JPWO2024225229A1 - - Google Patents
Info
- Publication number
- JPWO2024225229A1 JPWO2024225229A1 JP2025516797A JP2025516797A JPWO2024225229A1 JP WO2024225229 A1 JPWO2024225229 A1 JP WO2024225229A1 JP 2025516797 A JP2025516797 A JP 2025516797A JP 2025516797 A JP2025516797 A JP 2025516797A JP WO2024225229 A1 JPWO2024225229 A1 JP WO2024225229A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/08—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/12—Esters of monohydric alcohols or phenols
- C08F20/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F20/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F30/00—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F30/04—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F30/08—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/388—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/42—Block-or graft-polymers containing polysiloxane sequences
- C08G77/452—Block-or graft-polymers containing polysiloxane sequences containing nitrogen-containing sequences
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- General Chemical & Material Sciences (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023073658 | 2023-04-27 | ||
| PCT/JP2024/015746 WO2024225229A1 (ja) | 2023-04-27 | 2024-04-22 | オルガノポリシロキサン化合物、それを含む組成物、及びその硬化物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024225229A1 true JPWO2024225229A1 (https=) | 2024-10-31 |
| JPWO2024225229A5 JPWO2024225229A5 (https=) | 2026-01-16 |
Family
ID=93256587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2025516797A Pending JPWO2024225229A1 (https=) | 2023-04-27 | 2024-04-22 |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP4703394A1 (https=) |
| JP (1) | JPWO2024225229A1 (https=) |
| CN (1) | CN120981494A (https=) |
| WO (1) | WO2024225229A1 (https=) |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4697026A (en) * | 1986-01-06 | 1987-09-29 | Dow Corning Corporation | Acryl functional silicone compounds |
| CA2013012A1 (en) * | 1989-04-10 | 1990-10-10 | Michael A. Lutz | Ultraviolet cured gels with controlled modulus and viscosity |
| JP2005036018A (ja) | 2003-05-20 | 2005-02-10 | Jsr Corp | 硬化性組成物およびその硬化膜 |
| JP5929131B2 (ja) * | 2011-11-30 | 2016-06-01 | 信越化学工業株式会社 | (メタ)アクリル基含オルガノポリシロキサン及びその製造方法、並びに重合物 |
| JP6595496B2 (ja) * | 2014-03-17 | 2019-10-23 | ダウ シリコーンズ コーポレーション | 硬化性組成物、該硬化性組成物から形成される硬化物、及び該硬化物の形成方法 |
| JP7156151B2 (ja) * | 2019-04-16 | 2022-10-19 | 信越化学工業株式会社 | 活性エネルギー線硬化性組成物 |
| JP7202253B2 (ja) * | 2019-05-10 | 2023-01-11 | 信越化学工業株式会社 | 放射線硬化性オルガノポリシロキサン組成物並びに剥離シート |
| JP7226492B2 (ja) * | 2020-09-03 | 2023-02-21 | 荒川化学工業株式会社 | 化合物、活性エネルギー線硬化型コーティング剤組成物、離型コーティング剤組成物、積層体、及び積層体の製造方法 |
| JP7669733B2 (ja) | 2021-03-11 | 2025-04-30 | Dic株式会社 | アクリル樹脂、活性エネルギー線硬化性樹脂組成物、硬化物及び物品 |
| JP7483649B2 (ja) * | 2021-03-17 | 2024-05-15 | 信越化学工業株式会社 | シロキサン化合物及びその製造方法 |
-
2024
- 2024-04-22 CN CN202480026307.0A patent/CN120981494A/zh active Pending
- 2024-04-22 WO PCT/JP2024/015746 patent/WO2024225229A1/ja not_active Ceased
- 2024-04-22 EP EP24796975.1A patent/EP4703394A1/en active Pending
- 2024-04-22 JP JP2025516797A patent/JPWO2024225229A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| EP4703394A1 (en) | 2026-03-04 |
| WO2024225229A1 (ja) | 2024-10-31 |
| CN120981494A (zh) | 2025-11-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20251009 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20251009 |