KR100622912B1 - 내충격 및 내마모성이 우수한 TiAlN계 다층경질 박막 - Google Patents
내충격 및 내마모성이 우수한 TiAlN계 다층경질 박막 Download PDFInfo
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- KR100622912B1 KR100622912B1 KR1020040041580A KR20040041580A KR100622912B1 KR 100622912 B1 KR100622912 B1 KR 100622912B1 KR 1020040041580 A KR1020040041580 A KR 1020040041580A KR 20040041580 A KR20040041580 A KR 20040041580A KR 100622912 B1 KR100622912 B1 KR 100622912B1
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- thin film
- tialn
- atomic
- bias voltage
- coated
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/30—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer
- C23C28/34—Coatings combining at least one metallic layer and at least one inorganic non-metallic layer including at least one inorganic non-metallic material layer, e.g. metal carbide, nitride, boride, silicide layer and their mixtures, enamels, phosphates and sulphates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
여기에서 초기 바이어스 전압을 인가한 박막의 성분은 45원자%≤Ti≤55원자% 및 45원자%≤Al≤55원자%으로 함이 바람직하고, 바이어스 전압을 변경하여 인가한 박막의 성분은 40원자%≤Ti≤55원자% 및 45원자%≤Al≤60원자%로 함이 바람직하다. 따라서 전압변경으로 우선성장 방향이 변경됨과 동시에 박막 성분도 변경되며, 이는 바이어스 전압을 변경 유무를 판단할 수 있게 한다.
연속내마모시험 | 단속절삭시험 | |
가공물 | SCM440(HB250) | SCM440(HB250) |
절삭속도(m/min) | 271 | 125 |
날당이송량(mm/刃) | 0.167 | 0.24 - 0.6 |
절입량(mm) | 2.0 | 2.0 |
절삭유 | 무 | 무 |
가공 시간(pass) | 10 | 파손시까지 |
구분 | 증착 바이어스 전압 | 연속내마모시험 여유면마모(mm) | 단속절삭시험 최대날당이송량(mm/刃) |
1 | 30V | 0.11 | 0.36 |
2 | 50V | 0.102 | 0.36 |
3 | 70V | 0.12 | 0.36 |
4 | 90V | 0.17 | 0.54 |
5 | 110V | 0.17 | 0.6 |
6 | 130V | 0.19 | 0.6 |
7 | 150V | 0.20 | 0.6 |
8 | 170V | 0.28 | 0.48 |
9 | 50V+150V | 0.112 | 0.36 |
10 | 90V+150V | 0.184 | 0.6 |
11 | 150V+50V | 0.13 | 0.6 |
12 | 150V+90V | 0.192 | 0.6 |
구분 | 증착 바이어스 전압별 박막두께(㎛) | 연속내마모시험 여유면마모(mm) | 단속절삭시험 최대날당이송량(mm/刃) |
1 | 150V(1.0)+50V(1.0) | 0.12 | 0.36 |
2 | 150V(2.0)+50V(1.0) | 0.13 | 0.54 |
3 | 150V(3.0)+50V(1.0) | 0.12 | 0.6 |
4 | 150V(4.0)+50V(1.0) | 0.115 | 0.54 |
5 | 150V(1.0)+50V(0.5) | 0.125 | 0.54 |
6 | 150V(1.0)+50V(1.5) | 0.114 | 0.36 |
7 | 150V(1.0)+50V(2.0) | 0.113 | 0.36 |
8 | 150V(2.0)+50V(0.5) | 0.13 | 0.6 |
9 | 150V(2.0)+50V(1.5) | 0.118 | 0.42 |
10 | 150V(2.0)+50V(2.0) | 0.112 | 0.36 |
11 | 150V(2.0)+50V(2.5) | 0.103 | 0.3 |
Claims (10)
- 물리증착법을 이용하여 절삭공구 또는 내마모성 공구에 코팅되는 TiAlN계 다층경질박막에 있어서 Ti : Al의 비율이 50원자% : 50원자%인 합금 타겟을 사용하여 TiAlN 피복경질층과 TiAlCrN 피복경질층을 TiAlN/TiAlCrN/TiAlN/TiAlCrN....으로 교차하여 적층하며 증착시 바이어스 전압을 1회 이상 변경 증착하여 총박막두께가 6㎛이하로 됨을 특징으로 하는 다층경질박막.
- 제 1항에 있어서, 상기 TiAlCrN 박막은 (TiaAlbCrc)N의 조성으로 이루어져 있으며 여기서 a+b+c=1이고 c=5원자%-12원자%임을 특징으로 하는 다층경질박막.
- 제 2항에 있어서, 상기 a 및 b의 값이 40원자%≤a≤60원자% 및 40원자%≤b≤60원자%임을 특징으로 하는 다층경질박막.
- 제 2항에 있어서, 상기 (TiaAlbCrc)N 피복층은 우선성장 방위가 (200)면임을 특징으로 하는 다층경질박막.
- 제 1항에 있어서, 초기 바이어스 전압을 인가한 박막의 두께는 1-4㎛ 두께로 증착하고 바이어스 전압을 변경하여 0.5-1.5㎛ 두께로 증착함을 특징으로 하는 다층경질박막.
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KR1020040041580A KR100622912B1 (ko) | 2004-06-08 | 2004-06-08 | 내충격 및 내마모성이 우수한 TiAlN계 다층경질 박막 |
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KR1020040041580A KR100622912B1 (ko) | 2004-06-08 | 2004-06-08 | 내충격 및 내마모성이 우수한 TiAlN계 다층경질 박막 |
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KR20050116501A KR20050116501A (ko) | 2005-12-13 |
KR100622912B1 true KR100622912B1 (ko) | 2006-09-19 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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DE112009000799T5 (de) | 2008-04-24 | 2011-06-09 | Korloy Inc. | Mehrschichtiger Hartüberzug für Wendeschneidplatte |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
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CA2600097A1 (en) * | 2007-08-31 | 2009-02-28 | Mds-Prad Technologies Corporation | Physical vapour deposition process for depositing erosion resistant coatings on a substrate |
CN102776474B (zh) * | 2012-07-12 | 2014-03-05 | 济南大学 | 用于基底表面处理的纳米复合涂层及其制备方法和装置 |
EP3170919B1 (en) * | 2015-11-20 | 2019-01-09 | Seco Tools Ab | Coated cutting tool |
CN114855120B (zh) * | 2022-04-14 | 2023-12-19 | 超微中程纳米科技(苏州)有限公司 | 刀具蓝纳米复合涂层 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09217168A (ja) * | 1995-12-18 | 1997-08-19 | Hauzer Ind Bv | 金属及びセラミック基体のコーティング方法 |
KR20010037811A (ko) * | 1999-10-20 | 2001-05-15 | 유창종 | 절삭공구/내마모성 공구용 표면 피복 경질합금 |
KR20030008359A (ko) * | 2001-07-20 | 2003-01-25 | 한국야금 주식회사 | 공구용 초경합금에 코팅되는 TiAlN계 다층경질 박막 |
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Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09217168A (ja) * | 1995-12-18 | 1997-08-19 | Hauzer Ind Bv | 金属及びセラミック基体のコーティング方法 |
KR20010037811A (ko) * | 1999-10-20 | 2001-05-15 | 유창종 | 절삭공구/내마모성 공구용 표면 피복 경질합금 |
KR20030008359A (ko) * | 2001-07-20 | 2003-01-25 | 한국야금 주식회사 | 공구용 초경합금에 코팅되는 TiAlN계 다층경질 박막 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE112009000799T5 (de) | 2008-04-24 | 2011-06-09 | Korloy Inc. | Mehrschichtiger Hartüberzug für Wendeschneidplatte |
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