KR100649200B1 - 박막 증착장치 - Google Patents
박막 증착장치 Download PDFInfo
- Publication number
- KR100649200B1 KR100649200B1 KR1020050111659A KR20050111659A KR100649200B1 KR 100649200 B1 KR100649200 B1 KR 100649200B1 KR 1020050111659 A KR1020050111659 A KR 1020050111659A KR 20050111659 A KR20050111659 A KR 20050111659A KR 100649200 B1 KR100649200 B1 KR 100649200B1
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- South Korea
- Prior art keywords
- thin film
- deposition
- sensor
- film thickness
- crystal
- Prior art date
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (8)
- 증착 챔버;상기 증착 챔버의 내측 상부에 배치되는 기판 장착부;상기 증착 챔버의 내측 하부에 배치되며, 내부에는 증착 물질이 채워지는 도가니;복수의 크리스탈 센서를 구비하며, 상기 도가니에서 증발되어 상기 기판 장착부의 기판에 증착되는 증착 물질의 막 두께를 감지하는 막 두께 감지 센서;수명이 다한 크리스탈 센서를 교환하기 위한 센서 교환 신호를 출력하며, 박막 증착률을 설정 값으로 유지하도록 상기 크리스탈 센서로부터의 전기적 신호를 입력받아 증착 온도를 제어하는 제어부를 포함하며, 상기 크리스탈 센서는 설정 두께로 프리코팅되는 박막 증착장치.
- 제 1항에 있어서,상기 크리스탈 센서의 프리코팅 두께는 이상 현상 발생 구간에 해당하는 박막 두께 이상으로 이루어지는 박막 증착장치.
- 제 2항에 있어서,상기 크리스탈 센서의 프리코팅 두께는 600 내지 5,000Å으로 이루어지는 박 막 증착장치.
- 제 1항 내지 제 3항중 어느 한 항에 있어서,상기 증착 물질은 산화성이 강한 금속 물질로 이루어지는 박막 증착장치.
- 제 4항에 있어서,상기 증착 물질이 마그네슘인 것을 특징으로 하는 박막 증착장치.
- 제 5항에 있어서,상기 제어부는 박막 증착률을 1.0Å/sec로 유지하는 박막 증착장치.
- 제 6항에 있어서,상기 제어부는 증착 온도를 450℃로 유지하는 박막 증착장치.
- 제 7항에 있어서,상기 막 두께 감지 센서의 인접 하부에는 복수의 홀이 형성된 플레이트 형상의 쵸퍼가 설치되며, 박막 증착동안 상기 쵸퍼가 회전 작동되는 박막 증착장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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KR1020050111659A KR100649200B1 (ko) | 2005-11-22 | 2005-11-22 | 박막 증착장치 |
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KR1020050111659A KR100649200B1 (ko) | 2005-11-22 | 2005-11-22 | 박막 증착장치 |
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KR100649200B1 true KR100649200B1 (ko) | 2006-11-24 |
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KR1020050111659A KR100649200B1 (ko) | 2005-11-22 | 2005-11-22 | 박막 증착장치 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101140616B1 (ko) | 2011-01-28 | 2012-05-03 | (주) 에스엔에프 | 증착 챔버의 증착 물질 감지 장치 |
KR101449447B1 (ko) | 2013-03-18 | 2014-10-14 | 주식회사 선익시스템 | 증착챔버의 센서 이동장치 |
KR102121292B1 (ko) * | 2018-12-17 | 2020-06-10 | 주식회사 에스에프에이 | 증착 모니터링 장치 및 이를 구비하는 박막 증착 시스템 |
-
2005
- 2005-11-22 KR KR1020050111659A patent/KR100649200B1/ko active IP Right Grant
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101140616B1 (ko) | 2011-01-28 | 2012-05-03 | (주) 에스엔에프 | 증착 챔버의 증착 물질 감지 장치 |
KR101449447B1 (ko) | 2013-03-18 | 2014-10-14 | 주식회사 선익시스템 | 증착챔버의 센서 이동장치 |
KR102121292B1 (ko) * | 2018-12-17 | 2020-06-10 | 주식회사 에스에프에이 | 증착 모니터링 장치 및 이를 구비하는 박막 증착 시스템 |
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