KR100674033B1 - 증착 장치 - Google Patents
증착 장치 Download PDFInfo
- Publication number
- KR100674033B1 KR100674033B1 KR1020040006082A KR20040006082A KR100674033B1 KR 100674033 B1 KR100674033 B1 KR 100674033B1 KR 1020040006082 A KR1020040006082 A KR 1020040006082A KR 20040006082 A KR20040006082 A KR 20040006082A KR 100674033 B1 KR100674033 B1 KR 100674033B1
- Authority
- KR
- South Korea
- Prior art keywords
- plate
- organic
- deposition
- evaporation source
- organic material
- Prior art date
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/52—Means for observation of the coating process
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims (4)
- 유기물을 가열하여 유기물 증기를 발생시켜 외부로 분사하는 증발원을 포함하여 증발원에서 생성된 유기물 증기를 기판 표면에 분사, 증착시키는 증착장치에 있어서,증발원의 상부에 플레이트가 설치되어 있되, 상기 플레이트는 상기 증발원과 수평을 이루도록 설치되며, 상기 플레이트는 방착판에 고정되어 있는 것을 특징으로 하는 증착 장치.
- 제 1 항에 있어서, 상기 플레이트는 지지 부재를 통하여 방착판에 지지되어 있고, 상기 플레이트와 상기 지지 부재는 탈부착이 가능한 것을 특징으로 하는 증착장치.
- 제2항에 있어서, 상기 플레이트의 재질은 유리이며, 상기 지지 부재의 재질은 방착판의 재질과 동일한 것임을 특징으로 하는 증착장치.
- 제1항 또는 제2항 중 어느 한 항에 있어서, 상기 플레이트는 하나의 증발원과 대응되도록 설치된 것을 특징으로 하는 증착장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040006082A KR100674033B1 (ko) | 2004-01-30 | 2004-01-30 | 증착 장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020040006082A KR100674033B1 (ko) | 2004-01-30 | 2004-01-30 | 증착 장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20050077997A KR20050077997A (ko) | 2005-08-04 |
KR100674033B1 true KR100674033B1 (ko) | 2007-01-26 |
Family
ID=37265277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020040006082A KR100674033B1 (ko) | 2004-01-30 | 2004-01-30 | 증착 장치 |
Country Status (1)
Country | Link |
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KR (1) | KR100674033B1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101175918B1 (ko) * | 2010-12-29 | 2012-08-22 | 삼성전기주식회사 | 박형 기판용 지지체 탈부착 설비 및 그에 의한 탈착 방법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100779942B1 (ko) * | 2005-06-01 | 2007-11-28 | 주식회사 대우일렉트로닉스 | 두께측정센서를 구비한 유기 박막 증착 장치 및 이의 증착방법 |
KR102160155B1 (ko) | 2013-03-14 | 2020-09-28 | 삼성디스플레이 주식회사 | 진공증착기 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008049349A (ja) * | 2006-08-22 | 2008-03-06 | Taiyo Nippon Sanso Corp | ガス切断方法 |
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2004
- 2004-01-30 KR KR1020040006082A patent/KR100674033B1/ko active IP Right Grant
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008049349A (ja) * | 2006-08-22 | 2008-03-06 | Taiyo Nippon Sanso Corp | ガス切断方法 |
Non-Patent Citations (3)
Title |
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한국공개특허 제2002-89288호 |
한국공개특허 제2002-92295호 |
한국공개특허 제2004-9349호 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101175918B1 (ko) * | 2010-12-29 | 2012-08-22 | 삼성전기주식회사 | 박형 기판용 지지체 탈부착 설비 및 그에 의한 탈착 방법 |
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KR20050077997A (ko) | 2005-08-04 |
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