JPWO2024189685A1 - - Google Patents
Info
- Publication number
- JPWO2024189685A1 JPWO2024189685A1 JP2025506241A JP2025506241A JPWO2024189685A1 JP WO2024189685 A1 JPWO2024189685 A1 JP WO2024189685A1 JP 2025506241 A JP2025506241 A JP 2025506241A JP 2025506241 A JP2025506241 A JP 2025506241A JP WO2024189685 A1 JPWO2024189685 A1 JP WO2024189685A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/532—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body characterised by the materials
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/62—Electrodes ohmically coupled to a semiconductor
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Electrodes Of Semiconductors (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2023/009363 WO2024189685A1 (ja) | 2023-03-10 | 2023-03-10 | 半導体装置及びその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2024189685A1 true JPWO2024189685A1 (enrdf_load_stackoverflow) | 2024-09-19 |
JPWO2024189685A5 JPWO2024189685A5 (enrdf_load_stackoverflow) | 2025-07-08 |
Family
ID=92754557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2025506241A Pending JPWO2024189685A1 (enrdf_load_stackoverflow) | 2023-03-10 | 2023-03-10 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPWO2024189685A1 (enrdf_load_stackoverflow) |
TW (1) | TW202437394A (enrdf_load_stackoverflow) |
WO (1) | WO2024189685A1 (enrdf_load_stackoverflow) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7193323B2 (en) * | 2003-11-18 | 2007-03-20 | International Business Machines Corporation | Electroplated CoWP composite structures as copper barrier layers |
JP5532743B2 (ja) * | 2009-08-20 | 2014-06-25 | 三菱電機株式会社 | 半導体装置及びその製造方法 |
JP2013166998A (ja) * | 2012-02-16 | 2013-08-29 | Jx Nippon Mining & Metals Corp | 無電解Niめっき被膜を有する構造物、半導体ウェハ及びその製造方法 |
JP5725073B2 (ja) * | 2012-10-30 | 2015-05-27 | 三菱電機株式会社 | 半導体素子の製造方法、半導体素子 |
US10825724B2 (en) * | 2014-04-25 | 2020-11-03 | Taiwan Semiconductor Manufacturing Company | Metal contact structure and method of forming the same in a semiconductor device |
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2023
- 2023-03-10 JP JP2025506241A patent/JPWO2024189685A1/ja active Pending
- 2023-03-10 WO PCT/JP2023/009363 patent/WO2024189685A1/ja active Application Filing
-
2024
- 2024-01-08 TW TW113100725A patent/TW202437394A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
TW202437394A (zh) | 2024-09-16 |
WO2024189685A1 (ja) | 2024-09-19 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250416 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250416 |