KR100563044B1 - Metal shadowmask supporting device using magnetic force for vacuum deposition - Google Patents

Abstract

The present invention discloses a shadow mask support apparatus for magnetic deposition. The present invention and the fixing means for supporting and fixing the substrate; A fixing plate positioned on an upper portion of the substrate fixing means and vertically adhering a shadow mask to a lower surface of the substrate by a magnetic force caused by a permanent magnet during the deposition process; Relaxing means connected to the fixed plate and spaced apart from the fixed plate and the fixed plate between the fixed plate and the substrate to relax the magnetic force of the fixed plate; It provides a shadow mask support apparatus for magnetic deposition comprising.

Description

Metal shadowmask supporting device using magnetic force for vacuum deposition}

1 is an exploded perspective view of a shadow mask support apparatus for magnetic deposition according to the prior art,

FIG. 2A is a cross-sectional view showing a state before the support of the shadow mask support apparatus for magnetic deposition of FIG. 1 rises; FIG.

2B is a cross-sectional view illustrating a process of raising the shadow mask support apparatus for the magnetic deposition of FIG. 1;

3 is a perspective view showing an embodiment of a shadow mask support apparatus for magnetic deposition according to the present invention;

4 is an exploded perspective view illustrating an exploded main part of FIG. 3;

Figure 5a is a cross-sectional view showing a state before the support portion rises during the operation of the embodiment of the shadow mask support apparatus for magnetic deposition according to the present invention,

Figure 5b is a cross-sectional view showing a process of lifting the support portion of the embodiment of the shadow mask support apparatus for magnetic deposition according to the present invention.

<Brief description of symbols for the main parts of the drawings>

31; Substrate 33; Shadow mask

34; Fixed plate 35; Mitigation

36; Lifting device 37; support fixture

38; Pressurization

The present invention relates to a shadow mask support device for magnetic deposition, and more particularly to a shadow mask support device for magnetic deposition improved to prevent deformation of the substrate.

In general, electroluminescence is light emission when a strong electric field is applied to a solid. The reason is that free electrons accelerated by an electric field excite electrons of an active substance, which is a specific impurity that becomes a light emission center in a light emitting material. It is made up of the energy that is emitted while returning to the original state. The organic light emitting device using the light emitting principle is a type of display device using its own light emitting phenomenon in which electrons and holes injected between the cathode and the anode combine to emit light in an organic material. The organic light emitting diode can be driven at a low voltage of 15V or less, can be manufactured with high brightness, and a thin film. Therefore, a display device using the fast response speed has been released and is being commercialized. Recently, a large screen device has also been developed to be used as a TV or monitor.

In order to manufacture the organic light emitting device, a deposition process of a pattern using an organic material is required, and a shadow mask having a specific pattern is used. In other words, the deposition is performed only on the part which is not covered by the shadow mask.

However, since the shadow mask is in the form of a metal plate having an extremely thin thickness, if it comes into close contact with the substrate while supporting only the edge, the center part is sag due to its own weight, resulting in a pattern error during deposition. Therefore, in order to correct the deflection of the central portion, a method of providing an overall uniform adhesive force including the central portion using a permanent magnet or an electromagnet is used.

Conventionally, since the shadow mask is raised and mechanically bonded to the lower part of the substrate while supporting only the edge portion except for the pattern of the shadow mask, the center part is sag once. Subsequently, the substrate and the shadow mask are closely adhered to each other by the magnets distributed throughout. At this time, the magnetic force acts strongly on the shadow mask, which increases the center of the shadow mask, which shortens the life of the shadow mask. If not, the pattern of the shadow mask is deformed, which is a direct cause of poor deposition. In addition, the alignment of the shadow mask and the substrate may be disturbed along with the contact with the substrate with the magnet when the contact is caused, which also causes a defect.

1 shows a shadow mask support apparatus for magnetic deposition according to the prior art disclosed in Korean Patent Laid-Open No. 2001-0057828.

Referring to the drawings, the shadow mask support apparatus for the magnetic deposition according to the prior art is the upper plate 11 and the support plate 12 and the upper plate 11 and the support plate 12 which are opposed to each other and spaced apart from each other Interposed therebetween and comprises a plurality of magnetic force generating portion 13 is wound coil (13a). In addition, the upper plate 11 and the support plate 12 has the same planar shape and is provided with a support member 14 for providing a space therein the edge portion. The support member 14 has a shape of an edge of the upper plate 11 or the support plate 12 and has a predetermined width and height. A support holder 15 is provided on the bottom of the support plate 12. The support holder 15 is a member that elastically supports the substrate 16 by forming two pairs to face each other.

The substrate 16 is elastically supported by the support holder 15 on the bottom of the support plate 12, and the shadow mask 17 is pulled upward by the magnetic force of the permanent magnet 13b on the bottom of the substrate 16. The state in close contact with the bottom of (16) is maintained. At this time, the electromagnet 13c does not operate. Since the magnetic force of the permanent magnet 13b extends to the shadow mask 17 through the substrate 16, the shadow mask 17 is evenly adhered to the substrate 16 by a plurality of permanent magnets 13b, so that the deposition process is performed. Is performed. When the electromagnet 13a is operated, the magnetic force of the permanent magnet 13b is canceled by the magnetic force of the electromagnet 13a so that the shadow mask 17 is separated from the substrate 16 by gravity and spaced downward.

In the shadow mask support apparatus for magnetic deposition according to the related art, which is configured as described above, the center portion sags before the shadow mask 17 is in close contact with the substrate 16. Thereafter, the shadow mask 17 is transferred upward for close contact with the substrate 16, and the center of the shadow mask 17 is bent upside down to be deflected by the magnetic force of the permanent magnet 13b, thereby deforming the shadow mask 17. In addition, there is a problem that the alignment is disturbed by the mechanical contact with the support plate 12. This problem eventually leads to poor deposition of the substrate.

2A and 2B illustrate a process in which the above problem occurs.

Referring to the drawings, the substrate 21 and the shadow mask 22 are supported by the elevating mechanism 23 in FIG. 2A. At this time, since the central portions of the substrate 21 and the shadow mask 22 are not supported, sagging occurs. Since the fixed plate 24 having the magnetic force located on the upper portion of the substrate 21 is spaced apart from the substrate 21 and the shadow mask 22 by a predetermined distance, the magnetic force does not act in this state. In addition, the support device is usually provided with a pressing means 25 for bringing the fixed plate 24 and the shadow mask 22 in close contact.

In FIG. 2B, the substrate 21 and the shadow mask 22 are raised to closely adhere to the fixing plate 24. The fixing plate 24 is pressed downward by the pressing means 25 for a close contact. As shown in the drawing, the substrate 21 and the shadow mask 22 protrude upwards due to the magnetic force of the fixing plate 24 which is rapidly applied as opposed to the state before the ascension, which is the shadow mask 22. Will result in a deformation of. In addition, as described above, the contact with the fixing plate 24 at the moment of protruding results in the alignment with the substrate 21. These problems eventually lead to deformation of the deposition pattern.

The present invention has been made to solve the above problems, and the technical problem to be achieved by the present invention is a shadow mask for magnetic deposition that can prevent deformation, etc. due to the change of magnetic force even when the shadow mask is in close contact with the substrate. The purpose is to provide.

In order to achieve the above technical problem, the present invention is a fixing means for supporting and fixing the substrate, and the shadow mask is positioned on the upper portion of the substrate fixing means by the magnetic force by the permanent magnet during the deposition process of the substrate Provides a shadow mask support device for magnetic deposition comprising a fixing plate vertically in close contact with the lower surface, and a fixing means spaced apart from the fixing plate and a predetermined distance between the fixing plate and the substrate and connected to the fixing plate to alleviate the magnetic force of the fixing plate. .

In the present invention, it is preferable to further include lifting means having a support for supporting a lower surface of a portion of the edge of the shadow mask to vertically move the shadow mask.

In the present invention, the relieving means may be connected to the fixed plate by the pressing means, one end is connected to the relieving means and the other end is connected to the fixed plate.

In the present invention, it is preferable that the alleviating means is pressed downward by the pressing means to be in close contact with the lower substrate during the deposition process.

In the present invention, the pressing means is preferably an elastic body.

In the present invention, the alleviating means may be a plate made of a nonmagnetic material.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

3 is a partially cutaway perspective view of an embodiment of a shadow mask support apparatus for magnetic deposition according to the present invention.

Referring to the drawings, the shadow mask support apparatus 30 for magnetic deposition is located on the fixing means 32 that can fix the substrate 31 and the fixing means 32 of the substrate 31 Between the fixing plate 34 and the substrate 31 and the fixing plate 34 which serves to closely contact the shadow mask 33 having a predetermined pattern formed by a magnetic force during the deposition process in a vertical direction on the lower surface of the substrate 31. It is basically provided with a relaxation means 35 to relieve the magnetic force of the fixing plate 34 through. In order to relieve magnetic force, it is preferable to use a nonmagnetic material. In addition, the shape of the plate having the same plane shape as that of the fixed plate 34 is possible. Plates should be machined with holes, etc. for mounting in a range that does not change the magnetic field. The fixed plate 34 is preferably in terms of cost reduction compared to using an electromagnet or a combination of an electromagnet and a permanent magnet. Installation of the permanent magnet on the fixed plate 34 may be performed uniformly so as to have a uniform magnetic force of the fixed plate 34 as in the prior art, and the detailed method thereof is a conventional method. In addition, the shadow deposition support device 30 for the magnetic deposition is further provided with a lifting means 36 for raising and lowering the substrate 31 and the shadow mask 33, which is too large magnetic force or magnetic distribution If the pattern shape of the shadow mask 33 may be deformed by the magnetic force distribution when it is not uniform, the distance between the permanent magnet and the shadow mask 33 is appropriately adjusted. The distance may vary depending on the thickness of the substrate 31 or the shadow mask 33, and the intensity of the magnetic force may be adjusted according to the distance. The lifting means 36 is provided with a support portion 36a for supporting the edges of the substrate 31 and the shadow mask 33, and each corner thereof is mounted on the pillar 36b. The drive of raising and lowering is possible by usual means, such as hydraulic pressure. In addition, the lifting means 36 is preferably provided with a guide means 36c for preventing the left and right shake of the shadow mask 33 during the lifting and lowering, which supports the guide bush (guide) for guiding the transfer path in the vertical direction It can implement by installing in (37). In addition, a pressurizing means 38 may be provided between the alleviating means 35 and the fixed plate 34. The pressing means 38 is configured to connect the alleviating means 35 to the lower substrate 31 during the deposition process. It serves to be in close contact with each other, it is preferable to form an elastic body such as a spring between the relief means 35 and the fixing plate 34.

4 shows some of the components of FIG. 3 separately.

Referring to the drawings, a fixing plate 34 is provided on the uppermost portion, and a permanent magnet 34a is attached to the lower surface thereof. The permanent magnet 34a can be attached by inserting a cylindrical permanent magnet into a groove formed in the fixed plate 34, or by attaching a plate-shaped permanent magnet. Relief means 35 is placed below the fixing plate 34, and the pressing means 38, which can be composed of an elastic body such as a spring, is interposed between the relief means 35 and the fixing plate 34. A substrate 31 is placed below the relaxation means 35, and a portion of the edge of the substrate 31 is fixed by the substrate fixing means 32 to be connected to the support 37. The substrate fixing means is installed on the support 37 of the shadow mask support device 30 for magnetic vapor deposition similarly to the elevating means 36 or the like. A shadow mask 33 is placed below the substrate 31. The edge of the shadow mask 33 is supported by the support portion 36a of the mask elevating device 36.

5A and 5B illustrate an embodiment of the shadow mask support apparatus for the magnetic deposition according to the present invention in operation.

Referring to the drawings, FIG. 5A shows a state before the substrate 31 and the shadow mask 33 are raised. The substrate 31 and the shadow mask 33 are moved by the support 36a of the elevating device 36. Seat is supported. Due to the support of the edges only, the center portion is deflected. A fixing plate 34 and a relaxing means 35 and an urging means 38 interposed between the fixing plate 34 and the relaxing means 35 are provided on the substrate 31 and spaced apart from the predetermined distance. At this time, the magnetic force of the adjustment plate 34 does not reach the shadow mask 33.

5B shows a process in which the substrate 31 and the shadow mask 33 are raised by the elevating device 36 to be in close contact with the relaxation means 35. When the substrate 31 and the shadow mask 33 are raised, they come into contact with the mitigating means 35. At this time, the magnetic force of the fixing plate 34 does not reach. Therefore, as in the shadow mask support apparatus for the magnetic deposition according to the prior art, the phenomenon that the deflection is reversed or thereby suddenly no mechanical contact with the fixed plate occurs. Once the relaxation means 35, the substrate 31, and the shadow mask 33 are in contact with each other, the fixing plate 34 is moved through the pressing means 38 while the substrate 31 and the shadow mask 33 are further raised. The pressure is applied to 35 and the shadow mask 33 comes into close contact with the shadow mask 33 by applying magnetic force to the shadow mask 33 from a certain distance. That is, the shadow mask 33 is not deformed and the shadow mask 33 is not deformed due to the reversal phenomenon of the deflection of the substrate 31 and the shadow mask 33 or the sudden mechanical contact between the fixed plate 34 or the relaxation means 35. The alignment between the substrate 31 and the substrate 31 is not compromised. And as described above, because the guide means 36b for preventing the lateral movement of the shadow mask 33 is provided, the lateral disturbance is also prevented. After the deposition process proceeds, if the substrate 31 and the shadow mask 33 are lowered to some extent, the pressurizing means 38 is unfolded and the fixed plate 34 does not exert magnetic force, and thus for magnetic deposition according to the prior art. The substrate 31 and the shadow mask 33 can be easily separated without a configuration using an electromagnet such as a shadow mask support device.

As described above, the inventors of the present invention provide the shadow mask support apparatus for self-deposition by using a mitigating means for releasing the magnetic force of the fixed plate together with the pressing means and using a guide means for guiding the path of the substrate and the shadow mask during the ascending and descending. It is easy to mount the shadow mask easily and prevents the shadow mask's lifespan due to the deformation and alignment of the shadow mask or prevents the defect of the substrate, so that high quality substrate can be produced and the permanent magnet is used as a means to provide magnetic force Can be significantly lowered.

Although the present invention has been described with reference to the embodiments shown in the drawings, this is merely exemplary, and it will be understood by those skilled in the art that various modifications and equivalent other embodiments are possible. Therefore, the true scope of protection of the present invention should be defined only by the appended claims.

Claims (6)

Fixing means for supporting and fixing the substrate; A fixing plate positioned on an upper portion of the substrate fixing means and vertically adhering a shadow mask to a lower surface of the substrate by a magnetic force caused by a permanent magnet during the deposition process; Relaxing means connected to the fixed plate and spaced apart from the fixed plate and the fixed plate between the fixed plate and the substrate to relax the magnetic force of the fixed plate; Shadow mask support device for magnetic deposition comprising. The method of claim 1, And a lifting means having lifting portions supporting a lower surface of a portion of an edge of the shadow mask to vertically move the shadow mask. The method of claim 1, The relaxation means is a shadow mask support device for magnetic deposition, characterized in that the one end is connected to the fixing plate and the other end is connected to the fixing plate by the pressing means connected to the fixing plate. The method of claim 3, wherein The relief means is pressed downward by the pressing means is a shadow mask support device for magnetic deposition, characterized in that the adhesion to the lower substrate further in the deposition process. The method of claim 4, wherein The pressing means is a shadow mask support apparatus for magnetic deposition, characterized in that the elastic body. The method according to any one of claims 1 to 5, The relief means is a shadow mask support device for magnetic deposition, characterized in that the plate made of a non-magnetic material.

Images