KR100516828B1 - 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 - Google Patents

광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 Download PDF

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Publication number
KR100516828B1
KR100516828B1 KR10-2002-0044716A KR20020044716A KR100516828B1 KR 100516828 B1 KR100516828 B1 KR 100516828B1 KR 20020044716 A KR20020044716 A KR 20020044716A KR 100516828 B1 KR100516828 B1 KR 100516828B1
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KR
South Korea
Prior art keywords
image
inspection
substrate
pattern
acquisition step
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR10-2002-0044716A
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English (en)
Korean (ko)
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KR20040011676A (ko
Inventor
최현호
유근홍
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최현호
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Application filed by 최현호 filed Critical 최현호
Priority to KR10-2002-0044716A priority Critical patent/KR100516828B1/ko
Priority to JP2003090441A priority patent/JP4133509B2/ja
Priority to CNB031225802A priority patent/CN100456024C/zh
Publication of KR20040011676A publication Critical patent/KR20040011676A/ko
Application granted granted Critical
Publication of KR100516828B1 publication Critical patent/KR100516828B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K13/00Apparatus or processes specially adapted for manufacturing or adjusting assemblages of electric components
    • H05K13/08Monitoring manufacture of assemblages
    • H05K13/081Integration of optical monitoring devices in assembly lines; Processes using optical monitoring devices specially adapted for controlling devices or machines in assembly lines
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

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  • Engineering & Computer Science (AREA)
  • Operations Research (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Wire Bonding (AREA)
KR10-2002-0044716A 2002-07-29 2002-07-29 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템 Expired - Fee Related KR100516828B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR10-2002-0044716A KR100516828B1 (ko) 2002-07-29 2002-07-29 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템
JP2003090441A JP4133509B2 (ja) 2002-07-29 2003-03-28 光学的検査の誤った検出防止方法及びシステム
CNB031225802A CN100456024C (zh) 2002-07-29 2003-04-21 用于防止光学检查中错误检测的系统和方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR10-2002-0044716A KR100516828B1 (ko) 2002-07-29 2002-07-29 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템

Publications (2)

Publication Number Publication Date
KR20040011676A KR20040011676A (ko) 2004-02-11
KR100516828B1 true KR100516828B1 (ko) 2005-09-26

Family

ID=30439406

Family Applications (1)

Application Number Title Priority Date Filing Date
KR10-2002-0044716A Expired - Fee Related KR100516828B1 (ko) 2002-07-29 2002-07-29 광학적 검사의 과검출 방지 방법 및 이를 수행하기 위한 시스템

Country Status (3)

Country Link
JP (1) JP4133509B2 (enrdf_load_stackoverflow)
KR (1) KR100516828B1 (enrdf_load_stackoverflow)
CN (1) CN100456024C (enrdf_load_stackoverflow)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102353697B (zh) * 2011-08-31 2015-04-29 上海华虹宏力半导体制造有限公司 在线测评缺陷的方法
CN105865979B (zh) * 2016-03-30 2019-03-12 南京邮电大学 一种测量微液滴电湿效应的装置与方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0876359A (ja) * 1994-07-13 1996-03-22 Kla Instr Corp 自動フォトマスク検査装置及び方法
KR19980042720A (ko) * 1996-11-27 1998-08-17 모리시타 요이찌 전자부품관찰장치 및 전자부품관찰방법
KR20000011616A (ko) * 1998-07-10 2000-02-25 모리시타 요이찌 전자부품실장장치,인식장치및인식방법

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03160450A (ja) * 1989-11-17 1991-07-10 Fujitsu Ltd マスクの欠陥検査方法
JPH04198742A (ja) * 1990-11-28 1992-07-20 Matsushita Electric Ind Co Ltd 配線パターン検査装置
JP3189500B2 (ja) * 1993-06-25 2001-07-16 松下電器産業株式会社 電子部品の外観検査装置および外観検査方法
JPH10221041A (ja) * 1997-02-10 1998-08-21 Toppan Printing Co Ltd 欠陥検査方法
EP1003027B1 (en) * 1997-06-17 2003-08-27 Yuki Engineering System Co, Ltd. Device for optical sheet wrapping inspection
US6282309B1 (en) * 1998-05-29 2001-08-28 Kla-Tencor Corporation Enhanced sensitivity automated photomask inspection system
JP2001208693A (ja) * 2000-01-26 2001-08-03 Dainippon Printing Co Ltd 板状ワークの検査方法及び装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0876359A (ja) * 1994-07-13 1996-03-22 Kla Instr Corp 自動フォトマスク検査装置及び方法
KR19980042720A (ko) * 1996-11-27 1998-08-17 모리시타 요이찌 전자부품관찰장치 및 전자부품관찰방법
KR20000011616A (ko) * 1998-07-10 2000-02-25 모리시타 요이찌 전자부품실장장치,인식장치및인식방법

Also Published As

Publication number Publication date
JP4133509B2 (ja) 2008-08-13
KR20040011676A (ko) 2004-02-11
CN100456024C (zh) 2009-01-28
CN1472528A (zh) 2004-02-04
JP2004061491A (ja) 2004-02-26

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