KR100617454B1 - A base plate transfer system and transfer method using it - Google Patents

Abstract

It relates to a substrate transfer system and a transfer method using the same to reduce the transfer time when transferring the substrate from the upper working portion to the lower working portion.

This is a substrate transfer system having a lift that mounts and supplies or discharges a substrate from an upper working part to a lower working part or from a lower working part to an upper working part while moving between the upper working part and the lower working part, wherein the lift is mounted on the substrate. A plurality of horizontal support rods are provided at regular intervals so that they can be mounted, and can be mounted on a rotation support for temporarily mounting the substrate, and on a substrate discharge side from the upper work portion or on a substrate supply side to the upper work portion, and on which the substrate can be mounted. And a rotation means for rotating to a second position rotated upwardly or downwardly so that the first position and the lift on which the substrate is mounted are passed, and the rotation support is provided at regular intervals so as to pass between the horizontal support rods; It is provided with a support body for fixing the rotation support rods.

Such a system, when the first and second lifts 70 and 80 are lifted to transfer the substrates, the first and second rotation supports for the substrates 300 having completed the process in the upper and lower working parts 30 and 40. By temporarily waiting at (410, 420) (430, 44), the first and second lifts 70, 80 wait time until the process is completed in the upper and lower working parts 30, 40 By reducing the transfer time and processing time can be shortened.

Board, Transfer, Rotating Support, Lift

Description

Substrate transfer system and substrate transfer method using same {A base plate transfer system and transfer method using it}

1 to 3 is a conceptual diagram illustrating a conventional substrate transfer apparatus and method,

4 is a side view showing the substrate transfer system of the embodiment of the present invention;

5 is a plan view of FIG. 4;

6 is a left side view of FIG. 4;

7 is a right side view of FIG. 4;

8 and 9 is an operating state diagram showing the leaf and the rotation support,

10 is a plan view showing a rotation support,

11 to 15 are operational conceptual diagrams illustrating a system and a transfer method of an embodiment of the present invention.

* Explanation of symbols for main parts of the drawings

30 ... upper part 40 ... upper part

50 ... Substrate supply and discharge section 70, 80 ... 1st and 2nd lift

410,420 ... 1st support 430,440 ... 2nd support

The present invention relates to a substrate transfer system and a transfer method using the same, in particular, a substrate which can shorten the transfer time when transferring the substrate from the upper working portion to the lower working portion or from the lower working portion to the upper working portion It relates to a transfer system and a transfer method using the same.

For example, a substrate used for a flat panel display (FPT), a semiconductor wafer, an LCD glass, or the like is processed through a series of processes such as deposition, etching, stripping, cleaning, and rinsing.

Such a series of substrate processing processes are transferred by a substrate transfer system so that a process of supplying, processing, and discharging the substrate forms a circulation cycle.

As an example, referring to Figs. 1 to 3 showing the substrate transfer apparatus, it transfers the substrates 1 and 2 from the upper work bench 10 to the lower work bench 20, and again from the lower work bench 20 to the upper work bench. The substrate 1 and the substrate 2 are transported to and discharged from the substrate 10.

That is, as shown in FIG. 1, the substrate 1 is supplied through the supply and discharge portions 15 of the upper working platform 10, so that the UV cleaning is performed on the first substrate 1 in a certain section of the upper working platform 10. After this, the first substrate 1, which has been cleaned with ultraviolet rays, is moved to the supply side lift 11 and lowered as shown in FIGS. 2 and 3 to move the first substrate 1 to the lower work bench 20, In the work bench 20, a process such as washing with washing water is performed.

After the process at the lower work platform 20 is completed, the first substrate 1 is moved to the discharge side lift 21, and ascended, the first substrate 1 is supplied to the upper work platform 10 through the supply and discharge portions 15. The substrate 1 is discharged.

However, such a substrate transfer device has the following problems.

While the first substrate 1 is mounted on the supply side lift 11 and transferred from the upper work platform 10 to the lower work platform 20, the second substrate on which the UV cleaning process is completed on the upper work platform 10 as shown in FIG. 2. There is a problem in that (2) has to wait and thus, the supply of another substrate through the supply and discharge portions 15 is delayed, thereby lowering the productivity.

The present invention has been made in order to solve the above problems, an object of the present invention is to provide a substrate transfer apparatus that can shorten the working time by minimizing the standby time of the substrate.

The present invention to achieve the above object is a substrate transfer system having a lift to mount or supply the substrate from the upper working part to the lower working part or from the lower working part to the upper working part while elevating between the upper working part and the lower working part. In

The lift is provided with a plurality of horizontal support rods at regular intervals so that the substrate is mounted,

A rotation support positioned on a substrate discharge side from the upper work portion or a substrate supply side to the upper work portion to temporarily mount the substrate at a height equal to or lower than that of the upper work portion;

And rotating means for rotating the pivot support to a first position on which the substrate can be mounted and to a second position rotated up or down so that the lift on which the substrate is mounted passes.

The rotation support is characterized in that it comprises a rotation support rod provided at a predetermined interval so as to pass between the horizontal support rods, and a support body for fixing the rotation support rods.

In addition, the transfer system of the present invention is characterized in that the rollers are rotatably coupled to the horizontal support rod and the rotation support rod, respectively, so as to move the substrate.

In addition, the rotation means; The support body is rotatably coupled to the main frame to guide the lift to the lift,

The main body is rotatably coupled to the main body and a cylinder rod is rotatably connected to the support body.

On the other hand, the present invention to achieve the above object in the substrate transfer method using a substrate transfer system,

Rotating the pivot support to a first position and transferring the substrate from the upper work portion to the pivot support;

Mounting the substrate on the lift while elevating the lift and passing each horizontal support rod of the lift between the rotary support rods of the pivot support;

Rotating the pivot support to the second position;

Lowering the lift on which the substrate is mounted to a lower workbench position;

Transferring the substrate mounted on the lift to a lower workbench;

And rotating the pivotal support to the first position while the lift lowers the lower workbench or transfers the substrate mounted on the lift to the lower workbench.

According to the above characteristics of the present invention, the present invention waits for the substrate to be supplied from the upper workbench by the rotation support while the lift feeds the board to the lower workbench so that the processing time can be shortened by shortening the transfer time of the board. do.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

The substrate transfer system applied to the embodiment of the present invention allows the substrate such as LCD glass to be automatically transferred so as to undergo a series of processes such as deposition, etching, stripping, cleaning and rinsing.

Such a series of substrate processing processes are transferred by a substrate transfer system so that a process of supplying, processing, and discharging the substrate forms one circulation cycle.

Referring to FIGS. 2 and 3 showing the substrate transfer system of the embodiment of the present invention in a side view and a plan view, and FIG. 9 showing a schematic conceptual view of the transfer system of the present invention, it is composed of an upper working part 30 and a lower working part 40. The first lift 70 for transferring the substrate 300 from which the processing operation is completed from the upper working part 30 to the lower working part 40, and the substrate 300 where the processing process is completed at the lower working part 40. It is provided with a second lift (80) for transferring the to the substrate supply and discharge unit 50 of the upper working portion (30).

On the upper working part 30 side, a substrate supply and discharge part 50 is provided to supply the substrate 300 to be processed or to discharge the processed substrate, so that the substrate can be sucked and supplied or discharged by a robot, for example. .

Each of the upper and lower working parts 30 and 40 employs a plurality of rotating rods 32 employing rollers 31 so as to easily transport the mounted substrates 300. 32 may be rotated by a motor (not shown) for transfer or substrates may be transferred by a shift mechanism (not shown).

4 to 6, the first and second lifts 70 and 80 are lifted 120 up and down by screw shafts 111, 112, 211 and 212 rotated by the motors 110 and 210. It is mounted on the 220 and elevating, and can be elevated by another ordinary elevating structure.

In addition, as shown in FIG. 6, the first and second lifts 70 and 80 are provided with a plurality of horizontal support rods 71 at a predetermined interval so that the substrate can be mounted, and each horizontal support rod 71 has a substrate. Rollers 71 are employed to allow 300 to be moved.

Meanwhile, referring to FIGS. 3 to 9, the first and second pivotal supports for temporarily mounting the substrate 300 on the substrate discharge side from the upper work portion 30 and the substrate supply side to the upper work portion 30 ( 410 and 420 and 430 and 440 are provided.

Since the first and second pivotal supports 410 and 420 and 430 and 440 have the same structure, the first pivotal supports 410 and 420 will be described with reference to FIGS. 4 to 7. The first pivot support (410, 420) is a pivot support rod 411 is provided at regular intervals so as to pass between the horizontal support rods 71 of the lift 70 and the support body for fixing the pivot support rods (411) 415 and 425.

Rollers 412 and 422 are rotatably coupled to each of the rotation support rods 411 and 421 so that the substrates 300 may be clouded.

The first pivotal support 410 and 420 are moved upwardly or upwardly so that the first position (see FIG. 9) on which the substrate 300 can be mounted by the pivot means (see FIG. 9) and the lift 70 on which the substrate is mounted passes. It rotates to the 2nd position rotated downward (refer FIG. 12).

4 and 5, the rotation means is the support body 415, 425 is rotatably coupled to the main frame 100 for guiding the lift 70, the main frame (100) The cylinder body 510 is rotatably coupled to 100, and the cylinder rod 511 is rotatably connected to the support body 415.

8 shows a hinge portion 513 to which a cylinder body (not shown) is rotatably connected, and a hinge portion 514 to which a cylinder rod (not shown) is rotatably connected.

The first pivot support 410 and 420 can be rotated about 90 degrees from the first position to the second position as shown in FIGS. 9 and 12 by the operation of the cylinder.

The operation of the substrate transfer system having the configuration as described above will be described together with the transfer method of the embodiment of the present invention.

First, referring to FIG. 9, the substrate 300 to be processed is supplied to the substrate supply and discharge unit 50, and the supplied substrate is moved to the upper work unit 30 to the ultraviolet cleaner 60 (see FIG. 2). The cleaning process is performed. At this time, the movement of the substrate 300 from the substrate supply and discharge unit 50 to the upper working portion 30 can be transferred by the rotation of the roller 31 by a motor (not shown) or by a shift mechanism (not shown).

The substrate 30, which has been cleaned with ultraviolet rays, is transferred to the first rotation support members 410 and 420 as shown in FIGS. 8 and 10.

At this time, the first pivot support 410, 420 is moved to the first position, that is, the same plane as the upper working part 30 by moving the cylinder 510, 511 is positioned in a horizontal state.

Subsequently, as the first lift 70 is raised as shown in FIG. 10, the horizontal support rods 71 pass through the rotation support rods 411 of the first pivot support 410 and 420 as shown in FIG. The substrate 300 mounted on the supports 410 and 420 is seated on the horizontal support rod 71 of the first lift 70.

Meanwhile, the substrate on which the water cleaning operation is completed in the lower working part 40 is transferred to the second lift 80 side as shown in FIGS. 10 and 11, and mounted thereon, and the screw shaft driven by the motor 210 is driven as shown in FIG. 5. The second lift 80 is lifted toward the substrate supply and discharge part 50 by the rotation of the (211) (212). In this case, the second pivotal supports 430 and 440 are pivoted downward so that the second lift 80 can pass therethrough.

As described above, in the state in which the substrate 300 is seated on the horizontal support rod 71 of the first lift 70, as shown in FIG. 12, the first pivot supports 410 and 420 are moved downward to the second position by the operation of the cylinder. The first lift 70 is lowered to the lower work part 40 by the rotation of the screw shafts 111 and 112 by the motor 110 as shown in FIG. 4.

Subsequently, as shown in FIG. 13, the substrate 300 is transferred from the first lift 70 to the lower work part 40 to undergo a water cleaning process, and is raised through the second lift 80 to supply and discharge the substrate. It is discharged through (50).

As such, the substrate 300 is supplied through the substrate supplying and discharging unit 50, the ultraviolet ray cleaning process at the upper working unit 30, the first rotating support 410, and the first position of the 420 are rotated and the upper operation is performed. The substrate is moved from the part 30 to the first pivotal support 410 and 420 and the substrate is mounted from the first pivotal support 410 and 420 to the first lift 70 due to the movement of the first lift 70. , Downward rotation to the second position of the first pivot support 410, 420, lowering of the first lift 70, moving the substrate from the first lift 70 to the lower working portion 40, water cleaning process, etc. A series of cleaning processes are performed.

Meanwhile, the substrate on which the cleaning process is completed is moved to the second lift 80, the second lift 80 is raised, rotated to the horizontal position of the second pivot support 430, 440, and the second lift 80 is lowered. In this case, the substrate is moved from the second rotation support members 430 and 440 to the substrate supply and discharge unit 50, and the substrate discharge process is sequentially performed.

The substrate transfer system and the substrate transfer method according to the embodiment of the present invention as described above is a process in the upper and lower working parts 30 and 40 when the first and second lifts 70 and 80 transfer the substrate while being lifted. The first and second lifts 70 and 80 are placed on the upper and lower working parts 30 and 40 by temporarily waiting the completed substrates 300 on the first and second pivotal supports 410 and 420 and 430 and 44. By reducing the waiting time to wait until the process is completed, the transfer time and the process time can be shortened.

The present invention as described above is not limited to the above embodiments without departing from the spirit and scope of the present application can be practiced with a number of modifications.

According to the present invention as described above, when the first and second lifts 70 and 80 are transferred, the substrates 300 having the process completed in the upper and lower working parts 30 and 40 are first and second, respectively. By temporarily waiting on the second pivotal support (410, 420) (430, 44), the first and second lifts (70) and (80) should wait until the process is completed in the upper and lower working parts (30) and (40). By reducing the waiting time, it is possible to shorten the transfer time and the process time.

Claims (4)

A substrate transfer system comprising a lift for mounting and feeding or ejecting a substrate from an upper working part to a lower working part or from a lower working part to an upper working part while lifting between an upper working part and a lower working part, The lift is provided with a plurality of horizontal support rods at regular intervals so that the substrate is mounted, A rotation support positioned on a substrate discharge side from the upper work portion or a substrate supply side to the upper work portion to temporarily mount the substrate; And rotating means for rotating the pivot support to a first position on which the substrate can be mounted and to a second position rotated up or down so that the lift on which the substrate is mounted passes. And the pivot support has a pivot support rod provided at a predetermined interval to pass between the horizontal support rods, and a support body for fixing the pivot support rods. The substrate transport system of claim 1, wherein rollers are rotatably coupled to the horizontal support rod and the rotation support rod to respectively move the substrate. The method of claim 1 or 2, wherein the rotation means; The support body is rotatably coupled to the main frame to guide the lift to the lift, And a cylinder rod rotatably coupled to the mainframe and rotatably connecting a cylinder rod to the support body. In the method of transferring the substrate using the substrate transfer system of claim 1, Rotating the pivot support to a first position and transferring the substrate from the upper work portion to the pivot support; Mounting the substrate on the lift while elevating the lift and passing each horizontal support rod of the lift between the rotary support rods of the pivot support; Rotating the pivot support to the second position; Lowering the lift on which the substrate is mounted to a lower workbench position; Transferring the substrate mounted on the lift to a lower workbench; And rotating the pivot support to the first position while the lift descends the lower workbench or transfers the substrate mounted on the lift to the lower workbench.

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