JPWO2024161947A5 - - Google Patents
Info
- Publication number
- JPWO2024161947A5 JPWO2024161947A5 JP2024574376A JP2024574376A JPWO2024161947A5 JP WO2024161947 A5 JPWO2024161947 A5 JP WO2024161947A5 JP 2024574376 A JP2024574376 A JP 2024574376A JP 2024574376 A JP2024574376 A JP 2024574376A JP WO2024161947 A5 JPWO2024161947 A5 JP WO2024161947A5
- Authority
- JP
- Japan
- Prior art keywords
- dispersion
- beckman coulter
- reflectance
- rpm
- cnt
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023015650 | 2023-02-03 | ||
| PCT/JP2024/000599 WO2024161947A1 (ja) | 2023-02-03 | 2024-01-12 | ナノチューブペリクル膜、ペリクル、露光原版及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024161947A1 JPWO2024161947A1 (https=) | 2024-08-08 |
| JPWO2024161947A5 true JPWO2024161947A5 (https=) | 2025-10-03 |
Family
ID=92146491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024574376A Pending JPWO2024161947A1 (https=) | 2023-02-03 | 2024-01-12 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4644990A1 (https=) |
| JP (1) | JPWO2024161947A1 (https=) |
| KR (1) | KR20250126819A (https=) |
| CN (1) | CN120584321A (https=) |
| TW (1) | TW202447332A (https=) |
| WO (1) | WO2024161947A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220047581A (ko) * | 2019-08-26 | 2022-04-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치용 펠리클 멤브레인 |
| JP7283709B2 (ja) * | 2020-04-17 | 2023-05-30 | 三井化学株式会社 | 露光用ペリクル膜、ペリクル、露光原版、露光装置及び露光用ペリクル膜の製造方法 |
| KR20230014781A (ko) * | 2020-08-06 | 2023-01-30 | 미쯔이가가꾸가부시끼가이샤 | 펠리클, 노광 원판, 노광 장치, 펠리클의 제조 방법 및 반도체 장치의 제조 방법 |
| KR102889183B1 (ko) | 2020-09-16 | 2025-11-20 | 린텍 오브 아메리카, 인크. | Ｅｕｖ 리소그래피용 초박형, 초저밀도 필름 |
| JP7684560B2 (ja) | 2021-07-20 | 2025-05-28 | サミー株式会社 | 遊技機 |
| JP2023004883A (ja) * | 2022-05-12 | 2023-01-17 | 楠本化成株式会社 | 配合を容易にするカーボンナノチューブ分散体およびその使用 |
-
2024
- 2024-01-12 KR KR1020257024767A patent/KR20250126819A/ko active Pending
- 2024-01-12 WO PCT/JP2024/000599 patent/WO2024161947A1/ja not_active Ceased
- 2024-01-12 EP EP24749902.3A patent/EP4644990A1/en active Pending
- 2024-01-12 JP JP2024574376A patent/JPWO2024161947A1/ja active Pending
- 2024-01-12 CN CN202480008874.3A patent/CN120584321A/zh active Pending
- 2024-01-22 TW TW113102466A patent/TW202447332A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103134592B (zh) | 一种透射式全穆勒矩阵光谱椭偏仪及其测量方法 | |
| KR101949109B1 (ko) | 재구성가능한 분광 타원계 | |
| CN101949734B (zh) | 提高光束偏振度测量精度的方法 | |
| CN112945864B (zh) | 一种基于双快轴可调弹光调制的广义椭偏分析装置 | |
| US20190317010A1 (en) | Method for conducting optical measurement usingfull mueller matrix ellipsometer | |
| JP2010528334A5 (https=) | ||
| CN101936774B (zh) | 偏振检测装置中器件误差的测量方法 | |
| JPH07503740A (ja) | 光硬化性シクロブタレーン組成物 | |
| JPWO2024161947A5 (https=) | ||
| CN115112028A (zh) | 一种基于激光椭偏系统的薄膜厚度测量装置及测量方法 | |
| CN103196865A (zh) | 同时测量双折射元件厚度及折射率的测量方法 | |
| CN103424839A (zh) | 一种复合波片光轴对准方法 | |
| JP2021134115A5 (https=) | ||
| TWI615604B (zh) | 寬波段消色差複合波片的定標方法 | |
| CN102879103B (zh) | 偏振检测装置器件误差的校正方法 | |
| CN115728245B (zh) | 一种椭偏仪全局参数校准方法及校准系统 | |
| CN104677835A (zh) | 一种全穆勒矩阵椭圆偏振仪的校准方法 | |
| CN103163078B (zh) | 一种提高椭偏仪测量精度的方法 | |
| CN115468744A (zh) | 一种光学测量仪器的系统参数优化配置方法及装置 | |
| CN105136299A (zh) | 一种基于pem的新型红外光谱反演方法及其装置 | |
| CN103968783A (zh) | 一种测量双片波片补偿器中光轴偏差角的方法 | |
| Gut et al. | Measurements of the Attenuation by Means οf the Scattered Light of Planar Waveguide Structure, Basing on the Polymer SU8 on a Substrate οf Sodium-Calcium Glass | |
| CN104820341A (zh) | 一种基于激光干涉光刻技术制备纳米图形的方法 | |
| CN206804278U (zh) | 波片相位延迟量测量装置 | |
| TWI780700B (zh) | 極紫外光光譜橢偏儀 |