KR100755377B1 - 표면처리 동박의 제조방법 - Google Patents
표면처리 동박의 제조방법 Download PDFInfo
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- KR100755377B1 KR100755377B1 KR1020017012021A KR20017012021A KR100755377B1 KR 100755377 B1 KR100755377 B1 KR 100755377B1 KR 1020017012021 A KR1020017012021 A KR 1020017012021A KR 20017012021 A KR20017012021 A KR 20017012021A KR 100755377 B1 KR100755377 B1 KR 100755377B1
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- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
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- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
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- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/58—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of copper
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- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C2222/00—Aspects relating to chemical surface treatment of metallic material by reaction of the surface with a reactive medium
- C23C2222/20—Use of solutions containing silanes
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0355—Metal foils
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/389—Improvement of the adhesion between the insulating substrate and the metal by the use of a coupling agent, e.g. silane
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12431—Foil or filament smaller than 6 mils
- Y10T428/12438—Composite
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12472—Microscopic interfacial wave or roughness
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12556—Organic component
- Y10T428/12569—Synthetic resin
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12611—Oxide-containing component
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12903—Cu-base component
- Y10T428/1291—Next to Co-, Cu-, or Ni-base component
Abstract
Description
(3)표면처리 동박의 제조방법은, 동박의 표면에 조화(粗化)처리면을 형성하고, 방청처리를 실시하여, 조화처리면에 실레인 커플링제를 흡착시켜, 건조하는 프린트 배선판용 동박의 표면처리 방법에 있어서, 방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것으로, 전해 크로메이트도금 후에 동박표면을 건조시켜, 실레인 커플링제를 흡착시키고, 전해동박 자체의 온도가 105℃∼180℃의 범위가 되는 고온 분위기 내에서 2~6초간 유지하는 것에 의해 건조하는 것으로 표면처리 동박을 얻는 것이다.
(5)표면처리 동박의 제조방법은, 동박의 표면에 조화처리면을 형성하여, 방청처리를 실시하고, 조화처리면에 실레인 커플링제를 흡착시켜, 건조하는 것인 전해동박의 표면처리 방법에 있어서, 조화처리면의 형성은, 동박의 표면에 미세 동입자를 석출시키고, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하여, 극미세 동입자를 석출 부착시키고, 방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것이며, 전해 크로메이트도금 후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시켜, 전해동박 자체의 온도가 105℃~180℃ 범위가 되는 고온 분위기 내에서 2~6초간 유지하여 건조하는 것에 의해 표면처리 동박을 얻는 것이다.
Claims (10)
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- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 것인 프린트 배선판용 동박의 표면처리 방법에 있어서,방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것이고,전해 크로메이트도금 후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시키며,전해동박 자체의 온도가 105℃∼180℃ 범위로 되는 고온 분위기 내에서 2∼6초간 유지함으로써 건조하는 것을 특징으로 하는 표면처리 동박의 제조방법.
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 것인 프린트 배선판용 동박의 표면처리 방법에 있어서,방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것이며,상기 전해 크로메이트도금을 한 표면을 건조시키지 않고, 실레인 커플링제를 흡착시키며, 그 후에 전해동박 자체의 온도가 110℃∼200℃ 범위가 되는 고온 분위기 내에서 2∼6초간 유지함으로써 건조시키는 것을 특징으로 하는 표면처리 동박의 제조방법.
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 전해동박의 표면처리 방법에 있어서,조화처리면의 형성은 동박의 표면에 버닝(burning)도금의 전해조건으로 동 (銅) 전해용액에 의해 미세 동입자를 석출시키고, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하고, 비소 또는 9-페닐아크리딘(phenylacridine)을 함유한 동 전해액에 의해 극미세 동입자를 석출부착시키며,방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것으로서,전해 크로메이트도금 후에 동박표면을 건조시키고, 실레인 커플링제를 흡착시키며, 동박 자체의 온도가 105℃∼180℃의 온도가 되는 고온 분위기 내에서 2∼6초간 유지함으로써 건조하는 것을 특징으로 하는 표면처리 동박의 제조방법.
- 동박의 표면에 조화처리면을 형성하고, 방청처리를 실시하며, 조화처리면에 실레인 커플링제를 흡착시키고, 건조하는 전해동박의 표면처리방법에 있어서,조화처리면의 형성은, 동박의 표면에 버닝(burning)도금의 전해조건으로 동 (銅) 전해용액에 의해 미세 동입자를 석출시키고, 미세 동입자의 탈락을 방지하기 위한 피복도금을 하고, 비소 또는 9-페닐아크리딘(phenylacridine)을 함유한 동 전해액에 의해 극미세 동입자를 석출부착시키며,방청처리는 아연-동의 진유도금을 하고, 이어서 전해 크로메이트도금을 하는 것으로서,상기 전해 크로메이트도금을 한 표면을 건조시키지 않고, 실레인 커플링제를 흡착시키고, 그 후에 전해동박 자체의 온도가 110℃∼200℃ 범위가 되는 고온 분위기 내에서 2∼6초간 유지함으로써 건조하는 것을 특징으로 하는 표면처리 동박의 제조방법.
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JPJP-P-2000-00020782 | 2000-01-28 | ||
JP2000020782A JP3661763B2 (ja) | 2000-01-28 | 2000-01-28 | プリント配線板用表面処理銅箔の製造方法 |
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KR100755377B1 true KR100755377B1 (ko) | 2007-09-04 |
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US (1) | US6585877B2 (ko) |
EP (1) | EP1185150B1 (ko) |
JP (1) | JP3661763B2 (ko) |
KR (1) | KR100755377B1 (ko) |
CN (1) | CN1206888C (ko) |
AT (1) | ATE402593T1 (ko) |
DE (1) | DE60134925D1 (ko) |
HK (1) | HK1047855A1 (ko) |
MY (1) | MY126890A (ko) |
TW (1) | TW503670B (ko) |
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KR101126831B1 (ko) | 2009-09-02 | 2012-03-23 | 엘에스엠트론 주식회사 | 전해 동박 및 그 제조 방법 |
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JP4379854B2 (ja) * | 2001-10-30 | 2009-12-09 | 日鉱金属株式会社 | 表面処理銅箔 |
KR100602896B1 (ko) | 2002-06-04 | 2006-07-19 | 미쓰이 긴조꾸 고교 가부시키가이샤 | 저유전성 기재용 표면처리 동박과 그것을 사용한 동클래드적층판 및 프린트 배선판 |
US6863796B2 (en) * | 2002-07-02 | 2005-03-08 | Taiwan Semiconductor Manufacturing Co., Ltd | Method for reducing cu surface defects following cu ECP |
JP4354271B2 (ja) * | 2003-12-26 | 2009-10-28 | 三井金属鉱業株式会社 | 褐色化表面処理銅箔及びその製造方法並びにその褐色化表面処理銅箔を用いたプラズマディスプレイの前面パネル用の電磁波遮蔽導電性メッシュ |
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WO2006137240A1 (ja) * | 2005-06-23 | 2006-12-28 | Nippon Mining & Metals Co., Ltd. | プリント配線板用銅箔 |
JP5034059B2 (ja) | 2009-03-19 | 2012-09-26 | メック株式会社 | 積層体の形成方法 |
CN103221583B (zh) | 2010-11-22 | 2015-05-13 | 三井金属矿业株式会社 | 表面处理铜箔 |
KR101597749B1 (ko) * | 2012-07-27 | 2016-02-25 | 미쓰이금속광업주식회사 | 금속박 및 전자 디바이스 |
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CN104988484A (zh) * | 2015-06-08 | 2015-10-21 | 谢伟杰 | 一种铜合金防锈剂 |
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- 2001-01-24 KR KR1020017012021A patent/KR100755377B1/ko active IP Right Grant
- 2001-01-24 CN CNB018001130A patent/CN1206888C/zh not_active Expired - Lifetime
- 2001-01-24 DE DE60134925T patent/DE60134925D1/de not_active Expired - Lifetime
- 2001-01-24 WO PCT/JP2001/000435 patent/WO2001056345A1/ja active IP Right Grant
- 2001-01-24 EP EP01901521A patent/EP1185150B1/en not_active Expired - Lifetime
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Also Published As
Publication number | Publication date |
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CN1206888C (zh) | 2005-06-15 |
CN1358408A (zh) | 2002-07-10 |
TW503670B (en) | 2002-09-21 |
US20010014410A1 (en) | 2001-08-16 |
KR20020001793A (ko) | 2002-01-09 |
MY126890A (en) | 2006-10-31 |
EP1185150B1 (en) | 2008-07-23 |
DE60134925D1 (de) | 2008-09-04 |
WO2001056345A1 (fr) | 2001-08-02 |
EP1185150A1 (en) | 2002-03-06 |
ATE402593T1 (de) | 2008-08-15 |
HK1047855A1 (zh) | 2003-03-07 |
EP1185150A4 (en) | 2006-11-22 |
JP2001214297A (ja) | 2001-08-07 |
US6585877B2 (en) | 2003-07-01 |
JP3661763B2 (ja) | 2005-06-22 |
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