JPWO2024161947A1 - - Google Patents
Info
- Publication number
- JPWO2024161947A1 JPWO2024161947A1 JP2024574376A JP2024574376A JPWO2024161947A1 JP WO2024161947 A1 JPWO2024161947 A1 JP WO2024161947A1 JP 2024574376 A JP2024574376 A JP 2024574376A JP 2024574376 A JP2024574376 A JP 2024574376A JP WO2024161947 A1 JPWO2024161947 A1 JP WO2024161947A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B32/00—Carbon; Compounds thereof
- C01B32/15—Nano-sized carbon materials
- C01B32/158—Carbon nanotubes
- C01B32/168—After-treatment
- C01B32/174—Derivatisation; Solubilisation; Dispersion in solvents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/02—Single-walled nanotubes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/26—Mechanical properties
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/34—Length
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2202/00—Structure or properties of carbon nanotubes
- C01B2202/20—Nanotubes characterized by their properties
- C01B2202/36—Diameter
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Health & Medical Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2023015650 | 2023-02-03 | ||
| PCT/JP2024/000599 WO2024161947A1 (ja) | 2023-02-03 | 2024-01-12 | ナノチューブペリクル膜、ペリクル、露光原版及び露光装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPWO2024161947A1 true JPWO2024161947A1 (https=) | 2024-08-08 |
| JPWO2024161947A5 JPWO2024161947A5 (https=) | 2025-10-03 |
Family
ID=92146491
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2024574376A Pending JPWO2024161947A1 (https=) | 2023-02-03 | 2024-01-12 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP4644990A1 (https=) |
| JP (1) | JPWO2024161947A1 (https=) |
| KR (1) | KR20250126819A (https=) |
| CN (1) | CN120584321A (https=) |
| TW (1) | TW202447332A (https=) |
| WO (1) | WO2024161947A1 (https=) |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20220047581A (ko) * | 2019-08-26 | 2022-04-18 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피 장치용 펠리클 멤브레인 |
| JP7283709B2 (ja) * | 2020-04-17 | 2023-05-30 | 三井化学株式会社 | 露光用ペリクル膜、ペリクル、露光原版、露光装置及び露光用ペリクル膜の製造方法 |
| KR20230014781A (ko) * | 2020-08-06 | 2023-01-30 | 미쯔이가가꾸가부시끼가이샤 | 펠리클, 노광 원판, 노광 장치, 펠리클의 제조 방법 및 반도체 장치의 제조 방법 |
| KR102889183B1 (ko) | 2020-09-16 | 2025-11-20 | 린텍 오브 아메리카, 인크. | Ｅｕｖ 리소그래피용 초박형, 초저밀도 필름 |
| JP7684560B2 (ja) | 2021-07-20 | 2025-05-28 | サミー株式会社 | 遊技機 |
| JP2023004883A (ja) * | 2022-05-12 | 2023-01-17 | 楠本化成株式会社 | 配合を容易にするカーボンナノチューブ分散体およびその使用 |
-
2024
- 2024-01-12 KR KR1020257024767A patent/KR20250126819A/ko active Pending
- 2024-01-12 WO PCT/JP2024/000599 patent/WO2024161947A1/ja not_active Ceased
- 2024-01-12 EP EP24749902.3A patent/EP4644990A1/en active Pending
- 2024-01-12 JP JP2024574376A patent/JPWO2024161947A1/ja active Pending
- 2024-01-12 CN CN202480008874.3A patent/CN120584321A/zh active Pending
- 2024-01-22 TW TW113102466A patent/TW202447332A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| TW202447332A (zh) | 2024-12-01 |
| EP4644990A1 (en) | 2025-11-05 |
| CN120584321A (zh) | 2025-09-02 |
| WO2024161947A1 (ja) | 2024-08-08 |
| KR20250126819A (ko) | 2025-08-25 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20250724 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20250724 |