KR20250126819A - 나노튜브 펠리클 막, 펠리클, 노광 원판 및 노광 장치 - Google Patents

나노튜브 펠리클 막, 펠리클, 노광 원판 및 노광 장치

Info

Publication number
KR20250126819A
KR20250126819A KR1020257024767A KR20257024767A KR20250126819A KR 20250126819 A KR20250126819 A KR 20250126819A KR 1020257024767 A KR1020257024767 A KR 1020257024767A KR 20257024767 A KR20257024767 A KR 20257024767A KR 20250126819 A KR20250126819 A KR 20250126819A
Authority
KR
South Korea
Prior art keywords
pellicle
nanotube
film
pellicle film
nanotubes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
KR1020257024767A
Other languages
English (en)
Korean (ko)
Inventor
마사시 후지무라
히사코 이시카와
요스케 오노
아츠시 오쿠보
하루카 모모세
Original Assignee
미쯔이가가꾸가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 미쯔이가가꾸가부시끼가이샤 filed Critical 미쯔이가가꾸가부시끼가이샤
Publication of KR20250126819A publication Critical patent/KR20250126819A/ko
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/168After-treatment
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • C01B32/15Nano-sized carbon materials
    • C01B32/158Carbon nanotubes
    • C01B32/168After-treatment
    • C01B32/174Derivatisation; Solubilisation; Dispersion in solvents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70033Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983Optical system protection, e.g. pellicles or removable covers for protection of mask
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/02Single-walled nanotubes
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/20Nanotubes characterized by their properties
    • C01B2202/26Mechanical properties
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/20Nanotubes characterized by their properties
    • C01B2202/34Length
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2202/00Structure or properties of carbon nanotubes
    • C01B2202/20Nanotubes characterized by their properties
    • C01B2202/36Diameter

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
KR1020257024767A 2023-02-03 2024-01-12 나노튜브 펠리클 막, 펠리클, 노광 원판 및 노광 장치 Pending KR20250126819A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2023-015650 2023-02-03
JP2023015650 2023-02-03
PCT/JP2024/000599 WO2024161947A1 (ja) 2023-02-03 2024-01-12 ナノチューブペリクル膜、ペリクル、露光原版及び露光装置

Publications (1)

Publication Number Publication Date
KR20250126819A true KR20250126819A (ko) 2025-08-25

Family

ID=92146491

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020257024767A Pending KR20250126819A (ko) 2023-02-03 2024-01-12 나노튜브 펠리클 막, 펠리클, 노광 원판 및 노광 장치

Country Status (6)

Country Link
EP (1) EP4644990A1 (https=)
JP (1) JPWO2024161947A1 (https=)
KR (1) KR20250126819A (https=)
CN (1) CN120584321A (https=)
TW (1) TW202447332A (https=)
WO (1) WO2024161947A1 (https=)

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20220047581A (ko) * 2019-08-26 2022-04-18 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치용 펠리클 멤브레인
JP7283709B2 (ja) * 2020-04-17 2023-05-30 三井化学株式会社 露光用ペリクル膜、ペリクル、露光原版、露光装置及び露光用ペリクル膜の製造方法
KR20230014781A (ko) * 2020-08-06 2023-01-30 미쯔이가가꾸가부시끼가이샤 펠리클, 노광 원판, 노광 장치, 펠리클의 제조 방법 및 반도체 장치의 제조 방법
KR102889183B1 (ko) 2020-09-16 2025-11-20 린텍 오브 아메리카, 인크. Euv 리소그래피용 초박형, 초저밀도 필름
JP7684560B2 (ja) 2021-07-20 2025-05-28 サミー株式会社 遊技機
JP2023004883A (ja) * 2022-05-12 2023-01-17 楠本化成株式会社 配合を容易にするカーボンナノチューブ分散体およびその使用

Also Published As

Publication number Publication date
JPWO2024161947A1 (https=) 2024-08-08
TW202447332A (zh) 2024-12-01
EP4644990A1 (en) 2025-11-05
CN120584321A (zh) 2025-09-02
WO2024161947A1 (ja) 2024-08-08

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