KR100553819B1 - 퍼지효율이 향상된 박막증착장치 - Google Patents
퍼지효율이 향상된 박막증착장치 Download PDFInfo
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- KR100553819B1 KR100553819B1 KR1020030084986A KR20030084986A KR100553819B1 KR 100553819 B1 KR100553819 B1 KR 100553819B1 KR 1020030084986 A KR1020030084986 A KR 1020030084986A KR 20030084986 A KR20030084986 A KR 20030084986A KR 100553819 B1 KR100553819 B1 KR 100553819B1
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- Prior art keywords
- gas
- reaction
- reaction vessel
- purge
- valve
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
Abstract
Description
웨이퍼(w)에 박막을 증착하는 반응용기(100)와, 상기 반응용기(100)로 반응가스 및/또는 퍼지가스를 공급하기 위한 가스박스(200)와, 상기 반응용기 및/또는 가스박스의 반응가스 및/또는 퍼지가스를 외부로 배기시키는 배기펌프(300)를 포함하는 박막증착장치에 있어서,
상기 가스박스(200)는, 반응용기(100)로 반응가스를 공급하기 위한 반응가스공급원과, 상기 반응용기(100)를 퍼지시키기 위한 퍼지가스를 공급하는 퍼지가스공급원을 포함하고;
상기 반응용기(100)에는, 상기 가스박스(200)로부터 유입되는 반응가스를 상기 반응용기(100) 및/또는 배기펌프(300)로 선택적으로 흐르게 하거나, 퍼지가스를 상기 반응용기(100)로 선택적으로 흐르게 하는 밸브박스(400)가 설치되며;
상기 밸브박스(400)는, 상기 반응가스공급원을 통하여 유입되는 반응가스를 반응용기(100) 및/또는 배기펌프(300)로 선택적으로 흐르게 하는 제1용기밸브(401a, 401b)와, 상기 퍼지가스공급원(250)에서 유입되는 퍼지가스를 상기 반응용기(100)로 선택적으로 흐르게 할 수 있는 제2용기밸브(402)를 포함하는 것을 특징으로 한다.
Claims (2)
- 웨이퍼(w)에 박막을 증착하는 반응용기(100)와, 상기 반응용기(100)로 반응가스 및/또는 퍼지가스를 공급하기 위한 가스박스(200)와, 상기 반응용기 및/또는 가스박스의 반응가스 및/또는 퍼지가스를 외부로 배기시키는 배기펌프(300)를 포함하는 박막증착장치에 있어서,상기 가스박스(200)는, 반응용기(100)로 반응가스를 공급하기 위한 반응가스공급원과, 상기 반응용기(100)를 퍼지시키기 위한 퍼지가스를 공급하는 퍼지가스공급원을 포함하고;상기 반응용기(100)에는, 상기 가스박스(200)로부터 유입되는 반응가스를 상기 반응용기(100) 및/또는 배기펌프(300)로 선택적으로 흐르게 하거나, 퍼지가스를 상기 반응용기(100)로 선택적으로 흐르게 하는 밸브박스(400)가 설치되며;상기 밸브박스(400)는, 상기 반응가스공급원을 통하여 유입되는 반응가스를 반응용기(100) 및/또는 배기펌프(300)로 선택적으로 흐르게 하는 제1용기밸브(401a, 401b)와, 상기 퍼지가스공급원(250)에서 유입되는 퍼지가스를 상기 반응용기(100)로 선택적으로 흐르게 할 수 있는 제2용기밸브(402)를 포함하는 것을 특징으로 하는 퍼지효율이 향상된 박막증착장치.
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KR1020030084986A KR100553819B1 (ko) | 2003-11-27 | 2003-11-27 | 퍼지효율이 향상된 박막증착장치 |
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KR1020030084986A KR100553819B1 (ko) | 2003-11-27 | 2003-11-27 | 퍼지효율이 향상된 박막증착장치 |
Publications (2)
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KR20050051228A KR20050051228A (ko) | 2005-06-01 |
KR100553819B1 true KR100553819B1 (ko) | 2006-02-20 |
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KR102180282B1 (ko) * | 2016-01-26 | 2020-11-18 | 주식회사 원익아이피에스 | 박막 증착용 가스공급장치 및 그 제어방법 |
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