KR100649895B1 - Lid of plasma chamber - Google Patents

Abstract

Since the heat insulation is good by the heat insulating member 130, it is possible to further increase the temperature in the chamber. In addition, since the outer wall of the bell jar 140 is not hot by the cooling water pipe 145 of the cover, the safety of the worker can be guaranteed. In addition, the noise generated by the plasma electrode 120 is prevented from leaking to the outside by the heat insulating member 130. The plasma electrode 120 is insulated from the annular support plate 100 by the ceramic ring 110.

Belza, Insulation, Noise, Plasma

Description

Lid of plasma chamber             

1 is a schematic diagram illustrating a lid of a plasma chamber according to an embodiment of the present invention.

<Description of Reference Numbers for Main Parts of Drawings>

100: annular support plate 105, 145: cooling water pipe

110: ceramic ring 120: plasma electrode

130: heat insulating member 140: Belza

150: heating wire

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a lid of a plasma chamber, and more particularly to a lid of a plasma chamber capable of minimizing heat loss to the outside and external leakage of noise generated at the plasma electrode.

In order to perform the CVD process, a process of heating up to a certain reaction temperature is required. The heating method may be classified into a warm wall type and a cold wall type according to the heating method.

The cold wall type heats only the substrate without heating the chamber wall. According to this method, since the substrate is heated from the bottom of the substrate through the substrate support, the surface temperature slightly varies depending on the pattern density formed on the substrate surface. Therefore, there is a disadvantage that the film is not uniformly formed because the deposition suns of the place where the pattern density is dense and the place of the place are different. In other words, the loading effect is not good.

On the other hand, the warm wall type does not directly heat the substrate but rather heats the chamber wall to raise the temperature of the entire chamber. This is less affected by the pattern formed on the substrate surface than in the case of the cold wall type because the substrate is heated at the upper portion of the substrate. In the case of the warm-wall type, since the reaction chamber occupies a considerable space, power loss is large, and the temperature rise is not easy. One of these reasons is that the heat insulation of the chamber cover, in which the heating means is usually mounted, is not performed properly.

Therefore, the technical problem to be achieved by the present invention is to properly heat the chamber cover to properly heat the chamber and to prevent noise generated from the plasma electrode from being discharged to the outside when the plasma electrode is mounted. To provide a lid of a plasma chamber.

Cover of the plasma chamber according to the present invention for achieving the above technical problem is a chamber cover for covering the chamber in the upper portion of the dome shape, a metal dome-type plasma electrode; A metal bell covering the plasma electrode and spaced apart from the plasma electrode by a predetermined interval, and installed in a coil shape in which a coolant pipe through which a coolant flows is wound horizontally; A domed heat insulating member installed in close contact with the inner surface of the bell and spaced apart from the plasma electrode by a predetermined distance; And heating means fixedly installed inside the heat insulating member to surround the plasma electrode without touching the plasma electrode. Characterized in that it comprises a.
The heating means may be a coiled hot wire wound horizontally to surround the plasma electrode.
The domed plasma electrode may be placed in an annular groove formed on the upper surface of the ceramic ring, wherein the ceramic ring is inserted into an annular groove formed on the upper surface of the annular support plate of metal material, and the annular support plate is a chamber in which the upper part is open. It is preferable to be placed on the side wall of the.

Hereinafter, with reference to the accompanying drawings, preferred embodiments of the present invention will be described in detail.

1 is a schematic diagram illustrating a lid of a plasma chamber according to an embodiment of the present invention. Referring to FIG. 1, the annular support plate 100 is placed on a side wall of a chamber (not shown) with an open upper portion. Inside the annular support plate 100, a coolant pipe 105 through which coolant flows is installed in an annular shape. The annular support plate 100 is made of metal, and the grooves are formed in an annular shape on the inner side of the upper surface, and a ceramic ring 110 is inserted into the groove.

An upper surface of the ceramic ring 110 is formed with an annular groove, and the metal dome-shaped plasma electrode 120 is placed on the groove. The ceramic ring 110 is for insulation between the plasma electrode 120 and the annular support plate 100. Typically, the plasma electrode 120 is installed to cover the quartz dome, which is not shown here.

The bell jar 140 is placed on the outer surface of the upper surface of the annular support plate 100 without the ceramic ring 110 to cover the plasma electrode 120. At this time, the bell jar 140 and the plasma electrode 120 are spaced apart from each other by a predetermined interval. Inside the bell jar 140, a coolant pipe 145 through which coolant flows is installed in a coil wound horizontally.

The heat insulating member 130 is in close contact with the inner surface of the bell jar 140 and is installed in a dome shape. The heat insulating member 130 is also installed to be spaced apart from the plasma electrode 120 by a predetermined interval. The heating wire 150 is installed inside the heat insulating member 130 as an example of the heating means 150. The heating wire 150 has a coil wound horizontally and is installed not to contact the plasma electrode 120.

According to the present invention as described above, since the heat insulation is good by the heat insulating member 130, it is possible to further increase the temperature in the chamber. In addition, since the outer wall of the bell jar 140 is not hot by the cooling water pipe 145 of the cover, the safety of the worker can be guaranteed. And, the noise generated in the plasma electrode 120 by the heat insulating member 130 is not leaked to the outside.

The present invention is not limited to the above embodiments, and it is apparent that many modifications are possible by those skilled in the art within the technical spirit of the present invention.

Claims (3)

The chamber cover which covers the chamber in the upper part of the dome shape, A metal domed plasma electrode; A metal bell covering the plasma electrode and spaced apart from the plasma electrode by a predetermined interval, and installed in a coil shape in which a coolant pipe through which a coolant flows is wound horizontally; A domed heat insulating member installed in close contact with the inner surface of the bell and spaced apart from the plasma electrode by a predetermined distance; And Heating means fixedly installed inside the heat insulating member to surround the plasma electrode without touching the plasma electrode; Cover of the plasma chamber comprising a. The cover of claim 1, wherein the heating means is a coiled hot wire wound horizontally to surround the plasma electrode. The method of claim 1, wherein the dome-shaped plasma electrode is placed in an annular groove formed on the upper surface of the ceramic ring, the ceramic ring is fitted into an annular groove formed on the upper surface of the annular support plate of the metal material, the annular support plate is open the upper portion The cover of the chamber, characterized in that placed on the side wall of the chamber.

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