KR100271767B1 - 플라즈마를 이용하는 반도체장치 제조설비 - Google Patents

플라즈마를 이용하는 반도체장치 제조설비 Download PDF

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Publication number
KR100271767B1
KR100271767B1 KR1019980021372A KR19980021372A KR100271767B1 KR 100271767 B1 KR100271767 B1 KR 100271767B1 KR 1019980021372 A KR1019980021372 A KR 1019980021372A KR 19980021372 A KR19980021372 A KR 19980021372A KR 100271767 B1 KR100271767 B1 KR 100271767B1
Authority
KR
South Korea
Prior art keywords
cathode electrode
cylindrical
cathode
plasma
semiconductor device
Prior art date
Application number
KR1019980021372A
Other languages
English (en)
Korean (ko)
Other versions
KR20000001227A (ko
Inventor
이연휘
이영우
Original Assignee
윤종용
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 윤종용, 삼성전자주식회사 filed Critical 윤종용
Priority to KR1019980021372A priority Critical patent/KR100271767B1/ko
Priority to TW088100025A priority patent/TW404146B/zh
Priority to JP11010424A priority patent/JP2000012472A/ja
Publication of KR20000001227A publication Critical patent/KR20000001227A/ko
Application granted granted Critical
Publication of KR100271767B1 publication Critical patent/KR100271767B1/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32541—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
KR1019980021372A 1998-06-09 1998-06-09 플라즈마를 이용하는 반도체장치 제조설비 KR100271767B1 (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
KR1019980021372A KR100271767B1 (ko) 1998-06-09 1998-06-09 플라즈마를 이용하는 반도체장치 제조설비
TW088100025A TW404146B (en) 1998-06-09 1999-01-04 Equipment for fabricating semiconductor device using plasma
JP11010424A JP2000012472A (ja) 1998-06-09 1999-01-19 プラズマを利用する半導体装置製造設備

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019980021372A KR100271767B1 (ko) 1998-06-09 1998-06-09 플라즈마를 이용하는 반도체장치 제조설비

Publications (2)

Publication Number Publication Date
KR20000001227A KR20000001227A (ko) 2000-01-15
KR100271767B1 true KR100271767B1 (ko) 2001-02-01

Family

ID=19538796

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019980021372A KR100271767B1 (ko) 1998-06-09 1998-06-09 플라즈마를 이용하는 반도체장치 제조설비

Country Status (3)

Country Link
JP (1) JP2000012472A (ja)
KR (1) KR100271767B1 (ja)
TW (1) TW404146B (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100683653B1 (ko) * 2000-06-14 2007-02-20 삼성에스디아이 주식회사 스퍼터링 장치용 캐소드
JP5052017B2 (ja) * 2005-03-28 2012-10-17 京セラ株式会社 プラズマ装置およびそれを用いた太陽電池素子の製造方法
KR100978754B1 (ko) 2008-04-03 2010-08-30 주식회사 테스 플라즈마 처리 장치
US20120298302A1 (en) * 2011-05-23 2012-11-29 Yaomin Xia Vacuum plasma pprocessing chamber with a wafer chuck facing downward above the plasma
KR102161873B1 (ko) * 2014-05-09 2020-10-06 에베 그룹 에. 탈너 게엠베하 기판의 플라즈마 처리 방법 및 장치
JP2021095609A (ja) * 2019-12-18 2021-06-24 キヤノントッキ株式会社 成膜装置、成膜方法及び電子デバイスの製造方法

Also Published As

Publication number Publication date
TW404146B (en) 2000-09-01
JP2000012472A (ja) 2000-01-14
KR20000001227A (ko) 2000-01-15

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