KR100684739B1 - 유기물 증착장치 - Google Patents
유기물 증착장치 Download PDFInfo
- Publication number
- KR100684739B1 KR100684739B1 KR1020050111657A KR20050111657A KR100684739B1 KR 100684739 B1 KR100684739 B1 KR 100684739B1 KR 1020050111657 A KR1020050111657 A KR 1020050111657A KR 20050111657 A KR20050111657 A KR 20050111657A KR 100684739 B1 KR100684739 B1 KR 100684739B1
- Authority
- KR
- South Korea
- Prior art keywords
- film thickness
- deposition
- chopper
- deposition material
- substrate
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Electroluminescent Light Sources (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
- 삭제
- 삭제
- 삭제
- 증착 챔버;상기 증착 챔버의 내측 상부에 배치되는 기판 장착부;상기 증착 챔버의 내측 하부에 배치되며, 내부에는 증착 물질이 채워지는 도 가니;상기 도가니에서 증발되어 상기 기판 장착부의 기판에 증착되는 증착 물질의 막 두께를 감지하는 막 두께 감지 센서; 및복수의 홀이 동심원상에 형성된 플레이트와, 상기 홀에 부착되는 설정 개구율의 메쉬들을 포함하며, 상기 막 두께 감지 센서의 인접 하부에 설치되는 쵸퍼를 포함하는 유기물 증착장치.
- 제 4항에 있어서,상기 메쉬는 30% 이하의 개구율을 갖도록 형성되는 유기물 증착장치.
- 제 4항에 있어서,상기 홀들에는 서로 다른 개구율의 메쉬들이 각각 부착되는 유기물 증착장치.
- 제 4항에 있어서,상기 홀들에는 서로 동일한 개구율의 메쉬들이 각각 부착되는 유기물 증착장치.
- 제 4항 내지 제 7항 중 어느 한 항에 있어서,상기 쵸퍼는 증착 물질을 기판에 증착시키는 동안 비회전 상태로 유지되는 유기물 증착장치.
- 제 8항에 있어서,상기 쵸퍼는 상기 막 두께 감지 센서를 증착 물질에 노출시키는 메쉬의 선택이 가능하도록 회전 가능하게 설치되는 유기물 증착장치.
- 제 9항에 있어서,상기 쵸퍼의 인접 하부에는 상기 선택된 메쉬만 증착 물질에 노출시키는 가리개가 설치되는 유기물 증착장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050111657A KR100684739B1 (ko) | 2005-11-22 | 2005-11-22 | 유기물 증착장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020050111657A KR100684739B1 (ko) | 2005-11-22 | 2005-11-22 | 유기물 증착장치 |
Publications (1)
Publication Number | Publication Date |
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KR100684739B1 true KR100684739B1 (ko) | 2007-02-20 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050111657A KR100684739B1 (ko) | 2005-11-22 | 2005-11-22 | 유기물 증착장치 |
Country Status (1)
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KR (1) | KR100684739B1 (ko) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8366831B2 (en) | 2008-12-10 | 2013-02-05 | Samsung Display Co., Ltd. | Evaporation source |
KR20160084755A (ko) * | 2015-01-06 | 2016-07-14 | 주식회사 원익아이피에스 | 증착시스템 |
KR102262617B1 (ko) * | 2020-03-31 | 2021-06-09 | (주)알파플러스 | 증착 제어 장치 및 이를 이용하는 디스플레이 제조 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739171A (en) | 1980-08-20 | 1982-03-04 | Toshiba Corp | Film thickness monitoring apparatus in vapor deposition apparatus |
JPS61148927A (ja) * | 1984-12-24 | 1986-07-07 | Shingo Kato | 携帯電話方式 |
JPS634067A (ja) | 1986-06-24 | 1988-01-09 | Mitsubishi Electric Corp | 蒸着用治具 |
JPH07283281A (ja) * | 1994-04-05 | 1995-10-27 | Toshiba Corp | ターゲットの寿命判断方法及びスパッタ装置 |
-
2005
- 2005-11-22 KR KR1020050111657A patent/KR100684739B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5739171A (en) | 1980-08-20 | 1982-03-04 | Toshiba Corp | Film thickness monitoring apparatus in vapor deposition apparatus |
JPS61148927A (ja) * | 1984-12-24 | 1986-07-07 | Shingo Kato | 携帯電話方式 |
JPS634067A (ja) | 1986-06-24 | 1988-01-09 | Mitsubishi Electric Corp | 蒸着用治具 |
JPH07283281A (ja) * | 1994-04-05 | 1995-10-27 | Toshiba Corp | ターゲットの寿命判断方法及びスパッタ装置 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8366831B2 (en) | 2008-12-10 | 2013-02-05 | Samsung Display Co., Ltd. | Evaporation source |
KR20160084755A (ko) * | 2015-01-06 | 2016-07-14 | 주식회사 원익아이피에스 | 증착시스템 |
KR102092251B1 (ko) * | 2015-01-06 | 2020-03-23 | 주식회사 원익아이피에스 | 증착시스템 |
KR102262617B1 (ko) * | 2020-03-31 | 2021-06-09 | (주)알파플러스 | 증착 제어 장치 및 이를 이용하는 디스플레이 제조 방법 |
WO2021201436A1 (ko) * | 2020-03-31 | 2021-10-07 | (주)알파플러스 | 증착 제어 장치 및 이를 이용하는 디스플레이 제조 방법 |
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