KR100637324B1 - 기판 세정 장치 - Google Patents

기판 세정 장치 Download PDF

Info

Publication number
KR100637324B1
KR100637324B1 KR1020060081393A KR20060081393A KR100637324B1 KR 100637324 B1 KR100637324 B1 KR 100637324B1 KR 1020060081393 A KR1020060081393 A KR 1020060081393A KR 20060081393 A KR20060081393 A KR 20060081393A KR 100637324 B1 KR100637324 B1 KR 100637324B1
Authority
KR
South Korea
Prior art keywords
substrate
cleaning
unit
ultrapure water
work table
Prior art date
Application number
KR1020060081393A
Other languages
English (en)
Korean (ko)
Inventor
주명훈
Original Assignee
(주)케이엘테크
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by (주)케이엘테크 filed Critical (주)케이엘테크
Priority to KR1020060081393A priority Critical patent/KR100637324B1/ko
Application granted granted Critical
Publication of KR100637324B1 publication Critical patent/KR100637324B1/ko
Priority to CNA2007100027555A priority patent/CN101130189A/zh

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67046—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly scrubbing means, e.g. brushes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning In General (AREA)
KR1020060081393A 2006-08-26 2006-08-26 기판 세정 장치 KR100637324B1 (ko)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020060081393A KR100637324B1 (ko) 2006-08-26 2006-08-26 기판 세정 장치
CNA2007100027555A CN101130189A (zh) 2006-08-26 2007-01-30 基底清洁装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060081393A KR100637324B1 (ko) 2006-08-26 2006-08-26 기판 세정 장치

Publications (1)

Publication Number Publication Date
KR100637324B1 true KR100637324B1 (ko) 2006-10-23

Family

ID=37621673

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020060081393A KR100637324B1 (ko) 2006-08-26 2006-08-26 기판 세정 장치

Country Status (2)

Country Link
KR (1) KR100637324B1 (zh)
CN (1) CN101130189A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100733503B1 (ko) * 2006-09-27 2007-06-28 신라대학교 산학협력단 검둥감태 추출물을 이용한 여드름 피부용 화장료 조성물
KR100951780B1 (ko) * 2008-06-13 2010-04-08 주식회사 디엠에스 기판 처리장비의 구동부 부하율 측정 장치 및 방법

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108015036A (zh) * 2018-01-29 2018-05-11 张家港炬弘板业有限公司 一种用于生产钢卷的平面清洗机

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100733503B1 (ko) * 2006-09-27 2007-06-28 신라대학교 산학협력단 검둥감태 추출물을 이용한 여드름 피부용 화장료 조성물
KR100951780B1 (ko) * 2008-06-13 2010-04-08 주식회사 디엠에스 기판 처리장비의 구동부 부하율 측정 장치 및 방법

Also Published As

Publication number Publication date
CN101130189A (zh) 2008-02-27

Similar Documents

Publication Publication Date Title
CN210325702U (zh) 一种晶圆后处理系统
KR100568388B1 (ko) 기판세정장치및기판세정방법
JP3328426B2 (ja) 洗浄装置
US20160026082A1 (en) Cleaning device and linear coating machine
KR101004439B1 (ko) 글라스 기판 세정 유닛 및 이를 갖는 글라스 기판 세정 시스템
CN102716876A (zh) 一种玻璃清洗机及其清洗方法
KR101614423B1 (ko) 패널세정시스템
KR100637324B1 (ko) 기판 세정 장치
JP6143589B2 (ja) 基板処理装置
JP2017098278A (ja) エッチング装置
KR20100050397A (ko) 기판 처리 장치 및 기판 세정 방법
CN105097438A (zh) 一种晶片背面清洗装置
JPH1190359A (ja) オーバーフロー式スクラブ洗浄方法及び装置
KR20080083793A (ko) 기판 세정장치
JP2007044693A (ja) 洗浄装置
US20070221256A1 (en) Methods and apparatus for improving edge cleaning of a substrate
JP4282159B2 (ja) 基板洗浄装置および基板洗浄方法
KR101329766B1 (ko) 기판 세정장치
JPH09223681A (ja) 洗浄装置
JP6403564B2 (ja) 洗浄装置
KR101099591B1 (ko) 기판 세정용 디스크 유닛 및 이를 갖는 기판 세정 장치
JPH0766161A (ja) ウエ−ハ枚葉洗浄装置
KR101329765B1 (ko) 기판 세정장치
KR101304484B1 (ko) 기판 세정 장치
KR200420610Y1 (ko) 액정화면 보호창 고온스팀 클리닝 장치

Legal Events

Date Code Title Description
A201 Request for examination
A302 Request for accelerated examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant
FPAY Annual fee payment

Payment date: 20121016

Year of fee payment: 7

FPAY Annual fee payment

Payment date: 20131016

Year of fee payment: 8

FPAY Annual fee payment

Payment date: 20141016

Year of fee payment: 9

FPAY Annual fee payment

Payment date: 20151223

Year of fee payment: 10

LAPS Lapse due to unpaid annual fee