KR100210741B1 - 램프 어닐링 로의 램프 출력 제어 방법 - Google Patents

램프 어닐링 로의 램프 출력 제어 방법 Download PDF

Info

Publication number
KR100210741B1
KR100210741B1 KR1019920011199A KR920011199A KR100210741B1 KR 100210741 B1 KR100210741 B1 KR 100210741B1 KR 1019920011199 A KR1019920011199 A KR 1019920011199A KR 920011199 A KR920011199 A KR 920011199A KR 100210741 B1 KR100210741 B1 KR 100210741B1
Authority
KR
South Korea
Prior art keywords
temperature
control
lamp
output
radiation thermometer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1019920011199A
Other languages
English (en)
Korean (ko)
Other versions
KR930001034A (ko
Inventor
히데키 히가시라
Original Assignee
타카미 츄 무토
고요 세이코 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 타카미 츄 무토, 고요 세이코 가부시키가이샤 filed Critical 타카미 츄 무토
Publication of KR930001034A publication Critical patent/KR930001034A/ko
Application granted granted Critical
Publication of KR100210741B1 publication Critical patent/KR100210741B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment
    • H01L21/67115—Apparatus for thermal treatment mainly by radiation
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D23/00—Control of temperature
    • G05D23/19—Control of temperature characterised by the use of electric means
    • G05D23/27—Control of temperature characterised by the use of electric means with sensing element responsive to radiation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B3/00—Ohmic-resistance heating
    • H05B3/0033—Heating devices using lamps
    • H05B3/0038—Heating devices using lamps for industrial applications
    • H05B3/0047—Heating devices using lamps for industrial applications for semiconductor manufacture

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Automation & Control Theory (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Control Of Temperature (AREA)
KR1019920011199A 1991-06-28 1992-06-26 램프 어닐링 로의 램프 출력 제어 방법 Expired - Fee Related KR100210741B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP91-158495 1991-06-28
JP03158495A JP3096743B2 (ja) 1991-06-28 1991-06-28 ランプアニール炉の温度制御装置

Publications (2)

Publication Number Publication Date
KR930001034A KR930001034A (ko) 1993-01-16
KR100210741B1 true KR100210741B1 (ko) 1999-07-15

Family

ID=15672990

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019920011199A Expired - Fee Related KR100210741B1 (ko) 1991-06-28 1992-06-26 램프 어닐링 로의 램프 출력 제어 방법

Country Status (6)

Country Link
US (1) US5332883A (enExample)
EP (1) EP0520417B1 (enExample)
JP (1) JP3096743B2 (enExample)
KR (1) KR100210741B1 (enExample)
DE (1) DE69213356T2 (enExample)
TW (1) TW209330B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102049814B1 (ko) * 2018-07-09 2019-11-28 (주)하이비젼시스템 램프를 활용한 비접촉식 급속 온도 제어 장치

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2283583B (en) * 1993-10-15 1998-06-24 Seiko Epson Corp Temperature control in a fixing device for an image forming apparatus
US5960158A (en) 1997-07-11 1999-09-28 Ag Associates Apparatus and method for filtering light in a thermal processing chamber
US6064799A (en) * 1998-04-30 2000-05-16 Applied Materials, Inc. Method and apparatus for controlling the radial temperature gradient of a wafer while ramping the wafer temperature
US5970214A (en) 1998-05-14 1999-10-19 Ag Associates Heating device for semiconductor wafers
US5930456A (en) 1998-05-14 1999-07-27 Ag Associates Heating device for semiconductor wafers
US6210484B1 (en) 1998-09-09 2001-04-03 Steag Rtp Systems, Inc. Heating device containing a multi-lamp cone for heating semiconductor wafers
US6771895B2 (en) 1999-01-06 2004-08-03 Mattson Technology, Inc. Heating device for heating semiconductor wafers in thermal processing chambers
JP2000286200A (ja) * 1999-03-31 2000-10-13 Kokusai Electric Co Ltd 熱処理方法および熱処理装置
KR100432135B1 (ko) * 2001-06-30 2004-05-17 동부전자 주식회사 급속 열처리 장치
US20070179677A1 (en) * 2003-11-25 2007-08-02 Polymer Innovation, Llc Self contained bench top enclosure temperature control system

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3803386A (en) * 1972-10-13 1974-04-09 Kerdon Corp Aquarium heater
US3796858A (en) * 1972-12-05 1974-03-12 J Cohn Decorative aquarium heater
US3890486A (en) * 1973-05-01 1975-06-17 Equipment Dev Corp Aquarium-tank heating control
US3895217A (en) * 1974-01-14 1975-07-15 Odell Mfg Inc Thermostatically controlled safety heater for aquariums
US3896289A (en) * 1974-11-13 1975-07-22 Renna Edmond F Di Aquarium water heater
US4149067A (en) * 1976-11-15 1979-04-10 Erhard Boettger Aquarium heater
US4163145A (en) * 1978-05-30 1979-07-31 Neff Paul C Aquarium heater
US4379220A (en) * 1979-05-11 1983-04-05 Raychem Corporation Method of heating liquid
US4276466A (en) * 1979-05-11 1981-06-30 Raychem Corporation Heater with distributed heating element
FR2474802A1 (fr) * 1980-01-29 1981-07-31 Gloria Sa Resistances chauffantes et thermostats pour aquariophilie
DE3021390C2 (de) * 1980-06-06 1984-06-07 Eugen Jäger GmbH, 7156 Wüstenrot Aquarientauchheizkörper
JPS6298722A (ja) * 1985-10-25 1987-05-08 Koyo Seiko Co Ltd 光加熱装置の温度制御装置
KR910002596B1 (ko) * 1985-11-21 1991-04-27 다이닛뽕 스크린 세이조오 가부시기가이샤 온도제어방법 및 그 장치
JP2729283B2 (ja) * 1986-05-12 1998-03-18 光洋精工株式会社 ランプアニール炉の温度制御装置
JP2530124B2 (ja) * 1986-05-12 1996-09-04 光洋精工株式会社 ランプアニ−ル炉の温度制御装置
DE3642181C1 (de) * 1986-12-10 1988-04-14 Wolf & Co Kg Kurt Anordnung zum Beeinflussen der Gar- bzw. Kochzeit bei einem Kochgefaess
KR900008978B1 (ko) * 1987-01-22 1990-12-15 마쯔시다덴기산교 가부시기가이샤 가열조리장치
FR2633481B1 (fr) * 1988-06-22 1996-04-26 Seb Sa Procede de regulation thermique d'un appareil chauffant, dispositif pour sa mise en oeuvre et appareil chauffant comportant ce dispositif
US4889973A (en) * 1988-10-12 1989-12-26 Farinacci Michael F Aquarium heater

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102049814B1 (ko) * 2018-07-09 2019-11-28 (주)하이비젼시스템 램프를 활용한 비접촉식 급속 온도 제어 장치

Also Published As

Publication number Publication date
US5332883A (en) 1994-07-26
DE69213356D1 (de) 1996-10-10
TW209330B (enExample) 1993-07-11
JP3096743B2 (ja) 2000-10-10
EP0520417A1 (en) 1992-12-30
JPH055588A (ja) 1993-01-14
EP0520417B1 (en) 1996-09-04
DE69213356T2 (de) 1997-04-10
KR930001034A (ko) 1993-01-16

Similar Documents

Publication Publication Date Title
US4924073A (en) Method of controlling heat treatment apparatus for substrate
US6191399B1 (en) System of controlling the temperature of a processing chamber
KR100210741B1 (ko) 램프 어닐링 로의 램프 출력 제어 방법
TWI387007B (zh) 用以快速熱處理基材的適度控制法
EP0074108B1 (en) Cooker with heating control system
CN100423184C (zh) 利用动态预测热模型的用于高温斜率应用的晶片温度轨迹控制方法
US4937434A (en) Heat treatment apparatus and heat treatment method
KR100840806B1 (ko) 반도체 웨이퍼들의 열 처리를 위한 방법 및 장치
SE8704816D0 (sv) Anordning for att paverka tillagnings- eller koktiden vid ett kokkerl
US6462313B1 (en) Method and apparatus to control temperature in an RTP system
JPS62266385A (ja) ランプアニ−ル炉の温度制御装置
US5926390A (en) Programmed temperature controller
JPH07201765A (ja) 熱処理装置および熱処理方法
JP2530124B2 (ja) ランプアニ−ル炉の温度制御装置
JPH02298829A (ja) 熱処理装置
JPS6298722A (ja) 光加熱装置の温度制御装置
Vandenabeele et al. The Influence of Facility Conditions on A±0.25° C Repeatability Lamp Voltage Controlled RTP System
JPH10141848A (ja) 汚泥乾燥方法
JPH09302418A (ja) 焼入れ装置
JP2005183485A (ja) 枚葉式ランプ加熱装置
JPH0679730A (ja) 加硫機の温度制御装置
JPH06339930A (ja) 加硫機の温度制御装置
SU1305651A1 (ru) Устройство дл регулировани тепловых режимов печей инфракрасного нагрева
JPS5513819A (en) Power cycle tester
SU440140A1 (ru) Устройство дл регулировани работы выпарных установок

Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

A201 Request for examination
PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

PN2301 Change of applicant

St.27 status event code: A-5-5-R10-R13-asn-PN2301

St.27 status event code: A-5-5-R10-R11-asn-PN2301

FPAY Annual fee payment

Payment date: 20060420

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

LAPS Lapse due to unpaid annual fee
PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20070429

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20070429

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000