KR100246117B1 - 드라이 에칭 방법 - Google Patents
드라이 에칭 방법 Download PDFInfo
- Publication number
- KR100246117B1 KR100246117B1 KR1019920024094A KR920024094A KR100246117B1 KR 100246117 B1 KR100246117 B1 KR 100246117B1 KR 1019920024094 A KR1019920024094 A KR 1019920024094A KR 920024094 A KR920024094 A KR 920024094A KR 100246117 B1 KR100246117 B1 KR 100246117B1
- Authority
- KR
- South Korea
- Prior art keywords
- gas
- etching
- gas containing
- dry etching
- etching method
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP03352074A JP3083898B2 (ja) | 1991-12-13 | 1991-12-13 | ドライエッチング方法 |
| JP91-352074 | 1991-12-13 | ||
| JP91-331077 | 1991-12-16 | ||
| JP03331077A JP3124599B2 (ja) | 1991-12-16 | 1991-12-16 | エッチング方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR930014814A KR930014814A (ko) | 1993-07-23 |
| KR100246117B1 true KR100246117B1 (ko) | 2000-05-01 |
Family
ID=26573733
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1019920024094A Expired - Lifetime KR100246117B1 (ko) | 1991-12-13 | 1992-12-12 | 드라이 에칭 방법 |
Country Status (2)
| Country | Link |
|---|---|
| KR (1) | KR100246117B1 (enExample) |
| TW (1) | TW224492B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW365029B (en) * | 1995-09-28 | 1999-07-21 | Mitsui Chemicals Inc | Dry processing gas |
-
1992
- 1992-12-10 TW TW081109905A patent/TW224492B/zh not_active IP Right Cessation
- 1992-12-12 KR KR1019920024094A patent/KR100246117B1/ko not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| TW224492B (enExample) | 1994-06-01 |
| KR930014814A (ko) | 1993-07-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
St.27 status event code: A-0-1-A10-A12-nap-PA0109 |
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| R17-X000 | Change to representative recorded |
St.27 status event code: A-3-3-R10-R17-oth-X000 |
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| PG1501 | Laying open of application |
St.27 status event code: A-1-1-Q10-Q12-nap-PG1501 |
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| A201 | Request for examination | ||
| PA0201 | Request for examination |
St.27 status event code: A-1-2-D10-D11-exm-PA0201 |
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| R18-X000 | Changes to party contact information recorded |
St.27 status event code: A-3-3-R10-R18-oth-X000 |
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| PN2301 | Change of applicant |
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