JPWO2024162016A1 - - Google Patents

Info

Publication number
JPWO2024162016A1
JPWO2024162016A1 JP2024504788A JP2024504788A JPWO2024162016A1 JP WO2024162016 A1 JPWO2024162016 A1 JP WO2024162016A1 JP 2024504788 A JP2024504788 A JP 2024504788A JP 2024504788 A JP2024504788 A JP 2024504788A JP WO2024162016 A1 JPWO2024162016 A1 JP WO2024162016A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2024504788A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2024162016A1 publication Critical patent/JPWO2024162016A1/ja
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04—Coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Laminated Bodies (AREA)
  • Materials For Photolithography (AREA)
JP2024504788A 2023-02-01 2024-01-18 Pending JPWO2024162016A1 (cg-RX-API-DMAC7.html)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2023013849 2023-02-01
JP2023022399 2023-02-16
PCT/JP2024/001201 WO2024162016A1 (ja) 2023-02-01 2024-01-18 二軸配向積層ポリエステルフィルム

Publications (1)

Publication Number Publication Date
JPWO2024162016A1 true JPWO2024162016A1 (cg-RX-API-DMAC7.html) 2024-08-08

Family

ID=92146487

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2024504788A Pending JPWO2024162016A1 (cg-RX-API-DMAC7.html) 2023-02-01 2024-01-18

Country Status (4)

Country Link
JP (1) JPWO2024162016A1 (cg-RX-API-DMAC7.html)
CN (1) CN120659714A (cg-RX-API-DMAC7.html)
TW (1) TW202438310A (cg-RX-API-DMAC7.html)
WO (1) WO2024162016A1 (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2026054058A1 (ja) * 2024-09-06 2026-03-12 旭化成株式会社 感光性エレメント

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003340953A (ja) * 2002-05-27 2003-12-02 Toray Ind Inc ドライフィルムレジスト用支持体フィルムおよびそれを用いたドライフィルムレジスト
JP2008239743A (ja) * 2007-03-27 2008-10-09 Toray Ind Inc ドライフィルムレジスト支持体用ポリエステルフィルム
JP6957856B2 (ja) * 2016-10-12 2021-11-02 三菱ケミカル株式会社 ドライフィルムレジスト用ポリエステルフィルム
JP7172045B2 (ja) * 2017-01-31 2022-11-16 東レ株式会社 転写材用二軸配向ポリエステルフィルムロール
MY208690A (en) * 2018-04-18 2025-05-24 Mitsubishi Chem Corp Polyester film for dry film resist
JP7124409B2 (ja) * 2018-04-18 2022-08-24 三菱ケミカル株式会社 ドライフィルムレジスト用ポリエステルフィルム
JP2021001284A (ja) * 2019-06-24 2021-01-07 東レ株式会社 二軸配向ポリエステルフィルムおよびその製造方法
JP7543808B2 (ja) * 2019-09-27 2024-09-03 東レ株式会社 ポリエステルフィルム
JP7753748B2 (ja) * 2020-10-13 2025-10-15 東レ株式会社 二軸配向ポリエステルフィルムおよびその製造方法

Also Published As

Publication number Publication date
TW202438310A (zh) 2024-10-01
CN120659714A (zh) 2025-09-16
WO2024162016A1 (ja) 2024-08-08

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