KR100703650B1 - 박막증착장치 - Google Patents
박막증착장치 Download PDFInfo
- Publication number
- KR100703650B1 KR100703650B1 KR1020050115348A KR20050115348A KR100703650B1 KR 100703650 B1 KR100703650 B1 KR 100703650B1 KR 1020050115348 A KR1020050115348 A KR 1020050115348A KR 20050115348 A KR20050115348 A KR 20050115348A KR 100703650 B1 KR100703650 B1 KR 100703650B1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- chamber
- thin film
- slit valve
- purge gas
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Abstract
Description
Claims (2)
- 웨이퍼가 유입 및 유출되는 유출입구를 가지는 챔버;상기 챔버의 유출입구를 개폐하도록 그 챔버에 결합되는 슬릿밸브;상기 챔버의 내부공간에 설치되며 상기 웨이퍼가 배치되는 웨이퍼블록; 및상기 웨이퍼블록에 배치된 웨이퍼에 박막이 형성되도록 그 웨이퍼를 향해 소스가스를 분사하는 샤워헤드;를 구비하며,상기 슬릿밸브에는, 상기 챔버의 내부공간 및 유출입구에 퇴적되어 있는 공정부산물을 배출시키기 위하여 퍼지가스가 공급되는 유로가 형성되어 있는 것을 특징으로 하는 박막증착장치.
- 제 1항에 있어서,상기 유로는 상기 퍼지가스가 공급되는 주유로와, 상기 주유로와 연결되며 상기 웨이퍼가 공급되는 방향과 직교하는 방향으로 상기 퍼지가스가 유출 가능하도록 형성된 다수의 부유로를 구비하는 것을 특징으로 하는 박막증착장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050115348A KR100703650B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050115348A KR100703650B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100703650B1 true KR100703650B1 (ko) | 2007-04-06 |
Family
ID=38160860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050115348A KR100703650B1 (ko) | 2005-11-30 | 2005-11-30 | 박막증착장치 |
Country Status (1)
Country | Link |
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KR (1) | KR100703650B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009137395A2 (en) * | 2008-05-05 | 2009-11-12 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
KR101875305B1 (ko) * | 2017-01-09 | 2018-07-05 | 에스케이실트론 주식회사 | 챔버 사이에 마련되는 슬릿 퍼지 장치 및 이를 포함하는 고온 상압 기상성장장치 |
WO2019027863A1 (en) * | 2017-07-31 | 2019-02-07 | Applied Materials, Inc. | GAS SUPPLY ELEMENT WITH DEFLECTOR |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010032726A (ko) * | 1997-12-02 | 2001-04-25 | 조셉 제이. 스위니 | 현장 예비세정 단계를 포함하는 웨이퍼상의 티타늄화학기상증착 |
-
2005
- 2005-11-30 KR KR1020050115348A patent/KR100703650B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20010032726A (ko) * | 1997-12-02 | 2001-04-25 | 조셉 제이. 스위니 | 현장 예비세정 단계를 포함하는 웨이퍼상의 티타늄화학기상증착 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009137395A2 (en) * | 2008-05-05 | 2009-11-12 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
WO2009137395A3 (en) * | 2008-05-05 | 2010-02-18 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
KR20110015591A (ko) * | 2008-05-05 | 2011-02-16 | 어플라이드 머티어리얼스, 인코포레이티드 | 증가된 유동 균일성을 갖는 슬릿 밸브 |
US8377213B2 (en) | 2008-05-05 | 2013-02-19 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
KR101599926B1 (ko) | 2008-05-05 | 2016-03-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 증가된 유동 균일성을 갖는 슬릿 밸브 |
US9423042B2 (en) | 2008-05-05 | 2016-08-23 | Applied Materials, Inc. | Slit valve having increased flow uniformity |
KR101875305B1 (ko) * | 2017-01-09 | 2018-07-05 | 에스케이실트론 주식회사 | 챔버 사이에 마련되는 슬릿 퍼지 장치 및 이를 포함하는 고온 상압 기상성장장치 |
WO2019027863A1 (en) * | 2017-07-31 | 2019-02-07 | Applied Materials, Inc. | GAS SUPPLY ELEMENT WITH DEFLECTOR |
US11124878B2 (en) | 2017-07-31 | 2021-09-21 | Applied Materials, Inc. | Gas supply member with baffle |
US11885021B2 (en) | 2017-07-31 | 2024-01-30 | Applied Materials, Inc. | Gas supply member with baffle |
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