KR100768326B1 - Chemical supplying apparatus - Google Patents

Abstract

A chemical supply apparatus is provided to supply a chemical to a canister from a buffer when residuals filled in the canister are below a reference value. A canister(100) is filled with a chemical(113), and a buffer(200) has a discharge valve(240) which receives the chemical from the canister and discharges the chemical to a semiconductor equipment(250). The buffer(200) has a bubble discharge valve(260) which discharges bubbles contained in the chemical. The residual of the chemical in the canister is measured by a residual measuring member. A volume varying member retracts or expands a chemical receiving space of the buffer to feed the chemical to the canister if the residuals are below a reference value.

Description

Chemical Supply Unit {CHEMICAL SUPPLYING APPARATUS}

1 is a schematic view showing a chemical supply apparatus of the prior art.

Figure 2 is a schematic diagram showing the overall structure for explaining the chemical supply apparatus according to the first embodiment of the present invention.

Figure 3 is an enlarged view showing a buffer structure for explaining a chemical supply apparatus according to a second embodiment of the present invention.

Figure 4 is an enlarged view showing a buffer structure for explaining a chemical supply apparatus according to a third embodiment of the present invention.

<Description of Symbols for Main Parts of Drawing>

100: canister 110: cartridge

111: inert gas, nitrogen 113: chemical liquid

130: pressure pump 150: load cell

160: transfer pipe 170: pressure sensor

200: buffer 210: membrane member

220: variable actuator 230: level sensor

240: discharge valve 250: semiconductor equipment

260: bubble exhaust valve

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chemical supply apparatus for semiconductor equipment, and more particularly, to transfer chemicals used in a manufacturing process of a semiconductor wafer or a flat panel display (FPD) from a canister to a buffer and stably supply the semiconductor equipment. A chemical feeder for the present invention.

1 is a schematic view showing a chemical supply apparatus of the prior art.

Chemical supply apparatus according to the prior art as shown in the drawing is a semiconductor device 25 is supplied with a canister 10 is filled with a chemical raw material and a chemical (hereinafter, referred to as a chemical) filled in the canister 10 It consists of a buffer 20 for supplying stably.

The chemical liquid 11b is filled in the canister 10, and the chemical liquid 11b is packaged and supplied in a cartridge 11 in a plastic bag form.

At this time, the cartridge 11 is filled with an inert gas or nitrogen 11a as a solvent together with the chemical solution 11b.

The cartridge 11 as described above is mounted so that the transfer tube 16 penetrated into the center of the canister 10 may be immersed therein, and the chemical liquid 11b is buffered through the transfer tube 16. To be supplied.

At this time, the position of the buffer 20 is located above the canister 10, which requires a forced transfer means for forcibly transferring the chemical liquid 11b to the buffer 20 position.

As the forced conveying means, a pressurized pump 13 as shown in FIG. 1 may be used, and the pressurized pump 13 serves to increase the pressure inside the canister 10.

The internal pressure of the canister 10 raised by the action of the pressure pump 13 compresses the cartridge 11, and transfers the chemical liquid 11b inside the cartridge 11 to the buffer 20 by the compression force. Let's go.

The chemical liquid 11b sent to the buffer 20 is again sent to the semiconductor device 25 through the discharge valve 24. In this case, the semiconductor device 25 may be supplied to a plurality of at the same time, the buffer 20 is supplied with a constant amount of chemical liquid (11b) to one or a plurality of semiconductor equipment 25 at a stable pressure and transfer speed Be sure to

A bubble exhaust valve 26 for discharging bubbles contained in the chemical liquid 11b to the outside is installed at the upper portion of the buffer 20.

In addition, a level sensor 23 is installed at one side of the buffer 20 to measure the level of the filled chemical liquid 11b so that the filled state of the chemical liquid 11b can always be maintained above a certain level.

The reason why the level sensor 23 is installed is to prevent the gas from flowing into the semiconductor device 25 through the discharge valve 24.

However, when the chemical supply apparatus of the prior art as described above reaches the remaining amount (100 ~ 500cc) of the chemical liquid (11b) stored on the canister 10 side, the flow rate supplied to the buffer 20 is very fast.

At this time, when the flow rate of the chemical liquid (11b) increases as described above, the inert gas (11a) is mixed in the bubble state of the fine particles in the chemical liquid (11b) there is a problem that bubbles are generated.

At this time, the generated bubbles are transported to the buffer 20 because the particles are small, it does not rise to the upper layer of the chemical liquid (11b), hardened as mixed in the chemical liquid (11b) causing a serious failure in the piping system and machinery There was.

Therefore, conventionally, due to such a problem, it is impossible to use the chemical liquid 11b to the end, and the situation is discarded with the remaining amount of about 100 to 500 cc, and thus, there is a problem in that the loss of material waste and process shortening is very large. there was.

An object of the present invention for solving the problems of the prior art is to provide a chemical supply device for measuring the residual amount of the chemical liquid in the canister and the low-speed vacuum suction at the buffer side when the residual amount is less than the reference value.

Another object of the present invention is to provide a chemical supply device that can exhaust all of the chemical liquid in the cartridge without a residual amount as well as prevent bubbles from occurring in the residual chemical liquid.

Chemical supply apparatus according to the present invention for achieving the object of the present invention as described above canister is filled with a chemical liquid; A buffer for supplying a chemical liquid filled in the canister to supply the semiconductor device; Remaining amount measuring means for measuring the remaining amount of the chemical liquid in the canister; And a volume variable stage configured to suck the chemical liquid in the canister by contracting and expanding the chemical liquid receiving space in the buffer when the residual amount of the chemical liquid in the canister is equal to or less than a reference value.

Here, the canister is provided with a cartridge filled with the chemical liquid, it characterized in that the pressure pump for compressing the cartridge by increasing the internal pressure of the canister.

In addition, the buffer is provided with a discharge valve for discharging the chemical liquid to the semiconductor device side, and a bubble discharge valve for discharging the bubbles contained in the chemical liquid to the outside is provided at the upper portion of the buffer, the volume variable stage therein It is characterized in that it is installed.

At this time, the buffer is characterized in that the level sensor for measuring the level of the filled chemical liquid is installed.

The volume variable stage may include: a membrane member installed at left and right sides of the buffer, the membrane member having a contraction expansion action in a left and right direction so as to arbitrarily contract and expand a receiving space formed therebetween; And a variable actuator for contracting and expanding the membrane member. It includes.

Here, the membrane member is characterized by using any one of a diaphragm, corrugated pipe, and rubber plate.

At this time, the membrane member is produced in a spherical shape, the transport pipe is connected to the lower portion of the sphere, the bubble exhaust valve is connected to the upper, characterized in that the discharge valve is connected to one side connected to the transport pipe.

In addition, the variable actuator is characterized in that using the pressure reduction / reduction pump or cylinder.

And, the variable actuator is characterized in that the decompression drive is performed when the remaining amount of the chemical liquid in the cartridge is less than the reference value.

At this time, the residual amount reference value is characterized in that 100 ~ 500cc.

Here, the vacuum suction speed by the volume variable stage is characterized in that the flow rate of less than 10cc / s.

And, the remaining amount measuring means is installed on the bottom surface of the canister is characterized in that the pressure sensor installed in the load cell or the transfer pipe to detect the change in weight of the canister is used.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

<First Embodiment>

Figure 2 is a schematic diagram showing the overall structure for explaining the chemical supply apparatus according to the first embodiment of the present invention.

Chemical supply apparatus according to the present invention as shown in the Figure is a semiconductor device 250 is supplied with a canister 100 is filled with a chemical raw material and a chemical (hereinafter, referred to as a chemical liquid) filled in the canister 100 It is composed of a buffer 200 for supplying stably.

The canister 100 is filled with a chemical liquid, and the chemical liquid is packaged and supplied in a cartridge 110 in a plastic bag form.

In this case, the cartridge 110 is filled with an inert gas or nitrogen 111 as a solvent in addition to the chemical liquid 113 to be used.

The cartridge 110 as described above is mounted so that the transfer pipe 160 installed through the center of the canister 100 can be immersed therein, and the chemical liquid 113 is buffered through the transfer pipe 160. To be supplied.

At this time, the position of the buffer 200 is located above the canister 100, which requires a forced transfer means for forcibly transferring the chemical liquid 113 to the buffer 200 position.

As the forced conveying means, a pressurized pump 130 as shown in FIG. 2 may be used. The pressurized pump 130 serves to increase the pressure inside the canister 100.

The internal pressure of the canister 100 raised by the action of the pressure pump 130 compresses the cartridge 110, and transfers the chemical liquid 113 inside the cartridge 110 to the buffer 200 by the compression force. Let's go.

The chemical liquid 113 sent to the buffer 200 is again sent to the semiconductor device 250 through the discharge valve 240. In this case, the semiconductor device 250 may be supplied to a plurality of at the same time, the buffer 200 is supplied with a certain amount of the chemical liquid 113 is supplied to the one or a plurality of semiconductor equipment 250 at a stable pressure and transfer speed Be sure to

The upper portion of the buffer 200 is provided with a bubble exhaust valve 260 for discharging the bubbles contained in the chemical liquid 113 to the outside.

In addition, a level sensor 230 is installed at one side of the buffer 200 to measure the level of the filled chemical liquid 113 so that the filled state of the chemical liquid 113 can always maintain a predetermined level or more.

The reason why the level sensor 230 is installed is to prevent the gas from flowing into the semiconductor device 250 through the discharge valve 240.

In addition, a volume variable stage is installed in the buffer 200 to arbitrarily vary the filling space of the chemical liquid 113.

The volume variable stages are respectively installed in the left and right side portions of the buffer 200 and the membrane member 210 has a contraction expansion action in the left and right directions so as to arbitrarily contract and expand the receiving space of the chemical liquid 113 filled therebetween. And a variable actuator 220 for varying the shape and position of the membrane member 210.

As the membrane member 210 as shown in FIG. 2, a material free of shape deformation such as a diaphragm, a corrugated pipe, and a rubber plate may be used.

In addition, the variable actuator 220 for varying the membrane member 210 may be an acceleration / deceleration pump.

The pressurization / decompression pump normally forms a high pressure atmosphere in the space between the membrane member 210 and the buffer 200 so that the membrane member 210 expands to the center side of the buffer 200, resulting in the chemical liquid 113. To keep the receiving space at a minimum.

In such an acceleration / decompression pump, when the remaining amount of the chemical liquid 113 in the cartridge 110 is lower than the reference value, the decompression driving is performed. At this time, the pressure pump 130 on the canister 100 side stops the operation.

When the acceleration / decompression pump is driven under reduced pressure, the membrane member 210 contracts to the outer wall side of the buffer 200 as indicated by the dashed line in FIG. 2. When the membrane member 210 is contracted, the volume of the chemical liquid 113 receiving space is expanded relatively, and the pressure reduction phenomenon occurs.

As the receiving space of the chemical liquid 113 is depressurized, the residual amount of the chemical liquid 113 stored on the canister 100 is suctioned along the transfer pipe 160.

At this time, the depressurization driving of the acceleration / deceleration pump starts at the time when the residual amount standard becomes 100 to 500 cc and is made at the lowest flow rate, preferably 10 cc / s or less, until the residual amount reaches 50 to 0 cc. Let it progress slowly.

Here, the reason for maintaining the decompression rate at the minimum speed is to prevent bubbles from being generated in the chemical liquid 113.

In this manner, when a predetermined amount of the chemical liquid 113 is filled in the buffer 200, the contraction of the volume variable stage in the buffer 200 proceeds so that the chemical liquid 113 in the buffer 200 is semiconductor. Extruded to equipment 250.

In this case, the contraction of the volume variable stage may be performed by pressurizing the acceleration / decompression pump. The acceleration / decompression pump may pressurize by supplying compressed air to a space between the membrane member 210 and the buffer 200. The member 210 is expanded to the center side of the buffer 200.

As the membrane member 210 expands to the inner center side, the chemical liquid 113 receiving space formed between the membrane members 210 is contracted, and the chemical liquid 113 in the chemical liquid 113 receiving space is discharge valve 240. It is supplied to the semiconductor equipment 250 side through.

The pumping action of the volume variable stage is repeated until the chemical liquid 113 in the canister 100 is exhausted.

In addition, a residual amount measuring means is used to measure the remaining amount of the chemical liquid 113 of the canister 100. The remaining amount measuring means is installed on the bottom of the canister 100 to detect a change in weight of the canister. ) Or the pressure sensor 170 installed in the transfer pipe 160 may be used.

At this time, the pressure sensor 170 may be replaced by a sensor for measuring the flow rate and flow rate of the chemical liquid (113).

The chemical supply apparatus according to the first embodiment of the present invention as described above has the advantage of reducing the material cost as it is possible to exhaust all of the chemical liquid 113 in the cartridge 110 without the remaining amount.

Second Embodiment

3 is an enlarged view illustrating a buffer structure for explaining the chemical supply apparatus according to the second embodiment of the present invention.

The chemical supply apparatus according to the second embodiment of the present invention, as shown in the figure, changes only the structure of the buffer 200 from the first embodiment of the present invention as shown in FIG.

Therefore, hereinafter, the structure description of the canister 100 will be omitted, and the configuration description of the buffer 200 will be described in more detail.

The buffer 200 according to the second embodiment of the present invention includes a discharge valve 240 for supplying the chemical liquid 113 to the semiconductor equipment 250 at a lower portion, and bubbles contained in the chemical liquid 113 at the upper portion thereof. A bubble exhaust valve 260 for discharging to the outside is installed.

In addition, a level sensor 230 is installed at one side of the buffer 200 to measure the level of the filled chemical liquid 113 so that the filled state of the chemical liquid 113 can always maintain a predetermined level or more.

The reason why the level sensor 230 is installed is to prevent the gas from flowing into the semiconductor device 250 through the discharge valve 240.

In addition, a volume variable stage is installed in the buffer 200 to arbitrarily vary the filling space of the chemical liquid 113.

The volume variable stages are respectively installed in the left and right side portions of the buffer 200 and the membrane member 210 has a contraction expansion action in the left and right directions so as to arbitrarily contract and expand the receiving space of the chemical liquid 113 filled therebetween. And a variable actuator 220 for varying the shape and position of the membrane member 210.

As shown in FIG. 3, the membrane member 210 may use an accordion-shaped corrugated pipe member.

In addition, the variable actuator 220 for varying the membrane member 210 may be a cylinder or the like for transferring the front end of the corrugated pipe member in the horizontal direction.

The cylinder normally extends the piston to its maximum length so that the membrane member 210 is moved to the center side of the buffer 200, resulting in keeping the receiving space of the chemical liquid 113 in a minimum state.

In such a cylinder, when the remaining amount of the chemical liquid 113 in the cartridge 110 is lower than the reference value, the pressure reduction driving is performed.

When the cylinder 220 is driven under reduced pressure, the length of the piston is reduced to a minimum, and the membrane member 210 expands to the outer wall side of the buffer 200 to expand the volume of the receiving space of the chemical liquid 113 in the center relatively. do.

At this time, when the receiving space of the chemical liquid 113 is expanded, the internal pressure is sharply reduced so that the remaining amount of the chemical liquid 113 stored in the canister 100 is sucked toward the buffer 200 along the transfer pipe 160.

At this time, the depressurization driving of the acceleration / deceleration pump 220 starts at a time when the residual amount reference is 100 to 500 cc and is made at a minimum flow rate, preferably 10 cc / s or less, and the residual amount is 50 to 0 cc. Continue slowly until

As described above, when a predetermined amount of the chemical liquid 113 is filled in the buffer 200, the contraction action of the volume variable stage in the buffer 200 proceeds so that the chemical liquid 113 in the buffer 200 is converted into semiconductor equipment ( 250).

The contraction of the volume variable stage may be achieved by pressurizing the cylinder 220. For the pressurization driving, the cylinder 220 extends the piston to a maximum length so that the membrane member 210 moves toward the center of the buffer 200. As a result, the receiving space of the chemical liquid 113 is constricted.

As the chemical liquid 113 accommodating space is contracted, the chemical liquid 113 in the chemical liquid 113 accommodating space is supplied to the semiconductor device 250 through the discharge valve 240.

The pumping action of the volume variable stage is repeated until the chemical liquid 113 in the canister 100 is exhausted.

At this time, the residual amount measuring means for measuring the remaining amount of the chemical liquid 113 of the canister 100 is a pressure sensor 170 installed in the load cell 150 or the transfer pipe 160 to detect the change in the weight of the canister is to be used. Can be.

Such a pressure sensor 170 may be replaced by a sensor for measuring the flow rate and flow rate of the chemical liquid (113).

Third Embodiment

4 is an enlarged view illustrating a buffer structure for explaining a chemical supply apparatus according to a third embodiment of the present invention.

The chemical supply apparatus according to the third embodiment of the present invention, as shown in the drawing, changes only the structure of the buffer 200 from the first embodiment of the present invention as shown in FIG.

Therefore, hereinafter, the structure description of the canister 100 will be omitted, and the configuration description of the buffer 200 will be described in more detail.

The buffer 200 according to the third embodiment of the present invention includes a discharge valve 240 for supplying the chemical liquid 113 to the semiconductor device 250 at a lower portion, and bubbles contained in the chemical liquid 113 at the upper portion thereof. A bubble exhaust valve 260 for discharging to the outside is installed.

In addition, a level sensor 230 is installed at one side of the buffer 200 to measure the level of the filled chemical liquid 113 so that the filled state of the chemical liquid 113 can always maintain a predetermined level or more.

The reason why the level sensor 230 is installed is to prevent the gas from flowing into the semiconductor device 250 through the discharge valve 240.

In addition, a volume variable stage is installed in the buffer 200 to arbitrarily vary the filling space of the chemical liquid 113.

The volume variable stage is installed in a spherical shape in the inner center of the buffer 200, the membrane member 210 and the expansion and contraction action is made so that the expansion and contraction of the receiving space of the drug solution 113 filled therein arbitrarily and the; And a variable actuator 220 for contracting and expanding the membrane member 210.

In this case, as shown in FIG. 4, the membrane member 210 may use a spherical elastic member that has elasticity when contracted and expanded.

A transfer tube 160 is connected to a lower center of the spherical elastic member, a bubble exhaust valve 260 is connected to an upper center thereof, and a discharge valve 240 is connected to one side to which the transfer tube 160 is connected. .

In addition, the variable actuator 220 for varying the membrane member 210 may use an acceleration / decompression pump configured to pressurize and depressurize the space between the buffer 200 and the membrane member 210.

The pressurizing / depressurizing pump normally maintains the space between the buffer 200 and the membrane member 210 at a high pressure atmosphere so that the membrane member 210 contracts as much as possible, and consequently minimizes the receiving space of the chemical liquid 113 to a minimum state. Will be maintained.

In such a cylinder, when the remaining amount of the chemical liquid 113 in the cartridge 110 is lower than the reference value, the pressure reduction driving is performed.

When the cylinder 220 is driven under reduced pressure, a space is formed between the buffer 200 and the membrane member 210 to form a low pressure atmosphere so that the membrane member 210 is expanded to expand the volume of the central chemical liquid 113 receiving space. do.

At this time, when the receiving space of the chemical liquid 113 is expanded, the internal pressure is sharply reduced so that the remaining amount of the chemical liquid 113 stored in the canister 100 is sucked toward the buffer 200 along the transfer pipe 160.

At this time, the depressurization driving of the acceleration / deceleration pump 220 starts at a time when the residual amount reference is 100 to 500 cc and is made at a minimum flow rate, preferably 10 cc / s or less, and the residual amount is 50 to 0 cc. Continue slowly until

When a predetermined amount of the chemical liquid 113 is filled in the buffer 200 through the decompression driving as described above, the contraction of the volume variable stage in the buffer 200 proceeds so that the chemical liquid 113 in the buffer 200 proceeds. ) Is extruded into the semiconductor equipment 250.

The contraction of the volume variable stage may be achieved by pressurizing and driving the acceleration / decompression pump 220. The acceleration / decompression pump maintains the space between the buffer 200 and the membrane member 210 in a high pressure atmosphere to maintain the membrane member. As the 210 is contracted as much as possible, as a result, the receiving space of the chemical liquid 113 is contracted.

As the chemical liquid 113 accommodating space is contracted, the chemical liquid 113 in the chemical liquid 113 accommodating space is supplied to the semiconductor device 250 through the discharge valve 240.

The pumping action of the volume variable stage is repeated until the chemical liquid 113 in the canister 100 is exhausted.

At this time, the residual amount measuring means for measuring the remaining amount of the chemical liquid 113 of the canister 100 is a pressure sensor 170 installed in the load cell 150 or the transfer pipe 160 to detect the change in the weight of the canister is to be used. Can be.

Such a pressure sensor 170 may be replaced by a measuring sensor for measuring the flow rate and flow rate of the chemical liquid (113).

As the present invention having the above-described configuration and operation can be variously modified and changed by those skilled in the art using the various embodiments described above, the true technical scope of the present invention is not limited to the contents described in the detailed description of the specification, but the patent claims It should be determined by the scope.

According to the present invention, when the residual amount of the chemical liquid in the canister is less than the reference value, the low-speed vacuum suction is performed at the buffer side, thereby reducing the residual chemical liquid amount in the canister, thereby reducing the material cost.

In addition, the present invention has the effect of preventing the problem that the bubble is generated in the chemical liquid is fixed in the supply pipe by inhaling the remaining amount of the chemical liquid in the canister at a low speed of 10 cc / s or less.

Claims (12)

Canisters filled with chemical liquids; A buffer in which a discharge valve for receiving the chemical liquid filled in the canister and being sent to the semiconductor device is installed at a lower portion thereof, and a bubble exhaust valve for discharging bubbles contained in the chemical liquid to the outside is provided at an upper portion of the buffer; Remaining amount measuring means for measuring the remaining amount of the chemical liquid in the canister; And A volume variable stage configured to inhale the chemical liquid in the canister by contracting and expanding the chemical liquid receiving space in the buffer when the residual amount of the chemical liquid in the canister is less than a reference value as a result of the measurement using the remaining amount measuring means; Chemical supply apparatus comprising a configuration comprising a. The method of claim 1, A chemical supply device is provided in the canister, a cartridge filled with a chemical liquid, and a pressurized pump for compressing the cartridge by raising an internal pressure of the canister. delete The method of claim 1, The buffer is a chemical supply device characterized in that the level sensor is installed for measuring the level of the filled chemical liquid. The method of claim 1, The volume variable stage may include: a membrane member installed at left and right sides of the buffer and having a contraction and expansion action in a left and right direction so as to arbitrarily contract and expand a receiving space formed therebetween; And A variable actuator for contracting and expanding the membrane member; Chemical supply apparatus comprising a configuration comprising a. The method of claim 5, The membrane member is a chemical supply device, characterized in that using any one of a diaphragm, corrugated pipe and rubber plate. The method of claim 5, The membrane member is manufactured in a spherical shape, the lower part of the sphere is connected to the conveying pipe, the upper air bubble exhaust valve is connected, the chemical supply apparatus characterized in that the discharge valve is connected to one side connected to the conveying pipe. The method of claim 5, The variable actuator is a chemical supply device, characterized in that the use of the pressure reduction / reduction pump or cylinder. The method of claim 5, The variable actuator is a chemical supply device, characterized in that the decompression drive is performed when the remaining amount of the chemical in the cartridge is less than the reference value. The method of claim 9, Chemical supply apparatus, characterized in that the residual amount reference value is 100 ~ 500cc. The method of claim 1, And a vacuum suction speed by the volume variable stage is set at a flow rate of 10 cc / s or less. The method of claim 1, The remaining amount measuring means is installed on the bottom surface of the canister chemical supply device, characterized in that the pressure sensor installed in the load cell or transfer pipe to detect the change in weight of the canister is used.

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