KR0130411Y1 - Etching apparatus of metal sheet - Google Patents
Etching apparatus of metal sheet Download PDFInfo
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- KR0130411Y1 KR0130411Y1 KR2019920026100U KR920026100U KR0130411Y1 KR 0130411 Y1 KR0130411 Y1 KR 0130411Y1 KR 2019920026100 U KR2019920026100 U KR 2019920026100U KR 920026100 U KR920026100 U KR 920026100U KR 0130411 Y1 KR0130411 Y1 KR 0130411Y1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/08—Apparatus, e.g. for photomechanical printing surfaces
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
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Abstract
본 고안은 금속시트재 에칭장치에 관한 것으로, 노광(6)처리후 현상(7)이 완료된 금속시트재(1) 에칭(8)처리하기 위해 에칭상자(11)로 이동시키면, 상기 에칭상자(11)내부에 다수개 설치된 상,하분사파이프(12)(12-1)가 좌,우 요동하므로서 분사노즐(13)에서 일정한 압력(1-3kg/cm2)으로 분사되는 에칭액(14)이 에칭상사 측면(15)에 부딪힘에 따라 에칭액(14)이 금속시트재(1)양측벽 끝부분에 떨어져 금속시트재(1)의 불량율이 증가하며, 분사노즐(13)을 재배열시켜야 하는 문제점을 해결하기 위한 것이다.The present invention relates to a metal sheet material etching apparatus, and after moving to the etching box (11) in order to process the metal sheet material (1) etching (8) of the development (7) is completed after the exposure (6), the etching box ( 11) The etching liquid 14 sprayed at a constant pressure (1-3 kg / cm 2 ) from the injection nozzle 13 while the upper and lower injection pipes 12 and 12-1, which are installed in a plurality, swings left and right. As the etching solution 14 hits the side surface of the etching boss 15, the defect rate of the metal sheet material 1 increases due to the edges of both side walls of the metal sheet material 1, and the spray nozzles 13 need to be rearranged. Is to solve.
본 고안은 이와 같은 종래 문제점을 해결하기 위하여 에칭상자 측면에 에칭액 흡수망을 체결하므로서 분사파이프의 좌우요동에 의해 분사노즐에서 분사되는 에칭액의 에칭상자측면에 부딪히는 것을 방지하므로서 금속시트재의 양측폭 끝부분에 과다 에칭되는 현상을 방지하도록한 것으로, 금속시트재 제조장치에 적용한다.In order to solve such a conventional problem, the present invention, by connecting the etching solution absorbing net to the side of the etching box to prevent the impact of the etching box is injected from the injection nozzle by the left and right fluctuations of the injection pipe, both ends of the width of the metal sheet material It is to prevent the phenomenon of being excessively etched in, it is applied to a metal sheet material manufacturing apparatus.
Description
제1도는 일반적인 금속시트재 포토에칭과정을 보인 공정도.1 is a process chart showing a general metal sheet material photoetching process.
제2도는 종래 금속시트재 에칭처리과정을 보인 측면도.2 is a side view showing a conventional metal sheet material etching process.
제3도는 종래 금속시트재 에칭처리과정을 보인 정면도.3 is a front view showing a conventional metal sheet material etching process.
제4도는 종래 금속시트재 에칭후의 좌,우 에칭편차 파형도.4 is a waveform diagram of left and right etching deviations after etching of a conventional metal sheet.
제5도는 본 발명 금속시트재 에칭처리과정을 보인 정면도.5 is a front view showing the etching process of the metal sheet material of the present invention.
제6도의 (a)(b)는 본 발명 금속시트재 에칭처리장치에 구비된 에칭액 흡수망 상세도.Figure 6 (a) (b) is a detailed view of the etching solution absorption network provided in the metal sheet material etching treatment apparatus of the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1 : 금속시트재 11 : 에칭상자1: metal sheet material 11: etching box
12,12-1 : 상,하분사파이프 13 : 분사노즐12,12-1: Up and down injection pipe 13: Injection nozzle
14 : 에칭액 15 : 에칭상자 측면14: etching solution 15: etching box side
16 : 에칭액 흡수망16: etching solution absorption network
본 고안은 금속시트재 에칭장치에 관한 것으로, 특히 처리된 금속시트재를 에칭시 상기 금속시트재 양측 끝부분 상,하면의 과다에칭을 방지하는데 적당한 것이다.The present invention relates to a metal sheet material etching apparatus, in particular, to prevent over-etching on the upper and lower surfaces of both ends of the metal sheet material when etching the treated metal sheet material.
일반적인 금속시트재 제조는 제1도에 도시된 바와같이 먼저, 금속시트재(1)표면에 묻어있는 방청유 및 기타이물질 등을 완전히 탈지(2)한후 표면활성화를 위해 금속시트재(1)표면을 산처리(3)한다.As shown in FIG. 1, general metal sheet material manufacturing is performed by first degreasing (2) the rust-preventive oil and other foreign matters on the surface of the metal sheet material (1), and then removing the surface of the metal sheet material (1) for surface activation. Acid treatment (3).
산처리(3)가 완료되었으면 금속시트재(1)표면에 감광액을 도포한후 감광액이 마르도록 건조(5)한다.After the acid treatment (3) is completed, the photoresist is applied to the surface of the metal sheet material (1) and then dried (5) to dry the photoresist.
이후, 건조(5)가 완료된 금속시트재(1)에 제조할 형상의 원판을 안착하여 노광(5) 및 현상(7)처리한후 비노광부위를 에칭(8)시켜야 금속시트재(1)에 남아있는 감광액을 박막(9) 처리한후 절단(10)하여 완제품을 생산하는 것으로, 종래 금속시트재의 에칭 처리장치는 제2도와 제 3도에 도시된 바와같이, 노광(6)처리된 금속시트재(1)를 에칭(7)시키기 위해 에칭상자(11)내부에 체결된 다수개의 상,하분사파이프(12)(12-1)와, 상기 상,하분사파이프(12)(12-1)사이를 이동하는 금속시트재(1)에 에칭액(14)이 분사되도록, 상,하분사파이프(12)(12-1)에 분사노즐(13)이 체결되어 구성된 것으로, 15는 에칭상자 측면이다.Subsequently, an original plate of a shape to be manufactured is placed on the metal sheet material 1 having been dried (5), and after the exposure (5) and the development (7) treatment, the non-exposed areas are etched (8). After processing the thin film 9 remaining on the thin film 9 and cutting 10 to produce a finished product, the conventional etching apparatus for metal sheet material is exposed metal 6, as shown in FIG. A plurality of upper and lower injection pipes 12 and 12-1 fastened to the inside of the etching box 11 to etch the sheet material 1, and the upper and lower injection pipes 12 and 12-12. 1) The injection nozzle 13 is fastened to the upper and lower injection pipes 12 and 12-1 so that the etching liquid 14 is injected into the metal sheet 1 moving between them. Side.
제 1도를 참조로하여 종래 제2도와 제3도에 도시된 에칭 처리장치를 설명하면 다음과 같다.Referring to FIG. 1, a conventional etching treatment apparatus shown in FIGS. 2 and 3 is as follows.
먼저, 금속시트재(1)표면에 묻어 있는 방청유 및 기타이물질 등을 완전히 탈지(2)한후 표면 활성화를 위해 금속시트재(1)표면을 산처리(3)한다.First, the antirust oil and other foreign substances on the surface of the metal sheet 1 are completely degreased (2), and the surface of the metal sheet 1 is acid treated (3) for surface activation.
산처리가(3)가 완료되었으면 상기 금속시트재(1)표면에 감광액을 도포(4)한후, 건조(5)시킨다.After the acid treatment (3) is completed, the photoresist is applied (4) to the surface of the metal sheet (1), and then dried (5).
이후 건조(5)가 완료된 금속시트재(1)에 제조할 형상의 원판을 안착한후 노광(6)처리한 후 현상(7)시킨다.Subsequently, the original sheet having a shape to be manufactured is placed on the metal sheet 1 which has been dried (5), and then subjected to exposure (6), followed by development (7).
현상(7)이 완료된 금속시트재(1)는 에칭상자(11)로 이동하여 상기 에칭상자(11)내부에 다수개의 상,하분사파이프(12)(12-1)사이에 이동할 때 상기 상,하 분사파이프(12)(12-1)에 체결된 분사노즐(13)에서 분사되는 에칭액(14)에 의해 금속시트재(1)의 비노광부위를 에칭(8)시킨다.The metal sheet material 1 having completed the development 7 moves to the etching box 11 and moves between the plurality of upper and lower injection pipes 12 and 12-1 in the etching box 11. The non-exposed portion of the metal sheet material 1 is etched by the etching liquid 14 injected from the injection nozzle 13 fastened to the lower injection pipes 12 and 12-1.
즉, 상,하분사파이프(12)(12-1)가 좌,우 요동하므로 분사노즐(13)에서 분사되는 에칭액(14)에 의하여 금속시트재(1)의 비노광부위를 일정하게 에칭(8)시킨다.That is, since the upper and lower injection pipes 12 and 12-1 oscillate left and right, the non-exposed portions of the metal sheet material 1 are constantly etched by the etching solution 14 injected from the injection nozzle 13 ( 8)
에칭(8)이 완료된 금속시트재(1)는 상기 금속시트재(1)에 남아 있는 감광액을 제거하도록 박막(9)처리한후 이를 절단(10)하므로서 완제품을 생산되는 것이다.The metal sheet material 1 of which the etching 8 is completed is processed to the thin film 9 to remove the photoresist remaining in the metal sheet material 1, and then cut 10 thereof to produce a finished product.
그러나 종래 금속시트재 에칭장치는 노광(6)처리후 현상(7)이 완료된 금속시트재(1)를 에칭(8)처리하기 위해 에칭상자(11)로 이동시키면, 상기 에칭상자(11)내부에 다수개 설치된 상,하분사파이프(12)(12-1)가 좌,우 요동하므로서 상,하 분사파이프(12)(12-1)에 체결된 분사노즐(13)에서 일정한 압력(1-3kg/cm3)으로 분사되는 에칭액(14)이 에칭상자 측면(15)에 부딪힘에 따라 에칭액(14)이 금속시트재(1) 양측벽 끝부분에 떨어져 제 4도에 도시죈 바와같이 금속시트재(1)양측폭 끝부분의 에칭이 증가되어 금속시트재(1)의 에칭(8)정밀도(약 10μm)가 떨어져 금속시트재(1)의 불량율이 증가하며, 분사노즐(13)을 재배열시켜야 하는 문제점이 있었다.However, in the conventional metal sheet material etching apparatus, if the metal sheet material 1 in which the development 7 is completed after the exposure 6 process is moved to the etching box 11 for the etching 8 process, the inside of the etching box 11 is used. A plurality of upper and lower injection pipes 12 and 12-1 installed on the upper and lower injection pipes 12 and 12-1 are fixed at a predetermined pressure (1- As the etching solution 14 sprayed at 3 kg / cm 3 strikes the side surface 15 of the etching box, the etching solution 14 drops to the end portions of both side walls of the metal sheet material 1, as shown in FIG. Etching at both ends of the ash width is increased, so that the precision of the metal sheet material 1 (8) is reduced (approximately 10 μm), thereby increasing the defective rate of the metal sheet material 1, and the injection nozzle 13 is There was a problem that had to be arranged.
본 고안은 이와같은 종래 문제점을 해결하기 위하여 에칭상자 측면에 에칭액 흡수망을 체결하므로서 분사파이프의 좌우요동에 의해 분사노즐에서 분사되는 에칭액이 에칭상자 측면에 부딪히는 것을 방지하므로서 금속시트재의 양측폭 끝부분에 과다 에칭되는 현상을 방지하도록 하는데 그 목적이 있는 것으로, 첨부된 도면에 의하여 본 고안의 구성 및 작용효과를 셜명하면 다음과 같다.In order to solve such a conventional problem, the present invention is to fasten the etching solution absorbing net to the side of the etching box, preventing the etching liquid injected from the injection nozzle from hitting the side of the etching box by the left and right fluctuations of the injection pipe, so that both ends of the width of the metal sheet material The purpose of the present invention is to prevent the phenomenon of being excessively etched. According to the accompanying drawings, the construction and operation effects of the present invention will be described as follows.
먼저, 금속시트재의 에칭상자는 제5도와 제6도의 (a)(b)에 도시된 바와같이 금속시트재(1)를 에칭(8)시키는 에칭상자(11)와, 에칭상자(11)내부에 다수개 체결된 상,하분사파이프(12)(12-1)와, 상,하분사파이프(12)(12-1) 사이를 이동하는 금속시트재(1)를 에칭(8)시키기 위해 에칭액(14)이 분사되는 상,하 분사파이프(12)(12-1)에 체결된 분사노즐(13)과, 상기 상,하 분사파이프(12)(12-1)의 요동에 의해 분사노즐(13)에서 분사된 에쳉액(14)이 에칭상자측면(15)에 부딪히는 것을 방지하기 위해 플라스틱 또는 내부식재로 제작된 매시(#)20-100의 그물망을 이용한 꺽힘 또는 반원형상의 에칭액 흡수망(16)을 에칭상자측면(15)에 체결하도록 구성된 것이다.First, the etching box of the metal sheet material includes an etching box 11 for etching 8 the metal sheet material 1 and the inside of the etching box 11 as shown in FIGS. 5 and 6 (a) and (b). To etch (8) the metal sheet material (1) moving between the upper and lower injection pipes (12) (12-1) and the upper and lower injection pipes (12) and (12-1) fastened to the plurality. The injection nozzle 13 is coupled to the upper and lower injection pipes 12 and 12-1 through which the etching solution 14 is injected, and the injection nozzles are caused by the rocking of the upper and lower injection pipes 12 and 12-1. Bending or semi-circular etching solution absorbing net using mesh of mesh (#) 20-100 made of plastic or corrosion resistant material to prevent the etchant liquid 14 injected from (13) from hitting the etching box side surface 15 ( 16) is configured to be fastened to the etching box side surface (15).
이와같이 구성된 본 고안의 작용효과는 제1도를 참조로하여 설명하면 다음과 같다.The working effect of the present invention configured as described above will be described with reference to FIG.
먼저, 금속시트재(1)표면에 묻어 있는 방청유 및 기타이물질 등을 완전히 탈지(2)한후 표면 활성화를 위해 금속시트재(1)표면을 산처리(3)한다.First, the antirust oil and other foreign substances on the surface of the metal sheet 1 are completely degreased (2), and the surface of the metal sheet 1 is acid treated (3) for surface activation.
산처리(3)가 완료되었으면 상기 금속시트재(1)표면에 감광액을 도포(4)한후 건조(5)시킨다.After the acid treatment (3) is completed, the photoresist is applied (4) to the surface of the metal sheet (1) and then dried (5).
이후 건조(5)가 완료된 금속시트재(1)에 제조할 형상의 원판을 안착한후 노광(6)처리하여 현상(7)시킨다.Subsequently, the original sheet having a shape to be manufactured is placed on the metal sheet 1 which has been dried (5), and then developed (7) by exposure (6).
현상(7)이 완료된 금속시트재(1)는 에칭상자(11)내부에는 좌,우 요동하는 다수개 체결된 상,하분사파이프(12)(12-1)사이를 이동하면 상,하분사파이프(12)(12-1)에 체결된 분사노즐(13)에서 일정한 압력(1-3kg/cm3)으로 분사되는 에칭액(14)이 에칭상자측면(15)에 체결된 제6도의 (a)(b)에서와 같이 꺽힘 또는 반원현상의 에칭액 흡수망(16)에 의해 흡수되어 금속시트재(1)의 양측폭 끝부분에 과다 에칭되는 것을 방지하여 금속시트재(1)을 일정하게 에칭(8)시킨다.The metal sheet material 1 in which development (7) is completed is moved up and down by moving between a plurality of fastened upper and lower injection pipes 12 and 12-1 that are left and right swinging inside the etching box 11. The etching liquid 14 injected at a constant pressure (1-3 kg / cm 3 ) from the injection nozzle 13 fastened to the pipe 12 and 12-1 is fastened to the etching box side surface 15 (a) of FIG. As shown in (b), the metal sheet material 1 is constantly etched by being prevented from being etched by the etching solution absorbing net 16 of the bending or semi-circle phenomenon and being overetched at both ends of the width of the metal sheet material 1. (8)
에칭(8)이 완료된 금속시트재(1)는 상기 금속시트재(1)에 남아있는 감광액을 제거하도록 박막(9)처리한후 이를 절단(10)하므로서 완제품이 생산되는 것이다.The metal sheet material 1 of which the etching 8 is completed is processed by the thin film 9 so as to remove the photoresist remaining in the metal sheet material 1, and then cut 10 thereof to produce a finished product.
이상에서 설명한 바와같이 노광처리된 금속시트재를 에칭시 좌,우 요동하는 분사 파이프에 의해 분사노즐에서 분사되는 에칭액이 에칭상자측면에 부닺히지 않고 에칭상자 측면에 체결된 에칭액 흡수망에 흡수되므로서 금속시트재의 양측폭 끝부분에 과다 에칭되는 현상을 방지하므로서 금속시트재의 불량율이 저하되고 생산성이 향상되는 효과가 있다.As described above, the etching liquid injected from the injection nozzle by the injection pipe swinging left and right during etching of the exposed metal sheet material is absorbed into the etching solution absorbing net fastened to the etching box side without breaking the etching box side. By preventing the phenomenon of over-etching at both ends of the width of the metal sheet material, there is an effect that the defect rate of the metal sheet material is lowered and productivity is improved.
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Application Number | Priority Date | Filing Date | Title |
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KR2019920026100U KR0130411Y1 (en) | 1992-12-23 | 1992-12-23 | Etching apparatus of metal sheet |
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KR2019920026100U KR0130411Y1 (en) | 1992-12-23 | 1992-12-23 | Etching apparatus of metal sheet |
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KR940015893U KR940015893U (en) | 1994-07-22 |
KR0130411Y1 true KR0130411Y1 (en) | 1999-01-15 |
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Publication number | Priority date | Publication date | Assignee | Title |
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KR100469034B1 (en) * | 1996-11-08 | 2005-10-14 | 엘지마이크론 주식회사 | Etching apparatus of metal sheet and etching method of metal sheet |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100469034B1 (en) * | 1996-11-08 | 2005-10-14 | 엘지마이크론 주식회사 | Etching apparatus of metal sheet and etching method of metal sheet |
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