JPWO2025057394A1 - - Google Patents

Info

Publication number
JPWO2025057394A1
JPWO2025057394A1 JP2024572369A JP2024572369A JPWO2025057394A1 JP WO2025057394 A1 JPWO2025057394 A1 JP WO2025057394A1 JP 2024572369 A JP2024572369 A JP 2024572369A JP 2024572369 A JP2024572369 A JP 2024572369A JP WO2025057394 A1 JPWO2025057394 A1 JP WO2025057394A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024572369A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2025057394A1 publication Critical patent/JPWO2025057394A1/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/024—Quantitative history assessment, e.g. mathematical relationships between available data; Functions therefor; Principal component analysis [PCA]; Partial least square [PLS]; Statistical classifiers, e.g. Bayesian networks, linear regression or correlation analysis; Neural networks
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0218—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterised by the fault detection method dealing with either existing or incipient faults
    • G05B23/0224—Process history based detection method, e.g. whereby history implies the availability of large amounts of data
    • G05B23/0227—Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions
    • G05B23/0235—Qualitative history assessment, whereby the type of data acted upon, e.g. waveforms, images or patterns, is not relevant, e.g. rule based assessment; if-then decisions based on a comparison with predetermined threshold or range, e.g. "classical methods", carried out during normal operation; threshold adaptation or choice; when or how to compare with the threshold
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0262—Confirmation of fault detection, e.g. extra checks to confirm that a failure has indeed occurred
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P50/00—Etching of wafers, substrates or parts of devices
    • H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
    • H10P50/24—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials
    • H10P50/242—Dry etching; Plasma etching; Reactive-ion etching of semiconductor materials of Group IV materials

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Artificial Intelligence (AREA)
  • Evolutionary Computation (AREA)
  • Mathematical Physics (AREA)
  • Testing And Monitoring For Control Systems (AREA)
JP2024572369A 2023-09-15 2023-09-15 Pending JPWO2025057394A1 (https=)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2023/033673 WO2025057394A1 (ja) 2023-09-15 2023-09-15 プロセス処理装置の診断装置、診断システム、および診断方法

Publications (1)

Publication Number Publication Date
JPWO2025057394A1 true JPWO2025057394A1 (https=) 2025-03-20

Family

ID=95021035

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024572369A Pending JPWO2025057394A1 (https=) 2023-09-15 2023-09-15

Country Status (5)

Country Link
JP (1) JPWO2025057394A1 (https=)
KR (1) KR20250040892A (https=)
CN (1) CN120019342A (https=)
TW (1) TW202514853A (https=)
WO (1) WO2025057394A1 (https=)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011258261A (ja) * 2010-06-07 2011-12-22 Mitsubishi Electric Corp 劣化度判定装置及びコンピュータプログラム及び劣化度判定方法
WO2021241576A1 (ja) * 2020-05-29 2021-12-02 株式会社ダイセル 異常変調原因特定装置、異常変調原因特定方法及び異常変調原因特定プログラム
WO2023286142A1 (ja) * 2021-07-13 2023-01-19 株式会社日立ハイテク 診断装置及び診断方法並びにプラズマ処理装置及び半導体装置製造システム
WO2023148967A1 (ja) * 2022-02-07 2023-08-10 株式会社日立ハイテク 診断装置、診断方法、半導体製造装置システム及び半導体装置製造システム

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5259797B2 (ja) 2011-09-05 2013-08-07 株式会社東芝 学習型プロセス異常診断装置、およびオペレータ判断推測結果収集装置
JP6723669B2 (ja) * 2016-09-27 2020-07-15 東京エレクトロン株式会社 異常検知プログラム、異常検知方法および異常検知装置
JP2018147385A (ja) * 2017-03-08 2018-09-20 三菱日立パワーシステムズ株式会社 保守作業計画システム、保守作業計画方法及びプログラム
JP7321452B2 (ja) * 2019-10-11 2023-08-07 Ｂｉｐｒｏｇｙ株式会社 プログラム、情報処理装置、情報処理方法及び学習済みモデルの生成方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011258261A (ja) * 2010-06-07 2011-12-22 Mitsubishi Electric Corp 劣化度判定装置及びコンピュータプログラム及び劣化度判定方法
WO2021241576A1 (ja) * 2020-05-29 2021-12-02 株式会社ダイセル 異常変調原因特定装置、異常変調原因特定方法及び異常変調原因特定プログラム
WO2023286142A1 (ja) * 2021-07-13 2023-01-19 株式会社日立ハイテク 診断装置及び診断方法並びにプラズマ処理装置及び半導体装置製造システム
WO2023148967A1 (ja) * 2022-02-07 2023-08-10 株式会社日立ハイテク 診断装置、診断方法、半導体製造装置システム及び半導体装置製造システム

Also Published As

Publication number Publication date
CN120019342A (zh) 2025-05-16
WO2025057394A1 (ja) 2025-03-20
TW202514853A (zh) 2025-04-01
KR20250040892A (ko) 2025-03-25

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