KR100661696B1 - 이종 구조의 반도체 나노 와이어 및 그의 제조방법 - Google Patents
이종 구조의 반도체 나노 와이어 및 그의 제조방법 Download PDFInfo
- Publication number
- KR100661696B1 KR100661696B1 KR1020050114068A KR20050114068A KR100661696B1 KR 100661696 B1 KR100661696 B1 KR 100661696B1 KR 1020050114068 A KR1020050114068 A KR 1020050114068A KR 20050114068 A KR20050114068 A KR 20050114068A KR 100661696 B1 KR100661696 B1 KR 100661696B1
- Authority
- KR
- South Korea
- Prior art keywords
- zinc
- cadmium
- seed
- mercury
- nanowires
- Prior art date
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/46—Sulfur-, selenium- or tellurium-containing compounds
- C30B29/48—AIIBVI compounds wherein A is Zn, Cd or Hg, and B is S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/605—Products containing multiple oriented crystallites, e.g. columnar crystallites
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/701—Integrated with dissimilar structures on a common substrate
- Y10S977/715—On an organic substrate
- Y10S977/718—Carbohydrate substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/762—Nanowire or quantum wire, i.e. axially elongated structure having two dimensions of 100 nm or less
- Y10S977/766—Bent wire, i.e. having nonliner longitudinal axis
- Y10S977/768—Helical wire
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/773—Nanoparticle, i.e. structure having three dimensions of 100 nm or less
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/778—Nanostructure within specified host or matrix material, e.g. nanocomposite films
- Y10S977/784—Electrically conducting, semi-conducting, or semi-insulating host material
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/788—Of specified organic or carbon-based composition
- Y10S977/789—Of specified organic or carbon-based composition in array format
- Y10S977/79—Of specified organic or carbon-based composition in array format with heterogeneous nanostructures
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S977/00—Nanotechnology
- Y10S977/70—Nanostructure
- Y10S977/827—Nanostructure formed from hybrid organic/inorganic semiconductor compositions
Abstract
Description
Claims (13)
- 반도체 나노결정 씨드(seed)의 표면으로부터 선택적인 방향에 물질 조성이 다른 반도체 나노결정이 와이어 형태로 형성된 것을 특징으로 하는 이종 구조(heterostructure)의 반도체 나노 와이어.
- 제 1항에 있어서, 상기 반도체 나노 결정 씨드 또는 나노 와이어를 구성하는 물질이 II-VI족, III-V족, IV-VI족의 반도체 화합물 또는 이들의 혼합물로 이루어진 군에서 선택되는 것을 특징으로 하는 나노 와이어.
- 제 1항에 있어서, 상기 반도체 나노결정 씨드의 형태가 구형, 쌀형(rice shape), 큐브(cube)형, 정사면체, 및 정팔면체로 이루어지는 군에서 선택되는 것을 특징으로 하는 나노 와이어.
- 제 1항에 있어서, 상기 반도체 나노결정 씨드의 크기가 1nm 내지 50nm인 것을 특징으로 하는 나노 와이어.
- (a) 나노 결정 씨드(seed)를 제조하는 단계; (b) 전단계에서 수득한 나노결정 씨드를 나노 와이어의 금속 전구체 용액에 주입하는 단계; (c) 상기 혼합 용액에 나노 와이어의 비금속 전구체 용액을 주입하여 반응시킴으로써 나노 와이어를 형성하는 단계를 포함하는 반도체 나노 결정에 의해 개시된 나노 와이어의 제조방법.
- 제 5항에 있어서, (a) 단계의 나노 결정 씨드가 II-VI족, III-V족, IV-VI족의 반도체 화합물 또는 이들의 혼합물로 이루어진 군에서 선택되는 것을 특징으로 하는 방법.
- 제 5항에 있어서, (a) 단계의 나노 결정 씨드의 형태가 구형, 쌀형(rice shape), 큐브(cube)형, 정사면체, 및 정팔면체로 이루어지는 군에서 선택되는 것을 특징으로 하는 방법.
- 제 5항에 있어서, (a) 단계의 나노 결정 씨드의 크기가 1nm 내지 50nm인 것을 특징으로 하는 방법.
- 제 5항에 있어서, (b) 단계의 나노 와이어의 금속 전구체가 디메틸아연(dimethyl zinc), 디에틸아연(diethyl zinc), 아연아세테이트(zinc acetate), 아연아세틸아세토네이트(zinc acetylacetonate), 아연아이오다이드(zinc iodide), 아연브로마이드(zinc bromide), 아연클로라이드(zinc chloride), 아연플루오라이드(zinc fluoride), 아연카보네이트(zinc carbonate), 아연시아나이드(zinc cyanide), 아연나이트레이트(zinc nitrate), 아연옥사이드(zinc oxide), 아연퍼옥사이드(zinc peroxide), 아연퍼클로레이트(zinc perchlorate), 아연설페이트(zinc sulfate), 디메틸카드뮴(dimethyl cadmium), 디에틸카드뮴(diethyl cadmium), 카드뮴아세테이트(cadmium acetate), 카드뮴아세틸아세토네이트(cadmium acetylacetonate), 카드뮴아이오다이드(cadmium iodide), 카드뮴브로마이드(cadmium bromide), 카드뮴클로라이드(cadmium chloride), 카드뮴플루오라이드(cadmium fluoride), 카드뮴카보네이트(cadmium carbonate), 카드뮴나이트레이트(cadmium nitrate), 카드뮴옥사이드(cadmium oxide), 카드뮴퍼클로레이트(cadmium perchlorate), 카드뮴포스파이드(cadmium phosphide), 카드뮴설페이트(cadmium sulfate), 수은아세테이트(mercury acetate), 수은아이오다이드(mercury iodide), 수은브로마이드(mercury bromide), 수은클로라이드(mercury chloride), 수은플루오라이드(mercury fluoride), 수은시아나이드(mercury cyanide), 수은나이트레이트(mercury nitrate), 수은옥사이드(mercury oxide), 수은퍼클로레이트(mercury perchlorate), 수은설페이트(mercury sulfate), 납아세테이트(lead acetate), 납브 로마이드(Lead bromide), 납클로라이드(Lead chloride), 납플루오라이드(Lead fluoride), 납옥사이드 (Lead oxide), 납퍼클로레이트(Lead perchlorate), 납나이트레이트(Lead nitrate), 납설페이트(Lead sulfate), 납카보네이트(Lead carbonate), 주석아세테이트(Tin acetate), 주석비스아세틸아세토네이트(Tin bisacetylacetonate), 주석브로마이드 (Tin bromide), 주석클로라이드(Tin chloride), 주석플루오라이드(Tin fluoride), 주석옥사이드(Tin oxide), 주석설페이트(Tin sulfate), 게르마늄테트라클로라이드 (Germanium tetrachloride), 게르마늄옥사이드(Germanium oxide), 게르마늄에톡사이드(Germanium ethoxide), 갈륨아세틸아세토네이트(Gallium acetylacetonate), 갈륨클로라이드(Gallium chloride), 갈륨플루오라이드(Gallium fluoride), 갈륨옥사이드(Gallium oxide), 갈륨나이트레이트(Gallium nitrate), 갈륨설페이트(Gallium sulfate), 인듐클로라이드(Indium chloride), 인듐옥사이드 (Indium oxide), 인듐나이트레이트(Indium nitrate), 인듐설페이트(Indium sulfate)로 이루어진 군에서 선택되는 것을 특징으로 하는 방법.
- 제 5항에 있어서, (c) 단계의 나노 와이어의 비금속 전구체가 헥산 싸이올, 옥탄 싸이올, 데칸 싸이올, 도데칸 싸이올, 헥사데칸 싸이올, 머캡토 프로필 실란 등과 같은 알킬 싸이올 화합물, 설퍼-트리옥틸포스핀(S-TOP), 설퍼-트리부틸포스핀(S-TBP), 설퍼-트리페닐포스핀(S-TPP), 설퍼-트리옥틸아민(S-TOA), 트리메틸실릴 설퍼(trimethylsilyl sulfur), 황화 암모늄, 황화 나트륨, 셀렌-트리옥틸포스핀(Se-TOP), 셀렌-트리부틸포스핀(Se-TBP), 셀렌-트리페닐포스핀(Se-TPP), 텔루르-트리옥틸포스핀(Te-TOP), 텔루르-트리부틸포스핀(Te-TBP), 텔루르-트리페닐포스핀(Te-TPP), 트리메틸실릴 포스핀(trimethylsilyl phosphine) 및 트리에틸포스핀, 트리부틸포스핀, 트리옥틸포스핀, 트리페닐포스핀, 트리시클로헥실포스핀을 포함하는 알킬 포스핀(alkyl phosphine), 알세닉 옥사이드(Arsenic oxide), 알세닉 클로라이드(Arsenic chloride), 알세닉 설페이트(Arsenic sulfate), 알세닉 브로마이드(Arsenic bromide), 알세닉 아이오다이드(Arsenic iodide), 나이트릭 옥사이드(Nitroud oxide), 나이트릭산(Nitric acid), 암모늄 나이트레이트(Ammonium nitrate)로 이루어진 군에서 선택되는 것을 특징으로 하는 방법.
- 제 5항에 있어서, (c) 단계의 나노 와이어가 나노결정 씨드의 결정면 위에 에피텍셜형으로 성장하는 것을 특징으로 하는 방법.
- 제 5항에 있어서, 씨드로 사용한 나노 결정이 나노 와이어의 일정 부분에 포함된 것을 특징으로 하는 방법.
- 제 5항에 있어서, 씨드로 사용한 나노 결정과 나노 와이어의 전구체의 농도 비가 0.01:1 ~ 1:0.01 정도의 범위인 것을 특징으로 하는 방법.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/358,510 US20060185578A1 (en) | 2005-02-22 | 2006-02-21 | Heterostructure semiconductor nanowires and method for producing the same |
US11/835,778 US7682449B2 (en) | 2005-02-22 | 2007-08-08 | Heterostructure semiconductor nanowires and method for producing the same |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR20050014461 | 2005-02-22 | ||
KR1020050014461 | 2005-02-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20060093642A KR20060093642A (ko) | 2006-08-25 |
KR100661696B1 true KR100661696B1 (ko) | 2006-12-26 |
Family
ID=37601712
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020050114068A KR100661696B1 (ko) | 2005-02-22 | 2005-11-28 | 이종 구조의 반도체 나노 와이어 및 그의 제조방법 |
Country Status (2)
Country | Link |
---|---|
US (2) | US20060185578A1 (ko) |
KR (1) | KR100661696B1 (ko) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100661696B1 (ko) * | 2005-02-22 | 2006-12-26 | 삼성전자주식회사 | 이종 구조의 반도체 나노 와이어 및 그의 제조방법 |
KR100851499B1 (ko) * | 2007-03-28 | 2008-08-08 | 금오공과대학교 산학협력단 | 산화아연 나노로드 및 나노월의 제조방법 |
KR101436000B1 (ko) | 2008-02-22 | 2014-08-29 | 삼성전자주식회사 | 나노 또는 마이크로 크기의 다이오드 및 이의 제조 방법 |
KR101549620B1 (ko) | 2009-01-30 | 2015-09-02 | 삼성전자주식회사 | pn 구조를 지닌 Zn 산화물 나노 와이어 및 그 제조 방법 |
US9443662B2 (en) | 2012-11-07 | 2016-09-13 | University Of South Florida | Microstructured crystalline device in confined space, a dye-sensitized solar cell, and method of preparation thereof |
KR102514116B1 (ko) * | 2015-09-24 | 2023-03-23 | 삼성전자주식회사 | 반도체 나노결정 입자 및 이를 포함하는 소자 |
CN113060706B (zh) * | 2021-03-23 | 2024-02-09 | 中国科学技术大学 | 一种尺寸可调的胶体ZnSe量子线的制备方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002017362A2 (en) * | 2000-08-22 | 2002-02-28 | President And Fellows Of Harvard College | Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices |
KR20030066968A (ko) * | 2002-02-06 | 2003-08-14 | 학교법인 포항공과대학교 | 이종접합구조의 산화아연계 나노선 및 그 제조방법 |
KR20040000418A (ko) * | 2001-03-30 | 2004-01-03 | 더 리전트 오브 더 유니버시티 오브 캘리포니아 | 나노구조체 및 나노와이어의 제조 방법 및 그로부터제조되는 디바이스 |
KR20050104034A (ko) * | 2004-04-27 | 2005-11-02 | 삼성에스디아이 주식회사 | 나노와이어 제조방법 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU2002360670A1 (en) * | 2001-12-19 | 2003-07-09 | Wilk Patent Development Corporation | Method and related composition employing nanostructures |
US20040026684A1 (en) * | 2002-04-02 | 2004-02-12 | Nanosys, Inc. | Nanowire heterostructures for encoding information |
US6872645B2 (en) * | 2002-04-02 | 2005-03-29 | Nanosys, Inc. | Methods of positioning and/or orienting nanostructures |
EP2399970A3 (en) * | 2002-09-05 | 2012-04-18 | Nanosys, Inc. | Nanocomposites |
US7265037B2 (en) * | 2003-06-20 | 2007-09-04 | The Regents Of The University Of California | Nanowire array and nanowire solar cells and methods for forming the same |
WO2005067524A2 (en) * | 2004-01-15 | 2005-07-28 | Nanosys, Inc. | Nanocrystal doped matrixes |
US7303628B2 (en) * | 2004-03-23 | 2007-12-04 | The Regents Of The University Of California | Nanocrystals with linear and branched topology |
US7557367B2 (en) * | 2004-06-04 | 2009-07-07 | The Board Of Trustees Of The University Of Illinois | Stretchable semiconductor elements and stretchable electrical circuits |
CN101107737B (zh) * | 2004-12-09 | 2012-03-21 | 奈米系统股份有限公司 | 用于燃料电池的基于纳米线的膜电极组件 |
KR100661696B1 (ko) * | 2005-02-22 | 2006-12-26 | 삼성전자주식회사 | 이종 구조의 반도체 나노 와이어 및 그의 제조방법 |
US7597950B1 (en) * | 2005-02-28 | 2009-10-06 | Massachusetts Institute Of Technology | Nanoparticles having sub-nanometer features |
WO2008048705A2 (en) * | 2006-03-10 | 2008-04-24 | Goodrich Corporation | Low density lightning strike protection for use in airplanes |
CA2708319A1 (en) * | 2007-07-27 | 2009-02-05 | The Board Of Trustees Of The Leland Stanford Junior University | Supramolecular functionalization of graphitic nanoparticles for drug delivery |
US8647922B2 (en) * | 2007-11-08 | 2014-02-11 | Nanyang Technological University | Method of forming an interconnect on a semiconductor substrate |
-
2005
- 2005-11-28 KR KR1020050114068A patent/KR100661696B1/ko active IP Right Grant
-
2006
- 2006-02-21 US US11/358,510 patent/US20060185578A1/en not_active Abandoned
-
2007
- 2007-08-08 US US11/835,778 patent/US7682449B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002017362A2 (en) * | 2000-08-22 | 2002-02-28 | President And Fellows Of Harvard College | Doped elongated semiconductors, growing such semiconductors, devices including such semiconductors and fabricating such devices |
KR20040000418A (ko) * | 2001-03-30 | 2004-01-03 | 더 리전트 오브 더 유니버시티 오브 캘리포니아 | 나노구조체 및 나노와이어의 제조 방법 및 그로부터제조되는 디바이스 |
KR20030066968A (ko) * | 2002-02-06 | 2003-08-14 | 학교법인 포항공과대학교 | 이종접합구조의 산화아연계 나노선 및 그 제조방법 |
KR20050104034A (ko) * | 2004-04-27 | 2005-11-02 | 삼성에스디아이 주식회사 | 나노와이어 제조방법 |
Also Published As
Publication number | Publication date |
---|---|
KR20060093642A (ko) | 2006-08-25 |
US20060185578A1 (en) | 2006-08-24 |
US7682449B2 (en) | 2010-03-23 |
US20080168943A1 (en) | 2008-07-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Zhang et al. | ZnSe nanostructures: synthesis, properties and applications | |
US10276735B2 (en) | Semiconductor nanocrystals | |
Zhuang et al. | Controlled synthesis of semiconductor nanostructures in the liquid phase | |
Kershaw et al. | Narrow bandgap colloidal metal chalcogenide quantum dots: synthetic methods, heterostructures, assemblies, electronic and infrared optical properties | |
KR100621309B1 (ko) | 황 전구체로서 싸이올 화합물을 이용한 황화 금속나노결정의 제조방법 | |
KR102195665B1 (ko) | 나노결정의 측방향 성장에 의한 콜로이드 나노시트의 제조 방법 | |
KR100661696B1 (ko) | 이종 구조의 반도체 나노 와이어 및 그의 제조방법 | |
US9627200B2 (en) | Synthesis of CdSe/ZnS core/shell semiconductor nanowires | |
US11352556B2 (en) | Process for the synthesis of air stable metal sulphide quantum dots | |
KR20080107578A (ko) | 코어/쉘 나노결정 및 그 제조방법 | |
US7303628B2 (en) | Nanocrystals with linear and branched topology | |
Jia et al. | Catalyst-assisted solution–liquid–solid synthesis of CdS/CuInSe2 and CuInTe2/CuInSe2 nanorod heterostructures | |
Shim et al. | Anisotropic nanocrystal heterostructures: Synthesis and lattice strain | |
Li et al. | A review on the synthesis methods of CdSeS-based nanostructures | |
Liu et al. | Colloidal synthesis and characterization of CdSe/CdTe core/shell nanowire heterostructures | |
CA2485945C (en) | Method for producing inorganic semiconductor nanocrystalline rods and their use | |
US11866629B2 (en) | Scalable and safe nanocrystal precursor | |
Yang et al. | CdSe/Cd 1− x Zn x S core/shell quantum dots with tunable emission: Growth and morphology evolution | |
Panneerselvam et al. | Recent advances in quantum dot synthesis | |
KR101708996B1 (ko) | 이종접합된 이방성 나노구조체의 제조방법 및 이에 의한 나노구조체 | |
KR101401924B1 (ko) | 나노와이어/양자점 이종구조 및 이의 제조방법 | |
KR101197898B1 (ko) | 균일한 두께를 가지는 얇은 카드뮴 셀레나이드 나노 리본 및 그 제조방법 | |
Chen et al. | Synthesis, characterization and photoluminescence of CdS hyperbranched nanocrystals by a simple solution chemistry method | |
Hyuna et al. | aDepartment of Chemistry and Nanoscience, Ewha Womans University, Seoul, Republic of Korea, bDepartment of Physics, Indiana University, Bloomington, IN, United States | |
Malik et al. | The recent developments in nanoparticle synthesis |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20121115 Year of fee payment: 7 |
|
FPAY | Annual fee payment |
Payment date: 20131122 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20141119 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20151116 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20161118 Year of fee payment: 11 |
|
FPAY | Annual fee payment |
Payment date: 20171120 Year of fee payment: 12 |
|
FPAY | Annual fee payment |
Payment date: 20181119 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20191119 Year of fee payment: 14 |