope of the present application. The scope of the application is defined by the appended claims.

Claims (10)

1. A nanoimprint apparatus, comprising: the device comprises a rolling station, an imprinting station, a first workpiece moving platform and a die clamping carrier;

the first workpiece moving platform is used for bearing the substrate after dispensing at the dispensing station;

the first end of the die clamping carrier is hinged with the first end of the first workpiece moving platform;

the rolling station comprises a rolling mechanism which spans over the first workpiece moving platform;

the embossing station includes an embossing platen and a UV light source.

2. The nanoimprint apparatus according to claim 1, wherein when the first workpiece moving stage moves toward the first end of the mold clamping carrier, an angle between the mold clamping carrier and the first workpiece moving stage gradually decreases, a soft mold is mounted on the mold clamping carrier, and the rolling mechanism gradually presses the soft mold on the mold clamping carrier from the first end of the mold clamping carrier to make the soft mold adhere to the adhesive layer on the surface of the substrate;

when the first workpiece moving platform moves back to the first end direction of the die clamping carrier, an included angle between the die clamping carrier and the first workpiece moving platform is gradually increased, so that the soft die is gradually separated from the adhesive layer on the surface of the base material.

3. The nanoimprint apparatus according to claim 1, wherein the mold clamping carrier includes a main body frame, a rotation mechanism, a fixing device, and a tightening device;

the fixing device and the tightening device are respectively arranged at two opposite ends of the main body frame;

the rotating mechanism is arranged on the outer side of the fixing device and is used for driving the main body frame to rotate around the rotating shaft of the rotating mechanism.

4. The nanoimprint apparatus according to claim 1, wherein the roll pressing mechanism includes a pressing roll and height adjusting mechanisms provided separately at both ends of the pressing roll;

the height adjusting mechanism comprises a first wedge-shaped sliding block, a first grating displacement sensor and a first driving device;

two ends of the press roll are respectively erected on the wedge-shaped surface of the first wedge-shaped sliding block, wherein the press roll is abutted with a local area of the wedge-shaped surface;

the first wedge-shaped sliding block is respectively connected with the first grating displacement sensor and the first driving device.

5. The nanoimprinting apparatus according to claim 1, wherein the imprinting station further comprises a leveling device and a lifting device;

when the first workpiece moving platform is positioned at the stamping station, the stamping platform is positioned between the first workpiece moving platform and the leveling device;

the leveling device is used for adjusting the parallelism of the imprinting platform relative to the base material on the first workpiece moving platform;

the lifting device is connected with the imprinting platform and is used for driving the imprinting platform to generate displacement in the direction perpendicular to the imprinting operation platform.

6. The nanoimprinting apparatus according to claim 5, wherein the leveling device comprises a plurality of servo motors and a plurality of position sensors distributed at a top end of the imprinting stage.

7. The nanoimprinting apparatus according to claim 1, wherein the first workpiece moving stage comprises a light-transmitting region, the UV light source is disposed at a bottom of the imprinting operation stage, and the UV light source is configured to cure a glue layer on a substrate above the light-transmitting region through the light-transmitting region, the substrate being a transparent substrate.

8. The nanoimprint apparatus of claim 1 or 7, wherein the imprint platform is a light-transmissive platform, the UV light source being arranged above the imprint platform, the UV light source being for curing a glue layer on a substrate located below the imprint platform through the imprint platform.

9. The nanoimprinting apparatus of claim 1, wherein the dispensing station comprises: the device comprises a dispensing operation platform, a second workpiece moving platform, a second transmission guide rail, a dispensing mechanism and a knife coating mechanism;

the second transmission guide rail is positioned on the dispensing operation platform and is used for the second workpiece moving platform to transmit between a dispensing area and a doctor-blading area, wherein the dispensing area and the doctor-blading area are sequentially arranged along the length direction of the second transmission guide rail;

the dispensing area comprises a dispensing head and a third transmission guide rail, and the third transmission guide rail is positioned above the second transmission guide rail and is vertically arranged with the second transmission guide rail; one end of the dispensing head is suspended above the second transmission guide rail, and the other end of the dispensing head is connected with the third transmission guide rail; the third transmission guide rail is used for enabling the dispensing head to move in the length direction of the third transmission guide rail;

the scraping and coating area comprises a scraping and coating mechanism, and the scraping and coating mechanism comprises a scraping and coating roller, a second wedge-shaped sliding block, a second grating displacement sensor and a second driving device;

the two ends of the knife coating roller are respectively erected on the wedge-shaped surface of the second wedge-shaped sliding block, wherein the knife coating roller is abutted with a local area of the wedge-shaped surface of the second wedge-shaped sliding block;

the second wedge-shaped sliding block is respectively connected with the second grating displacement sensor and the second driving device.

10. The nanoimprint apparatus of claim 9, wherein a transfer-printing carrying platform is provided on the second workpiece moving platform, the transfer-printing carrying platform being for carrying a substrate to be transferred;

the bottom of the transfer printing bearing platform is connected with a jacking device and a rotating device.

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