JPWO2024247461A1 - - Google Patents
Info
- Publication number
- JPWO2024247461A1 JPWO2024247461A1 JP2025523297A JP2025523297A JPWO2024247461A1 JP WO2024247461 A1 JPWO2024247461 A1 JP WO2024247461A1 JP 2025523297 A JP2025523297 A JP 2025523297A JP 2025523297 A JP2025523297 A JP 2025523297A JP WO2024247461 A1 JPWO2024247461 A1 JP WO2024247461A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
- H10P50/20—Dry etching; Plasma etching; Reactive-ion etching
- H10P50/28—Dry etching; Plasma etching; Reactive-ion etching of insulating materials
- H10P50/282—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials
- H10P50/283—Dry etching; Plasma etching; Reactive-ion etching of insulating materials of inorganic materials by chemical means
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P50/00—Etching of wafers, substrates or parts of devices
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Surface Treatment Of Glass (AREA)
- Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023089319 | 2023-05-31 | ||
| PCT/JP2024/012084 WO2024247461A1 (ja) | 2023-05-31 | 2024-03-26 | 凹部構造を有する部材を製造する方法および凹部構造を有する部材 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2024247461A1 true JPWO2024247461A1 (https=) | 2024-12-05 |
Family
ID=93657139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025523297A Pending JPWO2024247461A1 (https=) | 2023-05-31 | 2024-03-26 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20260063997A1 (https=) |
| JP (1) | JPWO2024247461A1 (https=) |
| CN (1) | CN121219816A (https=) |
| TW (1) | TW202514768A (https=) |
| WO (1) | WO2024247461A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1539700A (en) * | 1976-05-14 | 1979-01-31 | Int Plasma Corp | Process for etching sio2 |
| JPS5587436A (en) * | 1978-12-25 | 1980-07-02 | Fujitsu Ltd | Method of producing semiconductor device |
| JP3704965B2 (ja) * | 1998-08-12 | 2005-10-12 | セイコーエプソン株式会社 | ドライエッチング方法及び装置 |
| TW200620451A (en) * | 2004-11-09 | 2006-06-16 | Univ Osaka | Method for forming hole in crystal substrate, and crystal substrate having hole formed by the method |
| JP6028969B2 (ja) * | 2012-08-24 | 2016-11-24 | 国立大学法人大阪大学 | 結晶基板に孔を形成する方法、並びに結晶基板内に配線や配管を有する機能性デバイス |
| JP7567547B2 (ja) * | 2021-02-19 | 2024-10-16 | Ａｇｃ株式会社 | 凹部を有するケイ素含有部材の製造方法 |
-
2024
- 2024-03-26 CN CN202480035726.0A patent/CN121219816A/zh active Pending
- 2024-03-26 WO PCT/JP2024/012084 patent/WO2024247461A1/ja not_active Ceased
- 2024-03-26 JP JP2025523297A patent/JPWO2024247461A1/ja active Pending
- 2024-04-01 TW TW113112268A patent/TW202514768A/zh unknown
-
2025
- 2025-11-11 US US19/385,936 patent/US20260063997A1/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| US20260063997A1 (en) | 2026-03-05 |
| WO2024247461A1 (ja) | 2024-12-05 |
| CN121219816A (zh) | 2025-12-26 |
| TW202514768A (zh) | 2025-04-01 |