KR100708635B1 - Cleaning composition for removing residue on substrate of display device - Google Patents

Cleaning composition for removing residue on substrate of display device Download PDF

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KR100708635B1
KR100708635B1 KR1020000053406A KR20000053406A KR100708635B1 KR 100708635 B1 KR100708635 B1 KR 100708635B1 KR 1020000053406 A KR1020000053406 A KR 1020000053406A KR 20000053406 A KR20000053406 A KR 20000053406A KR 100708635 B1 KR100708635 B1 KR 100708635B1
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substrate
color filter
display device
cleaning
cleaning composition
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KR20020020160A (en
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지승룡
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삼성에스디아이 주식회사
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • C11D2111/22—

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Abstract

본 발명은 디스플레이 장치의 제조공정 중에 발생하는 기판 상의 잔류물을 제거하기 위한 세정용 조성물에 관한 것으로서, 디에틸렌 글리콜 모노부틸 에테르 1 내지 20중량%, 2-아미노에탄올 1 내지 20중량%을 포함하며, 나머지 함량은 물인 것을 특징으로 세정용 조성물을 제공한다. 본 발명에 따른 세정액을 이용하여 기판을 세척하는 경우에는 기판 상의 잔류물을 제거할 수 있어서, 잔류물로 인하여 발생할 수 있는 문제점, 예를 들어 액정 물질이 오염되는 문제점 및 칼라 필터층과 보호층과의 밀착력이 떨어지는 등의 문제점을 제거할 수 있다.The present invention relates to a cleaning composition for removing the residue on the substrate generated during the manufacturing process of the display device, comprising 1 to 20% by weight of diethylene glycol monobutyl ether, 1 to 20% by weight of 2-aminoethanol , The remaining content is water to provide a cleaning composition. When the substrate is cleaned using the cleaning liquid according to the present invention, residues on the substrate may be removed, such as problems that may occur due to the residues, such as contamination of the liquid crystal material, and the color filter layer and the protective layer. Problems such as poor adhesion can be eliminated.

Description

디스플레이 장치 기판 상의 잔류물을 제거하기 위한 세정용 조성물{Cleaning composition for removing residue on substrate of display device} Cleaning composition for removing residue on substrate of display device

도 1은 종래 칼라 필터의 단면도이다.1 is a cross-sectional view of a conventional color filter.

도 2는 종래 칼라 필터의 제조방법의 개략적 흐름도이다.2 is a schematic flowchart of a method of manufacturing a conventional color filter.

도 3은 본 발명에 의한 실시예 1에 따른 조성물로 세정한 후에 촬영한 주사 현미경 사진이다.3 is a scanning micrograph taken after washing with the composition according to Example 1 of the present invention.

도 4는 비교예 3에 따른 조성물로 세정한 후에 촬영한 주사 현미경 사진이다.4 is a scanning micrograph taken after washing with the composition according to Comparative Example 3.

<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>

11, 21; 유리 기판 12, 22; 블랙 매트릭스층11, 21; Glass substrates 12 and 22; Black matrix layer

13a, 23a; 적색 필터층 13b, 23b; 청색 필터층13a, 23a; Red filter layers 13b, 23b; Blue filter layer

13c, 23c; 녹색 필터층 14, 24; 보호층13c, 23c; Green filter layers 14, 24; Protective layer

본 발명은 디스플레이 장치의 제조공정 중에 발생하는 기판 상의 잔류물을 제거하기 위한 세정용 조성물에 관한 것으로서, 상세하게는 디스플레이의 형광막을 제조하는 공정 중 기판 상에 잔류하는 포토레지스트를 제거하기 위한 세정용 조성물에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a cleaning composition for removing residues on a substrate generated during a manufacturing process of a display device, and more particularly, to cleaning photoresist remaining on a substrate during a process of manufacturing a fluorescent film of a display. It relates to a composition.

형광물질을 사용하는 디스플레이 장치에는 음극선관(CRT), 플라즈마 디스플레이 패널(PDP), 액정 디스플레이(LCD), 필드 에미션 디스플레이(FED) 및 형광표시관(VFD) 등이 있다. 이러한 디스플레이 장치는 음극선관의 형광막 또는 액정 디스플레이의 칼라 필터와 같이 형광물질로 이루어진 층을 구비하는데, 이러한 층을 형성하는 방법으로는 포토레지스트를 사용하는 포토리소그래피(photolithography) 방식이 이용될 수 있다.Display devices using fluorescent materials include a cathode ray tube (CRT), a plasma display panel (PDP), a liquid crystal display (LCD), a field emission display (FED), and a fluorescent display tube (VFD). Such a display device includes a layer made of a fluorescent material, such as a fluorescent film of a cathode ray tube or a color filter of a liquid crystal display, and a photolithography method using a photoresist may be used as a method of forming such a layer. .

이러한 포토리소그래피 방식을 이용하는 경우에는 적색, 청색 또는 녹색의 형광물질을 포함하는 포토레지스트가 깨끗하게 현상되지 않아 기판 상에 잔류하는 문제가 있다. 이러한 잔류물로 인하여 기판에 얼룩이 발생하여 디스플레이 장치의 불량을 야기하게 된다.In the case of using such a photolithography method, a photoresist including a red, blue, or green fluorescent material is not developed cleanly and thus remains on a substrate. Such residues may cause stains on the substrate and cause a defect of the display device.

액정 디스플레이의 칼라 필터를 예로 들어 그 제조방법 및 문제점을 상세히 살펴보겠다. Taking a color filter of a liquid crystal display as an example, a manufacturing method and a problem thereof will be described in detail.

칼라 필터는 백색 광을 이용하여 칼라 화상을 구현하기 위한 것으로, 통상적인 칼라 필터의 일 예를 도 1에 나타내 보였다.The color filter is for realizing a color image using white light, and an example of a conventional color filter is illustrated in FIG. 1.

도시된 바와 같이 칼라필터는 기판(11) 위에 소정의 패턴으로 형성된 블랙 매트릭스층(12)과, 상기 블랙 매트릭스 층(12) 사이에 형성되어 있는 적색, 청색 및 녹색 칼라 필터층(13a),(13b) 및 (13c) 그리고 상기 블랙 매트릭스층(12)과 칼라 필터층(13a), (13b) 및 (13c)의 상부에는 보호층(14)이 형성되어 구조로 이루어 져 있다.As shown, the color filter includes a black matrix layer 12 formed in a predetermined pattern on the substrate 11 and red, blue and green color filter layers 13a and 13b formed between the black matrix layer 12. ) And (13c), and a protective layer 14 is formed on the black matrix layer 12 and the color filter layers 13a, 13b, and 13c.

상술한 바와 같은 칼라 필터는 STN(Super Twisted Nematic) 액정표시장치, 박막트랜지스터(Thin Film Transistor: TFT)를 이용한 액정표시장치등에 등에 장착되어 칼라 화상을 구현하게 된다.The color filter as described above is mounted on a STN (Super Twisted Nematic) liquid crystal display device, a liquid crystal display device using a thin film transistor (TFT), or the like to implement a color image.

상기와 같은 칼라 필터를 제조하는 방법으로는 염색법, 염료 분산법, 안료분산법, 인쇄법, 전착법 등이 있다. 여기에서 안료 분산법은 안료가 분산된 포토레지스트를 도포, 노광, 현상 및 소성함으로써 칼라필터를 제조하는 방법이다. 도 2를 참조하여 상기 안료분산법에 따라 칼라필터를 제조하는 방법을 살펴보기로 한다.As a method of manufacturing such a color filter, there are a dyeing method, a dye dispersion method, a pigment dispersion method, a printing method, an electrodeposition method and the like. Here, a pigment dispersion method is a method of manufacturing a color filter by apply | coating, exposing, developing, and baking a photoresist in which the pigment was disperse | distributed. Referring to Figure 2 will be described a method for producing a color filter according to the pigment dispersion method.

이를 참조하면, 유리기판 (21)위에 크롬 금속, 유기물 등의 블랙 매트릭스 형성용 물질(26)을 도포한 다음, 포토리소그래피(photolithography)공정을 이용하여 블랙 매트릭스 패턴(22)을 형성한다. 이어서, 적색 칼라 필터 층 형성용 조성물, 즉 포토레지스트에 적색 안료가 분산된 조성물(27)을 도포한 다음, 포토마스크 (28) 및 자외선(미도시)을 이용하여 소정 영역만을 노광한 다음, 이를 알카리 수용액으로 현상하여 적색 칼라 필터층 (23a)을 형성한다. Referring to this, the black matrix forming material 26 such as chromium metal or organic material is coated on the glass substrate 21, and then the black matrix pattern 22 is formed by using a photolithography process. Subsequently, a composition for forming a red color filter layer, that is, a composition in which red pigment is dispersed in the photoresist is applied, and then only a predetermined region is exposed using the photomask 28 and ultraviolet light (not shown), and then It develops with alkaline aqueous solution, and forms the red color filter layer 23a.

적색 칼라 필터 층 형성용 조성물 대신, 녹색 및 청색 칼라 필터층 형성용 조성물을 이용하여 상기 과정을 반복하여 녹색 및 청색 칼라 필터층 (23b) 및 (23c)를 각각 형성한다. Instead of the red color filter layer forming composition, the above process is repeated using the green and blue color filter layer forming compositions to form the green and blue color filter layers 23b and 23c, respectively.

그 후, 상기 결과물상에 보호층 (24)을 형성하여 칼라 필터를 완성한다. Thereafter, a protective layer 24 is formed on the resultant to complete the color filter.

상기 방법에 따르면, 칼라필터의 정교성과 재현성은 우수하다는 장점이 있으 나, 자외선을 조사 받은 부위 또는 자외선 조사를 받지 않은 부위가 깨끗하게 현상되지 않아 적색, 청색 또는 녹색의 안료를 포함하는 포토레지스트가 유리 기판(21) 상에 잔류하는 문제가 있다. 이러한 잔류물은 보호층과의 접착력을 떨어뜨리며, 잔류물에 남아있는 안료에 의해 액정 물질이 오염되어 화면에 얼룩이 나타나는 등의 LCD 제조 상의 치명적 불량을 야기하게 된다. According to the above method, the color filter has the advantage of excellent precision and reproducibility, but the photoresist containing red, blue, or green pigment is free because the irradiated or unexposed areas are not developed cleanly. There is a problem that remains on the substrate 21. These residues degrade the adhesion to the protective layer and cause fatal defects in LCD manufacturing, such as staining of the liquid crystal material by stains remaining on the residue.

따라서, 상술한 바와 같은 잔류물을 보다 완벽하게 제거할 수 있는 방법이 요구되고 있다. Therefore, there is a need for a method that can more completely remove the residue as described above.

따라서, 본 발명이 이루고자 하는 기술적 과제는 디스플레이 장치의 제조공정 중 기판 상의 잔류물을 보다 완벽한 제거할수 있는 세정용 조성물을 제공하는 것이다.Therefore, the technical problem to be achieved by the present invention is to provide a cleaning composition that can more completely remove the residue on the substrate during the manufacturing process of the display device.

상기 기술적 과제를 달성하기 위하여 본 발명은 디에틸렌 글리콜 모노부틸 에테르 1 내지 20중량%, 2-아미노에탄올 1 내지 20중량%을 포함하며, 나머지 함량은 물인 것을 특징으로 디스플레이 장치의 제조공정 중 기판 상의 잔류물을 제거하기 위한 세정용 조성물을 제공한다.In order to achieve the above technical problem, the present invention comprises 1 to 20% by weight of diethylene glycol monobutyl ether, 1 to 20% by weight of 2-aminoethanol, and the remaining content is water on the substrate during the manufacturing process of the display device. A cleaning composition is provided for removing residue.

디스플레이 장치의 제조공정 중에 발생하는 포토레지스트의 잔류물을 제거하는 방법으로는 디스플레이 장치의 제조공정 중에 잔류물이 발생하지 않도록 하는 방법과 이미 발생한 잔류물을 세정하는 방법이 있을 수 있다. 본 발명자는 이미 발생한 잔류물을 세정용 조성물을 이용하여 세정하는 방법에 의해 발명을 완성하게 된 것이다.As a method of removing the residue of the photoresist generated during the manufacturing process of the display device, there may be a method of preventing the residue from occurring during the manufacturing process of the display device, and a method of cleaning the residue already generated. The present inventors have completed the invention by a method of cleaning a residue that has already occurred using the cleaning composition.

이하, 액정 디스플레이를 예로 들어 본 발명을 상세히 설명하고자 한다.Hereinafter, the present invention will be described in detail with reference to a liquid crystal display.

액정 디스플레이는 유리 기판 상에 적색, 녹색 및 청색의 3원색을 격자상으로 배열한 칼라 필터를 구비한다. 이러한 칼라 필터의 제조공정 중에 개끗하게 현상되지 않은 포토레지스트가 유리 기판 상에 잔류하게 된다. The liquid crystal display has a color filter in which three primary colors of red, green, and blue are arranged in a lattice form on a glass substrate. During the manufacturing process of such a color filter, a photoresist that is not developed clearly remains on the glass substrate.

스프레이식 유리 기판 세정장치를 이용하여 잔류물이 남아있는 유리 기판을 상술한 바와 같은 조성을 가진 본 발명의 조성물로 스프레이하여 잔류물을 제거할 수 있다.The sprayed glass substrate cleaning device can be used to remove the residue by spraying the glass substrate having the residue with a composition of the present invention having the composition as described above.

이 때에 세정액의 온도는 약 30 내지 40℃가 바람직하다. 30℃ 미만 경우에는 세정이 제대로 이루어지지 않고 40℃를 초과하는 경우에는 칼라 필터 층이 손상될 우려가 있다. 또한 세정액의 유속은 약 20 내지 50ℓ/min이 바람직하고, 세정 시간은 20 내지 60초 정도가 바람직하다.At this time, the temperature of the cleaning liquid is preferably about 30 to 40 ° C. If the temperature is less than 30 ° C., the cleaning is not performed properly. If the temperature is more than 40 ° C., the color filter layer may be damaged. In addition, the flow rate of the cleaning liquid is preferably about 20 to 50 L / min, and the cleaning time is preferably about 20 to 60 seconds.

상기와 같은 방법으로 세정을 완료한 후에 물로 30 내지 120초 동안 린스하는 단계를 더 거칠 수 도 있다.After completing the cleaning in the same manner as described above may be further subjected to the step of rinsing with water for 30 to 120 seconds.

본 발명의 조성물 및 린스액으로 물만을 사용하는 이유는 물 이외의 것을 사용할 경우에는 후 공정인 폴리이미드 배향막의 러빙이 안되기 때문이다.The reason why only water is used as the composition and the rinse liquid of the present invention is that rubbing of the polyimide alignment layer, which is a post-process, is not possible when using other than water.

이하, 실시예를 통하여 본 발명을 상세히 설명하고자 하나, 하기의 실시예는 본 발명을 설명하기 위한 예시에 불과하다는 것은 명백하다.Hereinafter, the present invention will be described in detail with reference to Examples, but it is apparent that the following Examples are only examples for describing the present invention.

<잔류물 측정 방법><Measurement of residues>

1. 러빙(rubbing) 시험 1.rubbing test                     

칼라 필터가 형성된 유리 기판을 상술한 바와 같은 본 발명의 조성물로 세정한 후 클로로포름 또는 에탄올에 적신 토랄리(torraly) 천으로 문지른 후에 토랄리천에 잔류물 속에 포함되어 있는 안료에 의한 색깔이 묻어나오는지를 700 내지 1000lux 하에서 육안으로 관찰하였다.After cleaning the glass substrate on which the color filter is formed with the composition of the present invention as described above, after rubbing with a toraly cloth soaked in chloroform or ethanol, the color of the pigments contained in the residue on the tolyli cloth appears. Was visually observed under 700 to 1000 lux.

2. 주사현미경 사진2. Scanning micrograph

칼라 필터가 형성된 유리 기판을 상술한 바와 같은 본 발명의 조성물로 세정한 후 배율 300,000으로 하여 주사현미경 사진을 촬영하여 잔류물의 잔존 여부를 측정하였다. After the glass substrate on which the color filter was formed was washed with the composition of the present invention as described above, a scanning microscope photograph was taken at a magnification of 300,000 to determine whether the residue remained.

<실시예 1><Example 1>

디에틸렌 글리콜 모노부틸 에테르 6중량%, 2-아미노에탄올 2중량% 및 물 92중량%를 혼합하고 철저히 교반하여 수용액을 제조하였다.6 weight% diethylene glycol monobutyl ether, 2 weight% 2-aminoethanol, and 92 weight% water were mixed and thoroughly stirred to prepare an aqueous solution.

안료 분산법에 의해 제조된 칼라 필터가 형성된 유리기판을 스프레이식 유리 기판 세정장치를 이용하여 상기의 수용액으로 세정한 후에 상술한 러빙 시험 및 주사 현미경 사진을 통해 잔류물의 존재여부를 그 결과를 표 1에 나타냈다.After the glass substrate on which the color filter manufactured by the pigment dispersion method was formed was washed with the aqueous solution using a spray-type glass substrate cleaning apparatus, the result of the presence of the residue was examined by the above-described rubbing test and scanning micrograph. Indicated.

이 때에 세정액 온도는 36℃, 유속은 44ℓ/min, 세정 시간은 48초였다. 세정 후에 촬영한 주사 현미경 사진을 도 3으로 하였다. At this time, the washing | cleaning liquid temperature was 36 degreeC, the flow rate was 44 L / min, and the washing time was 48 second. The scanning microscope photograph taken after washing | cleaning was set to FIG.

<실시예 2> <Example 2>

세정용 조성물을 디에틸렌 글리콜 모노부틸 에테르 16중량%, 2-아미노에탄올 4중량% 및 물 80중량%로 하여 제조한 것을 제외하고는 실시예 1과 동일한 방법을 이용하였다. 그 결과 역시 표 1에 나타냈다. The same method as in Example 1 was used except that the cleaning composition was prepared by using 16% by weight of diethylene glycol monobutyl ether, 4% by weight of 2-aminoethanol, and 80% by weight of water. The results are also shown in Table 1.                     

<비교예 1> Comparative Example 1

세정용 조성물을 디에틸렌 글리콜 모노부틸 에테르 20중량% 및 물 80중량%로 하여 제조한 것을 제외하고는 실시예 1과 동일한 방법을 이용하였다. 그 결과 역시 표 1에 나타냈다. 세정 후의 주사 현미경 사진을 도 4로 하였다.The same method as in Example 1 was used except that the cleaning composition was prepared by using 20% by weight of diethylene glycol monobutyl ether and 80% by weight of water. The results are also shown in Table 1. The scanning microscope picture after washing | cleaning was set to FIG.

<비교예 2>Comparative Example 2

세정용 조성물을 2-아미노에탄올 20중량% 및 물 80중량%로 하여 제조한 것을 제외하고는 실시예 1과 동일한 방법을 이용하였다. 그 결과 역시 표 1에 나타냈다. The same method as in Example 1 was used except that the cleaning composition was prepared by using 20% by weight of 2-aminoethanol and 80% by weight of water. The results are also shown in Table 1.

러빙 시험 결과Rubbing test result 주사 현미경 사진Scanning micrograph 실시예 1Example 1 관찰 않됨Not observed 잔류물 없음No residue 실시예 2Example 2 관찰 않됨Not observed 잔류물 없음No residue 비교예 1Comparative Example 1 관찰됨Observed 8개8 비교예 2Comparative Example 2 관찰됨Observed 15개15

상기 표 1를 살펴보면 실시예 1과 2의 경우에는 러빙 시험 및 주사 현미경 사진 모두에서 잔류물을 확인할 수 없었다. 그러나 비교예 1과 2의 경우에는 세정 후에도 잔류물이 완전히 제거되지 않고 각각 주사 현미경의 사진을 통해 8, 15개가 확인되었다. Looking at Table 1, in the case of Examples 1 and 2 it was not able to confirm the residue in both rubbing test and scanning micrographs. However, in the case of Comparative Examples 1 and 2, the residues were not completely removed even after washing, and 8 and 15 were confirmed through scanning microscope pictures, respectively.

상술한 바와 같이 본 발명에 따른 세정액을 이용하여 기판을 세정하는 경우에는 디스플레이 장치의 제조공정 중에 발생하는 잔류물을 제거할 수 있어서, 잔류물로 인하여 발생할 수 있는 문제점, 예를 들어 액정 물질이 오염되는 문제점 및 칼라 필터 층과 보호층과의 밀착력이 떨어지는 등의 문제점을 제거할 수 있다.As described above, when the substrate is cleaned using the cleaning liquid according to the present invention, residues generated during the manufacturing process of the display apparatus may be removed, and thus problems caused by the residues, for example, contamination of the liquid crystal material. It is possible to eliminate the problems such as the problem and the adhesion between the color filter layer and the protective layer is poor.

본 발명은 상술한 실시예에 의해 한정되지 않고, 본 발명의 기술적 범위 내 에서 본 발명이 속하는 기술 분야의 통상의 지식을 가진 자에 의한 다양한 형태로 변형 가능함은 물론이다. 따라서 본 발명의 기술적 범위는 첨부한 특허청구범위에 의해 정해져야 할 것이다.The present invention is not limited to the above-described embodiments, and may be modified in various forms by those skilled in the art within the technical scope of the present invention. Therefore, the technical scope of the present invention will be defined by the appended claims.

Claims (2)

디에틸렌 글리콜 모노부틸 에테르 1 내지 20중량%, 2-아미노에탄올 1 내지 20중량%을 포함하며, 나머지 함량은 물인 것을 특징으로 하는 디스플레이 장치 기판 상의 잔류물을 제거하기 위한 세정용 조성물로서, 세정시 온도가 30 내지 40℃인 것을 특징으로 하는 세정용 조성물.1 to 20% by weight of diethylene glycol monobutyl ether, 1 to 20% by weight of 2-aminoethanol, and the remaining content is water. The cleaning composition, characterized in that the temperature is 30 to 40 ℃. 제1항에 있어서, 상기 디스플레이 장치가 액정 디스플레이 인 것을 특징으로 하는 세정용 조성물.The cleaning composition according to claim 1, wherein the display device is a liquid crystal display.
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KR100956196B1 (en) 2008-06-26 2010-05-04 삼성엘이디 주식회사 composition for epoxy resin cleaning and cleaning method of needle for dispensing using the same

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JPH08123043A (en) * 1994-10-27 1996-05-17 Sumitomo Chem Co Ltd Removing solution for photoresist
JPH0934129A (en) * 1995-07-24 1997-02-07 Sumitomo Chem Co Ltd Removing solution for photoresist
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JP2000199971A (en) * 1999-01-07 2000-07-18 Tokyo Ohka Kogyo Co Ltd Removing solution composition for photoresist and method for removing photoresist using the same

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100956196B1 (en) 2008-06-26 2010-05-04 삼성엘이디 주식회사 composition for epoxy resin cleaning and cleaning method of needle for dispensing using the same

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