KR100544357B1 - 2차 전자제거유닛을 포함하는 리소그래피투영장치 - Google Patents

2차 전자제거유닛을 포함하는 리소그래피투영장치 Download PDF

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Publication number
KR100544357B1
KR100544357B1 KR1020030072586A KR20030072586A KR100544357B1 KR 100544357 B1 KR100544357 B1 KR 100544357B1 KR 1020030072586 A KR1020030072586 A KR 1020030072586A KR 20030072586 A KR20030072586 A KR 20030072586A KR 100544357 B1 KR100544357 B1 KR 100544357B1
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KR
South Korea
Prior art keywords
electrode
radiation
projection apparatus
lithographic projection
voltage
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020030072586A
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English (en)
Korean (ko)
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KR20040034524A (ko
Inventor
쿠르트랄프
바커레비누스피에터
슈우르만스프랑크예뢴피에터
Original Assignee
에이에스엠엘 네델란즈 비.브이.
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Publication of KR20040034524A publication Critical patent/KR20040034524A/ko
Application granted granted Critical
Publication of KR100544357B1 publication Critical patent/KR100544357B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020030072586A 2002-10-18 2003-10-17 2차 전자제거유닛을 포함하는 리소그래피투영장치 Expired - Fee Related KR100544357B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP02079329 2002-10-18
EP02079329.5 2002-10-18

Publications (2)

Publication Number Publication Date
KR20040034524A KR20040034524A (ko) 2004-04-28
KR100544357B1 true KR100544357B1 (ko) 2006-01-23

Family

ID=32668752

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020030072586A Expired - Fee Related KR100544357B1 (ko) 2002-10-18 2003-10-17 2차 전자제거유닛을 포함하는 리소그래피투영장치

Country Status (7)

Country Link
US (1) US6791665B2 (https=)
JP (1) JP4058404B2 (https=)
KR (1) KR100544357B1 (https=)
CN (1) CN1327296C (https=)
DE (1) DE60323584D1 (https=)
SG (1) SG115575A1 (https=)
TW (1) TWI294995B (https=)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10138313A1 (de) * 2001-01-23 2002-07-25 Zeiss Carl Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm
US7135692B2 (en) * 2003-12-04 2006-11-14 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
US7800079B2 (en) * 2003-12-22 2010-09-21 Asml Netherlands B.V. Assembly for detection of radiation flux and contamination of an optical component, lithographic apparatus including such an assembly and device manufacturing method
US7279690B2 (en) * 2005-03-31 2007-10-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7405417B2 (en) * 2005-12-20 2008-07-29 Asml Netherlands B.V. Lithographic apparatus having a monitoring device for detecting contamination
US7629594B2 (en) * 2006-10-10 2009-12-08 Asml Netherlands B.V. Lithographic apparatus, and device manufacturing method
US7825390B2 (en) * 2007-02-14 2010-11-02 Asml Netherlands B.V. Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus
JP2010257998A (ja) * 2007-11-26 2010-11-11 Nikon Corp 反射投影光学系、露光装置、及びデバイスの製造方法
NL1036769A1 (nl) * 2008-04-23 2009-10-26 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device.
DE102013218748A1 (de) * 2013-09-18 2014-10-02 Carl Zeiss Smt Gmbh Optisches Bauelement
CN113767335B (zh) * 2019-04-09 2025-01-14 库力&索法利特克有限公司 平版印刷系统及操作该系统的方法
KR102829107B1 (ko) * 2019-05-02 2025-07-07 삼성전자주식회사 Euv 노광 장치 및 그를 이용한 반도체 소자의 제조 방법
CN115210970B (zh) * 2020-03-03 2025-09-12 西默有限公司 用于光源的控制系统
JP6844798B1 (ja) * 2020-05-26 2021-03-17 レーザーテック株式会社 光学装置、及び光学装置の汚染防止方法
WO2023094084A1 (en) * 2021-11-25 2023-06-01 Asml Netherlands B.V. An optical device, illumination system, projection system, euv radiation source, lithographic apparatus, deposition of contamination preventing method, and optical component refurbishing method

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
JP2000100685A (ja) * 1998-09-17 2000-04-07 Nikon Corp 露光装置及び該装置を用いた露光方法
CA2349912A1 (en) * 2000-07-07 2002-01-07 Heidelberger Druckmaschinen Aktiengesellschaft Setting an image on a printing plate using ultrashort laser pulses
US6781673B2 (en) * 2000-08-25 2004-08-24 Asml Netherlands B.V. Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby
EP1182510B1 (en) 2000-08-25 2006-04-12 ASML Netherlands B.V. Lithographic projection apparatus
GB0031194D0 (en) 2000-12-21 2001-01-31 Eastman Kodak Co Processing photographic material
EP1223468B1 (en) * 2001-01-10 2008-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
DE10138284A1 (de) * 2001-08-10 2003-02-27 Zeiss Carl Beleuchtungssystem mit genesteten Kollektoren

Also Published As

Publication number Publication date
TW200424784A (en) 2004-11-16
US20040130694A1 (en) 2004-07-08
US6791665B2 (en) 2004-09-14
KR20040034524A (ko) 2004-04-28
JP4058404B2 (ja) 2008-03-12
DE60323584D1 (de) 2008-10-30
CN1327296C (zh) 2007-07-18
TWI294995B (en) 2008-03-21
SG115575A1 (en) 2005-10-28
CN1497358A (zh) 2004-05-19
JP2004289120A (ja) 2004-10-14

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